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Semiconductors
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ELECTRONIC SCIENCE UNIT-I
Conduction in Semiconductors
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ELECTRONIC SCIENCE UNIT-I
Creation of Hole
Due to the thermal energy supplied to the crystal, some electrons tend
to move out of their place and break the covalent bonds. These broken
covalent bonds, result in free electrons which wander randomly. But
the moved away electrons creates an empty space or valence behind,
which is called as a hole.
Hole Current
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ELECTRONIC SCIENCE UNIT-I
Electrons and holes while in random motion, may encounter with each
other, to form pairs. This recombination results in the release of heat,
which breaks another covalent bond. When the temperature increases,
the rate of generation of electrons and holes increase, thus rate of
recombination increases, which results in the increase of densities of
electrons and holes. As a result, conductivity of semiconductor
increases and resistivity decreases, which means the negative
temperature coefficient.
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ELECTRONIC SCIENCE UNIT-I
Intrinsic Semiconductors
Doping
Pentavalent Impurities
The pentavalent impurities are the ones which has five valence
electrons in the outer most orbit. Example: Bismuth, Antimony,
Arsenic, Phosphorus
Trivalent Impurities
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ELECTRONIC SCIENCE UNIT-I
The trivalent impurities are the ones which has three valence
electrons in the outer most orbit. Example: Gallium, Indium,
Aluminum, Boron
Extrinsic Semiconductor
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ELECTRONIC SCIENCE UNIT-I
8
ELECTRONIC SCIENCE UNIT-1 MCQs
1. A semiconductor is formed by 1. 2
……… bonds.
2. 3
1. Covalent
3. 6
2. Electrovalent
4. 4
3. Co-ordinate
Answer: : 4
4. None of the above
5. High electron mobility transistors
Answer: : 1 can be constructed with the use of
single semiconductor material like
2. A semiconductor has …………
GaAs that have high electron
temperature coefficient of resistance.
mobility.
1. Positive a) True
b) False
2. Zero
Answer: b
3. Negative
Explanation: High electron mobility
4. None of the above transistor is a hetero junction FET,
meaning that it does not use a single
Answer: : 3
semiconductor material, but instead
3. The most commonly used is constructed with several layers of
semiconductor is ……….. compound semiconductor materials.
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ELECTRONIC SCIENCE UNIT-1 MCQs
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ELECTRONIC SCIENCE UNIT-1 MCQs
Answer: : 4 Answer: : 2
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ELECTRONIC SCIENCE UNIT-2
Introduction
The starting material for integrated circuit (IC) fabrication is the single
crystal silicon wafer. The end product of fabrication is functioning chips
that are ready for packaging and final electrical testing before being
shipped to the customer. The intermediate steps are referred to as
wafer fabrication (including sort). Wafer fabrication refers to the set of
manufacturing processes used to create semiconductor devices and
circuits. Some common wafer terminology used are chip, die, device,
circuit, and microchip. These refer to patterns covering the wafer
surface that provide specific functionality. The terminology die and chip
are most commonly used and interchangeably refer to one standalone
unit on the wafer surface. Thus, a wafer can be said to be divided into
many dies or chips, as shown in figure 1.
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ELECTRONIC SCIENCE UNIT-2
Figure 1: Schematic of wafer showing the division into individual dies. One
individual die with electrical contacts is also shown. Some of these dies are used
for testing. Dies at the edge dies are incomplete. Adapted from Microchip
fabrication - Peter van Zant.
Figure 2: Schematic of various components of a wafer. (1) Chip (2) Scribe line (3)
Test die (4) Edge chips (5) Wafer crystal plane (6) Flats/notches.
The area between the dies is called a scribe line. This is used for
separating the individual dies when the fabrication is complete. Scribe
lines can be blank but most often they consist of test structures that are
used for electrical testing (e-test) during fabrication. This helps in
identification of process issues during fabrication, without having to
wait for the entire chip to be made.
