International Institute of Technology and Management (IITM), Murthal

Lesson Plan
DEPARTMENT : Electronics & Communication Engineering
SEMESTER : VI
SUBJECT & CODE : MICROELECTRONICS & ECE308
PREPARED BY : MS. RANJANA SHARMA
PREPARATION DATE : 1/1/2016 NO. OF HOURS REQUIRED : 45
CONTACT HOURS : 4 HRS/WEEK MAX. MARKS : 75
DURATION OF EXAM : 3HRS. MAX. MARKS CLASSWORK : 25

Unit Lecture Covered Topic Proposed Actual

no. No Date Date
CRYSTAL GROWTH AND WAFER PREPARATION
1 Clean room concept, safety requirements,
2 Crystal growth techniques: czochralski and gradient freeze techniques,
3 Physics involved in CZ growth, Energy flow balance, pull rate -considerations,
4 Problems and solutions , defects involved in CZ method,
5 Effects due to carbon and oxygen impurities, modeling of dopant incorporation,
6 Float zone growth for high purity silicon, liquid encapsulated growth for GaAs,
7 Material characterization-wafer shaping, crystal characterization, wafer cleaning
CURRENT ELEMENT CHARACTERISTICS

1 8 Growth mechanism and kinetic oxidation, thin oxides,oxidation techniques &

system, Oxide properties, characterization of oxide films,growth and properties
of dry and wet oxidation,
9 Charge distribution during oxidation, oxide characterization, anomalies with
thin oxide regimeGrowth mechanism and kinetic oxidation,
10 thin oxides, oxidation techniques and systems, oxide properties, characterization
of oxide films,growth and properties of dry and wet oxidation,
11 charge distribution during oxidation, oxide characterization, anomalies with thin
oxide regime
DIFFUSION
12 The nature of diffusion, diffusion mechanismsinterstitial, substitution,
13 Interstitial-substitution combined, interstitialcy and grain boundary, Ficks law
of diffusion,
14 Limited and constant source diffusion, models of diffusion in solid
15 Diffusion equation, atomic diffusion mechanisms,
2 16 Diffusion system for silicon and gallium arsenide.
17 Measurement techniques, experimental analysis of diffused profiles.
ION IMPLANTATION
18 Introduction, physics of implantation, range theory,
19 Projected range-ion stopping mechanisms-channeling, nuclear stopping,
20 Electronicstopping, implantation damage, implantation equipment, annealing,
21 shallow junction, application to silicon and
22 Galliumarseni de, RTA mechanism
LITHOGRAPHY

23 Pattern generation and mask making, exposure sources, photolithography,

24 Photoresists, optical lithography, electron lithography,
25 X-ray lithography,
26 Ion lithography, mask defect,
3 27 Atomic force microscopy based lithography system
28 Dip pen lithography system.
DEPOSITION
29 Need for film deposition, film deposition methods-physical and chemical,
30 Deposition processes, CVD techniques for deposition of polysilicon,
31 Silicon dioxide, silicon nitride and metal films, sputter deposition, sputter unit,
32 Epitaxy types, techniques, advantages, vapor phase epitaxy,
33 Molecular beam epitaxy
 International Institute of Technology and Management (IITM), Murthal

ETCHING
34 Directionality and selectivity issues,
35 Wet chemical etching, wet etchants,
36 Dry physical etching, dry etchants,
37 Plasma etching, advantages and disadvantages, issues involved
38 Dry etching systems, dry chemical etching,
39 Reactive ion etching,
4 40 Etching induced damage, cleaning.
METALLIZATION
41 Introduction, metallization applications
42 Metallization choices,
43 Physical vapor deposition,
44 Patterning
45 metallization problems

Text Books :

1. S.M.Sze, VLSI TechnologyTMH

2. S.K.Gandhi, VLSI Fabrication Principles

Reference Books:

1. S.M.Sze, Semiconductor Devices Physics and Technology

2. K.R.Botkar, Integrated Circuits.

TERM STAFF NAME & SIGNATURE

WITH DATE
01/01/2016
TO
22/04/2016 Ms. RANJANA SHARMA
 International Institute of Technology and Management (IITM), Murthal

Lesson Plan
DEPARTMENT : Electronics &Communication Engineering
SEMESTER : IV
SUBJECT & CODE : FIELD AND WAVES & ECE 212B
PREPARED BY : MS. RANJANA SHARMA
PREPARATION DATE : 1/1/2016 NO. OF HOURS REQUIRED : 45
CONTACT HOURS : 4 HRS/WEEK MAX. MARKS : 75
DURATION OF EXAM : 3HRS. MAX. MARKS CLASSWORK : 25

