JEM-2100Plus

Main specifications
Item UHR HR
Lattice Resolution 0.14 nm 0.14 nm
Point resolution 0.19 nm 0.23 nm
STEM resolution 1.0 nm 1.0 nm

Accelerating 80 – 200 kV
voltage
TEM x 30 - x 1,500,000
Magnification
STEM x 100 – x 2,000,000
magnification
Hardware on JEM-2100Plus
General view of JEM-2100Plus
Layout of lenses and deflector coils in column
 1. Illumination lens system

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Condenser lens : CL
Convergence angle : a
Condense aperture : CLA
Lay diagram of illumination lens system
Lay diagram of illumination lens system
 2. Objective lens
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Objective Lens: OL
Polepiece
Z-position
Cross-section of the objective lens polepiece
 Definitions of resolutions
Point resolution
d = 0.65 Cs1/4 l3/4
Cs: Spherical aberration coefficient
l: Wave length of electron

Lattice resolution
The lattice image formed by strong electron
diffraction in the lattice on crystal

Optimum focus (Scherzer focus) (DfSch)

DfSch = -1.2(Csl)1/2
Cross-section of the objective lens polepiece
Z-control operation
Principle of image wobbler
 5 Deflector
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Double deflection system

Tilt balance
Shift balance
Principle of double-deflection system (tilt)
Beam tilting

Beam tilt

Objective aperture
Principle of double-deflection system (shift)
Tilt & shift balance adjustment

Alignment panel
Tilt and shift balances adjustment
6 Daily alignment

Two axies in objective lens

Alignment for objective lens
Alignment operation

Alignment panel

L Operation panels R
7 Condenser alignment

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Spot size
Brightness
Spot size & brightness
Condenser stigmator
8 Electron gun and accelerating tube
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Electron gun
LaB6 emitter (filament)
Accelerating voltage (in kV)
Electrical diagram of electron gun
Advantages of higher accelerating voltage

1. Increasing penetration power of the

electron
2. Increasing peak/background (P/B)
in both EDS and EELS analysis
3. Increasing spatial resolution
4. Increasing brightness
 Gun alignment

LaB6 emission pattern in unsaturated condition

Alignment operation

Alignment panel

L Operation panels R
6. Specimen stage and holder

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Specimen Holder
Specimen Stage
Goniometer
e) Image forming lens system

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Intermediate Lens: IL
Projector Lens: PL
Selected Area Aperture:
SA-Aperture
Image Forming Optical System
5. Image Forming Optical System
 Image contrast as a function of OL-Aperture size
JEM-2100(HR)（200 kV)

OL#1 ：120μｍφ OL#2 ：60μｍφ OL#3 ：20μｍφ

Contrast：13.3％ Contrast：22.2％ Contrast：24.7％

5000.2μ
nm m
 High-Resolution TEM
image

Sample:Si3N4
 Point resolution
of JEM-3000F

Data courtesy
of Prof. D. Shindo of Tohoku Univ.
 8 Scanning imaging system

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Scanning Transmission EM: STEM

STEM Bright-Filed/ Dark-Field Image:
STEM BF/DF
High Angle Annular Dark-Field: HAADF
Optics of STEM
 STEM images
Comparison of BF and DF (Pt particles on zeolight)

BF image HAADF image

 Z-position change
Looking for a field-of-view (FOV) ＋Z
in the center beam
It is convenient technique to looking for
the FOV and crystal orientation
adjustment in the center beam with
changing the focus and Z-control.

Focus change

under over

-Z
 Crystal orientation adjustment
with center beam

In using a single crystal as a specimen, a

Kikuchi pattern is observable from the beam
position.
The Kikuchi pattern is convenient to adjust
the crystal orientation.
Measurement function
(Diffraction)
Daily adjustment procedure

1. Vacuum check
2. High voltage application
3. Fill LN2 to ACD tank
4. Specimen installation
5. Start emission
6. Alignment
Daily Alignment procedure
1. CL aperture centering
2. OL focus (standard focus)
3. Specimen Z-position
4. HT axis alignment
5. Tilt and Shift balances
6. Gun alignment
7. CL alignment
8. CL astigmatism correction
9. OL astigmatism correction
10. PL alignment