This document contains a training record for a class on wafer inspection standards. The class covered inspecting wafer color, visual inspection for scratches, chips, bubbles, cracks, and fogginess. Acceptance criteria included scratches under 60-40 microns, chips under 0.1 mm, bubbles under 0.13 mm and less than 10, and no cracks or strong fog allowed. The class was conducted internally on February 17, 2023 for an unspecified number of hours by an internal trainer. Attendees were required to sign acknowledging attendance and understanding of the material in order to properly apply the inspection standards in their work.
This document contains a training record for a class on wafer inspection standards. The class covered inspecting wafer color, visual inspection for scratches, chips, bubbles, cracks, and fogginess. Acceptance criteria included scratches under 60-40 microns, chips under 0.1 mm, bubbles under 0.13 mm and less than 10, and no cracks or strong fog allowed. The class was conducted internally on February 17, 2023 for an unspecified number of hours by an internal trainer. Attendees were required to sign acknowledging attendance and understanding of the material in order to properly apply the inspection standards in their work.
This document contains a training record for a class on wafer inspection standards. The class covered inspecting wafer color, visual inspection for scratches, chips, bubbles, cracks, and fogginess. Acceptance criteria included scratches under 60-40 microns, chips under 0.1 mm, bubbles under 0.13 mm and less than 10, and no cracks or strong fog allowed. The class was conducted internally on February 17, 2023 for an unspecified number of hours by an internal trainer. Attendees were required to sign acknowledging attendance and understanding of the material in order to properly apply the inspection standards in their work.
Class Title: Tiéu chuån kiém Wafer 150/ Wafer 150 inspection standard Location: FQA Start Date 17-Feb-2023 End Date 17-Feb-2023 Total Training Hours: Hr(s) Class Descri tion and/or Procedure: l. Kiöm loi måu vit tu•wafer / Wafercolor inspection. Dit lot hing trén trén carier / Put wafers vertical located in carrier Sir dung dén huynh quang •inh sång tring (dén B) kiem måu / Use white light source (lapnp B) Kiem måu wafer (chti trqng conh chåm), thay dbi nhicu g6c nhin xem con hång co bi åm måu hay khöng / Visual watch wafer (especially the edge) through different angle, to check if clear or color Chi chap n hip wafer trong suot, lopi wafer co måu / Onlyclear wafers are accepted, color M'afersare rejected 2. Kiem ngopi quan, chat Itrqng be mit wafer / Wafer Visual Inspection. Sti dung dén 9W inh sing vång, ncn den / Use 9Wyellow light source, black background condition Kicm ngoqi quan con hing dig, chip, / Do visual inspection to check scratch, dig, chip etc. Tiéu chuan dånh giå nhtr sau / Key requirement: o Scracth dig: 60-40 o Chip: 0.1 mm o Bubble: size < 0.13mm, Qty 10 O Crack: Khöng cho phép / not allow o Fog: mit trong su6t, khöng dec strong / Nofog is allow.
Trainer/Facilitator: Nguyen Dinh Cuong Internal O External
Trainer/FaciIitator Signature; By my signature below I indicate that I Training Type: agree to thefollowing: J. Training session/class was conducted O Induction O Engineering per the information in the box above, O DepartmentGeneral Training a safety 2. Attendance at the session. a PQS O Environment 3. Learning objectives are fully O OJT a Others understood. ØQuality 4. To apply knowledge, skills to perform O CompanyTraining job duties. O Cross-Dept Training
Reference document: /002 Page I of I Date: to-Nov-22, ECN# 25940
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Reference document: Page 2 of I Date: 10-Nov-22, ECN# 25940