A new production process is being tested to reduce the

number of “large” particles (2 microns and higher) that

contaminate silicon wafers. A random sample of n=90
wafers is drawn and the large contaminating particles
counted. The sample data are shown below.

a.

What is the sample estimate for the mean number of

large particle contaminants per wafer in the new
production process?
b. Calculate a 95% confidence interval for the mean
number of large particle contaminants per wafer in the
new production process

Large Particle Sample

Observation Contaminants Estimate S
1 3 1.866667 2.332959
2 1
3 6
4 1
5 3
6 3
7 0
8 0
9 0
10 4
11 0
12 3
13 0
14 1
15 3
16 0
17 0
18 2
19 1
20 0
21 0
22 6
23 12
24 3
25 1
26 3
27 2
28 2
29 1
30 8
31 2
32 0
33 0
34 0
35 4
36 1
37 2
38 0
39 0
40 7
41 4
42 1
43 4
44 1
45 0
46 3
47 2
48 0
49 2
50 1
51 3
52 5
53 0
54 3
55 1
56 0
57 2
58 0
59 1
60 0
61 2
62 0
63 1
64 1
65 2
66 0
67 0
68 10
69 2
70 1
71 0
72 0
73 0
74 7
75 2
76 4
77 1
78 1
79 0
80 5
81 0
82 1
83 2
84 0
85 5
86 0
87 0
88 0
89 1
90 2
a.

What is the sample estimate for the mean number

of large particle contaminants per wafer in the new
production process? 1.86667 (Large P.C.)
b.

Calculate a 95% confidence interval for the mean

number of large particle contaminants per wafer in
the new production process
Lower bound 1.37804 (Large P.C.)
Upper bound 2.35530 (Large P.C.) x-bar 1.866667
Alpha 0.05
S 2.332959
Sample Size 90
Confidence Interval
Lower 1.378038
Upper 2.355295

S (Sample
Large Particle Sample Standard
Observation Contaminants Estimate Deviation
1 3 1.866667 2.332958771
2 1
3 6
4 1
5 3
6 3
7 0
8 0
9 0
10 4
11 0
12 3
13 0
14 1
15 3
16 0
17 0
18 2
19 1
20 0
21 0
22 6
23 12
24 3
25 1
26 3
27 2
28 2
29 1
30 8
31 2
32 0
33 0
34 0
35 4
36 1
37 2
38 0
39 0
40 7
41 4
42 1
43 4
44 1
45 0
46 3
47 2
48 0
49 2
50 1
51 3
52 5
53 0
54 3
55 1
56 0
57 2
58 0
59 1
60 0
61 2
62 0
63 1
64 1
65 2
66 0
67 0
68 10
69 2
70 1
71 0
72 0
73 0
74 7
75 2
76 4
77 1
78 1
79 0
80 5
81 0
82 1
83 2
84 0
85 5
86 0
87 0
88 0
89 1
90 2