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ELECTRONIC SCIENCE UNIT-2
Along with the regular ICs, test dies or engineering dies are also
fabricated. These dies are used for electrical testing at the end, for
process or quality control. There are also some partial or edge dies at
the corners of the wafers. These arise because the wafers are circular
while the dies are usually rectangular. Corner dies can be used for
making smaller testing circuits for process control.
1. Layering
2. Patterning
3. Doping
4. Heat treatment
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ELECTRONIC SCIENCE UNIT-2
Layering
The layering step is used to add thin layers to the wafer surface. These
layers can be of a different material or a different microstructure or
composition of the same material (polycrystalline Si or silicon oxide).
Figure 3 shows the cross-section of a simple MOSFET, highlighting the
various thin layers that are part of the device. The different layers help
in defining the various components of the MOSFET and in obtaining a
functional device e.g. the passivation layer helps in electrically isolating
the metal contacts to the source, drain and gate. Layering can be of
many different types, though they can be broadly classified into two
main categories: grown and deposited. The various types of layering
operations are shown in figure 4.
In the case of grown layers, the underlying wafer material (typically Si)
is consumed. A classic example is the growth of the oxide layer, as
shown in the MOSFET structure in figure 3. This is formed by oxidation
of Si into SiO2 and is usually done in two ways.
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ELECTRONIC SCIENCE UNIT-2
Figure 3: Cross section of a MOSFET showing the different layers. Poly Si is used as
gate with SiNx used as the interlayer dielectric. Layering is the process by which
all of these different materials are added to the MOSFET.
Figure 4: Different kinds of layering steps. All layering steps are classified into two
major types. Grown layers use the underlying silicon substrate to form new layers.
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ELECTRONIC SCIENCE UNIT-2
Deposited layers do not consume the silicon but are added to the surface.
Adapted from Microchip fabrication - Peter van Zant.
In both cases, the SiO2 layer is formed on the surface by consuming the
underlying Si layer. For further oxidation, the oxidizing species (O2 or
H2O) has to diffuse through the oxide to reach the Si surface. Similarly,
nitrides can also be grown by consumption of Si.
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ELECTRONIC SCIENCE UNIT-2
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ELECTRONIC SCIENCE UNIT-2 MCQs
1. Find the basic chemical reaction 3. Where are the silicon wafers
used for Epitaxial growth? placed in the reaction chamber for
the epitaxial growth process?
a) Cup
b) Boats
c) Ingots
d) Crucible
Answer: b
Explanation: The silicon rods are not
Answer: c directly placed in the reaction
Explanation: The basic chemical chamber instead they are placed on a
reaction used for epitaxial growth of rectangular graphite rod called boats
pure silicon is the hydrogen reduction and then it is heated to 1200oc.
of silicon tetrachloride.
4. Which of the following is used to
2. Which component is added to the obtain silicon crystal structure while
p-type material in order to get the fabricating Integrating Circuits?
impurity concentration in epitaxial a) Oxidation
films? b) Epitaxial growth
a) Bi-borane (B2H2) c) Photolithography
b) Phosphine (PH3) d) Silicon wafer preparations
c) Boron chloride (BCl3)
Answer: b
d) Phosphorous pentoxide (P2O5)
Explanation: Epitaxial growth is
Answer: a arranging of atoms in single crystal
Explanation: Bi-Borane is used for fashion upon a single crystal
doping p-type materials and substrate, so that the resulting layer
Phosphine is used for doping n-type is an extension of the substrate
materials whereas Boron chloride crystal structure.
and Phosphorous pentoxide are used
5. Why oxidation process is required?
for doping during diffusion process.
a) To protect against contamination
b) To use it for fabrication various
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ELECTRONIC SCIENCE UNIT-2 MCQs
components Answer: b
c) To prevent diffusion of impurities Explanation: Silicon wafers are raised
d) All of the mentioned to a high temperature in the range
950-1115oc and are exposed to gas.
