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https://doi.org/10.1007/s00339-019-2864-6
Abstract
Functionalized Ag nanoparticles (AgNPs) were synthesized on both sides of a polished p-type Si wafer with the AgNO3
concentrations varying from 5 to 25 mM. The AFM results reveal the average particle size of AgNPs increased from 57
to 80 nm with an increase in the AgNO3 concentration. The crystallite size of AgNPs varied from 16.27 to 7.63 nm with
varying the AgNO3 from 5 to 25 mM. The area ratio for the two spin–orbit peaks for IAg(2p3/2)/Iag(2p1/2) and IAg(3d)5/2/
IAg(3d)3/2 are varied increasing from 1.95 to 1.54 and 1.92 to 2.8, respectively, indicated modified coordination of AgNPs
with AgNO3 concentrations. The ATR-FTIR result indicated the presence of C, N, and O functional groups on the AgNPs
film. The composition of Ag is 92% and that of N, O, and C is around 8% as obtained by the XPS analysis. The Schottky
contact in AgNPs/p-Si/AgNPs heterojunction was more pronounced space charge limited conduction due to variation in the
average particle size of AgNPs.
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565 Page 2 of 9 R. Bhujel, B. P. Swain
2 Experimental details on the silicon surface [12]. The reactions are illustrated by
the following equations:
AgNPs were synthesized on both sides of the polished Anodic (oxidation)
p-type Si(100) wafer by following the electroless deposi-
Si + 6HF = H2 SiF6 + 4H+ + 4e− (1)
tion method [9]. In detail, the Si wafers were dipped into
acetone under ultrasonic treatment for 10 min. Thereaf- Cathodic (reduction)
ter the Si wafers were cleaned with DI water for several Ag+ + e− = Ag (2)
times and then immersed in the piranha solution [ H2SO4
Equation (1) shows the etching of the Si surface by HF
(98%) + H2O2 (30%) in the 3:1 ratios] for 30 min followed
with the formation of water-soluble H 2SiF6 compound and
by washing with DI water for 3–4 times to obtain a cleaned
removal of electrons. Meanwhile, the Ag+ ions present in the
Si surface. Meanwhile, the 25 mM AgNO3 solution was
solution attract those electrons and gets reduced to atomic
prepared by dissolving 0.084gm of A gNO3 in 100 ml of
Ag nanoparticles on Si surface, as shown by the Eq. (2).
water. The remaining A gNO3 solutions with the concentra-
Figure 1a, b shows the 2D and 3D AFM images of AgNPs
tions of 5, 10, 15, and 20 mM were then made using the
deposited on the polished surface of p-type Si(100) sub-
previously prepared 25 mM A gNO3 solution as shown in
strates, with different AgNO3 concentrations of 5, 10, 15,
Table 1. Afterward, the cleaned Si substrate was dipped into
20, and 25 mM. The AgNPs exhibit solid and spherical mor-
the electroplating solution (i.e., HF 5% + different AgNO3
phology with the uniform particle distribution as shown in
solution) in 1:1 ratio for 10 s obtaining a large number of
the AFM images (Fig. 1(a)). The concentration of A gNO3
AgNPs on both sides of the Si wafer. The as-synthesized
has a pronounced effect on the particle size of as-deposited
AgNPs/Si/AgNps heterojunction was then analyzed with
AgNPs by the electrodeposition method. The smaller sized
the various characterization techniques. The morphology
AgNPs (57.32 nm) are obtained for 5 mM AgNO3 concen-
of AgNPson Si surface was characterized by Atomic force
tration. However with increasing the A gNO3 concentra-
microscopy (AFM) using a Nanoscope III scanning probe
tion from 5 to 25 mM the average particle size of AgNPs
microscope. The structural characterization was done with
increases from 57.32 to 80 nm. This increase in the average
the help of XRD using Rigaku Saturn 724 + Cu(Kα) Sin-
particle size of the AgNPs is may be due to the horizon-
gle-crystal X-ray diffractometer. The bonding and chemi-
tal spreading of small AgNPs into the agglomerated bigger
cal networks present on AgNPs film were further analyzed
sized AgNPs by the diffusion process as explained by the
with the help of XPS and ATR-FTIR spectroscopy. The XPS
diffusion-limited aggregation model [13]. In the very first
spectra were recorded using (VG ESCA-LABMK II with an
stage of this process, AgNPs deposited on the Si surface
Mg(Kα) X-ray (1253.6 eV) source. The ATR-FTIR spectra
will hit and stick with each other forming an aggregate. In
were recorded by SHIMADZU, FTIR, IRAffinity-1S and
the second stage, the number of nanoparticles will diffuse
the J–V measurements were done by KEYSIGHT B2901A
towards the initial aggregates forming bigger sized clusters
precession source/measure unit.
of AgNPs by the similar continuous hitting and sticking pro-
cess. The formation of AgNPs clusters is governed by the
anisotropic growth of the aggregates.
