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Abstract Data are presented showing open-eye 20-Gb/s transmission for a quantum-well transistor laser operating at room
temperature (25 C). The fast spontaneous recombination lifetime
(30 ps) in the base region results in a resonance-free frequency
response allowing demonstration of 20-Gb/s transmission with
an I/ITH = 3. It is shown that higher temperature hastens the
transition to the first excited state and improves bandwidth and
eye-opening at low bias levels (I/ITH = 2). In addition, room
temperature 20-Gb/s transmission through voltage modulation
of a transistor laser via intracavity photon-assisted tunneling in
the base-collector junction is reported.
Index Terms 20-Gb/s modulation, high speed, laser, photonassisted tunneling, transistor, voltage modulation.
I. I NTRODUCTION
HE BASE current in a transistor (minority carrier recombination) separates the low-impedance base input from
the high-impedance collector output and holds the key to
device operation [1]. In direct-bandgap semiconductors radiative carrier recombination has been leveraged to design light
emitting diodes (LEDs) [2] and, with the incorporation of
a cavity to confine the photons and achieve coherent light
output, diode lasers (DLs) [3], [4]. With further advances
in crystal growth, quantum-well DLs [5], [6] and verticalcavity surface-emitting lasers (VCSELs) [7], [8] have been
realized. Previously, we have reported record performance of
high-speed, high current density, sub-micron heterojunction
bipolar transistors (HBTs) [9], [10]. By inserting a quantum
well into the base of the HBT, trading off electrical gain for
optical generation, and fabricating a high-Q cavity, we have
demonstrated a high performance quantum-well heterojunction
bipolar transistor laser (QW-HBTL) [11], [12]. A device has
been reported previously [13] that can either operate as a twoport diode laser or a transistor in the forward active mode,
however, not both simultaneously.
The transistor laser (TL) has been demonstrated with: roomtemperature continuous wave operation [14], fast spontaneous
recombination lifetime (< 25ps) [15], bandfilling and voltage modulation via intracavity photon-assisted tunneling [16],
[17], signal mixing via a tunnel junction [18], resonancefree high frequency operation [19], collector feedback control
of laser power [20], and simultaneous 20 Gb/s electrical
and optical transmission at low temperature [21]. Recently,
low temperature operation of a vertical-cavity surface-emitting
transistor laser (VCTL) has also been demonstrated [22].
Analytical modeling of the transistor laser has been discussed
in [23] however, this falls short in agreeing with measured data
of fabricated devices, specifically with regards to the low-bias
resonance peak in the RF response. This is attributed to usage
of inaccurate parameters in the model.
In this letter 20 Gb/s data transmission is demonstrated
using a transistor laser operating in the range of 15 C
to 25 C. For the first time 20 Gb/s operation by using
the intracavity photon- assisted tunneling process to control
the laser output is reported. This is achieved by modulating
the collector voltage (VCE ). The role of temperature on the
transition of the laser to the first excited state (E0 E1 ,
0 1 , 0 > 1 ) and its effect on device bandwidth and
eye-opening at low bias currents are discussed.
II. T RANSISTOR L ASER E PITAXIAL S TRUCTURE
AND FABRICATION
The epitaxial crystal structure of the device described here
begins with a heavily doped n-type 5000 GaAs buffer grown
on SI-GaAs. It is followed by a 5000 n-type Al0.95 Ga0.05 As
layer that functions as both the sub-collector and as the laser
lower cladding layer providing transverse optical mode confinement. A 200 heavily-doped n-type GaAs layer functions
as the collector contact layer. A 120 In0.49 Ga0.51 P etch
stop layer is included for facilitating fabrication followed by
a 600 lightly-doped GaAs collector. A 1000 heavilydoped p-type AlGaAs/InGaAs/GaAs layer serves as the base
and includes one 120 undoped InGaAs quantum well
designed for 980nm emission. The emitter is a lightly-doped
n-type 250 In0.49 Ga0.51 P layer followed by 4000 of
n-type oxidizable Al0.950.99 Ga0.050.01 As that performs as
the upper cladding and serves (via lateral oxidation [24]) to
confine the current injection in the active area. The emitter
contact is a 1000 heavily-doped n-type GaAs layer. Device
fabrication of the HBTL consists of 9 photolithographic steps,
860
(a)
(b)
Fig. 1. False color SEM of a 400 m-long transistor laser. (a) Base current
modulated. (b) Collector voltage-modulated transistor laser configuration.
White boxes on inset schematics: bias tees.
861
Fig. 3. (Current modulation) Measured S32 data for base optical port
response at IB = 90 mA, at T = 15 C, 20 C, and 25 C. Inset: corresponding
open and clear 20-Gb/s eye diagrams at T = 15 C and 25 C.
(a)
(b)
Fig. 6. (Voltage modulation) Clear and open optical channel eye diagrams
with a 0.5 Vpp 20-Gb/s NRZ 27 -1 PRBS signal applied to the collector
terminal at T = 15 C, 20 C, and 25 C. IB and VCE bias points are indicated
for each diagram.
Fig. 5. (Current modulation) Measured S32 data for base optical port
response at IB = 70 mA, VCE = 1.5 V at T = 15 C, 20 C, and
25 C showing an increase of the RF optical bandwidth with temperature
due to excited-state operation. Inset: corresponding 20-Gb/s eye diagrams at
T = 15 C and 25 C showing closed eye at lower temperature and open eye
at higher temperature.
862
S31 from the PNA for each bias condition is i) 13.4 GHz
ii) 12.7 GHz iii) 12.2 GHz for the different temperatures. The
ability to selectively modulate the transistor laser either by
current (conventional recombination) or by voltage (intracavity
photon-assisted tunneling) arises from the unique three port
structure of the TL and offers a flexible choice for high-speed
photonic integrated circuit design.
V. C ONCLUSION
In conclusion, 20 Gb/s open-eye data transmission by the
transistor laser up to 25 C at a 90 mA bias corresponding
to I/ITH 3 has been demonstrated. By exploiting the effect
of temperature on the transition to the first excited state
we obtain 20 Gb/s open-eye transmission at I/ITH = 2 and
25 C. Additionally, 20 Gb/s data transmission in the range of
1525 C using voltage modulated operation by applying
the input signal to the collector port is reported. The TL
offers a choice of both voltage and current modulation for
high data rate transmission; combined with the resonancefree small-signal optical response this provides compelling
evidence for the TL to meet the demands of future highbandwidth, low power, short-haul optical communication
systems.
ACKNOWLEDGMENT
The authors would like to thank the shop staff at Electrical
and Computer Engineering and Physics for assistance in
constructing a stable measurement system. The authors would
also like to thank Dr. M. Gerhold of the Army Research Office.
N. Holonyak, Jr. would like to thank J. Bardeen, Chair (Sony)
of ECE, and M. Feng for support.
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