ME 462

Introduction to MEMS
Homework #2
Due: Thursday 31.03.2022, 11 AM

1. (5 points) Create a mask set for PolyMUMPs that will produce a folded cantilever structure. The 3D and side
views of the folded cantilever structure are shown in the figure (Be careful: The views are rough and not drawn
to scale). The substrate (together with nitride) layer is also shown on the figures.

The length and width of the upper cantilever should be 100 μm and 8 μm, respectively. The lower cantilever
should be wider and longer than the upper one, but it should be as short and narrow as possible. You need to
refer to PolyMUMPs Design Rules document, to apply the design rules correctly.

You should submit the mask drawings, together with the side view after the application of each mask. You do
not need to intermediate lithographic step (i.e. deposition of photoresist, exposure, etching, etc). Instead of the
process, focus on the geometric details. You are not expected to use some of the masks, such as DIMPLES,
HOLE?, METAL, etc.)

Do not forget to include proper dimensioning at all your mask drawings.

2. (3 points)
a. A 1 μm SiO2 layer is deposited on a (100) Si
substrate, and it is to be patterned and
released over a cavity to form a free-
standing cantilever beam having length 70
μm and width 20 μm. If the beam is to have
a clearance on all three free sides of 10 μm,
draw the mask used for this etch process. Is
it an isotropic or anisotropic etch? What is
the depth of the trench? Ignore any possible problems due to undercutting.

b. Calculate the time required for the etch to occur, if KOH is used as etchant. (To find the etch rate, use
the corresponding table in the paper:
https://nanolab.berkeley.edu/labmanual/chap1/JMEMSEtchRates2(2003).pdf.
c. This time, it is aimed to deposit some metal contacts before making the KOH bulk etch. Two
candidate metals are Aluminum and Chromium. Based on etch selectivity of KOH, which one should
be used as metal contacts.

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3. (2 points) Find a journal article (not a conference paper) that uses PolyMUMPs fabrication. Send the name of
the article to the course instructor for approval. Once approved, answer the following:
a. Which layers of polyMUMPs are used? Copy & submit the figure that shows polyMUMPs masks.
b. Are there any additional processes applied other than polyMUMPs? If yes, what are they?