austriamicrosystems

Device Matching Rules

1. Introduction

Matching tolerances occur from several effects:

1. Random process variations (local matching error)

2. Process gradients across die (distance effect)
3. Systematic influence of adjacent structures (proximity effect)
4. Non-isotropic effects (orientation effect)

Most of these effects can be minimized by appropriate layout techniques. The present state of art is described
below for different device types. In addition some basic design techniques should be applied to keep the
tolerances low.

Process anisotropies may result from certain processing steps (plasma etching, ion implant angle) or lattice
orientation, and affect mainly MOS devices. As a result, it may be important how devices are oriented relative
to each other or relative to the die flat.

Finally die stress from packaging or thermal gradients may cause considerable parameter changes or drift.
Pre- and post-assembly electrical parameters may be unequal. Partially this can be avoided by symmetric
placement of critical components with respect to the main die symmetry axes. It may even become necessary
to apply special assembly techniques like coating, or to change the position of the die inside the mold.

2. Design Techniques

Technique Device Type Notes

maximize size
all
unit elements only
maximize L
maximize W if possible
MOS
same L for mirrors
operate in strong inversion
maximize W
RES
match same device type (e.g. don't match Rpoly with Rnwell etc.!)

2. Layout Techniques

Technique Device Type Local Distance Proximity Anisotropy

minimize spacing X
 maximize size X
adjacent parallel placement X X
surround by dummy elements X
all
split & common centroid X X
split & interleaf X X
unit elements only X
maximize L X
maximize W MOS X
same Drain-Source orientation X
constant area/perimeter ratio CAP X
match contacts X
RES
match bends (shape) X

More Recommendations:

z Combinations of above techniques are allowed and recommendable

z Avoid 45° and other rotation angles (mask tolerances)
z Shape capacitor corners at 45° angle
z Shape serpentine resistor corners at 45° angle
z Keep surrounding of critical components uniform (if possible)
z Consider ground bus series resistance for current mirrors
z Consider parasitic wiring and contact series resistances
z Match interconnect wiring (capacitances) for good dynamic balance
z Please refer to our designrule documents for resistor and capacitor layout examples

3. Illustrations

Dummy Layout Technique for Capacitor and Resistor Arrays

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Common Centroid Layout Example

Common Centroid Bipolar Array (e.g. for Bandgap circuit)

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Interleafed Layout Examples

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MOS Drain Current Orientation

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Capacitor Unit and Non-unit Layout

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Resistor Contact Matching

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Resistor Bends Matching (Shape Matching)

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