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TECHNICAL PAPER
Received: 18 May 2007 / Accepted: 5 September 2007 / Published online: 25 September 2007
Springer-Verlag 2007
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492 Microsyst Technol (2008) 14:491–498
The pencil-lead graphite disc electrode was prepared from a graphitization of DLC and, hence, the conductance of
pencil-lead rod (HB, 0.5 mm in diameter) which was NDLC will rise (Liu and Liu 2005). For successful utili-
inserted into a polyethylene tube and fixed by epoxy glue. zation of NDLC in electrochemical applications in aqueous
The tip of this electrode (Fig. 1) was mechanically polished. solutions, NDLCs with conductance as high as possible are
Before use, the disc electrode was rinsed only with deion- required, of course. NDLC with the highest conductance
ized water and dried. The NDLC microelectrode array was was reached when the layer was sputtered at a nitrogen flow
prepared by vacuum pulse sputtering of graphite on a highly rate of 11 sccm. In this case, the graphite component
conductive (0.008–0.024 X cm) silicon substrate. The areas intensity was higher than that for disordered graphite
which act as working electrodes (an array of 50,625 (Fig. 3). Electrochemical properties of the graphite elec-
microdiscs with 3 lm in diameter and distance 20 lm trode as well as NDLC electrode array were investigated by
between them) were defined photolithographically (Fig. 2). cyclic voltammetry (CV). All the stock solutions were
The composition of NDLC film was analyzed by Raman prepared from analytical grade chemicals (Bi(NO3)35H2O,
spectroscopy. Generally, DLC is characterized by low 99.999%; Pb(NO3)2, 99.0%; Cd(NO3)24H2O, 99.0%;
conductance. The electrical properties can be controlled Zn(NO3)26H2O, 99.0%; CH3COOH, 99.8%; CH3COONa,
during sputtering by doping with nitrogen or different 99.0%; KNO3, 99.0%) in 18 M X cm deionized water. A
metallic elements. Nitrogen atoms incorporated during three-electrode arrangement was used in all experiments.
layer sputter-deposition affect the bonding formation (ratio As a reference, a homemade Ag/AgCl/agar Cl– (3 mol/L)/
between sp2 and sp3 bonded carbon) in the diamond-like agar NO3– (1 mol/L) electrode and, as a counter electrode, a
carbon structure. Usually, an excess of N atoms will lead to platinum wire were used. Voltammetric experiments were
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Microsyst Technol (2008) 14:491–498 493
performed with an electrochemical sensor interface 1 · 10–8 mol/L of each in an 0.1 mol/L acetate buffer. The
(PalmSens, Palm Instruments BV) in combination with a effect of the step increment was investigated in the range
personal computer. SWV or DPV were used in the mea- from 2 to 30 mV (Fig. 5). The best stripping response was
surement of the stripping voltammograms. obtained at 12 mV step increment for Pb(II) and Cd(II),
and at 25 mV for Zn(II). For all metals the peak positions
as well as the peak widths were independent of the step
3 Results and discussion increment. The SW pulse height was investigated in the
range from 20 to 120 mV (Fig. 6). When the pulse height
3.1 Characterization of pencil-lead graphite electrode increased, the stripping response gradually increased. The
and NDLC microelectrode array peak positions were shifted to the cathode direction by
about 20–30 mV per pulse height increment (20 mV) for
The behaviour of the graphite electrode and of the all metals. The peak widths were not influenced by the
NDLC microelectrode array was characterized by cyclic pulse height. The SW frequency had a significant effect on
voltammetry in an 0.1 mol/L acetate buffer (pH = 4.5) or the stripping response (Fig. 7). The peak heights for Pb(II)
0.1 mol/L KNO3 solution. In a potential range from –1.3 to and Cd(II) increase up to 120 Hz. Over this frequency, the
–0.4 V at a scan rate of 50 mV/s, the effect of the bismuth stripping responses decreased. A negligible effect of fre-
film was investigated (Fig. 4). In the case of the graphite quency on response was found for Zn(II). The peak
electrode (with or without bismuth film), the difference positions for all metals were shifted to the cathode direc-
between voltammograms was negligible despite the fact that tion by about 10 mV per frequency increment (20 Hz). In
various concentration of Bi(III) were used (1 · 10–6 to 1 · accordance with the observed results, a step increment of
10–5 mol/L). A remarkably different I–V curve was recorded 12 mV, pulse height 80 mV and frequency 120 Hz were
in the case of NDLC, when the NDLC was preplated with a chosen for SWV experiments with the pencil-lead graphite
bismuth film. In the case of bare NDLC the currents are electrode.
much lower, most likely due to the higher resistance of
NDLC.
3.3 Effect of the bismuth concentration
3.2 Effect of SWV parameters The concentration of Bi(III) used for in situ formation of
the bismuth film on graphite electrodes is known to influ-
The SWV parameters which affect the response of the ence the height of the stripping peaks of the target metals
sensor are SW step increment, SW pulse height and SW (Baldrianova et al. 2006b; Demetriades et al. 2004; Kefala
frequency (Kefala et al. 2003; Charalambous and Econo- et al. 2003; Wang et al. 2000; Charalambous and Econo-
mou 2005). These parameters were investigated using a mou 2005). Stripping voltammograms with the pencil-lead
solution with Pb(II), Cd(II) and Zn(II) concentration of graphite electrode for the solution with 1 · 10–8 mol/L
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494 Microsyst Technol (2008) 14:491–498
concentration of each of Pb(II), Cd(II) and Zn(II) in bismuth film, an increase of bismuth film thickness should
0.1 mol/L acetate buffer are shown in Fig. 8. They were have a little effect on metal stripping. The dependence of
recorded at different contents of Bi(III) from 3.3 · 10–8 the stripping response on Bi(III) concentration at low bis-
(bismuth-to-metals ratio of 3.3:1 ) to 1 · 10–6 mol/L muth-to-metals ratios (\20) and low target metal
(bismuth-to-metals ratio of 100:1). In Fig. 9 there are concentrations (1 · 10–8 mol/L) is probably a special fea-
shown the dependences of the stripping current on the ture of in situ prepared electrodes. We suppose that under
concentration ratio of Bi(III) to metals in the solution. As these conditions the surface of graphite electrode is not
the Bi(III) concentration increased, all the peaks increased covered by bismuth completely.
