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ABSTRACT:
The main aim of the project proposes high voltage DC generation using
Marx generator precept that uses MOSFET alongside capacitor stacks. The Marx
precept turned into brought with the aid of Erwin Otto Marx. The principle
includes producing a pulse of excessive voltage with the aid of the usage of some
of capacitors parallely in an effort to charge up to on time after which installation
in connection collection to develop an excessive voltage for the duration of the off
length. The machine is used inside the method of era of in Kv’s for actual time
checking out to be finished on electrical equipment insulation effectiveness to be
placed up on strength carriers. The system includes 4 stages such that everyone is
made up from diodes, one MOSFET in conjunction with one capacitor. Diodes are
used in capacitor charging at every stage and MOSFET is used as a transfer to keep
away from power losses. The capacitors are charged in parallel in the course of the
ON time using 555 timer. The capacitors are delivered in a sequence the use of
MOSFET switches in the course of the OFF time. Our challenge offers a compact
and smooth device from a DC deliver of 12 V to get an approx (36-40) Volts.
CHAPTER - I
INTRODUCTION
Both MOSFET and IGBT give variable pulse width and can generate a fast pulse
rise time within a few ns across the load. The switching time of MOSFET is much
lesser than IGBT (typically:- 20 ns for a MOSFET, 200 ns for an IGBT). IGBT are
available at higher voltage ratings (up to 6500 V), where as the MOSFETs are
limited to 1200 V. Solid state Marx Generator has replaced the charging resistors
in conventional Marx with high voltage diodes. Many new topologies with solid
state Marx Generators are proposed in literature. Yifan Wu has proposed repetitive
and high voltage Marx Generator using solid-state devices with inductive based
charging. Inductor here acts as a current limiter at the time of pulse generation.
Drawback of this topology is that it limits the pulse frequency due to long charging
time constant. Also it provides no isolation from input supply source during
discharging mode. A novel solid-state pulsed power modulator driving by
magnetic ring transformers is introduced by Jian Qiu. The charging power supply
here is a full bridge resonant inverter. There is provision of isolation between
charging and discharging loops implemented by magnetic rings. But the limitation
is that due to the use of magnetic rings, the stray parameters distort the output
voltage waveforms. Ju Won Baek proposed a novel repetitive impulse voltage
generator of unipolar configuration by using a boost converter array. The circuit
can easily obtain a high voltage pulse without pulse transformer. The proposed
circuit allows operation at kilohertz frequency with high efficiency. The drawback
is that if the number of boost stacks increases the line inductance increases and
hence the rise time of the output pulse increases. L.M. Redondo have proposed a
topology of solid state Marx Generator with energy recovery reset circuit using
transformer connected at the output. This scheme provides galvanic isolation to the
load. But a limitation is that leakage inductance of transformer limits the rise time
of output pulse. The efficiency of the system decreases due to losses and size of
transformer.
CHAPTER – II
PROPOSED METHOD
The Marx precept changed into advanced by way of Erwin Otto Marx. Its precept
is to generate an excessive voltage pulse. The use of some of capacitors in parallel
to charge up during the on time after which connected in collection to increase
higher voltage during the off length. This precept is used to generate voltages
inside the range of KV’s in actual-time for testing the insulation of the digital
home equipment like transformers and the insulation of the power carrying lines.
This task includes 4 degrees and each degree is manufactured from one MOSFET,
two diodes, and one capacitor. MOSFET is used as a switch; diodes are used to
charge the capacitor at every degree without power loss. A 555 timer generates
pulses for the capacitors to charge in parallel during ON time. During OFF time of
the pulses the capacitors are brought in series with the assist of MOSFET switches.
Subsequently, wide variety of capacitors utilized in series (four in our challenge)
adds up the voltage to approximately 3 (4 capacitors-1 capacitor) instances the
supply voltage. This device shape gives compactness and easiness to make entire
system.
Primary energy supply is taken as a step down AC supply. Its means step down to
suitable voltage and rectified to get consistent DC supply for charging of
capacitors. Capacitors are charge storage tool. The charging of capacitor takes
place as they are parallel linked to the rectifier. When capacitor is having suitable
charge saved in it, switches are used to attach all capacitor in series and discharge
of capacitor take region and we get n times of rectifier voltage across the burden.