3 Results and discussion Figure 1c shows the SEM images of AgNPs deposited on
the surface of the p-type Si wafer. The grain size of AgNPs
The electroless deposition of silver onto silicon surface in
increased as the AgNO3 concentration was increased from
an aqueous medium containing silver ions ( Ag+) and HF is
5 to 25 mM. The particle distribution inset in Fig. 1c shows
based on an electrochemical redox reaction in which both the
that the AgNPs prepared from 5 mM AgNO3 have the maxi-
oxidation and reduction processes take place simultaneously
mum number of particles having the size of ~ 60 nm. With
the increasing concentration of A gNO3 from 5 to − 25 mM
the AgNPs size increased drastically from 60 to 80 nm as
shown clearly from the particle distribution diagram. The
Table 1 Preparation of 5, 10, 15 and 20 mM AgNO3 solutions
increase in particle size with a higher concentration of
S. no Conc. of AgNO3 Volume of 25 mM The volume AgNO3 is due to the aggregation of small-sized AgNPs to
solution (mM) AgNO3 solution (ml) of DI water bigger sized AgNP clusters. The SEM images of AgNPs are
(ml)
in good agreement with the AFM images shown in Fig. 1a.
1 20 16 4 Figure 2a shows the XRD spectra of AgNPs deposited
2 15 12 8 on p-type Si(100) substrates with the different AgNO 3
3 10 8 12 concentrations of 5, 15, and 25 mM. The as-prepared
4 5 4 16
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Investigation of electronic environments and electrical characterization of functionalised… Page 3 of 9 565
Fig. 1 a 2D AFM images b 3D AFM images, and c SEM images of AgNPs with varying the A
gNO3 concentration from 5 to 25 mM
AgNPs shows high order of crystallinity with four prom- 7.63 nm for the AgNO3 concentrations of 5, 15 and 25 mM,
inent peaks in the XRD spectra. The peaks are arising respectively.
at the angles, 38.33, 44.58, 64.47, and 77.32° with the Figure 2b shows the strain present on AgNPs film for
corresponding planes of (111) (200) (220), and (311) the different A
gNO3 concentrations of 5, 15 and 25 mM as
observed, respectively. The crystallite size of the AgNPs calculated by applying the Williamson Hall formula i.e.
was obtained by applying the Debye Scherrer’s formula,
i.e.,
𝛽Cos𝜃 = K∕D + 4𝜀 Sin𝜃 (4)
where ε refers to the slope of the straight line which gives
D = (0.9 𝜆)∕(𝛽 Cos𝜃) (3) the residual strain present in the AgNPs film. The negative
where D is the crystallite size of AgNPs, λ is the X-ray wave- slope indicated that the film is subjected to compressive
length, β is the FWHM of the most intense XRD peak and stress. The residual strain present in the AgNPs film is 0.01,
θ is the value of glancing angle at 2θ. The calculated val- 0.016, and 0.012 with AgNO3 concentrations of 5, 15, and
ues of the crystallite size of the AgNPs are 16.27, 7.02 and 25 mM, respectively. The decrease in both the crystallite
size and strain in the AgNPs film is due to an increase in the
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565 Page 4 of 9 R. Bhujel, B. P. Swain
Fig. 1 (continued)
size of AgNPs with increasing the AgNO3 concentration dip signature observed at 2353 cm−1 corresponds to the
from 5 to 25 mM. It can be seen that with an increase in the presence of atmospheric C–O bonds.
