Professional Documents
Culture Documents
GO TO MENU
Macroporous strong base Type II
Quaternary
A-36 MP Strong Base
Polystyrene
Ammonium Chloride 16-50 0.3-1.2 140/60 0-14 1.2
42-44 Cl- ---> OH- 50
anion exchange resin having high
Multiple bed deionization, dealkalization
Copolymer 670-710 9 regeneration efficiency and resistance
Type ll
to organic fouling
Macroporous weak base anion
Polystyrene 40-42 FB ---> Cl- exchange resin, excellent
A-2X MP Weak Base Copolymer
Tertiary Amine Free Base 16-50 0.3-1.2 175/80 0-9 1.5 47 regeneration efficiency.
Deionization of high EMA waters
640-670 20
resistance to organic fouling
Polystyrene Nuclear Strong acid cation exchange resin Condensate polishing deploying Precoat
T-48 Strong Acid
Copolymer Sulphonic
Hydrogen 100 - 400 0.03 - 0.15 320/160 0-14 4.5 meq/gm NA NA 53 supplied in powder form Filter process
GO TO MENU
CONDENSATE POLISHING RESINS
PARTICLE TOTAL BACKWASH MOISTURE
IONIC SCREEN SIZE mm STABILITY EXCHANGE SETTLED REVERSIBLE
MATRIX FUNCTIONAL pH CONTENT
Tulsion
R
TYPE FORM SIZE (Minimum MAX TEMP CAPACITY DENSITY SWELLING % FEATURES APPLICATIONS
STRUCTURE GROUP 0 0 RANGE %
SUPPLIED US MESH 95 %) F/ C meq/ml. (min) lbs/cft g/l APPROX.
APPROX
Hydrogen 250/120 H
+ 50-52 H+ Macroporous strong acid cation High flow condensate polishing,
T-42 MP Strong Acid
Polystyrene Nuclear
16-50 0.3-1.2 0-14 1.6 800-830 H+ Na+ ---> H+ 56 H + exchange resin with excellent continuous ion exchange systems and
Copolymer Sulphonic
Sodium 52-54 Na+ 6 44 Na + physical and chemical characteristics chemical processing
280/140 Na+ 830-870 Na+
Quaternary Strong base gen Type I anion
Polystyrene 42-44 Cl- ---> OH-
A-21 Strong Base
Copolymer
Ammonium Chloride 20-40 0.42-0.85 175/80 Cl - 0-14 1.3
670-710 20
53 exchange resin with excellent bead High flow, deep bed condensate polishing
Type I strength and controlled particle size
Quaternary Strong base Type I anion exchange Condensate polishing deploying Precoat
Polystyrene 3.5
A-29 Strong Base
Copolymer
Ammonium Hydroxide 400 - 100 0.03-0.15 320/160 0-14 (meq/gm)
-- -- 60 resin, supplied in powder form. Filter process
Type I
A-354 (HC) Strong Base Crosslinked Quarternary 42-44 -- High capacity resin.
Polystyrene Chloride 16-50 0.3-1.2 175 / 80 0-14 1.6 42 Perchlorate removal, one time use resin
Ammonium 670-710
Crosslinked Nuclear 52-54
T-54 Strong Acid Polystyrene Sulphonic Na 50-120 0.12-0.3 280 / 140 0-14 2.0 7 53 Fine mesh cation resin Used in metal recovery
830-870
Crosslinked Quarternary 43-47 Acylic resin with high organic removal Decolorization of aqueous solution, sugar melt
A-30 MP. Strong Base Polyacrylic Ammonium Chloride 16-50 0.3-1.2 140 / 60 0-14 0.7 -- 67 capacity.
700-750 Decolorization
Polystyrene Quaternary 46-48 Fine mesh strong base Type I anion
A-35 Strong Base
Copolymer
Ammonium Chloride 50-120 0.12-0.3 175 / 80 0-14 1.5 23 50 exchange resin.
Process stream purification
Type l 730-770
GO TO MENU
SPECIAL GRADE ION EXCHANGE RESINS
PARTICLE TOTAL BACKWASH MOISTURE
IONIC SCREEN SIZE mm STABILITY EXCHANGE SETTLED REVERSIBLE
MATRIX FUNCTIONAL pH CONTENT
Tulsion
R
TYPE FORM SIZE (Minimum MAX TEMP CAPACITY DENSITY SWELLING % FEATURES APPLICATIONS
STRUCTURE GROUP 0 0 RANGE %
SUPPLIED US MESH 95 %) F/ C meq/ml. (min) lbs/cft g/l APPROX.
APPROX
Polystyrene Quaternary 42-45 Macroporous strong base Type I Tanin removal from ground water
A-72 MP Strong Base
Copolymer Ammonium Type l Chloride 16-50 0.3-1.2 175 / 80 0-14 1.0 670-720 21 58 anion exchange resin with controlled
Used for color removal from sugar syrup.
pore size
Crosslinked Flouride 52-54 Selective removal of fluoride from Removal of flouride from domestic drinking
CH-87 Chelating Polystyrene selective
--- 16-50 0.3-1.2 140 / 60 7-11 --
830-860 NA 45 water water.
