DESIGN OF

MOLECULE-BASED
MEMRISTIVE
MATERIALS
Salvador Cardona-Serra,
ICMol
EMRS 2021, 03/06/2021
@salvajcardona
 HOW?
(MOLECULAR)
MEMRISTORS

Prado-Socorro, C. D.; Giménez-Santamarina, S. Cardona-Serra, S. et al. Work in progress

Goswami, S.; Venkatesan, T. et al. Nat. Mater. 2017, 16 (12), 1216–1224.
 (MOLECULAR)
MEMRISTORS
Solid-State Molecular
Materials Materials

Design and functionalization

Low cost green materials

Low temperature
Solución-based processability
 MOLECULAR
MEMRISTORS
Polymer-based Spin-Crossover
ionic materials Single Molecule
Nanoparticles

100s nanometers 10s nanometers A few

nanometers

Bulk 0-Dimensional
 POLYMER-BASED
IONIC MATERIALS

Low-lattice energy salt

Ion-conductive polymer Semiconductive polymer

Patent nº: P202130383 (2021) Cardona-Serra et al.
Prado-Socorro, C. D.; Giménez-Santamarina, S. Cardona-Serra, S. et al. Work in progress
 POLYMER-BASED
IONIC MATERIALS
Experimental

Ionic bilayer formation Theory

Electron injection favored
Multiscale model
Analog behavior From quantum to coarse-grain
Relate structure to properties

Patent nº: P202130383 (2021) Cardona-Serra et al.

Prado-Socorro, C. D.; Giménez-Santamarina, S. Cardona-Serra, S. et al. Work in progress
 POLYMER-BASED
IONIC MATERIALS
Experimental (Glove-box electrical characterization)

Day 1 Day 2 Day 3 Day 4

Day 7 Day 10

Patent nº: P202130383 (2021) Cardona-Serra et al.

Prado-Socorro, C. D.; Giménez-Santamarina, S. Cardona-Serra, S. et al. Work in progress
 POLYMER-BASED
IONIC MATERIALS
Theory (Drift-Diffusion / Poisson equations)
Theory

Multiscale model
From quantum to coarse-grain
Relate structure to properties
Drif-Diffusion PBC + Poisson
 CONCLUSIONS Check for more info on
Stable, robust and tunable memristive materials can be built
from Polymeric materials. Carlos Prado’s poster!

Tuning the interaction between the three components

(Electronic semiconductor, Ions and Polymer electrolyte) is
the way to improve the memristive properties.

Theoretical multiscale calculations can offer design

guidelines to perform a material screening and overcome
try and error.

Patent nº: P202130383 (2021) Cardona-Serra et al.

Prado-Socorro, C. D.; Giménez-Santamarina, S. Cardona-Serra, S. et al. Work in progress
ACKNOWLEDGEMENTS
Prof. Eugenio Coronado
Dr. Alejandro Gaita-Ariño
Prof. Henk Bolink
Dr. Michele Sessolo
Ms. Ruth Manzanares