Because of numerous sensible constraints, the output voltage is incredibly much
less than n×V (in which n is a degree).
CHAPTER - III
HARDWARE DESCRIPTION
There are some demerits inside the traditional Marx circuit as follows: 1. Long
charging time because the charging cutting-current flows through the charging
resistors. 2. Low efficiency due to the identical cause referred to above. 3. Low
repetition rate. 4. Few output voltage appearance in charging duration because the
charging modern flows via the charging resistors and a load. 5. Turn-off is not
possible due to the usage of the spark gap switches. That allows you to clear up
those troubles, a few new Marx circuits are proposed. Those new progressed
circuits use a semiconductor switch which includes MOSFETs.
The generator capacitance C is to be first charged after which discharged into the
wave shaping circuits. A single capacitor C may be used for voltages as much as
two hundred kV. For generating very excessive voltages, banks of capacitor are
charged in parallel after which discharged in series. The association for charging
the capacitors in parallel and then connecting them in collection for discharging
became initially proposed by using Erwin Otto Marx in 1923 as proven in Fig.3.
Normally the charging resistance is selected to restrict the charging current to
approximately 50 to 100 mA , and the generator capacitance C is chosen such that
the product CRs is ready 10s to at least one min. The space spacing is chosen such
that the breakdown voltage of the distance G is more than the charging voltage V.
As a result, all of the capacitances are charged to the voltage V in about 1 minute.
While the impulse generator is to be discharged, the gaps G are made to spark over
concurrently by using some external means. For that reason, all the capacitors C
get related in series and discharge into the load capacitance or the check item. the
discharge time constant CR1/n (for n tiers) will be very small as compared to
charging time constant CRs so that it will be few be very small be very small
compared to charging time steady CRs if you want to be few seconds.
POWER SUPPLY UNIT
The essential feature of this arrangement is that for both polarities of the voltage at
the bridge input, the polarity of the output is constant.
BASIC OPERATION OF DIODE BRIDGE RECTIFIER
When the input connected at the left corner of the diamond is positive with
respect to the one connected at the right hand corner, current flows to the right
along the upper colored path to the output, and returns to the input supply via the
lower one.
When the right hand corner is positive relative to the left hand corner, current
flows along the upper colored path and returns to the supply via the lower colored
path.
FILTERS: In order to obtain a dc voltage of 0 Hz, we have to use a low pass filter. so
that a capacitive filter circuit is used where a capacitor is connected at the rectifier
output& a dc is obtained across it. The filtered waveform is essentially a dc voltage
with negligible ripples & it is ultimately fed to the load.
REGULATORS: The output voltage from the capacitor is more filtered & finally
regulated. The voltage regulator is a device, which maintains the output voltage
constant irrespective of the change in supply variations, load variations & temperature
changes. Here we use fixed voltage regulator namely LM7805.The IC LM7805 is a
+5v regulator which is used for microcontroller.
Circuit Diagram:
• Output Current up to 1A
• Output Voltages of 5, 6, 8, 9, 10, 12, 15, 18, 24V
Circuit symbols
A variety of symbols are used for the MOSFET. The basic design is
generally a line for the channel with the source and drain leaving it at right angles
and then bending back at right angles into the same direction as the channel.
Sometimes three line segments are used for enhancement mode and a solid line for
depletion mode. (see Depletion and enhancement modes) Another line is drawn
parallel to the channel for the gate. The "bulk" or "body" connection, if shown, is
shown connected to the back of the channel with an arrow indicating PMOS or
NMOS. Arrows always point from P to N, so an NMOS (N-channel in P-well or P-
substrate) has the arrow pointing in (from the bulk to the channel).
If the bulk is connected to the source (as is generally the case with discrete
devices) it is sometimes angled to meet up with the source leaving the transistor. If
the bulk is not shown (as is often the case in IC design as they are generally
common bulk) an inversion symbol is sometimes used to indicate PMOS,
alternatively an arrow on the source may be used in the same way as for bipolar
transistors (out for nMOS, in for pMOS). Comparison of enhancement-mode and
depletion-mode MOSFET symbols, along with JFET symbols.
