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CHAPTER 2
2.1
Based upon Table 2.1, a resistivity of 2.83 -cm < 1 m-cm, and aluminum is a conductor.
2.2
Based upon Table 2.1, a resistivity of 1015 -cm > 105 -cm, and silicon dioxide is an insulator.
2.3
A 108 cm2
I max 107 2 5m1m 500 mA
cm m
2
2.4
2.8
EG
ni BT 3 exp 5
with B = 1.27x1029 K 3cm6
8.62x10 T
6 3
T = 300 K and EG = 1.42 eV: ni = 2.21 x10 /cm
3 10 3
T = 100 K: ni = 6.03 x 10-19/cm T = 450 K: ni = 3.82 x10 /cm
2.9
E
ni2 BT 3 exp G B = 1.08x1031
kT
10 1.08x10 1.12
2
10 31
T 3 exp 5
8.62x10 T
Using a spreadsheet, solver, or MATLAB yields T = 305.22K
Define an M-File:
function f=temp(T)
f=1e20-1.08e31*T^3*exp(-1.12/(8.62e-5*T));
Then: fzero('temp',300) | ans = 305.226 K
2.10
cm2 V 6 cm
vn n E 700 2500 1.75x10
V s cm s
cm2 V 5 cm
v p p E 250 2500 6.25x10
V s cm s
1 cm
cm
jn qnvn 1.60x1019 C 1017 3 1.75x106 2.80x10
s
4 A
cm2
1 cm
cm
j p qnv p 1.60x1019 C 103 3 6.25x105 1.00x10
s
10 A
cm2
cm 2
MA
1.60 2
cm
1 cm
j p qnv p 1.60x1019 C 102 3 10 7
cm
1.60x10
s
10 A
cm2
2.12
j 2000A/ cm2 cm
v 2
2x105
Q 0.01C / cm s
2.13
C cm 6 A MA
j Qv 0.4 3 107 4 x10 4 2
cm sec 2
cm cm
2.14
cm2 V 6 cm
vn n E 1000 2000 2.00x10
V s cm s
cm2 V 5 cm
v p p E 400 2000 8.00x10
V s cm s
1 cm
jn qnvn 1.60x1019 C 103 3 2.00x106
cm s
3.20x10
10 A
cm2
1 cm
j p qnv p 1.60x1019 C 1017 3 8.00x105
cm
1.28x10
s
4 A
cm2
2.15
V
a E
5V
4
10x10 cm
5000
V
cm
b V 105 4
10x10 cm 100 V
cm
2.16
1019 cm
j p qpv p 1.60x1019 C 3 10 7
cm
1.60x10
s
7 A
cm2
A
i p j p A 1.60x10 7 2 1x104 cm 25x104 cm 4.00 A
cm
105 cm
1
2.270x1010
ni
q n p cm2 cm3
19
1.602x10 C 2000 750
v sec
5.152x1020 E
n 2i BT 3 exp G with
kT
6
cm
B 1.08x1031 K 3cm6 , k = 8.62x10-5 eV/K and EG 1.12eV
Using MATLAB as in Problem 2.5 yields T ≤ 316.6 K.
2.18
For intrinsic silicon, q n ni p ni qni n p
1000 cm
1
4.16x1019
ni
q n p cm2 cm3
1.602x10 C 100 50
19
v sec
1.73x1039 E
n 2i BT 3 exp G with
kT
6
cm
B 1.08x1031 K 3cm6 , k = 8.62x10-5 eV/K and EG 1.12eV
This is a transcendental equation and must be solved numerically by iteration. Using the HP
solver routine or a spread sheet yields T ≥ 2701 K. Note that this temperature is far above the
melting temperature of silicon.
Si Si Si
D onor electr on
fills acceptor
vacancy
P B Si
Si Si Si
2.20
Since Ge is from column IV, acceptors come from column III and donors come from column
V. (a) Acceptors: B, Al, Ga, In, Tl (b) Donors: N, P, As, Sb, Bi
2.21
(a) Gallium is from column 3 and silicon is from column 4. Thus silicon has an extra electron
and will act as a donor impurity.
(b) Arsenic is from column 5 and silicon is from column 4. Thus silicon is deficient in one
electron and will act as an acceptor impurity.
2.22
(a) Germanium is from column IV and indium is from column III. Thus germanium has one
extra electron and will act as a donor impurity.
(b) Germanium is from column IV and phosphorus is from column V. Thus germanium has
one less electron and will act as an acceptor impurity.
2.23
A
j 10000 2 0.02 cm 200
j V
E , a small electric field.
cm cm
2.24
C cm
jndrift qnn E qnvn 1.602x1019 1017 3 107
cm
kA
160 2
s cm
2-5 ©R. C. Jaeger & T. N. Blalock 10/18/09
2.25
1016 atoms 104 cm 3
N 0.5m5m0.5m 12,500 atoms
cm m
3
2.26
(a) Since arsenic is a donor, ND = 3 x 1017/cm3. Assume NA = 0, since it is not specified. The
material is n-type.