Polystyrene Imminodiacetic - 45 - 50 Special resin for selective removal of
CH - 90 Chelating
Copolymer acid Sodium 16-50 0.3-1.2 175 / 80 0 - 14 2 720 - 790 35 48 Brine purification in chloro alkali industry.
transition metals
Polystyrene Isothio- 150 gm/lit as 47-50 Special resin for selective removal of Used for mercury removal from effluent in
CH-95 Chelating
Copolymer Chloride 16-50 0.3-1.2 175 / 80 0-7 Hg 760-800
-- 50 mercury Chloro- alkali industry.
Uronium
Crosslinked 150 gm/lit as 42-45 Selective removal of mercury,
CH-97 Chelating Polystyrene Methylene thiol Chloride 16-50 0.3-1.2 140 / 60 0 - 14 Hg NA 40 Regenerable resin
Removal of mercury in Chloro- alkali industry.
670-720
Crosslinked Polyhydroxy 43-47
CH-99 Chelating Polystyrene amine Chloride 16-50 0.3-1.2 175 / 80 7 -11 0.8 NA 46 Selective removal of Boron Removal of Boron from industrial water.
700-750
CATALYTIC GRADE ION EXCHANGE RESINS
PARTICLE TOTAL BACKWASH MOISTURE
IONIC SCREEN SIZE mm STABILITY EXCHANGE SETTLED REVERSIBLE
MATRIX FUNCTIONAL pH CONTENT
Tulsion
R
TYPE FORM SIZE (Minimum MAX TEMP CAPACITY DENSITY SWELLING % FEATURES APPLICATIONS
STRUCTURE GROUP 0 0 RANGE %
SUPPLIED US MESH 95 %) F/ C meq/ml. (min) lbs/cft g/l APPROX.
APPROX
Macroporous catalytic grade strong
T-56 MP Strong Acid
Polystyrene Nuclear
Hydrogen 16-50 0.3-1.2 250/120 0-14 1.7
52-54 Na+ ---> H+ 50
acid cation exchange resin supplied in Catalysis of organic reactions in aqueous and
Copolymer Sulphonic 830-870 7 wet form. Also supplied in dry form non-aqueous media
containing moisture less than 2%.
Polystyrene Nuclear 4.8 Specially developed resin for phenol Phenol Alkayation, Isoboryl acetate synthesis.
T-62MP Strong Acid
Copolymer Sulphonic
Hydrogen 16-50 0.3-1.2 265 /130 -- ( meq / dry gm)
-- NA 2 alkylation Reaction of non-polar media.
Polystyrene Nuclear 5.0 Resin with low porosity and high Phenol Alkayation, For reaction of relativley
T-66MP Strong Acid
Copolymer Sulphonic
Hydrogen 16-50 0.3-1.2 265 /130 --
( meq / dry gm)
-- NA 2 surface area polar reactants.
Polystyrene 40-42 FB ---> Cl - Macroporous catalytic grade weak MEG purification and deacidification of
A-8X MP Weak Base Copolymer
Tertiary Amine Free Base 16-50 0.3-1.2 175/80 0-14 1.3
640-680 18
55 base anion exchange resin. aqueous and non-aqueous media
ADSORBENT RESINS
SPECIFIC
IONIC SCREEN PARTICLE STABILITY SURFACE
BULK REVERSIBLE MOISTURE
R
TYPE MATRIX FUNCTIONAL FORM SIZE SIZE MAX TEMP pH DENSITY SWELLING % CONTENT FEATURES APPLICATIONS
Tulsion STRUCTURE GROUP SUPPLIED US MESH (Minimum 0F/ 0C RANGE AREA lbs/cft APPROX. %
95 %) M2/gm (min) g/l APPROX
Polyacrylic Polyacrylic 43 - 47 Removal of hydrophilic organic chemicals
ADS - 400 NIL NA 18 - 50 0.3 - 1.0 205 / 95 0-14 375 NA 62 High organic removal capacity
adsorbent Copolymer 700 - 750 from Industrial waters
Polystyrenic Polystyrenic 43 - 47 Removal of hydrophobic organic chemicals
ADS - 600 Copolymer NIL NA 18 - 50 0.3 - 1.0 300 / 150 0-14 550 NA 57 High organic removal capacity
from Industrial waters
adsorbent 700 - 750
Polystyrenic Polystyrenic 40 - 44 Polystyrene resin for with high Removal of hydrophobic organic chemicals
ADS-800 Copolymer NIL NA 18 - 50 0.4-1.2 300 / 150 0-14 750 NA 55 organic removal capacity.
adsorbent 640 - 710 from industrial waters.
GO TO MENU