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A b s t r a c t - - A review is presented of the theory of the Hall effect and related phenomena in solids.
Basic principles are illustrated by application of the Lorentz force to moving charges in a free-electron
system. Application to a real solid is indicated through a consideration of the effects of band structure
and charge-carrier scattering mechanisms. Association is also made with the off-diagonal elements of
the conductivity tensor, and the influence of certain symmetries in the medium is discussed. Special
mention is made of specific parameters useful in characterizing a material for Hall-effect applications,
including the dependence of the parameters on temperature and impurity content.
T h e question of the variation of Hall coefficient with magnetic field is examined in some detail, with
particular attention to band structure and crystal anisotropy, scattering, inhomogeneities and multi-
band effects. Differentiation is made between isothermal and adiabatic phenomena, and the import-
ance of various thermomagnetic contributions is pointed out. Related galvanomagnetic phenomena
which are discussed include magnetoresistance effect and also the magnetic-field dependence of the
skin depth in the case of the transmission of a.c. fields through a disk.
R 6 s u m 6 - - - O n pr6sente une revue de la th~orie de l'effet Hall et des ph6nom~nes alli6s dans les
solides. Les principes fondamentaux sont illustr~s par l'application de la force Lorentz aux charges
mobiles dans u n syst~me ~t ~lectron mobile. L'application h u n solide r~el est indiqude par une
consideration des effets des structures de bande et des mdcanismes d'~parpillement des porteurs de
charge. U n e association est aussi faite avec les 6Mments non-diagonaux du tenseur de conductivit~
et l'influence de certaines sym&ries dans le milieu est discut~e. Une mention sp~ciale est faite des
param~tres spficifiques utiles pour caract6riser u n mat~riau pour applications h effet Hall, comprenant
la d6pendance des param~tres sur la temperature et la quantit~ d'impuretC
La question de la variation du coefficient Hall avec le champ magn~tique est examin6e en d&ail,
et en particulier la structure de bande et l'anisotropie de cristaux, l'#parpillement, les inhomo-
g~neit~s et les effets de bandes multiples. O n diffdrentie entre les phdnom~nes adiabatiques et
isothermes et l'importance de diverses contributions thermomagn~tiques est indiqu6e. Les phdno-
m~nes galvanomagn~tiques alli6s qui sont discut~s comprennent l'effet de magn~toresistance et aussi
la dfipendence d u champ magn~tique sur la profondeur de peau dans le cas de la transmission de
champs h courant alternatif h travers u n disque.
t Partial support by Air Force Office of Scientific Research through Grant No. 525-66 is gratefully acknowledged.
339
340 A. C. B E E R
thermal vibrations of the solid--i.e, the scattering, This angle is called the Hall angle, namely
as well as the band structure of the solid. The
latter consideration arises from the fact that the 0 - tan -:t Ey/Ex. (9)
charge carriers are not really free, but exist in a Thus the Hall effect can be described as a rotation
potential energy field having the periodicity of the of the electric field--a concept which is very useful.
lattice. As a result of these constraints, only At zero Hall field, the equipotential lines are
certain energy states, or bands, are allowed for the perpendicular to J, but when the Hall field appears,
charge carriers. Furthermore, the relationship they are oblique, so that a Hall voltage exists across
between energy and velocity of the carriers is not the specimen in a direction normal to the current.
the simple ½mvZ of the free electron, but is more The rotation aspect of the Hall effect is also
complex. As an approximation, one frequently brought out by considering the components of the
characterizes the charge carriers by an effective conductivity tensor, which relates electric current
mass, m*. In general, m* is anisotropic, i.e. it is densities and fields. For the boundary condition
a tensor. It may also vary with energy of the that Jz = 0, we may write
carrier.
Taking into account most of the complexities J~ = zzxEx+ ~rzyEu
just mentioned, one still obtains--when one type Jz=0, H=Hz
of charge carrier is present--an expression similar
to equation (7), namely Ju = - CrxuEx+ ~r¢xEy" (10)
In going from equations (20) to (26) we have resistance in the Hall circuit as
expressed the antisymmetric components of the
resistivity tensor by the vector product R H x J . Z~n~ = Kpb/Lt, (27)
This is a special case, adapted to our geometry, where p is the resistivity and b, L, t are respectively
of a more general relation given by CASIMIa.* the width, length and thickness of the Hall element.
