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DoE / Taguchi Method

OA based Experiments
Factor Effect Plots
and
Analysis for Best Settings and Predicted Results

By
Prakash R. Apte
COEP, Pune

Lecture 8c to FY PhD scholars at COEP


May 2020
E-mail: apte1947@gmail.com
Web-page: www.ee.iitb.ac.in/~apte
OUTLINE

 OA based Experiments
 Simplified Polysilicon Deposition Process
(using L9)

 Analysis for Factor Effect Plots,


Best Settings and Best Results

May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods Factor Effects & Analysis --2
8 STEPS IN TAGUCHI METHOD
for a simplified
POLYSILICON DEPOSITION PROCESS
with 4 variables

May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods Factor Effects & Analysis --3
8 STEPS IN TAGUCHI METHODOLOGY
Simplified Polysi Deposition Process:
Reduce Defects and Increase Thickness Uniformity

1. IDENTIFY THE MAIN FUNCTION,


SIDE EFFECTS, AND FAILURE MODE
2. IDENTIFY THE NOISE FACTORS,
TESTING CONDITIONS, AND QUALITY CHARACTERISTICS
3. IDENTIFY THE OBJECTIVE FUNCTION TO BE OPTIMIZED
4. IDENTIFY THE CONTROL FACTORS AND THEIR LEVELS
5. SELECT THE ORTHOGONAL ARRAY MATRIX EXPERIMENT
6. CONDUCT THE MATRIX EXPERIMENT
7. ANALYZE THE DATA,
PREDICT THE OPTIMUM LEVELS AND PERFORMANCE
8. PERFORM THE VERIFICATION EXPERIMENT
AND PLAN THE FUTURE ACTION

May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods Factor Effects & Analysis --4
8 STEPS IN TAGUCHI METHODOLOGY
Simplified Polysi Deposition Process:
Reduce Defects and Increase Thickness Uniformity

1. IDENTIFY THE MAIN FUNCTION,


SIDE EFFECTS, AND FAILURE MODE

MAIN FUNCTION : Simplified Polysilicon Deposition Process


Desired Thickness = 3600 A

SIDE EFFECTS : No Side-Effects are considered

FAILURE MODE : Defects in Polysilicon Layer


Defect Density < 10 / sq cm

May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods Factor Effects & Analysis --5
8 STEPS IN TAGUCHI METHODOLOGY
Simplified Polysi Deposition Process:
Reduce Defects and Increase Thickness Uniformity

Pressure
Gauge Wafers
3-Zone Furnace

Gas To
Inlet Pump

Schematic Diagram of a low pressure reactor

May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods Factor Effects & Analysis --6
8 STEPS IN TAGUCHI METHODOLOGY
Simplified Polysi Deposition Process:
Reduce Defects and Increase Thickness Uniformity

1. IDENTIFY THE MAIN FUNCTION,


SIDE EFFECTS, AND FAILURE MODE
2. IDENTIFY THE NOISE FACTORS,
TESTING CONDITIONS, AND QUALITY CHARACTERISTICS

Temperature, Pressure,
Variation in :
Settling Time, Cleaning Method

Testing Conditions : Wafers at 2 Ends and Centre


3 Wafers, 3 points each

Quality Characteristics : Defect Density

May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods Factor Effects & Analysis --7
Step 2: Noise Factors and Their Levels

LEVELS

NoIsE Number of
NoIsE Level 1 NoIsE Level 2 NoIsE Level 3
FACTORS LEVELS

X-axis
End1 Centre End2 3
Locations

Y-axis
low middle top 3
Locations

May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods Factor Effects & Analysis --8
8 STEPS IN TAGUCHI METHODOLOGY
Simplified Polysi Deposition Process:
Reduce Defects and Increase Thickness Uniformity

X X X
X X X
X X X

END 1 CENTRE END 2

Testing conditions : 3-points on 3-wafers

May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods Factor Effects & Analysis --9
8 STEPS IN TAGUCHI METHODOLOGY
Simplified Polysi Deposition Process:
Reduce Defects and Increase Thickness Uniformity

1. IDENTIFY THE MAIN FUNCTION,


SIDE EFFECTS, AND FAILURE MODE
2. IDENTIFY THE NOISE FACTORS,
TESTING CONDITIONS, AND QUALITY CHARACTERISTICS
3. IDENTIFY THE OBJECTIVE FUNCTION TO BE OPTIMIZED

OBJECTIVE FUNCTION :
n
1
(1) Defect Density ---> DEFCETS = – 10 Log10 ---
n y2
SMALLER - THE - BETTER i
i=1

Factor Effects & Analysis --


May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 10
8 STEPS IN TAGUCHI METHODOLOGY
Simplified Polysi Deposition Process:
Reduce Defects and Increase Thickness Uniformity

1. IDENTIFY THE MAIN FUNCTION,


SIDE EFFECTS, AND FAILURE MODE
2. IDENTIFY THE NOISE FACTORS,
TESTING CONDITIONS, AND QUALITY CHARACTERISTICS
3. IDENTIFY THE OBJECTIVE FUNCTION TO BE OPTIMIZED

4. IDENTIFY THE CONTROL FACTORS AND THEIR LEVELS

Control Factors = 4
Temperature, Pressure, Settling Time and Cleaning Method

Levels of each Control factor = 3

Factor Effects & Analysis --


May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 11
Step 4: Control Factors and Their Levels

 LEVELS 
CONTROL
FACTORS
1 2 3

Temperature (◦C) To-25 To To+25

Pressure (mTorr) Po-200 Po Po+200

Settling Time (min) to to+8 to+16

Cleaning Method none CM2 CM3

Starting Levels are indicated by underlined levels


Factor Effects & Analysis --
May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 12
8 STEPS IN TAGUCHI METHODOLOGY
Simplified Polysi Deposition Process:
Reduce Defects and Increase Thickness Uniformity

