ThetaMetrisis ProductLine

ThetaMetrisis
Product Line
February 2010
© 2008-2010 ThetaMetrisis
Table of Contents
Introduction 2
Background
Mission
Technology 3
SWI
WLRS
Built your own tool 6
FR-Monitor Software 8
Configuration examples 9
Applications 10
Contact Info 11
Specifications 12
1
© 2008-2010 Thetametrisis
Introduction
Background
ThetaMetrisis, established Dec. 2008, is a privately held company located in Athens, Greece.
ThetaMetrisis design and produce novel integrated state of the art optical metrology tools for the in-situ and
ex-situ characterization of thin and thick films (film thickness, refractive index and extinction coefficient). We
offer a wide range of tools (FR-series) covering a wide range of diverse applications such as semiconductor,
polymers, process monitoring, biomedical etc.
FR tools are designed to be modular and cost-affordable without any compromise in quality,
accuracy and versatility, thanks to the flexible tool design and parametrized software. ThetaMetrisis’s core
technology is based on White Light Reflectance Spectroscopy developed at the Institute of Microelectronics,
NCSR ‘Demokritos’ offering accurate and simultaneous evaluation of film thickness and refractive index (n, k)
of stacked thin and thick films. Furthermore, ThetaMetrisis offer extensive after-sales support and the
unique feature of collaboration with end-users on the addition of new characteristics in both hardware (FR-
tools configurations) and software.
ThetaMetrisis also delivers unique analytical services for film characterization such as in-situ film
swelling in the presence of controlled vapors, film thickness changes due to thermal cycling, film dissolution
etc.
Mission
At ThetaMetrisis, tools are tailored to customer’s needs without any compromise in accuracy,
quality and after sales support.
2
Technology
Light Interference is a powerful methodology for either the monitoring of film thickness changes or the
measurement of film thickness depending on the configuration used. In FR-tools the Single Wavelength
Interferometry (SWI) and its extension White Light Reflectance Spectroscopy (WLRS) are used.
SWI
Single Wavelength Interferometry (SWI) is an optical methodology suitable for the in-situ monitoring
of dynamic phenomena, such as film swelling, film thickness loss, taking place during the processing of semi-
transparent and transparent films. In fig. 1 a typical SWI set-up is illustrated.
SWI setup consists of a laser source (typically at 650nm), a detector, the power supplies and signal
conditioning electronics, a data acquisition card, and a PC for the data processing and apparatus control. The
sample is placed on a leveled surface and the light beam from the laser source incidents on the sample’s
surface at a nearly 90o angle. In the case of a sample consisting of a thin transparent film (e.g. polymer) over
reflective substrate (e.g. Si), the total energy incident on the detector could be approximated as the sum of
the energy from two beams, i.e. the internal reflections in the transparent film could be neglected in a first
order approximation. One beam (A) comes from the film surface and the second (B) from the film-substrate
interface. The total energy E that reaches the detector could be approximated as:
 4    n1  (eq. 1.1)
E  r012  r122  2  r01  r12  cos  d1 
  
where
 n n
1 2 (eq. 1a)
 n n (eq. 1.1b)
r r o 1
01
n n
1 2
01
n n
o 1
are the relative refractive indices between adjacent layers (0 is considered as ambient, 1 the film, 2 the
substrate), n1 the refractive index and d1 the thickness of the film respectively, while n2 the refractive index
of the substrate, and λ the corresponding laser wavelength used for the measurement.
Figure 1. Schematic of SWI setup over a two