in height up to a ratio of 20:1. After a slight decrease for
Cd(II) and Zn(II) peaks, the current responses of all metals
became independent of additional increasing of Bi(III). 3.4 Effect of the preconcentration time
Generally, the concentration of Bi(III) in the solution
controls the thickness of the bismuth film. Since bismuth– To improve the electroanalytical performance (especially
metal alloying occurs mainly on the surface (Baldrianova the sensitivity) of the in situ bismuth electrode, the pre-
et al. 2006b), without any diffusion of the metals into concentration time should be optimized for the stripping
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Microsyst Technol (2008) 14:491–498 495
The ability of using the BiFE for simultaneous determi- for the whole calibration range. We have found worse
nation of Pb(II), Cd(II) and Zn(II) is illustrated in Fig. 11. performance of BiFE at determination of Pb, Cd and Zn
All the peaks are well resolved and increase linearly with (Fig. 13) in comparison with calibration procedure car-
the metal concentration in the range from 1 · 10–8 to ried out at a constant concentration of bismuth (2 ·
1.2 · 10–7 mol/L. The resulting calibration plots (Fig. 12) 10–7 mol/L) (Fig. 12). Lower sensitivity, worse linearity
were used for estimating the detection limits. The cali- and higher LOD (2 · 10–8 mol/L for Pb(II) and 3.6 ·
bration data are given in Table 1. On the basis of criteria 10–8 mol/L for Cd) at determination of Pb(II) and Cd(II)
for calculation of the detection limit (Yintercept + 3 · SD) was obtained (Table 1) even though the linearity of bis-
the detection limits were estimated as 2.4 · 10–9 mol/L for muth dependence was high (R = 0.9979). In addition, the
Pb(II), 2.9 · 10–9 mol/L for Cd(II) and 1.2 · 10–8 mol/L calibration of Zn(II) could not be evaluated since the
for Zn(II). In addition, one of the features of BiFE is good stripping response of Zn(II) did not increase with increas-
precision. Moreover, a calibration measurement was car- ing concentration of Zn(II). A series of ten repetitive
ried out under conditions, when the concentration ratio of measurements of a solution with concentration 1 · 10–8
each metal to bismuth in the solution was constant (1:20) mol/L of each of Pb(II), Cd(II) and Zn(II) and 2 · 10–7
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496 Microsyst Technol (2008) 14:491–498
mol/L Bi(III) at 120 s preconcentration time gave highly 2.5 · 10–6 to 1 · 10–5 mol/L Bi(III) in 0.1 mol/L acidified
reproducible stripping peaks with relative standard devia- KNO3 (pH = 2) (Fig. 14). For ASV experiments, a con-
tions 4.5% for Pb(II), 3.4% for Cd(II) and 2.7% for Zn(II). centration of 2.5 · 10–6 or 5 · 10–6 mol/L was chosen
Good precision is attributed to the reproducible bismuth because the stripping current was not increased at concen-
film (2.8%). trations higher than 5 · 10–6 mol/L and, additionally, the
bismuth peak shape was distorted. We observed a minimum
effect of different supporting electrolytes (0.1 mol/L acetate
3.5.2 Bismuth-plated NDLC microelectrode array buffer (pH = 4), nitrate (acidified by HNO3) or perchlorate
solutions) in the bismuth plating procedure. The dependence
The bismuth-plated NDLC microelectrode array for in situ of the stripping response of bismuth-plated NDLC array on
determination of Pb(II) was prepared by co-deposition of Pb(II) concentration and a calibration plot is shown in
Bi(III) and Pb(II) at –1.3 V in a plating solution of Bi(III) in Figs. 15, 16. The stripping currents were linear in the range
a supporting electrolyte with different contents of Pb(II). from 2 · 10–8 to 1.2 · 10–7 mol/L concentration of Pb(II)
Stripping currents from reoxidation of Pb were recorded by with sensitivity of 2.5 lA L/lmol, and the estimated
differential pulse voltammetry (scan rate 30 mV/s, pulse detection limit was 2.2 · 10–8 mol/L.
duration 25 ms, step increment 2 mV and pulse height There are reports on the use of various types of bare
50 mV). The influence of many parameters, including con- carbon (glassy carbon, DLC, polycrystalline diamond) for
centration of the plating solution, the kind of supporting determination of heavy metals by ASV (Liu and Liu 2005;
electrolyte and concentration of Pb(II) on the stripping Manivannan et al. 2004). Deposition of metals ions results
current responses was analyzed. The influence of the con- in a film of atoms, which can occur as a monolayer or
centration of the plating solution on bismuth film formation multilayer on the carbon surface (Manivannan et al. 2004).
for in situ technique was investigated in the range of Results of the determination of the Pb(II) ions in 0.1 mol/L
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Microsyst Technol (2008) 14:491–498 497
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498 Microsyst Technol (2008) 14:491–498
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