The orientation of the symbols, (most significantly the position of source
relative to drain) is such that more positive voltages appear higher on the page than
less positive voltages, implying current flowing "down" the page: In schematics
where G, S, D are not labeled, the detailed features of the symbol indicate which
terminal is source and which is drain. For enhancement-mode and depletion-mode
MOSFET symbols (in columns two and five), the source terminal is the one
connected to the triangle. Additionally, in this diagram, the gate is shown as an "L"
shape, whose input leg is closer to S than D, also indicating which is which.
However, these symbols are often drawn with a "T" shaped gate (as elsewhere on
this page), so it is the triangle which must be relied upon to indicate the source
terminal. For the symbols in which the bulk, or body, terminal is shown, it is here
shown internally connected to the source (i.e., the black triangles in the diagrams
in columns 2 and 5). This is a typical configuration, but by no means the only
important configuration. In general, the MOSFET is a four-terminal device, and in
integrated circuits many of the MOSFETs share a body connection, not necessarily
connected to the source terminals of all the transistors.
Metal–oxide–semiconductor structure:
The traditional metal–oxide–semiconductor (MOS) structure is obtained by
growing a layer of silicon dioxide (SiO2) on top of a silicon substrate and
depositing a layer of metal or polycrystalline silicon (the latter is commonly used).
As the silicon dioxide is a dielectric material, its structure is equivalent to a planar
capacitor, with one of the electrodes replaced by a semiconductor. When a voltage
is applied across a MOS structure, it modifies the distribution of charges in the
semiconductor. If we consider a p-type semiconductor (with the density of
acceptors, p the density of holes; p = NA in neutral bulk), a positive voltage, , from
gate to body creates a depletion layer by forcing the positively charged holes away
from the gate-insulator/semiconductor interface, leaving exposed a carrier-free
region of immobile, negatively charged acceptor ions (see doping
(semiconductor)).
If is high enough, a high concentration of negative charge carriers forms in
an inversion layer located in a thin layer next to the interface between the
semiconductor and the insulator. Unlike the MOSFET, where the inversion layer
electrons are supplied rapidly from the source/drain electrodes, in the MOS
capacitor they are produced much more slowly by thermal generation through
carrier generation and recombination centers in the depletion region.
Conventionally, the gate voltage at which the volume density of electrons in the
inversion layer is the same as the volume density of holes in the body is called the
threshold voltage. When the voltage between transistor gate and source (VGS)
exceeds the threshold voltage (Vth), it is known as overdrive voltage. This
structure with p-type body is the basis of the n-type MOSFET, which requires the
addition of an n-type sourceand drain regions.
MOSFET structure and channel formation
An applied gate voltage bends bands, depleting holes from surface (left).
The charge inducing the bending is balanced by a layer of negative acceptor-ion
charge (right). Bottom panel: A larger applied voltage further depletes holes but
conduction band lowers enough in energy to populate a conducting channel. A
metal–oxide–semiconductor field-effect transistor (MOSFET) is based on the
modulation of charge concentration by a MOS capacitance between a body
electrode and a gate electrode located above the body and insulated from all other
device regions by a gate dielectric layer which in the case of a MOSFET is an
oxide, such as silicon dioxide.
Where
The switch is turned on, and a channel has been created, which allows
current to flow between the drain and source. Since the drain voltage is higher than
the source voltage, the electrons spread out, and conduction is not through a
narrow channel but through a broader, two- or three-dimensional current
distribution extending away from the interface and deeper in the substrate. The
onset of this region is also known as pinch-off to indicate the lack of channel
region near the drain. Although the channel does not extend the full length of the
device, the electric field between the drain and the channel is very high, and
conduction continues. The drain current is now weakly dependent upon drain
voltage and controlled primarily by the gate–source voltage, and modeled
approximately as:
As the channel length becomes very short, these equations become quite
inaccurate. New physical effects arise. For example, carrier transport in the active
mode may become limited by velocity saturation. When velocity saturation
dominates, the saturation drain current is more nearly linear than quadratic in VGS.