1. IDENTIFY THE MAIN FUNCTION,


SIDE EFFECTS, AND FAILURE MODE
2. IDENTIFY THE NOISE FACTORS,
TESTING CONDITIONS, AND QUALITY CHARACTERISTICS
3. IDENTIFY THE OBJECTIVE FUNCTION TO BE OPTIMIZED
4. IDENTIFY THE CONTROL FACTORS AND THEIR LEVELS

5. SELECT THE ORTHOGONAL ARRAY MATRIX EXPERIMENT


1 FOR MEAN AND
DEGREES OF FREEDOM = 2 EACH FOR 4 FACTORS = 8 Total = 9

ORTHOGONAL ARRAYS WITH 3 - LEVEL FACTORS :


NO. OF FACTORS 2-4 5-7 8-13
ORTHOGONAL ARRAY
L9
L9 L18 L27
Factor Effects & Analysis --
May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 13
L9 Orthogonal Array
  Control Factors
Expt. No. A B C D
1 1 1 1 1
2 1 2 2 2
3 1 3 3 3
4 2 1 2 3
5 2 2 3 1
6 2 3 1 2
7 3 1 3 2
8 3 2 1 3
9 3 3 2 1

Factor Effects & Analysis --


May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 14
L9 Array with CF assignments
Control Factors Assigned to columns
Pressure Settling Time Cleaning
Expt. No. Temperature ◦C
(mTorr) (min) Method
1 To-25 Po-200 to None
2 To-25 Po to+8 CM2
3 To-25 Po+200 to+16 CM3
4 To Po-200 to+8 CM3
5 To Po to+16 none
6 To Po+200 to CM2
7 To+25 Po-200 to+16 CM2
8 To+25 Po to CM3
9 To+25 Po+200 to+8 none

Factor Effects & Analysis --


May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 15
8 STEPS IN TAGUCHI METHODOLOGY
Simplified Polysi Deposition Process:
Reduce Defects and Increase Thickness Uniformity

1. IDENTIFY THE MAIN FUNCTION,


SIDE EFFECTS, AND FAILURE MODE
2. IDENTIFY THE NOISE FACTORS,
TESTING CONDITIONS, AND QUALITY CHARACTERISTICS
3. IDENTIFY THE OBJECTIVE FUNCTION TO BE OPTIMIZED
4. IDENTIFY THE CONTROL FACTORS AND THEIR LEVELS
5. SELECT THE ORTHOGONAL ARRAY MATRIX EXPERIMENT

6. CONDUCT THE MATRIX EXPERIMENT


---> CONDUCT THE 9 EXPTS. OF L9 ARRAY
---> IN EACH EXPT. MEASURE THE DEFECTS
FOR THE 9 NOISE CONDITIONS
OF WAFER LOCATION (IN X-AXIS) AND TEST POINTS (IN Y-AXIS)
Factor Effects & Analysis --
May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 16
8 STEPS IN TAGUCHI METHODOLOGY
Simplified Polysi Deposition Process:
Reduce Defects and Increase Thickness Uniformity

X X X
X X X
X X X

END 1 CENTRE END 2

Testing conditions : 3-points on 3-wafers

Factor Effects & Analysis --


May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 17
L9 Orthogonal Array Measured Data Objective
Function
Control Factors Assigned to columns

Expt. No. Temperature ◦C


Pressure
(mTorr)
Settling
Time (min)
Cleaning
Method
y1 y2 y3 y4 y5 y6 y7 y8 y9 ηdefect
1 To-25 Po-200 To None 14 16 12 15 13 12 16 14 13 ??

2 To-25 Po to+8 CM2 4 4 4 3 3 4 4 3 3 ??

3 To-25 Po+200 to+16 CM3 20 17 17 20 21 19 18 21 22 ??

4 To Po-200 to+8 CM3 18 20 15 18 18 19 20 19 16 ??

5 To Po to+16 None 141 156 129 161 120 134 154 148 148 ??

6 To Po+200 To CM2 1122 1107 1119 1143 992 978 1071 1063 1159 ??

7 To+25 Po-200 to+16 CM2 126 119 121 138 111 124 136 120 125 ??

8 To+25 Po To CM3 1413 1258 1318 1317 1237 1611 1597 1468 1223 ??

9 To+25 Po+200 to+8 None 1995 2092 2026 1708 1947 1827 2210 1906 1700 ??

Ov-Mean = ??

Factor Effects & Analysis --


May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 18
8 STEPS IN TAGUCHI METHODOLOGY
Simplified Polysi Deposition Process:
Reduce Defects and Increase Thickness Uniformity

1. IDENTIFY THE MAIN FUNCTION,


SIDE EFFECTS, AND FAILURE MODE
2. IDENTIFY THE NOISE FACTORS,
TESTING CONDITIONS, AND QUALITY CHARACTERISTICS
3. IDENTIFY THE OBJECTIVE FUNCTION TO BE
OPTIMIZED
4. IDENTIFY THE CONTROL FACTORS AND THEIR LEVELS
5. SELECT THE ORTHOGONAL ARRAY MATRIX
EXPERIMENT
6. CONDUCT THE MATRIX EXPERIMENT
7. ANALYZE THE DATA,
PREDICT THE OPTIMUM LEVELS AND PERFORMANCE
ASSUMING ADDITIVITY
OPTIMUM FACTOR LEVELS
PREDICT
FACTOR EFFECTS
PLOTS PREDICTED IMPROVEMENT
Factor Effects & Analysis --
May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 8 Steps in Taguchi Method --19
19
8 STEPS IN TAGUCHI METHODOLOGY
Simplified Polysi Deposition Process:
Reduce Defects and Increase Thickness Uniformity

1. IDENTIFY THE MAIN FUNCTION,


SIDE EFFECTS, AND FAILURE MODE
2. IDENTIFY THE NOISE FACTORS,
TESTING CONDITIONS, AND QUALITY CHARACTERISTICS
3. IDENTIFY THE OBJECTIVE FUNCTION TO BE OPTIMIZED