AgNO3 concentration, the crystallite size decreases while Figure 4a shows the broad scan of XPS spectra of AgNPs
that of particle size increases. Which confirms the presence with the A
gNO3 concentration varying from 5 to 25 mM. The
of more number densely packed Ag crystal inside the bigger core orbital spectra of Ag(4p)3/2, Ag(4 s), Ag(3d), Ag(3p)3/2
sized AgNPs. The increased number of Ag crystals is able to and Ag(3p)1/2 are observed at 62, 94.5, 368.6, 574.6, and
form a good contact between the Ag/Si interface. Therefore 604.5 eV, respectively. The binding energy for C(1 s), N(1 s),
greater the surface-to-volume ratio, more is the active sites and O(1 s) is observed at 284.4, 399.6, and 531.9 eV, respec-
available forming an attractive bond between two different tively, which indicates the attachment of C, N, and O func-
materials. This leads to a decrease in the barrier height of tional groups on the surface of AgNPs. The two Auger peaks
AgNP/p-Si and an increase in the conductivity of AgNPs/Si of OKLL and CKLL are also observed at 744.5 and 902.4 eV,
heterojunction with a larger particle size of AgNPs. respectively. The atomic percentage of Ag, N, O, and C in the
Figure 3 shows the ATR-FTIR spectra of AgNPs for the AgNPs film was further calculated by applying the formula
AgNO3 concentrations of 5, 15, and 25 mM in the range
of 400–4000 cm−1. Five small absorption signatures were Ai
Si
observed at 614.7, 707.6, 1100, 1634, and 3507 cm−1. The Atomic % = ∑ A (5)
absorptions at 614.7, 707.6, 1100, 1634, and 3507 cm−1
i
Si
correspond to N–H, C–H out of plane bending, C–C
stretching, C=C/C=O and N–Hn/O–H stretching modes, where Ai is the area under the XPS curve and Si is the rela-
respectively, indicating the presence of different functional tive sensitivity factor. The composition of Ag is 92 at.% and
groups attached on the AgNPs surface [14]. Moreover, a
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Investigation of electronic environments and electrical characterization of functionalised… Page 5 of 9 565
Fig. 1 (continued)
the total composition of impurity atoms (N, O, and C) are Similarly in Fig. 4c the Ag(3d) core orbital was deconvo-
around 8 at.% in the AgNPs film. luted into Ag(3d)5/2 and Ag(3d)3/2 states, respectively. The
Figure 4b shows the deconvolution of Ag(3p) core orbital FWHM and the hole lifetime of the Ag(3d)5/2 and Ag(3d)3/2
spectra into two Gaussian peaks corresponding to Ag(3p)3/2 core orbital shows a similar trend as like Ag(3p) states as
and Ag(3p)1/2 states. T heAgNO3 concentration was varied explained before.
from 5 to 25 mM. The FWHM of Ag(3p)3/2 core orbital From Fig. 4d it has been realized that the binding energy
increases from 8.08 to 8.86 eV. Similarly the FWHM of of Ag(3p)3/2 shifts from 574.52 to 573,78 eV and that of
Ag(3p)1/2 core orbital also increases from 8.7 to 11.43 eV for Ag(3p)1/2 shifts from 603.42 to 602.83 eV. A similar trend
an increase in the AgNO3 concentration from 5 to 25 mM. was also shown by the Ag(3d)5/2 /and Ag(3d)3/2 states. The
This variation in FWHM or excess broadening of the Ag(3p) shifting of this binding energy towards the red region (low
core orbital indicates (a) the non-uniformity of AgNps film frequency) with increasing the AgNPs size is due to the
and b) the increasing Ag content in AgNPs film with the attachment of a lesser number of electronegative atoms like
AgNO3 concentration varying from 5 to 25 mM. Further- oxygen and nitrogen on the surface of AgNPs film. There-
more, the hole lifetime in the AgNPs film was calculated fore at higher A gNO3 concentration, the purity of AgNPs
from the Heisenberg’s uncertainty relationship i.e. film increases.
Figure 4e shows the intensity ratios of IAg(3p)3/2/
FWHM = h∕𝜏 (6) IAg(3p)1/2 and IAg(3d)5/2 / IAg(3d)3/2 of AgNPs for the
where FWHM is full width at half maxima of Ag binding AgNO3 concentrations of 5–25 mM. The area ratio for the
energies, h = Planks constant and τ corresponds to the hole two spin–orbit peaks (2p3/2:2p1/2) decreased from 1.95 to
lifetime of AgNPs. The calculated result shows that the hole 1.54, however, ideally 2 electrons in the 2p1/2 level and 4
lifetime of AgNPs varied from 4.8 × 10–16 to 4.66 × 10–16 s electrons in the 2 p3/2 level. Similarly, the area ratio for the
for Ag(3p)3/2 states and for Ag(3p)1/2 states the hole lifetime two spin–orbit peaks for IAg(3d)5/2/ IAg(3d)3/2 is increasing
changes from 3.61 × 10–16 to 4.7 × 10−16 s, respectively. from 1.92 to 2.8 in which ideally 3:2 electrons participated
13
565 Page 6 of 9 R. Bhujel, B. P. Swain
1000 5mM between IAg(3d)5/2 and IAg(3d)3/2. This indicated the change
(a)
(111)
15mM of coordination within the Ag NPs.