At even shorter lengths, carriers transport with near zero scattering, known as
quasi-ballistic transport. In the ballistic regime, the carriers travel at an injection
velocity that may exceed the saturation velocity and approaches the Fermi velocity
at high inversion charge density. In addition, drain-induced barrier lowering
increases off-state (cutoff) current and requires an increase in threshold voltage to
compensate, which in turn reduces the saturation current.
Digital:
The growth of digital technologies like the microprocessor has provided the
motivation to advance MOSFET technology faster than any other type of silicon-
based transistor. A big advantage of MOSFETs for digital switching is that the
oxide layer between the gate and the channel prevents DC current from flowing
through the gate, further reducing power consumption and giving a very large input
impedance. The insulating oxide between the gate and channel effectively isolates
a MOSFET in one logic stage from earlier and later stages, which allows a single
MOSFET output to drive a considerable number of MOSFET inputs. Bipolar
transistor-based logic (such as TTL) does not have such a high fanout capacity.
This isolation also makes it easier for the designers to ignore to some extent
loading effects between logic stages independently. That extent is defined by the
operating frequency: as frequencies increase, the input impedance of the
MOSFETs decreases.
Analog:
The MOSFET's advantages in digital circuits do not translate into supremacy
in all analog circuits. The two types of circuit draw upon different features of
transistor behavior. Digital circuits switch, spending most of their time outside the
switching region, while analog circuits depend on the linearity of response when
the MOSFET is held precisely in the switching region. The bipolar junction
transistor (BJT) has traditionally been the analog designer's transistor of choice,
due largely to its higher transconductance and its lower output impedance (drain-
voltage independence) in the switching region. Nevertheless, MOSFETs are widely
used in many types of analog circuits because of certain advantages. The
characteristics and performance of many analog circuits can be scaled up or down
by changing the sizes (length and width) of the MOSFETs used.
By comparison, in most bipolar transistors the size of the device does not
significantly affect its performance. MOSFETs' ideal characteristics regarding gate
current (zero) and drain-source offset voltage (zero) also make them nearly ideal
switch elements, and also make switched capacitor analog circuits practical. In
their linear region, MOSFETs can be used as precision resistors, which can have a
much higher controlled resistance than BJTs. In high power circuits, MOSFETs
sometimes have the advantage of not suffering from thermal runaway as BJTs do.
Also, MOSFETs can be configured to perform as capacitors and gyrator circuits
which allow op-amps made from them to appear as inductors, thereby allowing all
of the normal analog devices on a chip (except for diodes, which can be made
smaller than a MOSFET anyway) to be built entirely out of MOSFETs. This means
that complete analog circuits can be made on a silicon chip in a much smaller
space and with simpler fabrication techniques.
Some ICs combine analog and digital MOSFET circuitry on a single mixed-
signal integrated circuit, making the needed board space even smaller. This creates
a need to isolate the analog circuits from the digital circuits on a chip level, leading
to the use of isolation rings and Silicon-On-Insulator (SOI). Since MOSFETs
require more space to handle a given amount of power than a BJT, fabrication
processes can incorporate BJTs and MOSFETs into a single device. Mixed-
transistor devices are called Bi-FETs (bipolar FETs) if they contain just one BJT-
FET and BiCMOS (bipolar-CMOS) if they contain complementary BJT-FETs.
Such devices have the advantages of both insulated gates and higher current
density.
SNUBBER CIRCUIT
Diode snubbers:
The diode must immediately enter into forward conduction mode as the driving
current is interrupted. Most ordinary diodes, even "slow" power silicon diodes, are
able to turn on very quickly,[1] in contrast to their slow reverse recovery time.
These are sufficient for snubbing electromechanical devices such as relays and
motors. In high-speed cases, where the switching is faster than 10 nanoseconds,
such as in certain switching power regulators, "fast", "ultrafast", or Schottky
diodes may be required
With 1[0]=0, 2[0]= -2π /3, 3[0]= - 4π/3, Ts, being the sampling period of the
control algorithm. When one of these angles becomes higher than 2π, 2π is
subtracted to it to keep it between 0 and 2π.