transparent film layers sample. (b) Detail of the
different optical path of the laser beam due to the
reflection between the film layer and the
substrate.
3
From eq. 1.1, the signal at the detector depends on refractive index, film thickness and probing
wavelength. Any changes in the film properties causes change in the detector’s signal that is recorded in the
PC through the data acquisition card. From eq. 1.1, and by considering a film with refractive index 1.5 and a
probing wavelength of 635nm the thickness change for a complete period in the detector’s signal is ~211nm
while if the wavelength is 532nm (green) the equivalent thickness is reduced to ~177nm offering more
sensitive detection of small thickness/refractive index changes. The quantitative analysis of film thickness
changes is limited to output signal changes larger than half of the corresponding period.
WLRS
The White Light Reflectance Spectroscopy (WLRS) methodology resembles SWI but involves, instead
of a laser (single wavelength), a VIS-NIR light source and a PC-driven VIS-NIR miniaturized spectrometer
instead of a photodetector (fig. 2a). The white light coming out from the light source is guided to a birfucated
optical fiber guiding the white light onto the sample under investigation. The typical sample consists of a
stack of transparent and semi-transparent films over an appropriate reflective or transmitting substrate (e.g.
Si wafer, glass slide). At the same time the bifurcated optical fiber collects the reflected beam, directing it to
the spectrometer. The beam from the light source interacts with the sample (fig. 2b) and produces a
reflectance signal, in the VIS-NIR spectrum, which is continuously recorded, from the spectrometer
Figure 2: Typical WLRS set up. (a)

detail of the configuration of Reflection
Probe, (b) detail of the light optical path
through a two layer sample
The total reflection coefficient for a k-layer sample, can be calculated by various approaches. In our
case the Abeles approach was followed where the effective Fresnel coefficient for the k-1 layer is
rk 1   k e i k 2i k 1
 k 1e i k 1

1  rk 1  k e i k 2i k (eq. 2.2)
where ρ is the amplitude and Δ the phase. From this set of equations the reflectance from any k-th
layer can be calculated. In the particular case of the present study i.e. two transparent layers between the
substrate and the environment the total energy can be written as:
4
A
E
B
4 4
A  r012  r122  r232  2r01r122 r23  r012 r122 r232  2r01r23 cos(
(n1d1  n2 d 2 ))  2r12r23 cos( n1d1 ) 
λ 
4 4 4
2r01r12r232 cos( n2 d 2 )  2r01r12 cos( n1d1 )  2r012 r12r23 cos( n1d1 )
   (eq. 2.3)
4 4π
B  1  r r  r r  r r  2r12r23 cos(
2 2 2 2 2 2
n 2 d 2 )  2r01r23cos( (n1d1  n 2 d 2 )) 

01 12 01 23 12 23
λ
4π 4 4 4
2r01r12r23 cos( n2 d 2 )  2r01r12 cos(
2
n1d1 )  2r01r12r23 cos(
2
n1d1 )  2r01r122 r23 cos( (n1d1  n2 d 2 )
λ   
where ni is the refractive index of the ith layer (i=0 for air, 1 for the polymeric film, 2 for the SiO2 layer
and 3 for the Si substrate), and di of the ith layer and λ the corresponding wavelength. The light propagation
between the various interfaces is illustrated in fig. 3. The reflectance spectrum for a two transparent layer on
Si wafer case is illustrated in fig. 4. The three spectra shown in this figure are from samples with slightly
different polymeric films over the SiO2 layer. The fitting of the experimental spectrum with the above
equation is performed by using the Levenberg-Marquardt algorithm. The refractive indices ni of all layers vs.
wavelength are calculated with a spectroscopic ellipsometer (J.A. Woolam) and fitted to a three parameter
(A, B, C) Cauchy model. By applying eq. 2.2 for all wavelengths in the 470-900nm spectrum range, the film
thickness may be calculated for each recorded spectrum.
3000
2500
Reflectance Signal (a.u.)
2000
1500
1000
500
0
500 600 700 800 900
wavelnegth (nm)
Figure 3: Light propagation schematic in Figure 4: Reflectance spectrum of a two layer