Evaluate the OBJECTIVE FUNCTION for each of the 9 rows :


9
1
(1) Defect Density ---> DEFCETS = – 10 Log10 ---
n y2
SMALLER - THE - BETTER i
i=1

Factor Effects & Analysis --


May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 20
Calculate the Objective Function for each
row

L9 Orthogonal Array Measured Data Objective


Function
Control Factors Assigned to columns

Expt. No. Temperature ◦C


Pressure
(mTorr)
Settling
Time (min)
Cleaning
Method
y1 y2 y3 y4 y5 y6 y7 y8 y9 ηdefect
1 To-25 Po-200 To None 14 16 12 15 13 12 16 14 13 -23.00

2 To-25 Po to+8 CM2 4 4 4 3 3 4 4 3 3 -11.00

3 To-25 Po+200 to+16 CM3 20 17 17 20 21 19 18 21 22 -26.00

4 To Po-200 to+8 CM3 18 20 15 18 18 19 20 19 16 -25.00

5 To Po to+16 None 141 156 129 161 120 134 154 148 148 -43.00

6 To Po+200 To CM2 1122 1107 1119 1143 992 978 1071 1063 1159 -61.00

7 To+25 Po-200 to+16 CM2 126 119 121 138 111 124 136 120 125 -42.00

8 To+25 Po To CM3 1413 1258 1318 1317 1237 1611 1597 1468 1223 -63.00

9 To+25 Po+200 to+8 None 1995 2092 2026 1708 1947 1827 2210 1906 1700 -66.00

Ov-Mean = -40.00

Factor Effects & Analysis --


May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 21
FACTOR EFFECTS
 EFFECT OF A FACTOR LEVEL IS DEFINED AS
" THE DEVIATION IT CAUSES FROM OVERALL MEAN , µ “
FACTOR EFFECT OF TEMPERATURE LEVEL 1 :

 A1 OCCURS IN EXPTS. 1, 2 AND 3, mA1 = 1/3 * (η 1 + η 2 + η 3 )

 FACTOR EFFECT OF A1 = a1 = mA1 - m

FACTOR EFFECT OF TEMPERATURE LEVEL 2 :


 A2 OCCURS IN EXPTS. 4, 5 AND 6, mA2 = 1/3 * (η 4 + η 5 + η 6 )

 FACTOR EFFECT OF A2 = a2 = mA2 - m

FACTOR EFFECT OF TEMPERATURE LEVEL 1 :


 A3 OCCURS IN EXPTS. 1, 2 AND 3, mA1 = 1/3 * (η 1 + η 2 + η 3 )

 FACTOR EFFECT OF A1 = a1 = mA1 - m

 REPEAT FOR ALL OTHER FACTORS AND ALL LEVELS


– mB1, mB2 , mB3, mC1, mC2, mC3, mD1, mD2, Md3

Find OvMean= mean of obj func = 1/9 * (η1 + η2 + . . . + η9) = -40


 Ready to make Factor Effect Plot
Factor Effects & Analysis --
May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 22
Factor Effect Plot with Error-Bars
S /N R a t io ( s m a lle r- t h e - b e t t e r) in d B

a1 = 20 b1 = 10 c2 = 6 d2 = 2

Factor Effect Plot for Surface Defects


0.00

O v -M ean
P o+200
Po-200
T o+25
T o-25

to + 1 6

none

CM3
CM2
to + 8
To

Po

to
-10.00
a1
b1
-20.00 c2 d2

-30.00

-40.00

-50.00

-60.00

Control Factor Levels

BEST levels are


To-25, Po-200, to+8, CM2
Factor Effects & Analysis --
May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 23
BEST RESULT (at best levels)

OPTIMUM CONDITIONS : [ A1 B1 C2 {D2} ]

SURFACE DEFECTS ηopt = OvMean + a1 + b1 + c2 ± 3dB


= (-40) + 20 + 10 + 6 ± 3dB
= -4 dB ± 3dB = -7 dB to -1 dB

SURFACE DEFECTS Yopt = 10^(-ηopt/20)= 10 ^ (7/20) = 1 to 3


defects

(VERIFICATION) UNDER OPTIMUM CONDITIONS :


SURFACE DEFECTS = 1 TO 10 / Sq. cm.

PREDICTED AND MEASURED RESULTS MATCH WELL

Factor Effects & Analysis --


May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 24
NOMINAL RESULT (at starting
levels)
NOMINAL CONDITIONS : [ A2 B2 C1 D1 ]

SURFACE DEFECTS ηnom= OvMean + a2 + b2 + c2 + d1 ± 3dB


= (-40) + (-3) + (1) + (-9 ) + (-4 ) ± 3dB
= -55 dB ± 3dB = -52 dB to -58dB

SURFACE DEFECTS Ynom=10^(-ηopt/20)=10^(-52/20)= 400 to 800


defects
(Predicted Results) UNDER NOMINAL CONDITIONS :
SURFACE DEFECTS = 400 TO 800 / Sq. cm.

(Predicted Results) UNDER OPTIMUM CONDITIONS :


SURFACE DEFECTS = 1 TO 10 / Sq. cm.

VERIFICATION Experiments needed to check whether


PREDICTED AND MEASURED RESULTS MATCH WELL or NOT
Factor Effects & Analysis --
May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 25
PREDICTION AND
VERIFICATION
STARTING CONDITIONS : ( A2 B2 C1 D1 )
SURFACE DEFECTS = 600 / Sq. cm. (400 TO 800 /sq cm)

OPTIMUM CONDITIONS : (PREDICTION) [ A1 B1 C2 {D2} ]


SURFACE DEFECTS = 1 to 3 / Sq. cm.

(VERIFICATION) UNDER OPTIMUM CONDITIONS :


SURFACE DEFECTS = 1 to 10 / Sq. cm.

