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https://doi.org/10.1007/s12633-017-9649-3
ORIGINAL PAPER
Received: 16 December 2016 / Accepted: 2 October 2017 / Published online: 4 January 2018
© Springer Science+Business Media B.V., part of Springer Nature 2018
2 Simulation of Monocrystalline Solar Cell In Fig. 2, the blue line shows the I-V curve and the red
line shows the P-V curve of the 12.10% efficient solar cell.
Efficient and accurate modeling requires all the parame- The current (I) versus voltage (V) curve of a solar cell shows
ters of the solar cell to be involved, but for simplicity and all the possible combinations of its current and voltage
to understand the impact of the parameters, some of the outputs, whereas, the power (W) versus voltage (V) curve
parameters like texturing and anti-reflection coating are not shows all the possible combinations of its power and voltage
considered at first. Typically a solar cell thickness varies outputs. The point in the I-V curve where voltage and cur-
from 100 to 500 nm and normally the area is of 10 × 10 cm2 rent is maximum is called the maximum power point (MPP).
or 12.5 × 12.5 cm2 [6]. So, a p-type silicon wafer, with an In the P-V curve MPP is the point where power has the high-
area of 10 × 10 cm2 and thickness of 300 μm was selected est value. In both I-V and P-V curves the maximum power
for solar cell simulation. The doping concentration of a point is represented as Pm. Also the maximum voltage and
monocrystalline silicon wafer varies from 1 × 1012 cm−3 to maximum current is designated as Vm and Im. The val-
1 × 1020 cm−3 as shown in Fig. 1 [7]. High doping concen- ues of short circuit current (Isc), open circuit voltage (Voc),
tration in a p-type wafer increases Voc (open circuit voltage) Im, Vm, Pm, efficiency and fill factor are shown in Table 1.
but at the cost of damaging the crystal [8]. So, moderate
doping is generally used in a p-type silicon wafer. Thus the
doping concentration of the p-type silicon wafer has been 3 Impact of Doping Concentration
randomly adjusted to 5 × 1016 cm−3 at first.
By using a four point probe instrument it is seen that The doping concentration of the p-type silicon wafer was
normally p-type wafer sheet resistivity varies from 0.01 to changed to find out the optimum doping concentration and its
10 .cm. Because of variation in doping concentration, the impact on the efficiency of the solar cell. At first, doping
sheet resistivity varies. The sheet resistivity decreases with concentration of the emitter (n-type) was kept fixed at 1 ×
the increase of doping concentration. For doping concen- 1019 cm−3 . Then the p-type silicon wafer doping concentration
tration 5 × 1016 cm−3 , the p-type wafer sheet resistivity was changed in the simulation. After completion of the simu-
is 0.3441 .cm [9]. So 0.3441 .cm was considered at lation, data was tabulated in Table 2 and the I-V curve due to
first for simulation. The doping level of the emitter (n- different doping concentrations was drawn and is shown in
type) has been randomly adjusted to 1 × 1019 cm−3 to Fig. 3. In Fig. 3, blue, red, green, violet, yellow, brown and
form a p-n junction. For 1 × 1019 cm−3 the emitter (n-type) black color respectively represents the following doping con-
sheet resistance is 26.11 / (ohms/square). 26.11 / centrations, 1 × 1014 cm−3 , 1 × 1015 cm−3 , 1 × 1016 cm−3 ,
was considered as the sheet resistance of the emitter. Nor- 1 × 1017 cm−3 , 1 × 1018 cm−3 and 5 × 1016 cm−3 .
mally the thickness of the emitter (n-type) varies from From the simulated data, in Table 2 and from Fig. 3,
1–2 μm. So in this simulation, the thickness of the emitter it is seen that increasing doping concentration does not
was adjusted to 2 μm and uniform doping profile condi- always increases efficiency. Especially when, the p-type sil-
tion has been assumed. Diffusion length must be less than icon wafer doping concentration is more than or closer to
the thickness of the p-type material. The thickness of the the doping concentration of the n-type wafer, efficiency
p-type wafer is selected as 300 μm and, at first, diffusion drastically decreases. Because of excessive doping, excess
length was randomly considered, 144.3 μm. To observe the minority carrier lifetime is reduced, thus the minority carrier
impact of the antireflection coating (ARC), ARC was not diffusion length is also reduced [10]. Also, carrier mobil-
applied at first. To emulate the sun, AM (Air Mass) −1.5 G ity decreases with increasing total dopant concentration thus
condition was selected. Also, to see the time progression, reducing efficiency [11]. Low p-type doping concentration
the number of time steps was selected as 100. After running
the simulation, it is seen that the efficiency of the solar cell
is 12.10%.