a layer stack consisting of two layers (1, 2) on stack (PHEMA / SiO2) over Si substrate under various
the substrate. conditions
5
Built Your Own Tool (FR-Series)
FR-Basic is a modular and extendable series of measurement instruments that share the same
technological platform, the White Light Reflectance Spectroscopy. FR-Basic tools are tailored to the
customer needs and are capable to be used in a wide range of diverse applications from standard
Absorbance/Transmittance and Reflectance measurements, to Films Characterization under temperature
and ambient controlled environment.
FR-Basic tools have been carefully designed to be assembled by modules. Each FR-Basic tool consists of
five modules (Core Module, Case Module, Working Area Module, Optical Fiber Configuration and Cover
Top Module). Furthermore there is an Extensive Series of Accessories. By choosing or combining different
modules one can make the most suitable measurement and characterization set-up for any end-user needs.
Figure 5: FR-Series Building blocks
The Core Unit houses a Miniaturized High Performance Spectrometer, a suitable light source and all
the necessary power sources and controllers. The light emitted from the Light Source and the light to be
analyzed by the spectrometer, are delivered through optical fibers. The light source offers high stability
emission spectrum, software controlled light intensity, and very long operation times. The Core Unit case is
manufactured from high quality industrial anodized aluminum elements offering a robust and modular
construction. The Core Unit is available in six configurations: UV/VIS or VIS/NIR spectrum standard
spectrometer, UV/NIR spectrum with High resolution spectrometer, UV/NIR or VIS/NIR spectrum with
scientific grade (cooled) spectrometer and in NIR spectrum. The supplied software (FR-Monitor) can control
and take advantage of the characteristics of both the spectrometer and the light source. The optical
connections are standard SMA 905 connectors.
There are two Case types available. Case Type A in which the optical connections are in the front panel
for maximum spectrometer’s response and the light source’s sensitivity. When this option is selected, Cover
Top cannot be used. Case Type B in which the optical connections are located on the back top of the case.
This configuration support all accessories and thus offers increased modularity of the FR-basic.
The Working Area Unit serves as the holder for the optical fibers carrying the light from the light
source and to the spectrometer for analysis. There are three configurations available: Flat aluminum Cover,
6
Predrilled Bench Top and Teflon cover. There are several options for the Optical Fiber Configuration Unit
depending on the measurement(s) to be performed: Cuvette Holder, Flow Cell, Reflection Probe, Hot Plate,
Liquid Vessel, Pressure Vessel. The last module is the Top cover with two choices available: transparent
panels, aluminum panels.
In addition to those four modules, the user can select from a wide range of extras.
More details can be found at http://www.thetametrisis.com/products/frbasic.html
Finally there two stand-alone, pre-configured systems (FR-Educational, FR-μProbe) developed for
particular applications. Please see at http://www.thetametrisis.com/products/products.html
FR-Basic-VIS/NIR, Case Type B with optical Bench Top FR-Basic-UV/NIR, Case Type A, with optical Bench Top
FR-Basic VIS, Case Type B, with optical bench top and FR-μProbe, tool with the optical fiber and the microscope
Cover top with Transparent panel. adapter.
Figure 6: FR-tools (3 FR-Basic configurations) and the FR-μProbe
7
Software (FR-Monitor)
FR-Monitor is a software package developed by ThetaMetrisis and provided with every FR-tool (i.e. FR-
Basic, FR-Liquid, FR-Thermal and FR-μProbe) and in all configurations. FR-Monitor is developed with Visual
C++, and it is suitable for Windows operating systems (Windows XP, Windows Vista, Windows 7). FR-Monitor
is designed as a general software platform to control all FR-tools subsystems: spectrometers, light sources,
supporting electronics modules such as temperature controller, humidity sensors etc.
In addition to FR-tool control, FR-Monitor® is
used for the acquisition / processing of the spectral
measurements and offers unique capabilities for a
wide range of applications and versatility. FR-
Monitor supports various Modes of operation such
as, Scope (raw measurement spectrum), Scope-
Dark (raw measurement minus dark spectrum),
Absorbance Mode, Transmittance Mode,
Reflectance Mode. In all modes the following
operations are supported a) spectra recording, b)
Figure 7: FR-Monitor screenshot, after fitting of an
specific wavelength(s) monitoring, c) integration of
experimental spectrum
a specific part of the spectrum.
In particular in Scope, Scope-Dark and Reflectance modes the implemented WLRS algorithms
(ThetaMetrisisTM), allow for the calculation of film thickness (>5nm up to 300μm) and optical constants (n &
k) of free-standing and supported (over transparent or partially/fully reflective substrates) stack of (<10
layers) films.
In all Modes of operations the acquired/calculated parameters can be performed and recorded in
Real Time, to monitoring dynamically change experiments, e.g. dissolution, temperature treatment, ambient
changes conditions, bio-reactions etc. Except the Real Time processing, in which various parameters can be
Calculated/Measured in real time, a Record feature is supported to record a full experiment (with the
addition of the record log). The analysis of the recorded experiment can be made later. In the Off Line
processing all FR-Monitor functions (including the Result View Mode described above) are available.
Figure 8: FR-Monitor ver.1.3. Pull down menus and Buttons bar. Description of the buttons bar (from left to
right): Material Database, Configuration // Real Time View, Fit (Mode) View, Result View (real time processing) // Off
Line and Real Time button pallet, Pause/Stop, back to First Spectrum, back one Spectrum, forward one spectrum,
forward to last spectrum, record spectra // Zoom+, Zoom-, Pan left, Pan right // Capture reference spectrum, Capture
dark spectrum // Scope Mode, Scope - Dark Mode, Absorbance Mode, Transmittance Mode, Reflectance Mode, 0-
100% or 0-1 scale (for Transmittance & Reflectance modes) // Open/Close lamp shutter.
Periodic upgrades of FR-Monitor are scheduled withinQ2 and Q4 of each calendar year. New FR-Monitor
versions will be available at ThetaMetrisis web-site for downloading after customer authorization.
8
Typical Applications
FR-tools are suitable for a wide range of diverse applications covering
single films and stack of films,

