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ORIGINAL ARTICLE
a
Chem. Dept. Faculty of Appl. Sci., Umm Al-Qura University, Makkah Al Mukaramha, P.O. Box 118, Saudi Arabia
b
Institute of Inorganic Chemistry, Johannes-Kepler-Universität, Linz, A-4040 Linz, Austria
KEYWORDS Abstract The electrochemical reactions of a copper electrode in Na2S solutions were studied
Copper; using cyclic voltammetry, potentiostatic and galvanostatic measurements. In addition surface
Sodium sulfide; examination and morphological studies were applied using scanning electron microscopy
Corrosion (SEM), energy dispersive analysis of X-rays (EDAX). There are three anodic peaks were found
in the anodic branch of the voltammogram’s. These peaks may be corresponding successively
to the formation of Cu2S, CuS and Cu2O. On the other hand, the cathodic branch contains four
peaks. These peaks correspond to the reduction of copper oxide and copper sulfide formed on the
anodic branch.
ª 2009 King Saud University. Open access under CC BY-NC-ND license.
formed. The oxide film may or may not doped with sul- cuprous oxide doped with elements from solution (sulfur
fur content never approach that of Cu2S scale that doped, oxide scale).
grows on top of it then an oxide-type may begin to grow
beneath the sulfide film as suggested by More and Bac- 3.1.2. Peak (B)
caria (1975). The second anodic peak (B) appears at nearly 0.1 V. This
(ii) Initially thin films of cuprous oxide and cuprous sulfide peak is thought to correspond to the partial transformation
could be formed on the surface in random fashion. Both of the thick corrosion product Cu2S, formed under peak (A)
compounds are cation deficient and that both thickening to CuS:
occur by inducing the outward diffusion of Cu ions to
the film/solution interphase. The build up of these films Cu2 S þ S2
2CuS ð5Þ
is rather complex. The deviation from stoichiometry of
Some CuS may also be formed by the direct combination
Cu2O is different from that Cu2S and consequently rate
between Cu2+ ions and sulfide ions which could block some
of thickening will be different. Beside the cuprous oxide
pores in the sulfide-type film.
is a nonporous film while the cuprous sulfide is porous
film. As mentioned above, the porous structure of the Cu þ S2
CuS þ 2e ð6Þ
sulfide film allows the solution to come in direct contact
with the copper electrode and Cu2O is obtained at the
metal/electrolyte interface at the bottom of Cu2S film. 3.1.3. Peak (C)
The third anodic peak (C) at about 0.5 V, correspond to the
Thus, peak (A) could be attributed to the formation of du- thick cuprous sulfide scale is transformed to copper oxide, ele-
plex corrosion product on copper electrode. The available evi- mental sulfur is produced Nevertheless, the electronic and io-
dence would indicate that the surface of the electrode is nic conduction of the growing film decease because of the
covered with a thick optically black and porous scale which low S2 ion content (Bates and Popplewell, 1975).
is primarily Cu2S. This black-scale is separated from the metal
2CuS þ OH
Cu2 O þ 2S þ Hþ þ 2e ð7Þ
by a thin, subscale which is primarily protective, nonporous
0.700x10-1
0.600x10-1
0.500x10-1
0.400x10-1
i/A
0.300x10-1
0.200x10-1
0.100x10-1
0
0 250.0 500.0 750.0 1000.0
t/s
Figure 2 Potentiostatic current–time curve of copper electrode in Na2S 0.8 M at potential 0.722 V (Cu2S formation, peak I in Fig. 1).
0.175x100
0.150x100
0.125x100
i/A
0.100x100
0.075x100
0.050x100
0.025x100
0
0 250.0 500.0 750.0 1000.0
t/s
Figure 3 Potentiostatic current–time curve of copper electrode in Na2S 0.8 M at potential 0.1 V (CuS formation, peak II in Fig. 1).
186 I. Zaafarany, H. Boller
0.800x10 -2
0.700x10 -2
0.600x10 -2
0.500x10 -2
Q/C
0.400x10 -2
0.300x10 -2
0.200x10 -2
0.100x10 -2
0
0 25.0 50.0 75.0 100.0
t/s
-0.400
-0.450
-0.500
-0.550
E/V
-0.600
-0.650
-0.700
-0.750
-0.800
0 25.0 50.0 75.0 100.0 125.0 150.0 175.0 200.0
t/s
Figure 5 Galvanostatic curve recorded for copper electrode in 0.8 M Na2S constant current 1 A.
-1.000
-0.900
-0.800
-0.700
E/V
-0.600
-0.500
-0.400
-0.300
0 25.0 50.0 75.0 100.0
t/s
Figure 6 Galvanostatic curve recorded for copper electrode in 0.8 M Na2S current = 0.
Corrosion of copper electrode in sodium sulfide solution 187
Figure 9 SEM pattern and EDAX profile of the layer form by CV from 1.8 to 0.8 V at sweep rate 50 mV/s in 0.8 M Na2S.
188 I. Zaafarany, H. Boller
Figure 10 SEM pattern and EDAX profile of the layer form by CV from 1.8 to +0.2 V at sweep rate 50 mV/s in 0.8 M Na2S.
current (Fig. 6) is most interesting, after switching off the cur- Figs. 9 and 10 show EDAX profile of the layer formed on
rent, the potential rapidly increase towards more negative val- the surface of copper often the CV from 1.8 to 0.8 V and
ues, as a consequence of active Cu dissolution. The first 1.8 to 0.2 V, respectively, at sweep rate 50 mV/s. EDAX
potential arrest, which is believed to correspond solely to the analysis of the surface showed amounts of sulfur Cu and oxy-
monolayer of Cu(I) sulfide is denoted as the nucleation poten- gen. This is consistent with above discussion of the layers
tial (E0). The potential plateau reached thereafter at approxi- formed on copper dissolution in Na2S.
mately 0.7 V, corresponding to the peak potential in cyclic
voltammetry measurements as shown in Fig. 1. This potential 4. Conclusion
is denoted as the formation potential Ef. The period of time
corresponding to the potential plateau are denoted as transi- The electrochemical behavior of copper in sodium sulfide solu-
tion time (Southampton Electrochemical Group, 1990). tions are very complex and involve different processes depend-
After the plateau is completed, the potential begins to in- ing in the potential range considered. The formation of
crease again with time, indicating the further growth of an- Roxbyite Cu2xS and Covellite CuS has been observed. The
other sulfide layer. The second step in phenomenological evidence from CV and CA for anodic copper sulfide layer
similar to the first one. Thus, the formation of two well-defined growth model that is compositionally heterogeneous has been
layers is indicated. verified XRD and SEM. Additionally the probe has shown the
presence of an initial layer electrodissolution step involving the
3.4. Surface analysis oxidation of Cu to the Cu(I) state. Nucleation and chemical
sulfidization of the copper has been shown to be an important
The corrosion product formed after immersed the copper elec- layer growth pathway.
trode in 0.8 M Na2S solution was investigated by scanning
electron photomicrograph (SEM) and energy dispersive analy- References
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