A sine table is the used to compute the three voltages that should be
applied to the stator, Va[k] = Vsm(s[k]) sita (1[k])
Ts/ 2(1 + Va[k] / Vs max), with = 1- 2/Ts, Vs max and are respectively
the highest value of the stator voltage magnitude and the dead time of the inverter
switches. The resulting data-flow diagram is shown on Figure 23.
Fig 23: data flow diagram of pwm method
The manufacturing process consists of two methods; print and etch, and
print, plate and etch. The single sided PCBs are usually made using the print and
etch method. The double sided plate through – hole (PTH) boards are made by the
print plate and etch method. The production of multi layer boards uses the
methods. The inner layers are printed and etch while the outer layers are produced
by print, plate and etch after pressing the inner layers.
SOFTWARE:
The software used in our project for obtaining schematic layout is ORCAD.
PATTERNING (ETCHING)
The vast majority of printed circuit boards are made by bonding a layer of
copper over the entire substrate, sometimes on both sides, (creating a "blank PCB")
then removing unwanted copper after applying a temporary mask (eg. by etching),
leaving only the desired copper traces. A few PCBs are made by adding traces to
the bare substrate (or a substrate with a very thin layer of copper) usually by a
complex process of multiple electroplating steps.
DRILLING
Holes, or vias, through a PCB are typically drilled with tiny drill bits made of
solid tungsten carbide. The drilling is performed by automated drilling machines
with placement controlled by a drill tape or drill file. These computer-generated
files are also called numerically controlled drill (NCD) files or "Excellon files".
The drill file describes the location and size of each drilled hole.
EXPOSED CONDUCTOR PLATING AND COATING
SOLDER RESIST
Areas that should not be soldered to may be covered with a polymer solder
resist (solder mask) coating. The solder resist prevents solder from bridging
between conductors and thereby creating short circuits. Solder resist also provides
some protection from the environment.
SCREEN PRINTING
Screen print is also known as the silk screen, or, in one sided PCBs, the red
print. Lately some digital printing solutions have been developed to substitute the
traditional screen printing process. This technology allows printing variable data
onto the PCB, including serialization and barcode information for traceability
purposes.
POPULATING
1: Amplification
2: Isolation
3: Impedance matching
D1
FROM MICRO CONTROLLER
U1
D 1N 1190
R1 R3
R4 Q2
1K
1k
Q3
O P -0 7 C /3 0 1 /T I
Q1 100 230/12V
MCT2E R2
R5
500mA
100 B D X37
G C1
1n
100
R8
1k
R6
1k
S
0
Fig 30
The buffer IC used here IC 4050 is used for pulse generation to generate triggering
pulse. There are pull up resistors to provide a resistance in series with the
microcontroller which acts as a current source here. This IC acts as an impedance
improvement buffer IC. Voltage follower concept is used and the signal is getting
inverted. Now it is given to the isolator.
2.4 OPTOCOUPLER
In photovoltaic mode, the diode acts like a current source in parallel with a
forward-biased diode. The output current and voltage are dependent on the load
impedance and light intensity. In photoconductive mode, the diode is connected to
a supply voltage, and the magnitude of the current conducted is directly
proportional to the intensity of light.
Here the LED glows and current flows through the base of the transistor, so
the signal will be got across a resistance and given to another transistor CK 100
which is a PNP transistor to provide inversion again. In order to improve the
voltage and the current gain we go for the Darlington amplifier, which amplifies
the voltage.
Based on controllability:
2.6.2 MOSFET
The component that is used as the switch in the inverter unit is the
MOSFET which is a voltage controlled device. They are the power semi conductor
devices that have a fast switching property with a simple drive requirement.
Fig 33: MOSFET symbol
Vdss= 500 V
Id= 20 A
This MOSFET provide the designer with the best combination of fast
switching, ruggedixed device design, low on-resistance and cost-effectiveness.
This package is preferred for commercial and industrial applications where higher
power levels are to be handled.
CONSTRUCTION
N CHANNEL DEPLETION
When negative voltage applied between the gate and source (VGS) , The
positive charge induced in the channel and the channel is depleted of electrons.
Thus there is no flow of current through this terminal.
When appositive voltage is applied between the gate and source, more
electros are induced in the channel by capacitor action. So there is a flow of current
from drain to source. As the gate source voltage increases, the channel gets wider
by accumulation of more negative charges and resistance to the channel decreases.