supported or free-standing films as well as
transparent or semi-absorbing films
Typical applications for the FR-Tools are:
 Absorbance – Transmission – Fluorescence measurements

 Chemical & Biological Sensing
 Photonic Structures Characterization
 Materials (Metal, Dielectrics) Characterization
 LED, VCSEL, OLED characterization
 Semiconductor Fabrication
 Data Storage Films Characterization
 Polymers Characterization
 Supported & Free-standing films characterization
 Process control (endpoint & fault detection)
 Optical Coatings
 In-Situ Measurements
 Hardcoats
9
FR-Tools Configuration Examples
A) Film thickness measurements of single films or stack of films over substrate or suspended
membrane
For film thickness in the range 10nm -100μm the suggested configuration is:
FR-Basic VIS/NIR
FR-reflectance Holder
FR-reflectance probe 6x1 200μm
FR-basic-cover
B) Film thickness measurements of ultra thick films or stack of films over substrate or suspended
membrane
For film thickness in the range 0.5 – 300 μm the suggested configuration is:
FR-Basic NIR
FR-basic-cover
C) In-situ thermal processing and monitoring of film thickness changes and calculation of
physicochemical parameters (e.g. Tg of polymers)
FR-Basic VIS/NIR
FR-basic-cover
FR-Thermal Kit
D) Film thickness measurements of single films or stack of films over substrate or suspended
membrane, and Absorbance/Transmitance measurements of liquids in UV – VIS range
For film thickness in the range 10nm -100μm and absorbance/transmittance measurements in UV-VIS range,
the suggested configuration is:
FR-Basic UV/VIS
FR-optical-bench top
FR-cuvette-holder-1cm
FR-fiber-600-2m for UV (x2)
FR-cuvette-1cm-2W (x4)
FR-basic-cover
10
Contact Info
ThetaMetrisis
Polydefkous 14
Athens, 12243
Greece
E-mail: info@thetametrisis.com
sales@thetametrisis.com
Tel: +30-6974157612
Fax: +30-2105987898
WEB: www.thetametrisis.com
11
Specifications
Below described the basic core unit’s specifications of FR-Series