Now the first term on the right hand side of According to S~ER and coUaborators(lS), the value
equation (26) results from the off-diagonal terms of K is usually between 2 and 5.
of the resistivity tensor which are antisymmetric The Hall voltage V~ is given, in practical units,
in their indices, and which, we saw, are odd in H. by
This is the familiar Hall field. The second term, VH = MO-aRHI/t (volts) (28)
which results from off-diagonal terms which are
symmetric and therefore even in H, is associated where ?, is essentially unity, differing only for
with a magnetoresistance effect. The term vanishes geometries where contact shorting is significant.
under conditions of sufficient symmetry, as was Now for maximum power transfer, the external
illustrated by equations (10). In the absence of resistance must equal Z~nt, so that the expression
adequate symmetry, however, it follows that the for the power in the load becomes
Hall probes can register an admixture of Hall
Wo = VH2/4Z~nt. (29)
voltages (odd in H) and magnetoresistance voltages
(even in H). Since, under such conditions, V ( H ) The power supplied to the specimen is
is no longer equal to - V ( - H ) , it follow that for
most Hall effect devices, such a situation must be W~ = I~pL/bt (30)
avoided. An example of the admixture of Hall and and hence, in practical units,
magnetoresistance voltages is given in Section 6.
Wo = ( 1 0 - 1 6 a ~ / ~ ( R ~ / p ~ ) W ~ ~ ~ 2 ~ W ~ .
5. OPTIMIZATION OF MATERIALS PARAMETERS
A number of considerations enter into the criteria (31)
for the characteristics of the best material for a Thus for maximum power, we are interested in
given Hall effect application. Many of these will highest mobility materials.
be discussed in subsequent papers. Here we shall For case (b), where maximum output voltage is
devote our attention only to the Hall element-- desired, we have, from equations (28) and (30):
excluding the magnetic circuit--and shall consider
two contrasting examples which illustrate some of V~ = AIO-SRIII/t
the major factors to be considered. These cases = IO-SA(b/Lt)II2(RH/pll2)W,I/~ ,,~ (I~R)ll2HW, ll2.
are (a) maximum power output and (b) maximum
voltage. In both cases, the constraint on the input (32)
current to the element is that imposed by a certain For maximum output voltage, the figure of merit
maximum heat generation rate. for the material is therefore the quantity R[~/p
An exact calculation of maximum output voltage or V'(/~R). Representative values of these para-
or power from the Hall element involves, of course, meters of merit for various materials are given in
the solution of the field equations for the geometry Table 1. It is apparent from the table that if the
of the system which includes the active element operating requirement is maximum output power
and the contacts. Various aspects of the problem --without further limitations--then InSb is the
have been considered by a number of investigators obvious choice; if the requirement is the highest
using, for the most part, conformal transforma- no-load output voltage, then silicon is the fore-
tions.(9-n) Several conference papers are to be front contender J15,16) In practice, other constraints
devoted to this subject.(lg) For our purposes here, are usually imposed. An important one is that the
we shall follow the procedure adopted by SAKER temperature coefficient be small. This means--as
and co-workers(13) and absorb these geometry can be seen from the last column in Table 1 -
factors in a parameter K, writing the internal that intrinsic or nearly intrinsic materials must be
* See, for example, pp. 41-43 and 83-85 of Ref. 1. avoided. Thus, in the case of InSb, the specimen
344 A . C. B E E R
o,
Material cm3/C f~-cm cm-s cm2/V-sec R/p1~2 klt~2§ kz(R/pl/a)§ . ~o]°C
must be doped into the moderate 10 t7 region.(17) a decrease by a factor of 2½ from good bulk values, t
T h e mobility is then degraded by impurity scat- F r o m T a b l e 1 it is apparent that because of the
tering to a value which is not much different from higher resistivity of InAs, the material could be
that in InAs of the required doping. Another almost an order of magnitude thicker to yield the
consideration, which is especially pertinent in the same resistance. T h e mobility in the element would
case of I n S b , is the resistance of the Hall unit. I n be essentially the bulk value. F o r these reasons,
most circuits this needs to be the order of ohms I n A s is often preferred to InSb(20), in spite of the
rather than fractions of ohms. T o achieve such fact that the m a x i m u m figure of merit is higher
values with a material of resistivity as low as that for the latter material.
in the doped InSb, requires very thin s p e c i m e n s - -
perhaps the order of a few microns. I f deposition 6. M A G N E T I C FIELD D E P E N D E N C E OF
HALL COEFFICIENT
techniques are used to produce such thin films,
Factors which can influence how the Hall
the mobility may be further degraded. For example,
coefficient varies with magnetic field include the
the I n S b in Hall elements of respective resistances
nature of the charge-carrier scattering, the degree
3 and 15 f~ produced by MARAIS etal.(ls) possessed
of degeneracy (i.e. the location of the Fermi level
electron mobilities of 34,000 and 18,000cm2/
with respect to the band edge), the band structure,
V-see, respectively. Film thicknesses were between
and the degree of inhomogeneity of the specimen.