PREDICTED AND MEASURED RESULTS MATCH


WELL

Factor Effects & Analysis --


May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 26
8 STEPS IN TAGUCHI METHODOLOGY
Simplified Polysi Deposition Process:
Reduce Defects and Increase Thickness Uniformity

1. IDENTIFY THE MAIN FUNCTION,


SIDE EFFECTS, AND FAILURE MODE
2. IDENTIFY THE NOISE FACTORS,
TESTING CONDITIONS, AND QUALITY CHARACTERISTICS
3. IDENTIFY THE OBJECTIVE FUNCTION TO BE OPTIMIZED
4. IDENTIFY THE CONTROL FACTORS AND THEIR LEVELS
5. SELECT THE ORTHOGONAL ARRAY MATRIX EXPERIMENT
6. CONDUCT THE MATRIX EXPERIMENT
7. ANALYZE THE DATA,
PREDICT THE OPTIMUM LEVELS AND PERFORMANCE

8. PERFORM THE VERIFICATION EXPERIMENT


AND PLAN THE FUTURE ACTION
ADOPT
RESULTS MATCH WELL WITH PREDICTION NEW
SETTINGS
Factor Effects & Analysis --
May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 27
End of RM Lecture 8c

Factor Effects & Analysis --


May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 28
P.R. Apte :Integration of TRIZ Innovation and Taguchi
10 Sep 2014 Optimization EDM & Polysi Case Studies- 29
DoE / Taguchi Method
Analysis of Variance (ANOVA)
Analysis for % Factor-Effects and Error-Bars
Best Settings and Predicted Results

By
Prakash R. Apte
COEP, Pune

Lecture 8c to FY PhD scholars at COEP


May 2020
E-mail: apte1947@gmail.com
Web-page: www.ee.iitb.ac.in/~apte
OUTLINE

 OA based Experiments
 Simplified Polysilicon Deposition Process
(using L9)

 Analysis for Factor Effect Plots,


Best Settings and Best Results

Factor Effects & Analysis --


May 2020 Apte 8c: Research Methodology using TRIZ & Taguchi Methods 31
Good Plot with Error-Bars
S /N R a t io ( s m a lle r- t h e - b e t t e r) in d B

a1 = 20 b1 = 10 c1 = 6 d1 = 2

Factor Effect Plot for Surface Defects


0.00

O v -M ean
P o+200
Po-200
T o+25
T o-25

to + 1 6

none

CM3
CM2
to + 8
To

Po

to
-10.00
a1
b1
-20.00 c1 d1

-30.00

-40.00

-50.00

-60.00

Control Factor Levels

Apte : WS L : Taguchi Method to QUICKLY get World’s BEST


9 June 2016 Results Matrix Expt 32
Good Plot without Error-Bars
r- tr-ht eh -eb- eb tet et tr)e r)inind Bd B
a lle

a1 = 20 b1 = 10 c1 = 6 d1 = 2
sm
S /NR aR taiot io( s(m a lle

Factor Effect Plot for Surface Defects


Factor Effect Plot for Surface Defects
0.00

O v -M ean
P o+200
P o-200
T o+25
T o-25

to + 1 6

none

CM2

CM3
to + 8
To

Po

to
S /N

-10.00
-10.00
a1
b1 c1
-20.00
-20.00
d1
-30.00
-30.00

-40.00

-40.00
-50.00

-50.00
-60.00

-60.00
-70.00

Control Factor Levels


Control Factor Levels

Apte : WS L : Taguchi Method to QUICKLY get World’s BEST


9 June 2016 Results Matrix Expt 33
Step 2: Noise Factors and Their Levels

LEVELS
NoIsE FACTORS NoIsE Level 1 NoIsE Level 2 NoIsE Level 3 Number of LEVELS

X-axis Locations End1 Centre End2 3

Y-axis Locations low middle top 3

Apte : WS L : Taguchi Method to QUICKLY get World’s BEST


9 June 2016 Results Matrix Expt 34
Step 4: Control Factors and Their Levels

 
LEVELS
CONTROL FACTORS  
1 2 3

Temperature ◦C To-25 To To+25

Pressure (mTorr) Po-200 Po Po+200

Settling Time (min) to to+8 to+16

Cleaning Method none CM2 CM3

Apte : WS L : Taguchi Method to QUICKLY get World’s BEST


9 June 2016 Results Matrix Expt 35
L9 Orthogonal Array
  Control Factors
Expt. No. A B C D
1 1 1 1 1
2 1 2 2 2
3 1 3 3 3
4 2 1 2 3
5 2 2 3 1
6 2 3 1 2
7 3 1 3 2
8 3 2 1 3
9 3 3 2 1

Apte : WS L : Taguchi Method to QUICKLY get World’s BEST


9 June 2016 Results Matrix Expt 36
L9 Array with CF assignments
Control Factors Assigned to columns
Temperature Pressure Settling Time Cleaning
Expt. No. ◦C (mTorr) (min) Method
1 To-25 Po-200 to None
2 To-25 Po to+8 CM2
3 To-25 Po+200 to+16 CM3
4 To Po-200 to+8 CM3
5 To Po to+16 none
6 To Po+200 To CM2
7 To+25 Po-200 to+16 CM2
8 To+25 Po To CM3
9 To+25 Po+200 to+8 none

