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effect transistors are produced using high cell density , DMOS trench ● RDS(ON)≦13mΩ@VGS=10V
especially tailored to minimize on-state resistance. These devices ● Super high density cell design for extremely low RDS(ON)
are particularly suited for low voltage application such as cellular ● Exceptional on-resistance and maximum DC current
phone and notebook computer power management and other battery capability
(SOP-8)
Top View
June, 2009-Ver1.0 01
ME4812/ME4812-G
N-Channel 30-V(D-S) MOSFET, ESD Protection
Electrical Characteristics (TA =25℃ Unless Otherwise Specified)
a
VGS=10V, ID= 11.2A 10 13
RDS(ON) Drain-Source On-State Resistance mΩ
VGS=4.5V, ID= 10A 17.5 21.5
VSD Diode Forward Voltage IS=1A, VGS=0V 0.4 0.5 V
DYNAMIC
Qg Total Gate Charge(10V) VDS=15V, VGS=10V, ID=11.2A 19
Qg Total Gate Charge(4.5V) 9.7
VDS=15V, VGS=4.5V, nC
Qgs Gate-Source Charge 4.2
ID=11.2A
Qgd Gate-Drain Charge 4.6
Ciss Input capacitance 830
Coss Output Capacitance VDS=15V, VGS=0V, f=1.0MHz 280 pF
Crss Reverse Transfer Capacitance 84
Rg Gate-Resistance VDS=0V, VGS=0V, f=1MHz 1 Ω
td(on) Turn-On Delay Time 14
VDD=15V, RL =15Ω
tr Turn-On Rise Time 14
ID=1A, VGEN=10V ns
td(off) Turn-Off Delay Time 39
RG=3Ω
tf Turn-Off Fall Time 4
Notes: a. Pulse test: pulse width≦ 300us, duty cycle≦ 2%, Guaranteed by design, not subject to production testing.
b. Matsuki reserves the right to improve product design, functions and reliability without notice.
June, 2009-Ver1.0 02
ME4812/ME4812-G
N-Channel 30-V(D-S) MOSFET, ESD Protection
Typical Characteristics (TJ =25℃ Noted)
June, 2009-Ver1.0 03
ME4812/ME4812-G
N-Channel 30-V(D-S) MOSFET, ESD Protection
Typical Characteristics (TJ =25℃ Noted)
June, 2009-Ver1.0 04
ME4812/ME4812-G
N-Channel 30-V(D-S) MOSFET, ESD Protection
MILLIMETERS (mm)
DIM
MIN MAX
A 1.35 1.75
A1 0.10 0.25
B 0.35 0.49
C 0.18 0.25
D 4.80 5.00
E 3.80 4.00
e 1.27 BSC
H 5.80 6.20
L 0.40 1.25
θ 0° 7°
June, 2009-Ver1.0 05