10 and 16/~. T h e deposits were polycrystalline,
and although it appears that recrystallization ~"Further improvements are being reported (see the
conference papers cited in Ref. 19), and it appears that
techniques(19) might produce films as thin as 1-2/~ the mobility gap between vapour deposited films and bulk
with mobilities of 30,000, the result still represents crystals of InSb is being substantially reduced.
THE HALL EFFECT AND RELATED PHENOMENA 345
to sum the contributions from each band in obtain- materials depends only on the carrier densities,
ing the elements of the conductivity tensor shown 1
in equation (10), noting that the antisymmetric Rtt-,oo ]elc(p_n), n ~ p, (34)
terms bear opposite signs for conduction by holes
and does not involve the mobilities. Thus in the
example just cited, we may expect a significant
37 >
~. , , ~ o l o o g [oo0 ox,~T ~ change in Hall coefficient as the magnetic field is
-~ 3"6 varied. This is precisely what one finds, for
3-5 example, in p-type germanium, where the valence
o
3-4 I] I r band is degenerate and bands of light- and heavy-
"3 53
mass holes exist. Experimental data for such a
specimen are shown in Fig. 6. T h e decrease in r0
3'2
at lower temperatures is attributed to the influence
2 3'1 of increased ionized impurity scattering. Warping
o 3-0 (non-sphericity) of the heavy-mass band exists,
2 4 6 8 I0 12 14 [6 18 20 22
and in silicon the competition of effects from the
Mognefic F}eld, H, ira kHogouss
two bands, from warping, and from mixed scatter-
Fro. 4. Ratio of Rn]po for a [100] cylinder for two direc- ing can result in substantially different magnetic
tions of the magnetic field (after MAsoN et a/.(7)). field dependences at low temperatures in specimens
of different purity. This is illustrated in Fig. 7.
velocity separation of charge carriers by the effects are important---or if the so-called "thermo-
Lorentz force--the energetic ones going to one electric materials"* are involved~then considera-
side, the slower ones to the other. Temperature tion of thermomagnetic effects may be advisable.
gradients are produced, and also electric fields. In Thermomagnetic phenomena are responsible in
the Righi-Leduc effect, a longitudinal temperature first approximation, for differences between the
gradient produces a transverse temperature so-called isothermal and adiabatic Hall coeffi-
gradient (thermal analog of the Hall effect); in cients.Ca0-32) T o reduce any such differences, in
the Nernst effect, it produces a transverse electric addition to choice of materials having relatively
field. In the Ettingshausen effect, a longitudinal large thermal conductivities, one may also employ
electric current produces a transverse temperature the expedient of making a good thermal attachment
~z. _ -- - - E95
Ge Specimen 2-C
NA- No~lO'3 cm -3
Experimental data at temperature
7, I
indicated : v•z~oD
• • • •, - -o I
p
(D
-c
. I Eo,o]
i
0"1 I'0 IO
gradient. The latter effect, if large, can modify the of the Hall element to a block of material having
Hall field, since the potential probes and leads are high thermal conduction.
seldom made of the same material as the specimen. Independent of thermomagnetic effects are, of
Therefore the Ettingshausen temperature gradient course, any temperature gradients and resuking
can produce a thermoelectric voltage which adds thermoelectric voltages produced by uneven heat-
to the Hall voltage. ing in the specimen. These factors must always
T h e thermomagnetic effects depend inversely be considered in design of a Hall element.
on the thermal conductivity of the material and
8. RELATED P H E N O M E N A
therefore can usually be negleeted where there is
an appreciable lattice component of thermal A widely studied galvanomagnetic effect is
conductivity. If, however, the application of the transverse magnetoresistance. This phenomenon can
Hall effect is sufficiently critical that higher order • See, for example, p. 112 of of Ref. 29.