tools:
 FR-Basic UV/NIS
 FR-Basic VIS/NIR
 FR-Basic UV/NIR-HR (High Resolution)
 FR-Basic UV/NIR-SG (Scientific Grade)
 FR-Basic VIS/NIR-SG (Scientific Grade)
 FR-Basic NIR
12
FR-Basic UV/VIS
Spectrometer OceanOptics* USB4000
Detector Toshiba TCD1304AP linear CCD array
Scanning range: 200nm - 1100 nm
Number of Pixels 3648
Pixel Size 8 μm x 200 μm
Pixel Well Depth ~100.000 electrons
Optical Design f/4, Symmetrical crossed Czerny-Turner
Focal length 42mm input
Aperture standard 50 µm wide slit, other sizes are possible (5, 10, 25, 50, 100, 200)
Grating Grating #1, 200nm - 850nm, best efficient (>30%) 200nm - 575nm
Detector Len L4, to increases light-collection efficiency
DET4 200-850 filter OFLV Variable Longpass Order-sorting Filter, to block second- and third-
order light
Optical Fiber connector SMA 905 to 0.22 NA single-strand optical fiber
Optical resolution For 50μm slit ~2.0nm (FWHM), for different slit size 0.3nm - 10nm
Signal-to-noise ratio 300:1
A/D resolution 16 bit
Dark noise 50 RMS counts
Acquisition time 10 milliseconds to 10 seconds
Corrected linearity >99.8%
Light Source
Lamp type Combined Deuterium - Tungsten Halogen Light Source (controlled
indipendently)
Wavelength range 200-410 nm (deuterium), 360-2000 nm (tungsten halogen)
Shutter Manual Software control
Output 3.8 watts (deuterium); 1.2 watts (tungsten halogen)
Lifetime ~1500 hours (deuterium); 1500 hours (tungsten halogen)
Time to Stabilize ~10min
General characteristics
Sample size 8mm - 200mm (irregular shape)
Computer requirements PC with Windows XP/Vista and a USB port available
Power requirements 115VAC/230VAC (0.6A/0.3A)
Sort cut circuit Slow Blow Fuse 5A.
Dimensions (W x L x H) Standard Size: 320mm x 360mm x 180mm, Other sizes are possible to
meet particular needs
Weight ~9Kgr, depending on the configuration
*OceanOptics is TM of Ocean Optics, Inc. http://www.oceanoptics.com
13
FR-Basic VIS/NIR
Spectrometer OceanOptics* USB4000
Grating Grating #3, 350nm - 1000nm, best efficient (>30%) 350nm - 850nm
DET4-350-1000 Filter OFLV Variable Longpass Order-sorting Filter, to block second- and third-
order light
Optical resolution For 50μm slit ~2.0nm (FWHM), for different slit size 0.3nm - 10nm
Light Source
Lamp type Tungsten Halogen Light Source
Wavelength range 360-2000 nm
Shutter Manual or Software control
Output 20 watts (tungsten halogen)
Color Temperature 3000oK
Lifetime ~2000 hours (tungsten halogen)
14
FR-Basic UV/NIR-HR (high resolution)
Spectrometer OceanOptics* HR4000