Answer: d
The thickness of layer is governed by
Explanation: Oxidation provides
time, temperature and its moisture
extreme hard protective coating, thus
content.
protecting against contamination and
by selective etching, it can be made 8. Oxidation process in silicon planar
to fabricate components. technology is also called as
a) Photo oxidation
6. Mention the chemical reaction for
b) Silicon oxidation
oxidation process
c) Vapour oxidation
a) Si + 2H2O –> SiO2 + 2H2
d) Thermal oxidation
b) Si + O2 –> SiO2
c) 2Si + 2H2O –> 2SiO2 + 2H2 Answer: d
d) 2Si + 2H2O + 2O2 –> 2SiO2 + 2H2 + Explanation: The oxidation process is
O2 called thermal oxidation process
because high temperature is used to
Answer: a
grow the oxide layer.
Explanation: For oxidation process,
silicon wafers are heated to a high 9. In Crzochralski crystal growth
temperature and simultaneously they process, the materials are heated up
are exposed to a gas containing H2O to
or O2 or both. a) 950oc
b) 1000 oc
7. At what temperature should the
c) 1420oc
oxidation process be carried out to
d) 1200oc
get an oxide film of thickness 0.02 to
2µm? Answer: c
a) 0-105oc Explanation: The materials are
b) 950-1115oc heated above 1420oc which is greater
c) 200-850oc than the silicon melting point.
d) 350-900oc
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ELECTRONIC SCIENCE UNIT-2 MCQs
10. How to obtain silicon ingots of 10- 12. The process involved in
15cm diameter? photolithography is
a) By crystal pulling process a) Making of a photographic mask
b) By crystal melting process only
c) By crystal growing process b) Photo etching
d) All of the mentioned c) Both photo etching and making of
photographic mask
Answer: a
d) None of the mentioned
Explanation: During crystal pulling
process, the seed crystal and the Answer: c
crucible rotate in opposite direction, Explanation: Photolithographic
in order to produce ingots of circular involves both processes in sequence.
cross section (diameter of 10/15cm First photographic mask is used for
normally obtained). artwork and reduction. Then Photo
etching for removal of SiO2 from
11. If the thickness of wafer after all
designed region.
polishing steps in silicon wafer
preparation is 23-40 mils. Find its raw 13. How will be the initial artwork
cut slice thickness? done for a normal IC?
a) 16-32 mils a) Smaller than the final dimension of
b) 23-40 mils chip
c) 8-12 mils b) Same as that of final dimension of
d) None of the mentioned chip
c) Larger than the final dimension of
Answer: a
chip
Explanation: Usually the silicon wafer
d) None of the mentioned
obtained has a very rough surface
due to slicing operation. So, these Answer: c
wafers undergo a number of Explanation: The initial artwork of an
polishing steps to produce flat and IC is done at a scale several hundred
smooth polished surface. Therefore, times longer than the final
the thickness of wafers will be dimensions. This is because for a tiny
reduced from its raw cut slice. chip, larger the artwork, more
accurate is the final mask.
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ELECTRONIC SCIENCE 3
Superposition theorem
currents which would flow through the branch for each source keeping
all other sources dead.
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ELECTRONIC SCIENCE 3
in it when each source acts alone while all the other independent
sources are replaced by their internal resistances.
It is only applicable to the circuit which is valid for the ohm’s law (i.e.,
for the linear circuit).
The statement.
Here, two 1.5 Volt batteries present in the circuit. At this condition, the
current through 1 ohm resistance is 1.2 ampere.
The ammeter indicates this value in the above picture.
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ELECTRONIC SCIENCE 3
Now, we replace the left side battery by a short circuit as shown. In this
case the current flowing through the 1 ohm resistance is 0.6 ampere.
The ammeter indicates this value as shown in the picture above.
If someone replaces all the sources from the circuit by their internal
resistance except first source which is now acting along in the circuit
and giving current I1 through the said branch, then he reconnects the
second source and replaces the first source by its internal resistance.
Now the current through that said branch for this second source alone
can be assumed I2.
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ELECTRONIC SCIENCE 3
Similarly, when nth source acts alone in the circuit and all other sources
are replaced by their internal electrical resistances, then said In current
flows through the said branch of the circuit.
