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N.B.:
(1) Question No.1 is compulsory
(2) Attempt any three questions out of remaining five questions
(3) Figures to right indicate full marks
(4) Assume suitable data if necessary.
(5) Notations carry usual meaning.
Q.3(A) Explain steps jivelved in4 photolithography process. (Note: Draw neat labeled 10
diagrams to explain the process).
(B) Write short note on (1) ot nage sensors (ii) Air bag sensor
s 10
Q. 4 (A) Determine the electrostatic force exehted on a plates (in the direction of length, 10
width and normal) separated by distance 2 microns and having length and width as
1000 micrometer. The e=1.0: for air as dielectric material and ep= 8.85x10°"? C?/N-
m’, V=1V
(B) Explain (i) Chemival Vapour Deposition technique (ii) Nano-Electro-Mechanical 10
Systems
Q.6(A) Write short note on (i) bulk-micromachining (ii) Scaling laws in modeling of MEMS 10
-(B) Explain potential use of silicon dioxide in MEMS 05
(C) Discuss the domestic and industrial application of Nanotechnology. 05
2 2 ee 22 oe 2 ok oe oe 2 2 2K ok ak 2 ok.
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