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05 Reverse Biased Junction & Breakdown
05 Reverse Biased Junction & Breakdown
p- n diode rectifiers
qV
exp − 1
~ kT 1
IS
2
Ir = 0 in an ideal VF = 0 in an ideal
rectifier. rectifier
Voltage
VD = VSource
Current
1
2
Time Time
Lecture objective: p-n diode at reverse bias
Simulated Electron - Hole profile in Si p-n junction
Junction
0
V bi
E
c
-0.8
E
F
V bi
Electron-hole concentration -1.6 Ev
in a Si p-n junction. p-type n-type
Acceptor density Na=5× ×1015 cm-3 -2 -1 0 1 2
Donor density Nd=1× ×1015 cm-3.
Distance (µm)
T=300K. 10 16
p = Na n = Nd
Dashed line show the boundaries 10 14
Hole Electron
of the depletion region concentration concentration
10 12
10 10
p -type n -type
10 8
10 6
n = n i2 / N a p = n i2 / N d
10 4
-2 -1 0 1 2
Distance (µm)
Charge distribution in the depletion region.
Total charge density in the semiconductor: ρ = q××(Nd + p - Na - n);
NA ND
Concentration
p n
ρ = 0; ρ = 0;
pn ≈ 0; nn ≈ 0;
np ≈ 0; pn ≈ 0;
ρ ≈ -q NA; ρ ≈ +q ND;
Mobile Charge density distribution in the p-n junction
Depletion
Charge density
region
(C/cm3)
Free
electrons x
Holes
p-type n-type
pn ≈ 0; nn ≈ 0;
np ≈ 0; pn ≈ 0;
Charge distribution in the depletion region.
Total charge density in the semiconductor: ρ = q××(Nd + p - Na - n);
Charge density
(C/cm3)
qND
x
ρ = 0; ρ = 0;
qNA
pn ≈ 0; nn ≈ 0;
np ≈ 0; pn ≈ 0;
ρ ≈ -q NA; ρ ≈ +q ND;
Electric field profile in the p-n junction
dF ρ -6
0
= ; -2 -1 1 2
dx ε s
X
2
Charge, Field, 0
Potential Profiles in the
-2
-xp xn
p-type n-type
p-n junction
-4
dF ρ -6
0
= ; -2 -1 1 2
dx ε s
Using the depletion approximation, we obtain X
qNa
− ε , for − xp < x < 0
dF s
=
dx qNd
, for 0 < x < xn
ε s
2
Charge, Field, 0
Potential Profiles in the
-2
-xp xn
p-type n-type
p-n junction
-4
dF ρ -6
0
= ; -2 -1 1 2
dx ε s 0
Using the depletion approximation, we obtain -xp xn
qNa -5
dx qNd
, for 0 < x < xn
ε s -15
-2 -1 0 1 2
0.2
x
0
x -0.6
Distance (µm)
Maximum Field in the p-n junction
0
-xp xn dF ρ
-5
From = :
dx ε s
-10
-15
-2 -1 0 1 2 qN A
On the p-side of the junction, Fm = xp
εε 0
qN D
On the n-side of the junction, Fm = xn
εε 0
At the junction interface: Fm(p-side) = Fm (n-side)
qN D qN A xp ND
Fm = xn = xp =
εε 0 εε 0 xn N A
Voltage drop across the p-n junction
qN D qN A
Fm = xn = xp
εε 0 εε 0
The voltage drop across the p-n junction, V p − n = − ∫ F ( x ) dx
From x p = xn ( N D / N A )
W = xn + xp = xn (1 + ND/NA);
The voltage (the area of the triangle): Vbi –Vr = Fm× W/2;
W
qN D qN A
Fm Fm = xn = xp
εε 0 εε 0
qN D qN D 2 1 q 2 ND N A
Vbi −Vr = xn W / 2 = W = W
εε 0 2εε 0 1 + N D / N A 2εε 0 N A + ND
Depletion region of the p-n junction summary
Depletion region (a.k.a space-charge region) width
q 2 ND N A
Vbi − Vr = W N '; where N ' =
2εε 0 N A + N D
1 q
N D >> N A , Vbi − Vr = NAW 2 W ≈ xp
2 ε ε0
The space-charge region is extended mainly to the low-doped side
of the p-n junction
Depletion region width as a function of voltage
From q
Vbi − Vr = W 2N '
2εε 0
2ε ε 0 (Vbi − Vr )
W= where
qN '
ND N A
N '=
N A + ND
1
Vbi − Vr = Fm W
2
2q N ' (Vbi − Vr )
Fm =
ε ε0
ε ε 0 Fm2 2
ε ε 0 FBD
Vbi −Vr = Vmax =
2q N ' 2q N '
P-n Junction Breakdown
Avalanche Breakdown mechanism
0
-xp xn
-5
-10
-15
-2
Fm
-1 0 1 2
e1
e1 Atom
h2 e2
Avalanche multiplication during the breakdown
Multiplication factor:
The condition for avalanching: (every carrier has one ionizing collision)
Avalanche breakdown interpretation using band diagrams
np
EV
p n
EC
pn
Avalanche breakdown interpretation using band diagrams
EV
p n
EC
Avalanche breakdown interpretation using band diagrams
(3) These secondary e-h pairs in also acquire high energy and
may in turn produce more e-h pairs.
EV
p n
EC
Avalanche breakdown interpretation using band diagrams
(4) New electron hole pairs will add up to the reverse current
EV
p n
EC
Avalanche breakdown interpretation using band diagrams
EV
p n
EC
Breakdown voltage of the p-n junction
For a p+ - n junction
(NA >> ND):
2
ε s Fbd
Vabd =
2qN d
Si p-n junction. Example 1:
Maximum Field vs. Reverse Voltage
1.0E+06
9.0E+05 -3
N = 1E15 cm
Fm
8.0E+05
7.0E+05
5.0E+05
4.0E+05
FBD
3.0E+05
2.0E+05
1.0E+05
0.0E+00
0 500 1000 1500 2000
Reverse Voltage, V
2q N ' (Vbi − Vr )
Fm =
ε ε0
Si p-n junction. Example 2
Maximum Field vs. Doping
1.60E+06
1.40E+06
V=1000 V
1.20E+06
1.00E+06
Fm, V/cm
8.00E+05
6.00E+05
4.00E+05 FBD
2.00E+05
0.00E+00
0.00E+ 1.00E+ 2.00E+ 3.00E+ 4.00E+ 5.00E+ 6.00E+ 7.00E+
00 15 15 15 15 15 15 15
Doping, cm-3
2q N ' (Vbi − Vr )
Fm =
ε ε0
Si p-n junction. Example 3
Maximum Voltage vs. Doping
2.50E+03
2.00E+03
1.50E+03
Vmax, V
1.00E+03
5.00E+02
0.00E+00
0.00E 1.00E 2.00E 3.00E 4.00E 5.00E 6.00E 7.00E 8.00E
+00 +15 +15 +15 +15 +15 +15 +15 +15
Doping, cm-3
2
ε ε 0 FBD For Silicon,
Vmax = FBD ≈ 3 ×105 V/cm
2q N '
Zener (tunneling) breakdown
If the junction is highly doped then the depletion region can be very thin:
2ε ε 0 (Vbi − Vr )
W=
qN '
At high reverse bias, the conduction and valence bands on the opposite sides
of the junction are very close to each other
Thin junction (heavily doped)
EV
EC
Zener (tunneling breakdown)
At certain reverse bias, the electrons from the valence band of p-material
can tunnel into the conductance band of n-material.
The reverse current increases abruptly at a certain voltage:
EC
EV