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ThD1-1 (Invited) IPRM2013, May 19 - 23, 2013, Kobe, Japan

The 25th International Conference on Indium Phosphide and Related Materials


8:30 - 9:00

Asymmetric Dual-Grating Gate InGaAs/InAlAs/InP


HEMTs for Ultrafast and Ultrahigh Sensitive
Terahertz Detection
Taiichi Otsuji, Takayuki Watanabe, Stephane Boubanga-Tombet, Tetsuya Suemitsu
Research Institute of Electrical Communication, Tohoku University
Sendai, Japan
otsuji@riec.tohoku.ac.jp
Dominique Coquillat, Wojciech Knap
LC2 Laboratory. University of Montpellier and CNRS
Montpellier, France
Denis Fateev, Vyacheslav Popov
Kotelnikov Institute of Radio Engineering and Electronics (Saratov Branch), RAS
Saratov, Russia

Abstract—This paper reviews recent advances in ultrafast and boundaries is greatly enhanced by applying different gate
ultrahigh sensitive broadband terahertz detection utilizsing voltages Vg1 and Vg2 to the two different sub-gratings of the A-
asymmetric double-grating-gate InP-based high-electron- DGG. Terahertz electric current distribution and resultant
mobility transistors, demonstrating a record responsivity of 2.2 photovoltaic response were numerically simulated using a self-
kV/W at 1 THz under drain-unbiased conditions with a superior consistent electromagnetic approach combined with the
low noise equivalent power of 15 pW/¥Hz and 6.4 kV/W even at perturbation theory for the hydrodynamic equations for 2D
1.5 THz under drain-biased conditions. plasmons in HEMTs [6]. Figure 2a shows the electric-current
distribution, underneath an A-DGG unit cell. It is clearely seen
Keywords—terahertz; plasmon; detector; HEMT; grating
that the photocurrent (thus the responsivity) dramatically
increases in the undepleted regions, as the portions of the
I. INTRODUCTION channel under the second sub-grating gates is strongly
Hydrodynamic nonlinearities of two-dimensional (2D) depleted. One can see a giant enhancement of responsivity by
plasmons in high-electron-mobility transistors (HEMTs) are four orders of magnitude (Fig.2a) in asymmetric structures (d1
promising for fast and sensitive rectification/detection of  d2) compared to conventional symmetric ones (d1 = d2). Two
terahertz (THz) radiation [1], which can be applied to real-time different processes may be considered to analyze the
THz sensing and future THz wireless communications [2]. enhancement of the photovoltage in our A-DGG-FET
When a terahertz radiation excites the 2D plasmons in a structures: i) resonant excitation of plasmon modes in
HEMT, local carrier densities as well as local carrier drift undepleted portions of the 2D electron channel that generate
velocity in the channel are modulated by the THz radiation, strong THz photocurrent due to the nonlinear behavior of these
resulting in generation of quadratic plasma-wave current with a plasmons, and ii) non resonant excitation of overdamped
rectified DC component, giving rise to a photovoltaic effect at plasmons in depleted regions. The strong depleting of those
the high-impedance drain terminal under a common-source
asymmetric boundary condition. Recently, InP- and GaN-based
HEMTs as well as Si-MOSFETs have demonstrated improved
responsivities [3,4], approaching 1 kV/W at 1 THz by
introducing narrowband dipole antenna merged with the gate
electrode [3]. A metal grating gate is an efficient broadband
coupler between plasmons and THz radiation, but suffers from
poor responsivity [5]. This paper reviews recent advances in
ultrahigh sensitive, broadband THz detection based on InP-
based HEMTs incorporating authors’ original asymmetric
double-grating-gate (A-DGG) structure.

II. DEVICE STRUCTURE AND ANALYSIS


Typical A-DGG HEMT structure of the authors’ proposal
Figure 1. Fig. 1. Schematic view and SEM images of an A-DGG HEMT
[6] is depicted in Fig. 1. The asymmetry of the cavity THz detector. Lg1 = 200 nm, Lg2 = 1.6 ȝm, d1 = 200 nm, d2 = 400 nm.

978-1-4673-6132-3/13/$31.00 ©2013 IEEE

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ThD1-1 (Invited)
8:30 - 9:00

(a)

Figure 2. Measured responsivity (a) and NEP (b) under drain-unbiased


Figure 4. Simulated current distribution (a) and responsivity (b) for an A- conditions at 1, 1.5, and 2 THz at 300K.
DGG HEMT. Lg1 = 200 nm, Lg2 = 800 nm, d1 = 200 nm, d2 = 400 nm.

regions greatly enhances the channel resistance, which leads to


enormous enhancement of the photovoltage induced between
the source and drain contacts of the entire A-DGG-FET
structure. Therefore these structures combine the advantages of
both, resonant and non-resonant plasmonic THz detectors.

III. EXPERIMENTS
A-DGG HEMTs have been designed and fabricated using Figure 3. Measured responsivity in resonant mode at 292 GHz at low
InAlAs/InGaAs/InP heterostructure material systems (Fig. 1). temperatures under drain-unbiased conditions (a) and in nonresonant mode at
1.5 THz at 300K under drain-biased conditions (b).
The asymmetric factor, d1/d2, was fixed to be 0.5. A chirped
grating structure for the G1 finger Lg1 was introduced, which
can compensate the electron density chirp along the channel ACKNOWLEDGMENT
under a specific drain-source bias Vds condition [7]. Figure 3
shows measured responsivities at 300 K (a) and related noise This work is supported by the JST-ANR WITH, Japan.
equivalent power (NEP) (b) under 1-THz radiation.
Responsivities of as high as 2.2 kV/W and NEP below 15 REFERENCES
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