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ELECTRONIC SCIENCE 3
Electrical sources may be of two kinds mainly, one is voltage source and
other is current source. When we remove the voltage source from a
circuit, the voltage, was contributed to the circuit becomes zero. So for
getting zero electric potential difference between the points where the
removed voltage source was connected, these two points must be
short circuited by zero resistance path. For more accuracy, one can
replace the voltage source by its internal resistance. Now if we remove
a current source from the circuit, current is contributed by this source
will become zero. Zero current implies open circuit. So when we
remove current source from a circuit, we just disconnect the source
from the circuit terminals and keep both terminals open circuited. As
the ideal internal resistance of a current source is infinitely large,
removing a current source from a circuit can be alternatively referred
as replacing the current source by its internal resistance. So for
superposition theorem, the voltage sources are replaced by short
circuits and source s are replaced by open circuits.
Step – 1
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ELECTRONIC SCIENCE 3 MCQs
Answer: a Answer: b
Explanation: In superposition Explanation: In superposition
theorem when we consider the effect theorem when we consider the effect
of one voltage source, all the other of one voltage source, all the other
voltage sources are shorted and current sources are opened and
current sources are opened. voltage sources are shorted.
Answer: a Answer: b
Explanation: In superposition Explanation: In superposition
theorem, whether we consider the theorem, whether we consider the
effect of a voltage or current source, effect of a voltage or current source,
voltage sources are always shorted current sources are always opened
and current sources are always and voltage sources are always
opened. shorted.
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ELECTRONIC SCIENCE 3 MCQs
5. Find the value of Vx due to the 16V 6. Find Vx due to the 3A source.
source.
a) 56V
a) 4.2V b) 78V
b) 3.2V c) 38V
c) 2.3V d) 48V
d) 6.3V
Answer: d
Answer: b Explanation: Due to the 3A source,
Explanation: When we consider the we short the 16V and 10V source and
16V source, we short the 10V source open the 15A source. From the
and open the 15A and 3A source. resulting circuit, we can use current
From the resulting series circuit we divider to find the current in the 20
can use voltage divider to find Vx. ohm branch and then multiply it with
Vx = 16*20/(20+80)=3.2A. the resistance to find the voltage.
I20 = 3*80/(20+80)=2.4A
Vx=20*2.4=48V.
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ELECTRONIC SCIENCE 3 MCQs
a) 0V
b) 2V
c) 4V
d) 6V
Answer: a
Explanation: Due to 15 A current
source, 10V and 16V sources get
a) 1V shorted and the 3A source acts as an
b) 2V open circuit. Since the 10V source is
c) 3V shorted, it acts as a low resistance
d) 4V path and current flows only within
that loop and do not flow to the 20
Answer: b ohm resistor. Hence the voltage is 0V.
Explanation: Due to the effect of the
10V source, we short the 16V source 9. Superposition theorem is valid for
and open the 3A and 15A source. _________
From the resulting series circuit, we a) Linear systems
can use voltage divider to find the b) Non-linear systems
value of Vx. c) Both linear and non-linear systems
Vx=10*20/(80+20)=2V. d) Neither linear nor non-linear
systems
8. Find the voltage due to the 15A
source. Answer: a
Explanation: Superposition theorem
is valid only for linear systems
because the effect of a single source
cannot be individually calculated in a
non-linear system.
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ELECTRONIC SCIENCE 4
Rectifier
We mainly have two types of voltage types present that are widely
used these days. They are alternating and direct voltage types. These
voltage types can be converted from one type to another using special
circuits designed for that particular conversion. These conversions
happen everywhere.
Our main supply which we get from power grids are alternating in
nature and the appliances we use in our homes generally require a
small DC voltage. This process of converting alternating current into
direct current is given the name rectification. Converting AC to DC is
preceded by further process which can involve filtering, DC-DC
conversion and so on. One of the most common part of an electronic
power supply is a bridge rectifier.
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ELECTRONIC SCIENCE 4
What is Rectifier?
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ELECTRONIC SCIENCE 4
Rectifiers can take a wide variety of physical forms, from vacuum tube
diodes and crystal radio receivers to modern silicon-based designs.