I-V and P-V Curve
2.5
2
Low doping Moderate doping Heavy doping 1.5
(A)
1 (W)
0.5
12 14 16 18 20
10 10 10 10 10 0
0 0.1 0.2 0.3 0.4 0.5 0.6 0.7
-3
Dopant Concentration [cm ] Voltage(V)
Fig. 1 Range of doping concentration Fig. 2 I-V and P-V curve of 12.10% efficient solar cell
Silicon (2018) 10:1653–1660 1655
Table 1 Data of 12.10 % efficient solar cell I-V curve with various p-type doping concentration
3
Isc Voc Vm Im Pm FF Efficiency doping
1x10^14
2.5 doping
2.28 A 0.636 V 0.56 V 2.16 A 1.21 W 0.835 12.10% 1x10^15
2 doping
Current (A)
1x10^16
doping
1.5 1x10^17
doping
1 1x10^18
also shows an unfruitful result. Here, from the simulation, doping
1x10^19
optimum p-type doping concentration has been found to be 0.5 doping
Material Doping concentration Short circuit current (Isc) Open circuit voltage (Voc) Max power (W) Fill factor (FF) Efficiency
Table 3 Data of solar cell with various n-type and p-type doping concentration
Doping concentration Doping concentration Short circuit Open circuit Max power Fill factor Efficiency
(n-type) (p-type) current (Isc) voltage (Voc) (W) (FF)
cell is 13.75%. It should be noted that if diffusion length is 54.74◦ . Pyramids having equal angles of 48◦ have also been
increased more the efficiency will increase but for a realistic found as shown in Fig. 7.
approach the diffusion length is considered to be 200.3 μm. Taking the value from the practically obtained data tex-
turization was done in the simulation. Both front surface and
back surface texturization, only front surface texturization,
5 Texturization and its Impact on the Solar Cell and only back surface texturization procedures were done.
Also, pyramid heights and angles were changed in the sim-
Texturization on the solar cell is done to reduce reflection ulation. Simulation shows that the front and back surface
and enhance light absorption. Texturization normally cre- textured wafer, having pyramids with height 2–3 μm and
ates an uneven surface, that is pyramid-like structures form having an equal angle of 54.74◦ has the maximum efficiency
on the surface of the p-type wafer as shown in Fig. 6. of 14.02%. Similar results have also been found for only
Texturization is normally done using a wet chemical front surface texturing, but as only one-sided texturing is a
recipe. Here, a cleaned p-type wafer was textured using difficult and costly procedure and after the diffusion process
0.763 wt% KOH–4 wt% IPA solution. Generally pyramid it is difficult to identify the textured surface, both surface
height varies from 1–6 μm. By using a stylus surface pro- texturing is considered optimum. All the results from the
filometer the height of the peak of the pyramids was mea- simulation are tabulated in Table 5. It suffices to say textur-
sured. The result shows pyramid height lies in the range of ization increases at least 1% to 2% efficiency of the solar
1–3.5 μm. Also from the SEM image, pyramid angles were cell.
measured using triangle maker software. Although pyramid
angle being equilateral is theoretically possible but practi-
cally isosceles pyramid structures are formed. Measurement 6 Impact of Anti-reflection Coating
shows isosceles pyramids having equal angles of maximum
The anti-reflection coating (ARC) shows the most signif-
Various Ntype Doping Concentration with fixed icant change in efficiency in this simulation. To design
5x10^16 cm-3 ptype doping concentration
doping
2.5
ntype
1x10^19 OPTIMUM DOPING CONCENTRATION
doping doping ntype
2 2.5
ntype 5x10^17
1x10^20 doping ptype
doping 5x10^16
Current (A)
1.5 2
ntype
CURRENT (A)
Efficiency
12.94%
13.75%
12.45%
determine, the thickness and refractive index of the ARC
layer.
