Electron Beam Lithography(EBL)

Photoresist

1. Heat up the Hot Plate until 180o.

2. Clean Aceton and IPA glass beaker for 3 times.
3. Put the wafer and vibrate on Aceton 3 minutes, and IPA 1 minute, Dry by N 2 gun, hot plate 10
seconds.
4. Clean the spin coater by Aceton and water.
5. Turn On Pump. Clean the sucker and pipe by N2 gun
6. Remove the o-ring, put the wafer on spin coater, and turn on the pump.
7. Recipe
A3
A5
*Align the wafer exactly in middle
*Clean the pipe and sucker by aceton
*A5 in refrigerator, don’t forget to keep it close after use
*throw two drops and coat well on the wafer
*after coating wait until the surface is uniform
*heat the hot plate for 90o.
*Put the wafer on hotplate (how long?)
*clean the pipe by acetone, and throw into garbage
8. E-spacer
E-spacer recipe
*throw 2 drops before coat, coat well and pull to the corner if not enough drip
*cleaned the spin coater by water
*cooling down hot plate to 20o

Develop

1. MIBK/IPA, clean glass beaker for 3 times, pour small amount.

2. Clean the wafer bty D.I water, and dry use N2 gun
3. Steer in MIBK/IPA for 1 minutes 10 seconds
4. Steer in IPA for 1 minutes