Use of a Rectifier
1. Convert DC to AC
2. Change the voltage using a transformer
3. Convert AC back to DC using a rectifier
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ELECTRONIC SCIENCE 4
What is Rectification?
Types Of Rectifiers
1. Uncontrolled Rectifier
2. Controlled Rectifier
Bridge rectifiers are of many types and the basis for the classification
can be many, to name a few, type of supply, bridge circuit’s
configurations, controlling capability etc. Bridge rectifiers can be
broadly classified into single and three phase rectifiers based on the
type of input they work on. Both of these types include these further
classifications which can be made into both single and three phase
rectifiers.
Half wave rectifier only converts half of the AC wave into DC signal
whereas Full wave rectifier converts complete AC signal into DC.
Uncontrolled Rectifier:
Uncontrolled rectifier uses only diodes and they give a fixed output
voltage depending only on the AC input.
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ELECTRONIC SCIENCE 4
A Type of rectifier that converts only the half cycle of the alternating
current (AC) into direct current (DC) is known as halfwave rectifier.
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ELECTRONIC SCIENCE 4
A half wave rectifier that converts only the positive half cycle and
blocks the negative half cycle.
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ELECTRONIC SCIENCE 4 MCQs
EXPERTIES DIWAKAR
EDUCTION HUB
ELECTRONIC SCIENCE 4 MCQs
Answer: d
4. Bridge rectifier is an alternative for
Explanation: All of the mentioned are
a) Full wave rectifier
different types of a rectifier.
b) Peak rectifier
2. For a half wave or full wave c) Half wave rectifier
rectifier the Peak Inverse Voltage of d) None of the mentioned
the rectifier is always
Answer: a
a) Greater than the input voltage
Explanation: Bridge rectifier is a
b) Smaller than the input voltage
better alternative for a full wave
c) Equal to the input voltage
rectifier.
d) Greater than the input voltage for
full wave rectifier and smaller for the 5. Which of the following is true for a
half wave rectifier bridge rectifier?
a) The peak inverse voltage or PIV for
Answer: b
the bridge rectifier is lower when
Explanation: The peak input voltage is
compared to an identical center
smaller than the input voltage due to
tapped rectifier
the presence of diode(s). A single
b) The output voltage for the center
diode reduces the output voltage by
tapped rectifier is lower than the
approximately 0.7V.
identical bridge rectifier
3. For a half-wave rectifier having c) A transistor of higher number of
diode voltage VD and supply input of coil is required for center tapped
VI, the diode conducts for π – 2Θ, rectifier than the identical bridge
where Θ is given by rectifier
a) tan -1 VD/VI d) All of the mentioned
b) tan-1 VD/VI – VI
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ELECTRONIC SCIENCE 4 MCQs
Answer: a Answer: c
Explanation: For the supply voltages Explanation: w Δt ~ √(2Vr/Vp)
less than 0.7V super diodes are used. Θ = √(2 X 2/100)
Θ = 0.2 rad or 3.18% of the cycle
7. A simple diode rectifier has
‘ripples’ in the output wave which (Q.9-Q.10) The op amp in the
makes it unsuitable as a DC source. precision rectifier circuit is ideal with
To overcome this one can use output saturation levels of ±12 V.
a) A capacitor in series with a the Assume that when conducting the
load resistance diode exhibits a constant voltage
b) A capacitor in parallel to the load drop of 0.7 V.
resistance
c) Both of the mentioned situations
will work
d) None of the mentioned situations
will work
Answer: b
Explanation: A capacitor is parallel
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ELECTRONIC SCIENCE 4 MCQs
Answer: a
Explanation: VI = -1v
Vo = 1v
VA = 1.7v
V– = 0v
Virtual gnd as negative feedback is
closed through R.
VI > 0 D1 conducts D2 cutoff. 11. The diode in a half wave rectifier
VI < 0 D2 conducts D1 cutoff. has a forward resistance RF. The
V ⁄
0 VI = -1.
voltage is Vmsinωt and the load
resistance is RL. The DC current is
given by _________
a) Vm/√2RL
b) Vm/(RF+RL)π
c) 2Vm/√π
d) Vm/RL