Refractive index of ARC is ηAR = ηair ∗ ηsi (λ0 )
0.839510940
0.857172718
λ0
0.84249973
And the thickness of ARC is d =
Fill factor
4 ∗ ηAR
(FF) Using both equations, thickness and refractive index of
the ARC layer are tabulated in Table 6.
Varying the refractive index and thickness the simulation
Max power
I-V curve of the solar cell with no ARC and texturing. The
red curve represents the I-V curve of the solar cell with no
ARC but with texturing. Last but not least the green curve
Diffusion length
(Micrometer)
represents I-V of the solar cell with ARC and texturing. The
130.5
200.3
Table 4 Data of solar cell with different diffusion (DL ) length
100
Doping concentration
1 × 1017 cm−3
1 × 1017 cm−3
1 × 1017 cm−3
(p-type)
Doping concentration
1 × 1018 cm−3
1 × 1018 cm−3
1 × 1018 cm−3
(n-type)
Doping concentration 1 × 1018 cm−3 Short circuit Open circuit Max power Fill factor Efficiency Efficiency increased
(n-type), 1 × 1017 cm−3 current (Isc) voltage (Voc) (W) (FF)
(p-type) DL = 200.3
(1.402−1.375)
Not textured 2.420 A 0.6744 V 1.375 W 0.84250 13.75% 1.375 ∗ 100 = 1.96364%
Textured 2.466 A 0.6748 V 1.402 W 0.84252 14.02%
Front and back surface textured
Angle 54.74◦
Depth 3 μm
(1.402−1.375)
Textured 2.466 A 0.6748 V 1.402 W 0.84252 14.02% 1.375 ∗ 100 = 1.96364%
Front and back surface textured
Angle 54.74◦
Depth 2 μm
(1.402−1.375)
Textured 2.466 A 0.6748 V 1.402 W 0.84252 14.02% 1.375 ∗ 100 = 1.96364%
Front and back surface textured
Angle 54.74◦
Depth 1 μm
(1.401−1.375)
Textured 2.465 A 0.6747 V 1.401 W 0.84238 14.01% 1.375 ∗ 100 = 1.8909%
Front and back surface textured
Angle 54.74◦
Depth 5 μm
(1.395−1.375)
Textured 2.454 A 0.6747 V 1.395 W 0.84254 13.95% 1.375 ∗ 100 = 1.454545%
Front and back surface textured
Angle 48◦
Depth 3 μm
(1.402−1.375)
Textured 2.466 A 0.6748 V 1.402 W 0.84252 14.02% 1.375 ∗ 100 = 1.96364%
Front surface textured
Angle 54.74◦
Depth 2 μm
(1.395−1.375)
Textured 2.420 A 0.6744 V 1.374 W 0.84189 13.74% 1.375 ∗ 100 = 1.454545%
Back surface textured
Angle 54.74◦
Depth 2 μm
Silicon (2018) 10:1653–1660 1659
Doping concentration 1 × 1018 cm−3 Short circuit Open circuit Max power Fill factor Efficiency
(n-type), 1 × 1017 cm−3 (p-type) current (Isc) voltage (Voc) (W) (FF)
DL = 200.3 (Textured)
Parameters of solar cell Published literature/experimental value Simulated optimum value Remark
P-type doping concentration range 1 × 1012 cm−3 to 1 × 1020 cm−3 [7] 1 × 1017 cm−3 Optimum value is within the range
N-type doping concentration range 1 × 1012 cm−3 to 1 × 1020 cm−3 [7] 1 × 1018 cm−3 Optimum value is within the range
Diffusion length 100–300 μm [14] 200.3 μm Optimum value is within the range
Textured wafer pyramid height 1–6 μm [18] 1–3.5 μm (Experimental) 2–3 μm Optimum value is within the range
Textured wafer pyramid angle 60◦ (Theoretical) 54.78◦ (Experimental) 54.78◦ Optimum value is within the range
ARC layer thickness 30–135 nm [19] 74 nm Optimum value is within the range
1660 Silicon (2018) 10:1653–1660
2.5 14.02%
enerdata.net/electricity-domestic-consumption-data-by-region.html.
No ARC, Accessed date: 07 July 2017
2
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Acknowledgments The authors express their thanks to the Univer- at 300 K. Prog Photovolt Res Appl 3(3):189–192
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of Dhaka for contributing to this kind of research. 07 July 2017