25mM
The bandgap alignment in AgNP/p-Si/AgNP heterojunc-
800
tion is controlled by electron affinity, work function, and
intensity (a. u)
(200)
600 the structure of AgNPS/p-Si/AgNPs heterojunction where
(220)
AgNPs is deposited on both sides of the p-type Si wafer. The
(311)
400 AFM distribution shows that the particle size of AgNPs is
within the range of 55–100 nm. Hence the energy states of
AgNPs are not continuous but are split into discrete energy
200
states. Therefore to calculate the HOMO and LUMO states
of AgNPs, the ionization potential and electron affinity value
0 are calculating using the formula.
20 30 40 50 60 70 80
2θ Degrees 3 1
( )
I=W+ (7)
8 R
0.02 25 mM
(b)
5 1
( )
A=W− (8)
8 R
0.00
where I is the ionization potential, A is the electron affinity,
0.02 15 mM W is the work function for the bulk Ag metal and R is the
β cos θ
80 nm, respectively.
Intensity (a.u)
N-Hn /O-H
C-C
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Investigation of electronic environments and electrical characterization of functionalised… Page 7 of 9 565
(a) 5mM
Ag(3d)
10mM
15mM 20 mM
20 mM
20mM
25mM
Counts/Sec
Ag(3p) 3/2
Counts/sec
Ag(3p) 1/2
Counts/sec
15 mM
C KLL 15 mM
N(1s)
O(1s)
OKLL
Ag(4p) 3/2
10 mM
C(1s)
Ag(4s)
10 mM
5 mM
5 mM
0 500 1000 540 550 560 570 580 590 600 610 620 360 380
Binding energy (eV) Binding energy (eV) Binding energy(eV)
3.0
I3p3/2 /I3p1/2 (e)
(d)
Binding energy (eV) I3d5/2 /3d 3/2
2.5
2.0
1.5
5 10 15 20 25
AgNO3 concentration (mM)
Fig. 4 a Broad XPS spectra of AgNPs, b the deconvolution of Ag(3p) and e IAg(3p)3/2/IAg(3p)1/2 and IAg(3d)5/2/IAg(3d)3/2 of Ag(3d) core
core orbital, c deconvolution of Ag(3d) core orbital, d binding energy orbital with different A
gNO3 concentration of 5–25 mM
of Ag(3d)5/2, Ag(3d)3/2 and Ag(3p)3/2 and Ag(3p)1/2 deconvolution,
no current flow through the potential barrier. However, in Figure 5c shows the J–V characteristic curve for
room temperature some current flows through the AgNPs/p- AgNPs/p-Si/AgNPs heterojunctions with A gNO3 concen-
Si/AgNPs heterojunction due to hopping conduction. At the trations varying from 5 to 25 mM. The current density of
voltage, V > 0, the energy level of AgNPs (right) moves to AgNPs/p-Si/AgNPs heterojunction increases with increasing
the downside, hence, the above V = 0.188 eV, the electro- the AgNO3 concentration from 5 to 25 mM over the whole
chemical potential (µ) of AgNPs (left side) decreases which voltage range of − 5 to 5 V as a result of the increase in
shifts the forward current flows through the AgNPs/p-Si number and particle size of AgNPs which further leads to
heterojunction. Hence, the electrons are first excited from an increase in the connectivity between the AgNPs within
the LUMO of AgNPs to the conduction band of p-Si and the film resulting in the higher mobility of the electrons.
again to the conduction band of AgNPs as shown in Fig. 5b. It was further observed that the J-V curves of AgNPs/Si/
Similarly, V < 0, the µ of AgNPs (left side) increased which AgNPs are slightly asymmetric in nature due to the presence
shifts the energy level of AgNPs (left) upside, hence, the of nonuniformly distributed AgNPs on both sides of the p-Si
above V = 0.188 eV, the reverse current flows through the wafer. The curves will be more symmetric if the uniform-
AgNPs/p-Si heterojunction. Hence, the electrons are first sized particles can be formed.
excited from the LUMO of AgNPs and flow to the con- Figure 5d shows the log (J) versus log (V) graph for
duction band of p-Si and again to the conduction band of AgNPs with A gNO 3 concentrations varying from 5 to
AgNPs. 25 mM. The ideality factor (n) evaluated from AgNPs/p-Si/
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565 Page 8 of 9 R. Bhujel, B. P. Swain
(a) 1000
5mM
(c)
10mM
15mM
-500
(b) -1000
-4 -2 0 2 4
Voltage (V)
3 5mM (d)
10mM
15mM
2 20 mM
25mM
Log (J)
1
-1
Fig. 5 a Band gap structure of AgNPs/p-Si/AgNPs heterojunction, b versus log (V) graph of AgNPs/Si/AgNPs heterojunction with AgNO3
band diagram of AgNPs/p-Si/AgNPs heterojunction and c J–V char- concentration varying from 5 to 25 mM
acteristic curve of AgNPs/p-Si/AgNPs heterojunction, and d log (J)
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