Unit Lecture Covered Topic Proposed Actual

no. No Date Date
1 Coulombs Law of Electrostatic Force, Electric Field Intensity,
2 Electric Potential,
3 Electric Charge Density,
4 Field of A Finite Line Of Charge,
5 Field Potential of an Infinite Line Of Charge,
6 Electric Potential Difference,
1 7 Electric Dipole, Electric Flux Density Gauss Law,
8 Application of Gauss Law, Laplace Equation,
9 Solution of Laplace Equation in Rectangular And Cartesian Coordinates,
10 Uniqueness Theorem of Electrostatic Field Solutions,
11 Methods of Electrostatic Images, Electrostatic Energy, Capacitance
12 Introduction, Faraday Induction Law,
13 Magnetic Effect on Current Carrying Conductor,
14 Magnetic Flux, Magnetic Flux Density,
15 Biot-Savarts Law,
16 Amperes Law of Force,Magnetic Field of A Solenoid,
2 17 Magnetic Field In Vector Notations, Magnetic Field Intensity,
18 Magnetic Flux Density outside and inside
19 An Infinitely Long Cylinder Containing Uniform Current Density,
20 Magnetic Vector Potential,
21 Energy Stored In A Magnetic Field,
22 Energy Density In A Magnetic Field.
23 Introduction, Displacement Current Mawells Equations: In Free Space,
24 Differential Form And Integra Form,
25 Physical Interpretations Of Maxwells Field Equations,
26 Boundary Conditions
27 Electromagnetic Wave In Homogeneous Medium,
3 28 Wave Equation,
29 Plane Wave And
30 Uniform Plane Wave,
31 Electromagnetic Wave Equations,
32 Wave Propagation In Conducting Medium,
33 Polarization
34 Introduction, Basic Principles Of Transmission Lines,
35 Equivalent Circuit Representation,
36 General Transmission Line Equation,
37 Wave Characteristics on Finite Transmission Lines,
38 Transients on Transmission lines,
4 39 Primary Constant,
40 Voltage And Current Calculations,
41 Characteristic Impedance,
42 Open And Short Circuit Lines
43 Reflection Coefficient,
44 VSWR, Smiths Chart And
45 Its applications
 International Institute of Technology and Management (IITM), Murthal

Text Books:

1. Electro-magnetic Waves and Radiating System : Jordan & Balmain, PHI.

2. Antenna & Wave Propagation: K.D Prasad, Satya Prakashan.
3. Field and Wav Electromagnetics: David K.Cheng, Pearson,Second edition

Reference Books:

1. Engineering Electromagnetics: Umran S.Inan & Aziz S. Inan, Pearson

2. Engineering Electromagnetics : Hayt; TMH
3. Electro-Magnetics : Krauss J.DF; Mc Graw Hill

TERM STAFF NAME & SIGNATURE

WITH DATE
01/01/2016
TO
22/04/2016 Ms. RANJANA SHARMA
 International Institute of Technology and Management (IITM), Murthal

Lesson Plan
DEPARTMENT : Electrical Engineering
SEMESTER : IV
SUBJECT & CODE : ELECTROMAGNETIC THEORY & EE 208B
PREPARED BY : MS. RANJANA SHARMA
PREPARATION DATE : 1/1/2016 NO. OF HOURS REQUIRED : 45
CONTACT HOURS : 4 HRS/WEEK MAX. MARKS : 75
DURATION OF EXAM : 3HRS. MAX. MARKS CLASSWORK : 25

Unit Lecture Covered Topic Proposed Actual

no. No Date Date
STATIC & STEAD Y FIELDS
1 electro-static energy,
Coulombs Law , Gausss Law , bou nd ary
2 Potential function, field due to a continuous distribution of charge,
3 Equi-potential surfaces, Gausss Theorem, Poisons equation,
4 Laplaces equation, Method of electrical images, capacitance,
1 5 Electro-static energy, boundary conditions
6 The electro-static uniqueness theorem , far field of a charge distribution
7 Dirac-delta representation for a point charge and an infinitesimal dipole.
8 Faradays law of Induction, Amperes Work law in the differential vector form ,
9 Ampere's law for a current element,
10 Magnetic field due to volume distribution of current
11 Dirac-delta function, Amperes Force Law
TIME VARYING FIELDS
12 Magnetic vector potential, vector potential (Alternative derivation),
13 Far field of a current distribution, equation of continuity,
14 Equation of continuity for time varying fields,
15 Inconsistency of Amperes law , Maxwells field equations
2
16 And their interpretation, solution for free space conditions,
17 Electromagnetic waves in a homogeneous medium ,
18 Propagation of uniform plane-wave, relation b/w E&H in a uniform plane-wave
19 Wave equations for conducting medium ,
20 Maxwells equations using phasor notation,
21 Wave propagation in a conducting medium, conductors, dielectrics,
22 Wave propagation in good conductor and good dielectric, depth of penetration.
POLARIZATION, REFLECTION AN D REFRACTION OF E M WAVES
23 Polarization,(linear),
24 Polarization,(circular),
25 Polarization,(elliptical),
26 Reflection and refraction of plane waves at the surface of a perfect conductor &
3 27
28 Perfect dielectric (both normal incidence as well as oblique incidence),
29
30 Brewester's angle
31 Total Marks internal reflection,
32 Reflection at the surfaces of a conductive medium,
33 Surface impedance.
TRASMISSION LINE THEORY
34 Transmission-line analogy,
35 Poynting theorem ,
36 Interpretation of E x H ,
37 Power loss in a plane conductor.
4 38 Transmission line as a distributed circuit,
39 Transmission n line equation,
40 Travelling & standing waves,
41 Characteristic impedance,
 International Institute of Technology and Management (IITM), Murthal