Focal length 101.6 mm input and output
Grating Grating #HC1, 200nm - 1100nm, best efficient 200nm - 1050nm
OFLV-200-1100 filter OFLV Variable Longpass Order-sorting Filter, to block second- and third-
order light
UV enhanced window UV4
Optical resolution For 50μm slit ~1.8nm (FWHM), for different slit size 0.02nm - 8.4nm
Acquisition time 3.8 milliseconds to 10 seconds
Light Source
indipendently)
Computer requirements PC with Windows XP/Vista/7 and a USB port available
Weight ~10.5Kgr, depends of the configuration
15
FR-Basic UV/VIS SG (scientific grade)
Spectrometer OceanOptics* QE65000
Detector Hamamatsu S7031-1006 (cooled)
Number of Pixels 1024 x 58 (1044 x 64 total pixels)
Pixel Size 24.576 μm2
Pixel Well Depth 1000 Ke-
Sensitivity ~0.065 counts / e-
Quantum efficiency 90% peak; 65% at 250 nm
Grating Grating #HC1, with OFLV filter best efficient 200nm - 950nm
OFLV-QE filter OFLV Variable Longpass Order-sorting Filter, to block second- and third-
order light
Dark current 4000 e-/pixel/sec @ 25 ºC; 200 e-/pixel/sec @ 0 ºC
Acquisition time 8 milliseconds to 15 minutes
Light Source
indipendently)
Dimensions (W x L x H) Standard Size: 360mm x 400mm x 180mm, Other sizes are possible in
order to meet particular needs
16
FR-Basic NIS/NIR SG (scientific grade)
Spectrometer OceanOptics* QE65000
Detector Hamamatsu S7031-1006 (cooled)
Number of Pixels 1024 x 58 (1044 x 64 total pixels)
Pixel Size 24.576 μm2
Pixel Well Depth 1000 Ke-
Sensitivity ~0.065 counts / e-
Quantum efficiency 90% peak; 65% at 250 nm
Grating Grating #HC1, with OFLV filter best efficient 350nm - 1100nm
OFLV-QE 350 filter OFLV Variable Longpass Order-sorting Filter, to block second- and third-
order light
Dark current 4000 e-/pixel/sec @ 25 ºC; 200 e-/pixel/sec @ 0 ºC
Acquisition time 8 milliseconds to 15 minutes
Light Source
Shutter Manual or Software controlled
Dimensions (W x L x H) Standard Size: 360mm x 400mm x 180mm, Other sizes are possible in
order to meet particular needs
Weight ~11Kgr, depends of the configuration
17
FR-Basic NIR
Spectrometer OceanOptics* NIRQuest 512
Detector Hamamatsu G9204-512 InGaAs linear array (cooled)
Pixel Size 25 µm x 500 µm
Aperture standard 50 µm wide slit, other sizes are possible (10, 25, 50, 100, 200)
Grating Grating NIR3, 150 l/mm, 900-1700 nm
Filter OF1-RG830 longpass NIR filter, to block second- and third-order light
Optical resolution With 50μm slit ~3.6nm (FWHM), with different slit size 2.0nm - 12.3nm
Signal-to-noise ratio 15000:1 @ 100msec integration, 13000:1 @ 1000msec
Dark noise 6 RMS counts @ 100msec integration, 12 RMS counts @ 1000msec
Light Source
Shutter Manual or software control
Short-cut circuit Slow Blow Fuse 5A.
Weight ~11.5Kgr, depends of the configuration
18

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Figure 1. Schematic of SWI setup over a two

Figure 2: Typical WLRS set up. (a)

Figure 3: Light propagation schematic in Figure 4: Reflectance spectrum of a two layer

Figure 5: FR-Series Building blocks

FR-tools are suitable for a wide range of diverse applications covering

single films and stack of films,

Typical applications for the FR-Tools are:

 Absorbance – Transmission – Fluorescence measurements

Below described the basic core unit’s specifications of FR-Series

 FR-Basic UV/NIR-HR (High Resolution)

 FR-Basic UV/NIR-SG (Scientific Grade)

 FR-Basic VIS/NIR-SG (Scientific Grade)

*OceanOptics is TM of Ocean Optics, Inc. http://www.oceanoptics.com

*OceanOptics is TM of Ocean Optics, Inc. http://www.oceanoptics.com

Spectrometer OceanOptics* HR4000

*OceanOptics is TM of Ocean Optics, Inc. http://www.oceanoptics.com

*OceanOptics is TM of Ocean Optics, Inc. http://www.oceanoptics.com

*OceanOptics is TM of Ocean Optics, Inc. http://www.oceanoptics.com

*OceanOptics is TM of Ocean Optics, Inc. http://www.oceanoptics.com

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