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Introduction to Microfluidics
BITS Pilani
Hyderabad Campus
Handout
Introduction
Text Book:
Fundamentals and applications of microfluidics by Nam-
Trung Nguyen and Steven T. Wereley, Artech House,
2002.
Reference Books:
Introduction to Microfluidics, by Patrick Tabeling, Oxford
University Press, 2005.
Theoretical Microfluidcs, by Henrik Bruus, Oxford Master
Series in Condensed Matter Physics, 2008.
Microfluidics Fundamentals, Devices and Applications,
Edited by Yujun Song, Daojian Cheng, and Liang Zhao,
Wiley 2018.
Weightage
8. Notices: CMS
•Wet station
•Physical vapor
deposition tool
•Oxidation and annealing
furnaces
•U.V. exposure System
•Electrical
characterization tool
A class 100 cleanroom maintains less than one hundred particles larger
than 0.5 microns in each cubic foot of air space.
A class 1000 cleanroom has less than 1000 such particles per cubic foot.
14 BITS Pilani, Hyderabad Campus
Air shower
Applications
• RCA Process
• Piranha Process
• Development process
• Wet etch
• Glass/PET substrate
cleaning
• Incoming wafer surface have organic
and inorganic residues on it, before
going into device fabrication on those
wafers one should do RCA process to
remove contaminants
•Rinse/ used DI water will be drained
• All the other chemicals collected in used bottles and will have to do third party disposal .
Werner Kern developed the basic procedure in 1965 while working for RCA, the Radio
Corporation of America
Piranha solution, also known as piranha etch, is a mixture of sulfuric acid (H2SO4)
and hydrogen peroxide (H2O2), used to clean organic residues off substrates.
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2-Inch furnaces capabilities
Tools/specs Dry oxidation N2 annealing General
purpose CDA
Deposition SiO2 NA
materials
Type of Si, Si, Other Si & Other
Substrates substrates on substrates on
case by case case by case
approval approval
2 inch furnaces
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Metallization by electron beam
evaporator
Tool/ E beam evaporator
specs
Materials to All metals except high
melting point materials like
deposit W, Pt and other ceramics
Technical Specifications:
Range of UV : 350 nm to 450 nm
Wave Length
Wattage of Lamp : Not more than 2 kW
Exposure Area : Min : 100 mm x 100 mm
Max : 200 mm x 200 mm
UV Exposure Unit will have a programmable time counter
and Mask and substrate will be held by Vacuum.
Note:
• If all features are above 50 microns we use Transparency masks can be
printed out side using laser printer
• Resolution need to be identified
• Only level one lithography is possible
Mask Aligner
24 BITS Pilani, Hyderabad Campus
BITS Pilani
Hyderabad Campus
Microfluidics
Size characteristics of microfluidic devices
34
Modelling Approaches
Modelling approaches for microfluidic simulation
Continuum Fluid Mechanics
Molecular Approaches
MD
DSMC Technique Small Characteristic length.
Kn
L Multi physics Simulation
VL
Re
k Ma
Kn
2 Re
VL
Pe
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Modelling Approaches
Modelling approaches for microfluidic simulation
Continuum assumption fails for some range of parameters:
Knudsen number for gas when Knudsen is larger than 0.1
For liquids when fluid is sheared at faster than twice the characteristic molecular
interaction frequency
Molecular Approaches
Molecular Dynamics:
Straight forward application of Newton’s second laws for each molecule.
Collection of molecules distrusted in the space .
Each molecules assigned random velocity, such that it follows Boltzmann
distributions
Molecular velocities are integrated forward in time to arrive new molecular position.
As per user desire velocity can be sampled, averaged to compute flow quantities.
Direct Simulation Monte Carlo (DSMC) Technique:
DSMC is based on Kinetic theory of gas
DSMC tracks the motion of hundreds of particles out of thousands or millions of
particles.
It uncouples molecular motions from intermolecular collisions.
Molecular motions are treated deterministically, while intermolecular collisions are
treated statistically
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