42 Input impedance of terminated line,

43 Reflection coefficient,
44 VSWR,
45 Smith's chart and its applications.

Text Books:

1. Electro-magnetic Waves and Radiating System : Jordan & Balmain, PHI.

2. Antenna & Wave Propagation: K.D Prasad, Satya Prakashan.
3. Field and Wav Electromagnetics: David K.Cheng, Pearson,Second edition

Reference Books:

1. Engineering Electromagnetics: Umran S.Inan & Aziz S. Inan, Pearson

2. Engineering Electromagnetics : Hayt; TMH
3. Electro-Magnetics : Krauss J.DF; Mc Graw Hill

TERM STAFF NAME & SIGNATURE

WITH DATE
01/01/2016
TO
22/04/2016 Ms. RANJANA SHARMA
 International Institute of Technology and Management (IITM), Murthal

Lesson Plan
DEPARTMENT : Electrical Engineering
SEMESTER : VI
SUBJECT & CODE : ADVANCED MICROPROCESSOR & MICROCONTROLLER & EE 306B
PREPARED BY : MS. RANJANA SHARMA
PREPARATION DATE : 1/1/2016 NO. OF HOURS REQUIRED : 45
CONTACT HOURS : 4 HRS/WEEK MAX. MARKS : 75
DURATION OF EXAM : 3HRS. MAX. MARKS CLASSWORK : 25

Unit Lecture Covered Topic Proposed Actual

no. No Date Date
1 Introduction to 8086 microprocessor,
2 RISC and SISC processors,
3 Architecture and pin diagram of 8086 and description of various signals.
4
5 Register organization of 8086;
1 6 Description of address computations &
7 Memory segmentation;
8 Segment override,
9 Instruction pipelining,
10 Timing diagrams,
11 Addressing modes.
12 Instruction set of 8086,
13 Instruction execution timing,
14 Instruction format,
15 Data transfer instructions,
16 Arithmetic instructions, Branch instructions, Loop instructions,
2
17 NOP & HT instructions,
18 Flag manipulation instructions,
19 Logical instructions,
20 Shift & Rotate instructions,
21 Directives & operators, Interrupts of 8086,
22 Assembly language Programs using 8086
23 The concept of microcontroller,
24 Comparison between Microcontrollers & Microprocessors.
25 Architecture and Pin diagram of 8051 microcontroller,
26 Memory organization .
27 Special function registers.
3 28 External memory,
29 Reset operation .
30 Instruction Set,
31 Addressing modes, arithmetic, Logical. Data transfer.
32 Boolean variable manipulation,
33 Program branching instructions etc. Programs based on various instructions
34 Timer operation,
35 Timer Mode register,
36 Timer Control register.
37 Timer modes & overflow flag,
38 Starting, Stopping & controlling the timers.
39 Programs for generating square waves of various frequencies.
4
40 Serial port operation, UART, Serial port control register,
41 Modes of serial port operation. Serial port baud rate.
42 Initialization & programming of serial port
43 Interrupts of 8051, SFRs related to interrupts, processing interrupts,
44 Program design using interrpts.
45 Interfacing with LED, DC motors, stepper motors.
 International Institute of Technology and Management (IITM), Murthal

TEXT BOOKS:
1. M.A. Mazid i, J.G.Mazidi, and R.D.Mckinlay,The 8051 Microcontroller and embedded
systems, Pearson.

REFERENCE BOOKS:
1. Brey and Sharma, The Intel Microprocessors: Architecture, Programing & Interfacing,Pearson

2. D.V. Hall, Microprocessors and Interfacing: Programming & Hardware, TMH.

3. Kenneth J. Ayala, The 8051 Microcontroller: Architecture, programming & Applications,

Penram International Publishers.
4. Ajoy Kumar Ray and K. M. Bhurchandi, Advanced Microprocessors and Peripherals,
TMH. .

TERM STAFF NAME & SIGNATURE

WITH DATE
01/01/2016
TO
22/04/2016 Ms. RANJANA SHARMA