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Bicmos Technology
Bicmos Technology
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TALK FLOW
What is VLSI
What is BiCMOS
FEATURES
CHARACTERSTICS OF CMOS, BIPOLAR and
BICMOS TECHNOLOGY
BiCMOS fabrication process
CMOS inverter
BiCMOS inverter
Comparison between CMOS and BiCMOS
Pros and Cons
Applications
Conclusion
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What is VLSI ?
VLSI stands for very large scale integration and is the
process of creating integrating circuits by combining
thousands of transistors into a single chip.
Invention of VLSI is based on the achievements in the field
of semiconductor technology.
Transistors were invented at Bell labs in 1947.
Jack kilby at texas instruments in 1958 was first to make a
integrated circit ready.
It elimnates the use of discrete components, wires and
manual assembly of components.
Eg. Microprocessor,controllers etc.
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WHAT IS BiCMOS
Bipolar compatible CMOS(BiCMOS) technology:
Introduced in early 1980s
Combines Bipolar and CMOS logic
BiCMOS
CMOS BIPOLAR
Low power dissipation High speed
High packing density High output drive
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Features:
The objective of the BiCMOS is to combine bipolar and CMOS so as to
exploit the advantages of both the technlogies.
Today BiCMOS has become one of the dominant technologies used for
high speed, low power and highly functional VLSI circuits.
The process step required for both CMOS and bipolar are almost similar
The primary approach to realize high performance BiCMOS devices is
the addition of bipolar process steps to a baseline CMOS process.
The BiCMOS gates could be used as an effective way of speeding up the
VLSI circuits.
The applications of BiCMOS are vast.
Advantages of bipolar and CMOS circuits can be retained in BiCMOS
chips.
BiCMOS technology enables high performance integrated circuits IC’s
but increases process complexity.
.
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Characterstics of Bipolar
Technology
Higher switching speed
Higher current drive per unit area, higher gain
Generally better noise performance and better high frequency characteristics
Improved I/O speed (particularly significant with the growing importance of
package limitations in high speed systems).
high power dissipation
lower input impedance (high drive current)
low packing density
low delay sensitivity to load
It is essentially unidirectional.
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Charactestics of CMOS
Lower static power dissipation
Higher noise margins
Higher packing density
High yield with large integrated complex functions
High input impedance (low drive current)
Scaleable threshold voltage
High delay load sensitivity
Low output drive current (issue when driving large capacitive loads)
Bi-directional capability (drain & source are interchangeable)
A near ideal switching device
Low gain
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Characterstics of Bicmos
Technology
It follows that BiCMOS technology goes some way towards combining the
virtues of both CMOS and Bipolar technologies
Improved speed over purely-CMOS technology
Lower power dissipation than purely-bipolar technology(Lower power
consumption than bipolar)
Flexible I/Os for high performance
Improved current drive over CMOS
Improved packing density over bipolar
High input impedance
Low output impedance
High Gain and low noise
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Cmos fabrication
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BiCMOS FABRICATION PROCESS
CMOS process BIPOLAR process
1 . N well 1. n collector
2. P base doping(extra
step)
3. PMOS source and 3. p+ base contact
drain
4. NMOS source and 4. n+ emitter
drain
Adapted from A.R.Alvarage et al.,”An overview of BiCMOS Technology and
Applications”,IEEE International Symposium on Circuits and Systems,1-3
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May,1990
BiCMOS CROSS-SECTION
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CMOS INVERTER
CIRCUIT DIAGRAM
VDD
IP
OP
GND
C load
C load
CMOS
BiCMOS
C COMPLEXITY
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CONS OF BiCMOS
Increased manufacturing process complexity
Speed degradation due to scaling
The efficiency of BiCMOS device increased by 2 and cost increased by 1.3 to 1.5
as compared to CMOS.
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BiCMOS PRODUCTS
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CONCLUSION
The extra process complexity requires chip
manufacturers to command a premium for BiCMOS
products. In the analog market the ability to integrate
large mixed systems provides the compelling cost
advantage of BiCMOS; this market is still emerging.
BiCMOS is a complement to pure CMOS and Bipolar
technologies in important system application areas.
One of the main challenges facing BiCMOS design is
to maintain its performance gain at lower voltage
levels.
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REFERENCES
[1]Kiat-Seng Yeo et al.,”CMOS/BiCMOS ULSI:Low voltage,Low power”,Pearson
Education,Inc., First edition,2002.
[2]Sung-Mo Kang,Yusuf Leblebici,”CMOS Digital Integrated Circuits:Analysis and
Design”,Tata McGraw-Hill,Third edition,2003.
[3]E.A.Gonzalez,”BiCMOS processes,trends and applications”,DLSU ECE,Technical
report,Nov.29,2004.
[4]A.R.Alvarez et al.,”An overview of BiCMOS technology and applications”,IEEE
International Symposium on Circuits and Systems,1-3 May,1990.
[5] T. Sakurai, “A review on low-voltage BiCMOS circuits and a BiCMOS vs. CMOS speed
comparison,” Proceedings of the 35th Midwest Symposium on Circuits and Systems, vol.
1, Aug. 9-12 1992.
[6] J. M Rabaey, Digital Integrated Circuits: A Design Prespective, NewJersey: Prentice-
Hall, Inc., 1996.
[7] J. P. Uremuya, Circuit Design for CMOS VLSI, Massachusetts: Kluwer Academic
Publishers, 1992.
[8] Adapted from H.Klose et al.,”Bicmos,a tehnology for High speed/High density ICs”,IEEE
international conference on Computer Design:VLSI in computers and proessors,2-4
Oct.,1989
[9] Larry Wissel and Elliot L. Gould,”Optimal Usage of CMOS within a BiCMOS
Technology”,IEEE J. of solid-state circuits, Vol. 27, No. 3, March 1992
[10] Paul G. Y. Tsui et al.,”Study of BiCMOS Logic Gate Configurations for Improved Low-
Voltage Performance”, IEEE J. of solid-state circuits, Vol. 28, No 3. March 1993.
[11] D.L.Harame,”Current Status and Future Trends of SiGe BiCMOS Technology” IEEE
transactions on electron devices, vol. 48, no. 11, november 2001
[12]Adapted from D.Harame et al.,”The Emerging Role of SiGe BiCMOS Technology
in Wired and Wireless Communications”, Fourth IEEE International Caracas Conference
on Devices, Circuits and Systems, Aruba, April 17-19, 2002.
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