Apte : WS L : Taguchi Method to QUICKLY get World’s BEST


9 June 2016 Results Matrix Expt 37
Good Plot without Error-Bars
r- tr-ht eh -eb- eb tet et tr)e r)inind Bd B
a lle

a1 = 20 b1 = 10 c1 = 6 d1 = 2
sm
S /NR aR taiot io( s(m a lle

Factor Effect Plot for Surface Defects


Factor Effect Plot for Surface Defects
0.00

O v -M ean
P o+200
P o-200
T o+25
T o-25

to + 1 6

none

CM2

CM3
to + 8
To

Po

to
S /N

-10.00
a1
b1 c1
-20.00
d1
-30.00

-40.00

-50.00

-60.00

-70.00

Control Factor Levels


Control Factor Levels

Apte : WS L : Taguchi Method to QUICKLY get World’s BEST


9 June 2016 Results Matrix Expt 38
Factor Effects

LEVELS

CONTROL FACTORS 1 2 3

Temperature ◦C a1=20 a2= -3 a3= -17

Pressure (mTorr) a1=10 b2=1 b3= -11

Settling Time (min) c1= -9 c2=6 c3=3

Cleaning Method d1= -4 d2=2 d3=2

Apte : WS L : Taguchi Method to QUICKLY get World’s BEST


9 June 2016 Results Matrix Expt 39
MATRIX EXPERIMENTS
USING ORTHOGONAL ARRAY

 DESCRIPTION OF 'CVD' PROCESS UNDER STUDY


 MATRIX EXPERIMENT AND CONCEPT OF
ORTHOGONALITY
 ANALYSIS OF DATA OBTAINED FROM MATRIX EXPT.
 ADDITIVE MODEL
 ANALYSIS OF VARIANCE ( ANOVA ) AND ANALOGY
BETWEEN ANOVA AND FOURIER ANALYSIS
 USE OF ADDITIVE MODEL FOR PREDICTION AND
DIAGNOSIS

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 40
CVD PROCESS FOR POLYSILICON DEPOSITION
IN VLSI TECHNOLOGY

 CONTROL PARAMETERS ( FACTORS )


 TEMPERATURE ( A ), PRESSURE ( B ),

SETTLING TIME ( C ) AND CLEANING METHOD ( D )

 EACH PARAMETER HAS 3 SETTINGS ( LEVELS ) ONE


OF WHICH IS THE STARTING LEVEL

 AIM IS TO MINIMISE THE SURFACE DEFECTS

 MATRIX EXPERIMENTS ARE PERFORMED SO AS TO


OBTAIN OPTIMUM LEVELS OF FACTORS

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 41
MATRIX EXPERIMENTS USING L9 ARRAY

 ONLY 9 EXPERIMENTS

OUT OF A TOTAL OF 34 = 81
 FOUR CONTROL FACTORS ASSIGNED TO
THE FOUR COLUMNS OF L9
 EACH ROW REPRESENTS AN EXPERIMENT
HAVING A COMBINATION OF CONTROL
FACTOR LEVELS
e.g. ROW #3 ( EXPT. #3 ) --> A1 B2 C3 D3
and ROW #8 ( EXPT. #8 ) --> A3 B2 C1 D3

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 42
L9 ORTHOGONAL ARRAY

EXPT. NO. 1 2 3 4
. A . . B . . C . . D .
1 A1 B1 C1 D1
2 A1 B2 C2 D2
3 A1 B3 C3 D3

4 A2 B1 C2 D3
5 A2 B2 C3 D1
6 A2 B3 C1 D2

7 A3 B1 C3 D2
8 A3 B2 C1 D3
9 A3 B3 C2 D1

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 43
L9 ORTHOGONAL ARRAY

 COLUMNS ARE ORTHOGONAL – IN THE SENSE THAT


" FOR ANY PAIR OF COLUMNS, ALL
COMBINATIONS OF FACTOR LEVELS
OCCUR AN EQUAL NUMBER OF TIMES "

 COLUMNS ARE BALANCED,


WHICH ALSO IMPLIES ORTHOGONALITY

 SIX PAIRS OF COLUMNS ( 4C2 )

? CAN YOU VERIFY ORTHOGONALITY FOR A FEW PAIRS ¿

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 44
L9 ORTHOGONAL ARRAY
EACH COMBINATION APPEARS only ONCE

EXPT. NO. 1 2 3 4
. A . . B . . C . . D .
1 B1 C1
2 B2 C2
3 B3 C3

4 B1 C2
5 B2 C3
6 B3 C1

7 B1 C3
8 B2 C1
9 B3 C2

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 45
L9 ORTHOGONAL ARRAY
with MEASURED SN-RATIO

EXPT. NO.
1 2 3 4 SN-RATIO η
. A . . B . . C . . D . ( in dB )
1 A1 B1 C1 D1 η1
2 A1 B2 C2 D2 η2
3 A1 B3 C3 D3 η3

4 A2 B1 C2 D3 η4
5 A2 B2 C3 D1 η5
6 A2 B3 C1 D2 η6

7 A3 B1 C3 D2 η7
8 A3 B2 C1 D3 η8
9 A3 B3 C2 D1 η9

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 46
FACTOR EFFECTS
 EFFECT OF A FACTOR LEVEL IS DEFINED AS
" THE DEVIATION IT CAUSES FROM OVERALL MEAN , m "
 FACTOR EFFECT OF TEMPERATURE LEVEL 3 :

– A3 OCCURS IN EXPTS. 7, 8 AND 9

– mA3 = 1/3 * (η 7 + η 8 + η 9 )

– FACTOR EFFECT OF A3 = a3 = mA3 - m


 REPEAT FOR ALL FACTORS AND ALL LEVELS

– mA1 , mA2 , mB1 , . . . . , mD2 , mD3

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 47
TABULAR AND GRAPHICAL REPRESENTATION
OF FACTOR EFFECTS

 NUMERICAL VALUES ARE GIVEN IN A TABULAR FORM

or

 GRAPHICAL REPRESENTATION IS CONVENIENT FOR


DRAWING QUALITATIVE INFERENCES AND CHOOSING
THE OPTIMUM LEVELS OF FACTORS

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 48
L9 ORTHOGONAL ARRAY AND EXPERIMENTER'S LOG
TEMPERATURE COLUMN VARIABLE SHOWS HOW TO ENTER THE EXPT. LOG