Thus more current from drain to source. As there is a current flow through device
for zero Gate Source Voltage, it is called as normally ON MOSFET.
N CHANNEL ENHANCEMENT
When the positive voltage is applied between the gate and the source, the
electron get accumulated in the channel by capacitive induction in the channel
formed out of electrons allowing the flow of current. This channel gets widened as
more positive voltage is applied between gate and source. There will not be any
condition through the device if the gate source voltage is negative.
Setting VGS to a constant value, varying VDS and nothing the corresponding
changes into give the drain characteristic. VGS ≤0, the device does not conduct drain
current and the device is considered to be in the off state. In this state, the entire
voltage drop across the device i.e., between drain and source.
In the ON state of the device, gate source voltage is positive and the drain
current is increased with the increase in the gate source voltage. It is understood
clearly in the transfer characteristics. As the enhancement type mosfet conduct
only after applying positive gate voltage, it is also called as normally OFF
MOSFET. For this reason it becomes easily controllable and is used in power
electronics as a switch.
CONCLUSION
The simulation gives the concept of HVDC generation i.e., 2kV the use of sphere
gaps. In this study, solid state devices consisting of MOSFET and diodes are used
in Marx generator to replace of switches and resistors. Moreover, its miles
reasonable that MOSFET drivers make use of method of self-provided power. The
Marx generator is used to multiply voltage by way of the usage of MOSFETS. The
number of MOSFETS used comes to a decision the wide variety of times the
voltage needs to be increased. In this examine we've got used four stages in
hardware and the circuit multiplies the enter voltage effectively
FUTURE SCOPE
The output voltage increment depends on the amount of stages. The switching
devices i.e., MOSFETS is replaced by way of the alternative devices. In this circuit
we obtain high voltage and low current so in future we increase voltage as well as
current.
REFERENCES
[1] J.W.Baek, D.W. Yoo, G.H. Rim, and J.S. Lai, " Solid State Marx generator
using series connected IGBTs ‖, IEEE Trans. on Plasma Science, Vol. 33, No. 4,
pp.1198-1204, Aug. 2005.
[2] Kefu Liu, Yan Luo and Jian Qiu, "A Repetitive High Voltage Pulse Adder
Based on Solid State Switches", IEEE Trans. on Dielectrics and Electrical
Insulation Vol. 16, No. 4, August 2009.
[3] Tatsuro Sakamoto and Hidenori Akiyama, "Solid-State Dual Marx Generator
With a Short Pulse width", IEEE Trans. on Plasma Science, Vol. 41, No. 10,
October 2013.
[4] Harshada C. Bhosale, Bindu S., Sincy G., P.C. Saroj, Archana S, " Design and
Simulation of 50 kV, 50 A Solid State Marx Generator", IEEE, International
Conference on Magnetics, Machines & Drives (AICERA- 2014 iCMMD).
[5] "Solid State Pulsed Power Systems", Dr. Stephan Roche Physique & industrie,
17 rue de la rente Logerot, 21160 Marsannay la cote, France.
[6] R. Cassel and S. Hitchcock, ―A new type high voltage fast rise/fall time solid
state Marx pulse modulator‖, IEEE Parti cle Accelerator Conf., New Mexico, USA,
pp. 865-867, 2007.
[7] Yifan Wu, Kefu Liu, Jian Qiu , XiaoXu Liu and Houxiu Xiao, " Repetitive and
High Voltage Marx Generator Using Solid-state Devices", IEEE Trans. on
Dielectrics and Electrical Insulation Vol. 14, No. 4; August 2007.
[8] Jian Qiu, Kefu Liu and Liuxia Li, " Stray Parameters in a Novel Solid State
Pulsed Power Modulator", IEEE Trans. on Dielectrics and Electrical Insulation
Vol. 20, No. 4; August 2013.
[9] Ju Won Baek, Dong Wook Yoo, Geun Hie Rim and Jih-Sheng (Jason) Lai,
"Solid State Marx Generator Using Series- Connected IGBTs", IEEE Trans. on
Plasma Science, Vol. 33, No. 4, August 2005.