(b) At room temperature, n i 1010 / cm3 and N D N A 3x1017 / cm3 >> 2n i
ni2 1020 /cm6
So n 3x10 /cm and p
17 3
17 3
333/cm3
n 3x10 /cm
(c) At 250K, ni 1.08x10 250 exp
1.12
4.53x1015 /cm6
2 31 3
8.62x10 250
5
4.53x1015
ni 6.73x10 /cm
7 3
N D N A 2ni , so n = 3x10 / cm and n =
17 3
17
0.0151/ cm3
3x10
2.27
(a) Since boron is an acceptor, NA = 6 x 1018/cm3. Assume ND = 0, since it is not specified.
The material is p-type.
(b) At room temperature, ni 1010 /cm3 and N A N D 6x1018 / cm3 >> 2n i
ni2 1020 /cm6
So p 6x1018 /cm3 and n 18 3
16.7/cm3
p 6x10 /cm
(c) At 200K, ni 1.08x10 200 exp
1.12
5.28x109 /cm6
2 31 3
8.62x10 200
5
5.28x109
ni 7.27x104 /cm3 N A N D 2ni , so p 6x1018 /cm3 and n 18
8.80x1010 /cm3
6x10
2.28
(a) Arsenic is a donor, and boron is an acceptor. ND = 2 x 1018/cm3, and NA = 8 x 1018/cm3.
Since NA > ND, the material is p-type.
(b) At room temperature, n i 1010 / cm3 and N A N D 6 x1018 / cm3 >> 2n i
ni2 10 20 /cm6
So p 6 x1018 /cm3 and n 18 3
16.7 /cm3
p 6 x10 /cm
2.29
(a) Phosphorus is a donor, and boron is an acceptor. ND = 2 x 1017/cm3, and NA = 5 x 1017/cm3.
Since NA > ND, the material is p-type.
(b) At room temperature, ni 1010 /cm3 and N A N D 3 x1017 / cm3 >> 2n i
ni2 1020 /cm6
So p 3x10 /cm and n
17 3
17 3
333/cm3
p 3 x10 /cm
2.31
N A N D : The material is p - type. N A N D 1015 1014 9x1014 /cm3
If we assume N A N D 2ni 1014 / cm3 :
ni2 251026
p N A N D 9x10 /cm | n 14
3
14
2.78x1012 /cm3
p 9x10
2
and n 2.77x10 /cm . The answers are essentially the same.
12 3
2.32
N D N A: The material is n - type. N D N A 3x1017 2x1017 1x1017 /cm3
2ni 2x1017 /cm3 ; Need to use Eq. (2.11)
n 17
/cm3
2
ni2 1034
p 17
6.18x1016 /cm3
n 1.62x10
2.33
ND = 5 x 1016/cm3. Assume NA = 0, since it is not specified.
N D N A : The material is n - type. | N D N A 5x1016 / cm3 2ni 2x1010 / cm3
ni2 1020
n = 5x1016 / cm3 | p = 16
2x103 / cm3
n 5x10
cm2 cm2
N D N A 5x1016 / cm3 | Using Fig. 2.8, n 960 and p 280
V s V s
1 1
0.130 cm
q n n cm2 5x1016
19
1.602x10 C 960
V s cm
3
2.35
Indium is from column 3 and is an acceptor. NA = 8 x 1019/cm3. Assume ND = 0, since it is not
specified.
N A N D : material is p - type | N A N D 8x1019 /cm3 2ni 2x1010 /cm3
ni2 1020
p 8x1019 /cm3 | n= 1.25/cm3
p 8x1019
cm2 cm2
N D N A 7x1019 / cm3 | Using Fig. 2.8, n 100 and p 50
V s V s
1 1
1.56 m cm
q p p cm2 8x1019
19
1.602x10 C50
V s cm
3
2.36
Phosphorus is a donor: N D 4.5x1016 / cm3 | Boron is an acceptor: N A 5.5x1016 / cm3
N A N D : The material is p - type. | N A N D 1016 / cm3 2ni 2x1010 / cm3
ni2 1020
p 1016 /cm3 | n 10 4 /cm3
p 1016
cm2 cm2
N D N A 1017 / cm3 | Using Fig. 2.8, n 800 and p 220
V s V s
1 1
2.84 cm
q n n 19
cm2 1016
1.602x10 C220 3
V s cm
NA p p p
2.38
1 1 1.16x1020
| n n
qn n
1.602x1019 C 0.054 cm V cm s
An iterative solution is required. Using the equations in Fig. 2.8:
ND n n n
2.39
1 1 1.16x1020
| p p
q p p 1.602x10 C0.054 cm
19
V cm s
NA p p p
NA p p p
2.41
Yes, by adding equal amounts of donor and acceptor impurities the mobilities are reduced, but
the hole and electron concentrations remain unchanged. See Problem 2.44 for example.
However, it is physically impossible to add exactly equal amounts of the two impurities.