TEMPERATURE PRESSURE SILANE CLEANING METHOD


EXPT. NO.
A B C D

1 T0-25--> 1 1 1 1
2 T0-25--> 1 2 2 2
3 T0-25--> 1 3 3 3

4 T0-----> 2 1 2 3
5 T0-----> 2 2 3 1
6 T0-----> 2 3 1 2

7 T0+25--> 3 P0-200--> 1 S0------> 3 CM2-----> 2


8 T0+25--> 3 P0------> 2 S0-100--> 1 CM3-----> 2
9 T0+25--> 3 3 2 1

EXPT #7 AND #8 SHOW THE EXPERIMENTER'S LOG

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 49
SELECTING OPTIMUM FACTOR LEVELS

 PRIMARY GOAL – TO MINIMISE DEFECTS


– TO FIND OPTIMUM LEVELS

 BEST LEVELS
FOR TEMPERATURE  A1  TO - 25
FOR PRESSURE  B1  PO - 200
FOR SETTLING TIME  C2  to + 8
FOR CLEANING METHOD  D2  CM2
or  D3  CM3

 OPTIMUM SETTINGS  MINIMUM DEFECTS

 A1 B1 C2 D2 or A1 B1 C2 D3  how few ?

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 50
ADDITIVE MODEL
AN ADDITIVE MODEL ( ALSO CALLED SUPERPOSITION MODEL )
 RELATIONSHIP BETWEEN RESPONSE VARIABLE AND
CONTROL FACTORS
 EFFECTS OF CONTROL FACTOR LEVELS IS ESTIMATED
SEPARATELY
 PREDICTION BY SIMPLY ADDING INDIVIDUAL FACTOR
EFFECTS

THE ADDITIVITY IS INFLUENCED BY THE CHOICE OF


 QUALITY CHARACTERISTICS, S/N RATIO, CONTROL
FACTORS / LEVELS

BENEFITS OF ACHIEVING ADDITIVITY :


 PREDICTIONS VALID FOR LAB AND MANUFACTURING
CONDITIONS

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 51
ADDITIVE MODEL (CONTD.)

VARIABLES SEPARABLE MODEL


PROVIDES JUSTIFICATION FOR CALCULATING
FACTOR EFFECTS AS AVERAGES OF APPROPRIATE
EXPTS. ( AS WAS DONE EARLIER )

ADDITIVE MODEL AS AN APPROXIMATION

= + ai + b j + ck + dl +...+
DEVIATION CAUSED BY LEVEL Ai FROM µ IS
GIVEN BY ai , BY Bj FROM µ AS bj ETC.

 IS THE ERROR DUE TO ADDITIVE


APPROXIMATION AS WELL AS ANY ERROR IN
MEASUREMENT.

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 52
ADDITIVE MODEL (contd.)

 INDIVIDUAL FACTOR EFFECTS CAN BE LINEAR,


QUADRATIC OR OF HIGHER ORDER

 CROSS - PRODUCT TERMS INVOLVING TWO OR


MORE FACTORS ARE NOT ALLOWED

 SUM OF DEVIATIONS CAUSED BY 3 LEVELS OF


EACH FACTOR IS ZERO

e.g. FOR FACTOR A  a1 + a2 + a3 = 0

 THE MEAN OF FACTOR EFFECTS OF ‘ALL’ FACTORS IS


EQUAL TO 'µ'

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 53
L8 ORTHOGONAL ARRAY

1 2 3 4 5 6 7
EXPT. NO.
A B C D E F G

1 1 1 1 1 1 1 1
2 1 1 1 2 2 2 2
3 1 2 2 1 1 2 2
4 1 2 2 2 2 1 1

5 2 1 2 1 2 1 2
6 2 1 2 2 1 2 1
7 2 2 1 1 2 2 1
8 2 2 1 2 1 1 2

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 54
L9 ORTHOGONAL ARRAY

EXPT. NO. 1 2 3 4
. A . . B . . C . . D .
1 A1 B1 C1 D1
2 A1 B2 C2 D2
3 A1 B3 C3 D3

4 A2 B1 C2 D3
5 A2 B2 C3 D1
6 A2 B3 C1 D2

7 A3 B1 C3 D2
8 A3 B2 C1 D3
9 A3 B3 C2 D1

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 55
L18 ORTHOGONAL ARRAY
EXPT. 1 2 3 4 5 6 7 8
NO. . A .. B . C . D . E .. F .. G . H .
1 1 1 1 1 1 1 1 1
2 1 1 2 2 2 2 2 2
3 1 1 3 3 3 3 3 3
4 1 2 1 1 2 2 3 3
5 1 2 2 2 3 3 1 1
6 1 2 3 3 1 1 2 2
7 1 3 1 2 1 3 2 3
8 1 3 2 3 2 1 3 1
9 1 3 3 1 3 2 1 2
10 2 1 1 3 3 2 2 1
11 2 1 2 1 1 3 3 2
12 2 1 3 2 2 1 1 3
13 2 2 1 2 2 1 3 2
14 2 2 2 3 3 2 1 3
15 2 2 3 1 1 3 2 1
16 2 3 1 3 3 3 1 2
17 2 3 2 1 1 1 2 3
18 2 3 3 2 2 2 3 1
17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 56
ACHIEVING ADDITIVITY
 RELATIONSHIP BETWEEN CONTROL FACTORS AND
PERFORMANCE CHARACTERISTIC MUST BE
ADDITIVE
 ADDITIVITY ENSURES STABILITY OF DESIGN
UNDER LABORATORY , MANUFACTURING AND
CUSTOMER USAGE
> DESIGN IS ROBUST
 ADDITIVITY DEPENDS ON
– CONTROL FACTOR SELECTION
– QUALITY CHARACTERISTIC SELECTION

 LOG FORM OF OBJECTIVE FUNCTION


 IMPROVES ADDITIVITY

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 57
ESTIMATION OF FACTOR EFFECTS
USING ADDITIVE MODEL

 EFFECT OF SETTING TEMPERATURE AT LEVEL 3


mA3 = 1/3 * (η7 + η8 + η9 ) = m + a3

 EFFECT OF SETTING CLEANING METHOD AT LEVEL 3


mD3 = 1/3 * (η3 + η5 + η9 ) = m + d3

etc. etc.