348 A. C. B E E R
be illustrated by the pictorial scheme in Fig. 1. of a certain "average" velocity will be undeflected.
I f a charge carrier is deflected by the Lorentz T h e remaining carriers, having velocities either
force so as to traverse a longer path, it will contri- larger or smaller than the "average" will traverse
bute less to the conductivity, and there will be a larger paths. T h u s the resistance is increased. A
positive magnetoresistance. It was noted, however, similar situation obtains if more than one type of
that if all charge carriers have the same velocity carrier is present. It is also apparent that any
none will be deflected at steady state, since then mechanism which shorts out the Hall voltage--
1.24
g
i.z0
N ['16
Symbol
z~
v
o
o
T= 7 7 oK
Sample
162
2A
IB
8A
/
o H2
..a
u
~ ,.08
c
o
I
1.00
0.96
IO00 IO,O00 IO0,OOO
Magnetic Field , gauss
FIG. 7. Magnetic-field dependence of relative Hall coefficient in several p-type silicon samples of different purity
(after BRmtt25)).The ultra-pure specimens 8A and 1B have room-temperature resistivities of 2700 and 5400 ~-cm,
respectively. Sample 1B appears to have more compensation than does 8A, a postulate borne out by the Rcr data
which are 5 to 10 per cent lower.
the Hall field will exactly cancel the v x H force. for example, special geometry, shorting contacts,
This is the case of the isotropic metal, where the inhomogeneities in the specimen--wiU increase
velocity of all electrons is essentially the Fermi the magnetoresistance.
velocity. It is also true for electron scattering T h e technique of shorting the Hall field is used
mechanisms described by a relaxation time which to advantage in the Corbino disk,(33) shown in
does not vary with energy. If, however, there is a Fig. 9. As a result, the measured magnetoresistance
distribution of electron velocities--as in a semi- continues as/z2H 2 and does not saturate at strong
conductor--then it is clear that only those electrons magnetic fields. Another procedure for fabricating
THE HALL EFFECT AND RELATED PHENOMENA 349
2"0
n-type InSb
77 ° K
Sample B
Ro=4'O x I03 crn3/coulomb
~6
09
1.5
1'4
J.2
H ~"
SQmple A
e =3'4xlO2ohm-cm
rL~L 0 1,0 rr
o
R,,,~= 1"4~7x104 cm3/coulomb
I0-e F H =I
"90
/ 90
I0 102 103 104
H in Gouss
FIG. 8. Magnetic-field d e p e n d e n c e of t h e n o r m a l i z e d H a U c o e ~ c i e n t of two h i g h - p u r i t y n - t y p e I n S b
s a m p l e s . Carrier c o n c e n t r a t i o n s are: s a m p l e zq: 4-2 × 1014 c m - 8 ; s a m p l e B ( n o n - l m i f o r m ) : 5 x 1014 to
5 x 10 is c m -18 (after B A ~ et al.{Zo)).
350 A. C. B E E R
30. A. G. SANIOILOWITSCHand L. L. KORENBLIT, 35. For a discussion of the distinction between magneto-
Fortschr. Physik 1, 486 (1954). conductivity and magnetoresistanee, consult p. 229
31. ¥. A. JOHNSONand F. M. SHIPLEY,Phys. Rev. 90, of Ref. 1.
523 (1953). 36. H. Wvlss, Paper II-7; L. T. Y u ~ , Paper 111-4;
32. L. S. STIL'BANS,Zh. Tekh. Fiz. 22, 77 (1952). R. BONN~ILLE,Paper III-9.
33. H. WEISSand H. W~.L~a, Z. Physik 138, 322 (1954) ; 37. For a discussion of helicon wave phenomena consult
O. MADELU~G,Naturwissenschaften 42, 406 (1955). R. BOWERSand M. C. STEELE,Proc. Inst. Elect.
See also p. 71-76 of Ref. 1. Electron Engrs. 52, 1105 (1964); also R. G.
34. H. WELV~ERand H. WEISS in Solid State Physics CHAMBERSand B. K. JONES,Proc. Roy. Soc. A270,
(F. SEXTZand D. TUR~mULL,eds.), Vol. 3, p. 1. 417 (1962); JACQUESGRI~MILLET,Comptes 2~endus
Academic, New York (1956). 257, 2431 (1963).
38. P. F. HILLE, F. J. REID and A. C. BEER,Paper II-8.