2.42
1 1 2.08x1018
| n n n N D
qn n 1.602x10 C3 cm
19
V cm s
ND n nn
ND n nn
(b)
1 1 6.24x1021
| p p p N A
q p p 1.602x1019 C0.001 cm V cm s
An iterative solution is required using the equations in Fig. 2.8:
NA p p p
2.44
Based upon the value of its resistivity, the material is an insulator. However, it is not intrinsic
because it contains impurities. Addition of the impurities has increased the resistivity.
Since N D N A = 0, n = p = ni , and q n ni p ni qni n p
N A N D 1020 / cm3 which yields p 49.6 and n 95.0 using the
equations from Fig. 2.8.
1 1
4.32x106 - cm
qni n p cm2
1.602x10 C10
19 10
cm3
95.0 49.6v sec
NA p p p
1016 406 4.1 x 1018
1.5 x 1016 383 5.7 x 1018
1.7 x 1016 374 6.4 x 1019
To change the resistivity to 0.25 ohm-cm:
1 1 2.5x1019
| p p pN A
q p p
1.602x1019 C 0.25 cm V cm s
NA p p p
16 3
So ND = 4.1 x 10 /cm must be added to change achieve a resistivity of 0.25 ohm-cm. The
silicon is converted to n-type material.
qn n qn N D 1.602x1019 C 1250 1016
2.00
cm
Now we add acceptors until = 5.0 (-cm) : -1
4 cm
1
2.50x1019
q p p | p p p N A N D
1.602x1019 C V cm s
NA ND + NA p NA - ND p p
1.00E+17 1.10E+17 2.25E+02 9.00E+16 2.02E+19
2.00E+17 2.10E+17 1.76E+02 1.90E+17 3.34E+19
1.50E+17 1.60E+17 1.95E+02 1.40E+17 2.74E+19
1.40E+17 1.50E+17 2.00E+02 1.30E+17 2.60E+19
1.30E+17 1.40E+17 2.06E+02 1.20E+17 2.47E+19
1.32E+17 1.42E+17 2.05E+02 1.22E+17 2.50E+19
2.47
q p p q p N A 1.602x1019 C 405 1016
0.649
cm
Now we add donors until = 5.5 (-cm) -1:
5.5 cm
1
3.43x1019
qn n | n n n N D N A
1.602x1019 C V cm s
ND ND + NA n ND - NA p p
2.48
kT 1.38x1023 T
VT 19
8.62x105 T
q 1.602x10
2.50
cm2 1019 / cm3
j qD p
dp
dx
19
1.602x10 C 15 4
e xp
x
4
s 2x10 cm 2x10 cm
x A
j 1.20x105 exp5000 2
cm cm
8 2
I 0 j 0A 1.20x10
5 A 2 10 cm
10m
cm2
m
2
12.0 mA
2.51
dp 1 dp 1 dp
j p q p pE qD p q p pE VT 0 E VT
dx p dx p dx
E VT
1 dN A 1022 exp 10 4 x
0.025 14
N A dx 10 1018 exp 10 4 x
1022
E 0 0.025
V
250
10 10
14 18
cm
10 exp5
22
E 5x104 cm 0.025 14
10 10 exp5
18
246
V
cm
2.52
At x = 0:
cm2 1016 V
drift
n
j qn nE 1.60x10 C 350 19
3 20 11.2 2
V s cm cm
A
cm
cm2 1.01x1018 V
j pdrift q p pE 1.60x1019 C 150
V s cm
3
20 484 2
cm
A
cm
cm2 10 4 1016
jndiff qDn
dn
dx
1.60x1019 C 350 0.025 4
s 2x10 cm 4
A
70.0 2
cm
cm2 1018 1.01x1018
j pdiff qD p
dp
dx
1.60x1019 C 150 0.025
4
s 2x10 cm 4
A
30.0 2
cm
A
jT 11.2 484 70.0 30.0 535
cm2
2.53 NA = 2ND
EC
E N N ND
D D D
EA NA NA NA NA
E
V
Holes
2.54
34
hc 6.626 x10 J s 3x10 m / s
8
1.108 m
E
1.12eV 1.602 x1019 J / eV
2.55
Al - An ode Al - Cathode
Si02
n-type silicon
p-type silicon
2.56
An n-type ion implantation step could be used to form the n+ region following step (f) in Fig.
2.17. A mask would be used to cover up the opening over the p-type region and leave the
opening over the n-type silicon. The masking layer for the implantation could just be
photoresist.
Mask Ion implantation
Photoresist
Si02
n+
p-type silicon p-type silicon
Side view
Top View
2.57
1 1
(a) N = 8 6 4
1 8 atoms
8 2
3 3
(b) V l 3 0.543x109 m 0.543x107 cm 1.60x1022 cm3
8 atoms atoms
(c) D = 5.00x1022
1.60x1022 cm3 cm3
g
(d ) m = 2.33 3 1.60x1022 cm3 3.73x1022 g
cm
(e) From Table 2.2, silicon has a mass of 28.086 protons.
3.73x1022 g g
mp 1.66x1024
28.0828protons proton
Yes, near the actual proton rest mass.