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 58
ANALYSIS OF VARIANCE (ANOVA)

 RELATIVE MAGNITUDE OF FACTOR EFFECTS 


‘QUALITATIVELY’ FROM TABLES or GRAPHS

 ANOVA GIVES A ‘QUANTITATIVE’ MEASURE FOR


THE RELATIVE MAGNITUDES OF DIFFERENT
FACTOR EFFECTS

 ANOVA IS NEEDED FOR ESTIMATING THE

ERROR VARIANCE FOR THE FACTOR EFFECTS and

VARIANCE OF THE PREDICTION ERROR

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 59
ANOVA - SUM OF SQUARES
9
2
 GRAND TOTAL G = i
T
SUM OF SQUARES i=1

 SUM OF SQUARES SM = 9 * m2
DUE TO MEAN

 TOTAL SUM OF SQUARES =


9
G
T
- S M
2
also =
i
- 9 * m2
i=1

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 60
ANOVA - SUM OF SQUARES
DUE TO FACTORS

 SUM OF SQUARES DUE TO FACTOR ' A '


SSQ_A = 3 ( a 12 + a22 + a32 )
 SUM OF SQUARES DUE TO FACTOR ' B '
2 2 2
SSQ_B = 3 ( b1 + b2 + b3 )
 SUM OF SQUARES DUE TO FACTOR ' C '
SSQ_C = 3 ( c 12 + c 22 + c32 )
 SUM OF SQUARES DUE TO FACTOR ' D '
2 2 2
SSQ_D = 3 ( d1 + d2 + d3 )

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 61
DEGREES OF FREEDOM and VARIANCE RATIO 'F'

 NUMBER OF INDEPENDENT PARAMETERS OR LEVELS


ASSOCIATED WITH A
– MATRIX EXPERIMENT
– FACTOR
or
– SUM OF SQUARES
 TOTAL DEGREES OF FREEDOM DECIDE WHICH
ORTHOGONAL ARRAY IS SUITABLE
 DETERMINE  SUM OF SQUARES DUE TO ERROR
 DETERMINE THE VARIANCE RATIO ' F ' FOR A FACTOR

MEAN OF SUM OF SQUARES DUE TO A FACTOR


F = ---------------------------------------------------------------
MEAN SQUARE ERROR

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 62
ERROR VARIANCE
AND POOLING OF ERRORS
 ERROR VARIANCE –
2 SUM OF SQUARES DUE TO ERROR
σe = --------------------------------------------------------

DEGREES OF FREEDOM FOR ERROR

 POOLING OF ERRORS
– WHEN DEGREES OF FREEDOM FOR ERROR ARE ZERO
or
– WHEN ONE OR MORE FACTORS HAVE A SMALL
EFFECT ON THE OBJECTIVE FUNCTION

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 63
CONFIDENCE INTERVALS FOR FACTOR EFFECTS

 ERROR VARIANCE –
2 SUM OF SQUARES DUE TO ERROR
σe = --------------------------------------------------------
DEGREES OF FREEDOM FOR ERROR

 FOR 95% CONFIDENCE INTERVAL –


 CHOOSE TWO STANDARD DEVIATIONS FOR ERROR AS THE
CONFIDENCE INTERVAL
 CONFIDENCE INTERVAL = ± 2 [ SQRT (ERROR VARIANCE) ] dB

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 64
VARIANCE RATIO ' F ' and
INTERPRETATION OF ANOVA TABLES

 VARIANCE RATIO ' F ' –


MEAN SUM OF SQUARES DUE TO A FACTOR
F = --------------------------------------------------------------
ERROR MEAN SQUARE

 F < 1 – FACTOR EFFECT IS SMALLER THAN THE


ERROR OF THE ADDITIVITY MODEL
 F > 2 – FACTOR EFFECT NOT QUITE SMALL
 F > 4 – FACTOR EFFECT IS QUITE LARGE

SUM OF SQUARES DUE TO A FACTOR


% CONTRIBUTION = ------------------------------------------------
TOTAL SUM OF SQUARES

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 65
PREDICTION OF IMPROVEMENT

 OPTIMUM QUALITY FOR , say , A1 B1 (C2 D2)

 ηOPT = m + a1 + b1
 ηOPT = m + (mA1 - m) + (mB1 - m) NO CHANGE

 IMPROVEMENT OVER NOMINAL (A2 B2 C2 D2)



ηOPT - ηNOM = (a1 - a2) + (b1 - b2)

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 66
CONFIRMATION EXPERIMENTS

 TO VERIFY THAT THE PREDICTION IS CORRECT

 TO VERIFY WHETHER ADDITIVE MODEL IS SATISFIED


– IF YES > ADOPT THE ' NEW ' SETTINGS
– IF NO > FAILURE OF ADDITIVE MODEL
and
INDICATION OF STRONG INTERACTION
AMONGST TWO OR MORE FACTORS
therefore
PLAN FUTURE ACTION

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 67
INTERACTION AMONGST FACTORS

 DESIRABLE – NO INTERACTIONS
– SATISFY ADDITIVITY

 SYNERGISTIC INTERACTION – LEADS TO SOME ERROR


– BUT IT IS ACCEPTABLE

 ANTI-SYNERGISTIC INTERACTION –
> FAILURE OF ADDITIVE MODEL
> SELECT APPROPRIATE S / N RATIO
> PERFORM FRESH MATRIX EXPERIMENTS
TO STUDY SPECIFIC INTERACTIONS

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 68
EXAMPLES OF ORTHOGONAL ARRAYS

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 69
L8 ORTHOGONAL ARRAY

1 2 3 4 5 6 7
EXPT. NO.
A B C D E F G

1 1 1 1 1 1 1 1
2 1 1 1 2 2 2 2
3 1 2 2 1 1 2 2
4 1 2 2 2 2 1 1

5 2 1 2 1 2 1 2
6 2 1 2 2 1 2 1
7 2 2 1 1 2 2 1
8 2 2 1 2 1 1 2

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 70
L9 ORTHOGONAL ARRAY

EXPT. NO. 1 2 3 4
. A . . B . . C . . D .
#1 1 1 1 1
#2 1 2 2 2
#3 1 3 3 3

#4 2 1 2 3
#5 2 2 3 1
#6 2 3 1 2

#7 3 1 3 2
#8 3 2 1 3
#9 3 3 2 1

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 71
L18 ORTHOGONAL ARRAY
EXPT. 1 2 3 4 5 6 7 8
NO. . A .. B . C . D . E .. F .. G . H .
1 1 1 1 1 1 1 1 1
2 1 1 2 2 2 2 2 2
3 1 1 3 3 3 3 3 3
4 1 2 1 1 2 2 3 3
5 1 2 2 2 3 3 1 1
6 1 2 3 3 1 1 2 2
7 1 3 1 2 1 3 2 3
8 1 3 2 3 2 1 3 1
9 1 3 3 1 3 2 1 2
10 2 1 1 3 3 2 2 1
11 2 1 2 1 1 3 3 2
12 2 1 3 2 2 1 1 3
13 2 2 1 2 2 1 3 2
14 2 2 2 3 3 2 1 3
15 2 2 3 1 1 3 2 1
16 2 3 1 3 3 3 1 2
17 2 3 2 1 1 1 2 3
18 2 3 3 2 2 2 3 1
17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 72
L8 ORTHOGONAL ARRAY AND EXPERIMENTER'S LOG
FOR DRILLING HOLE IN A CAST ALLOY WHEEL

SPEED FEED RATE DRILL LENGTH COOLANT FIXTURE RESPONSE


EXPT. NO.
A B C D E S/N

1 1500 15 4 BLUE OLD 42.18


2 1500 15 7 WHITE NEW 53.96
3 1500 18 4 WHITE NEW 48.48
4 1500 18 7 BLUE OLD 48.98

5 2000 15 4 BLUE NEW 44.20


6 2000 15 7 WHITE OLD 42.19
7 2000 18 4 WHITE OLD 41.58
8 2000 18 7 BLUE NEW 56.40

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 73
L18 ORTHOGONAL ARRAY AND EXPERIMENTER'S LOG
COMPUTER TUNING for HIGH PERFORMANCE
1 2 3 4 5 6 7 8
EXPT. NO.
F B C D E A G H

1 2 a 4 1/5 0 4&1 400 a

2 2 a 3 1/4 3 4&2 500 b

3 2 a 3.5 1/3 8 4&2 600 c

16 0 c 4 1/3 3 4&2 400 b

17 0 c 3 1/5 8 4&2 500 c

18 0 c 3.5 1/4 0 4&1 600 a

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 74
ROLE OF ORTHOGONAL ARRAYS

 OPTIMIZATION BY STUDYING ONE FACTOR AT A TIME


DOES NOT GIVE ANY IDEA ABOUT INTERACTIONS
 ABSENCE OF ADDITIVITY IS POINTED OUT
BY THE FAILURE OF VERIFICATION EXPERIMENT
WHICH IN TURN POINTS TO LARGE INTERACTIONS
 DEVIATION FROM ADDITIVITY QUANTIFIES LARGENESS OF
INTERACTIONS RELATED TO MAIN EFFECTS
 RECHECK THE CHOICE OF CONTROL FACTORS AND
QUALITY CHARACTERISTICS
§ IF THE VERIFICATION EXPERIMENT SUCCEEDS,
THE PRODUCT / PROCESS IS PROVED TO BE
ROBUST ( AGAINST NOISE FACTORS )

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 75
Thank You

17-19 Oct 2016 Apte : DoE / Taguchi Method : ROBUST Technology Development Matrix Expt - 76
S /N R a tio (s m a lle r-t h e - b e t te r) in d B

Factor Effect Plot for Surface Defects


0.00

O v -M ean
P o +2 0 0
Po-200
T o +2 5
T o-25

to +1 6

none

CM2

CM3
to +8
Po
To

to
-10.00

-20.00
a1
b1
-30.00 c1 d1

-40.00

-50.00

-60.00

-70.00

Control Factor Levels

Apte : WS L : Taguchi Method to QUICKLY get World’s BEST


9 June 2016 Results Matrix Expt 77
S /N R a t io ( s m a lle r- t h e - b e t t e r) in d B

a1 = 20 b1 = 10 c1 = 6 d1 = 2

Factor Effect Plot for Surface Defects


0.00

O v -M ean
P o+200
Po-200
T o+25
T o-25

to + 1 6

none

CM2

CM3
to + 8
To

Po

to
-10.00

a1
-20.00 b1 c1 d1
-30.00

-40.00

-50.00

-60.00

-70.00

Control Factor Levels

Apte : WS L : Taguchi Method to QUICKLY get World’s BEST


9 June 2016 Results Matrix Expt 78
Good plot
S /N R a t io ( s m a lle r- t h e - b e t t e r) in d B

a1 = 20 b1 = 10 c1 = 6 d1 = 2

Factor Effect Plot for Surface Defects


0.00

O v -M ean
Po+200
P o-200
T o+25
T o-25

to + 1 6

none

CM2

CM3
to + 8
To

Po

to
-10.00
a1
b1 c1
-20.00
d1
-30.00

-40.00

-50.00

-60.00

-70.00

Control Factor Levels

Apte : WS L : Taguchi Method to QUICKLY get World’s BEST


9 June 2016 Results Matrix Expt 79

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