High-Purity Chemicals

in Electronic Applications
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Training guide for filtration products
 Introduction

Schematic

Selection Process

Applications

Ultra-Pure
Water (UPW)

High-Purity
For technical or application support related to our fluid filtration Solvents Isopropyl
Alcohol (IPA)

solutions, please call our toll free number 877 784 2234 or High-Purity
Acids & Bases

email dhpsales.na@parker.com Hydrofluoric Acid

High-Purity
Acids & Bases
Sulfuric Acid

High-Purity
Acids & Bases
Hydrogen Peroxide

Services

Selection Matrix

Parker domnick hunter has a continuous policy of product development and although the Company reserves the right to change specification, it attempts to keep customers Product Overview
informed of any alterations. This publication is for general information only and customers are requested to contact our Process Filtration Sales Department for detailed
information and advice on a product’s suitability for specific applications. All products are sold subject to the company’s Standard conditions of sale.
Contents Introduction

Schematic

Introduction :....................................................................................................................................... 2 Selection Process

HP Chemical Schematic :....................................................................................................................................... 3

Selection Process :....................................................................................................................................... 4 Applications

Understanding the application : Ultra-Pure Water (UPW)............................................................................................. 5
Ultra-Pure
: High-Purity Solvents Isopropyl Alcohol (IPA)............................................................. 6 Water (UPW)

: High-Purity Acids & Bases Hydrofluoric Acid........................................................... 7 High-Purity

Solvents Isopropyl

: High-Purity Acids & Bases Sulfuric Acid.................................................................. 8 Alcohol (IPA)

: High-Purity Acids & Bases Hydrogen Peroxide........................................................ 9 High-Purity

Acids & Bases
Services : Technical Support Group (TSG)............................................................................... 10 Hydrofluoric Acid

High-Purity Chemicals High-Purity

Selection Matrix :.................................................................................................................................... 11 Acids & Bases
Sulfuric Acid
Products :............................................................................................................................. 12-13
High-Purity
Acids & Bases
Hydrogen Peroxide

Services

Selection Matrix

Product Overview

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Introduction Introduction

Providing a cost-effective filtration technology that ensures

consistent quality and process optimization Schematic

High-purity chemicals and materials are essential in manufacturing Given the variations of these processes for high-purity chemicals,
microelectronics devices that are enabling advances in work, chemistries, and solvents, it is critical to consider the operating
life science, communications, transportation, efficient lighting, parameters when selecting filtration for each stage of manufacturing. Selection Process
entertainment, shopping, and many other areas that affect our lives.
As our customers require fewer and smaller particles and the need
Parker domnick hunter’s proven product range and applications for lower metal extractables increases, it is essential for us to fully
experience in the manufacturing of these high-purity chemicals, understand their applications and process demands. In addition to
chemistries, and solvents allows our customers to meet the high- helping our customers achieve their final specification, we must Applications
purity requirements that enable constant technical advancement recommend filtration solutions that minimize process downtime and
of their customers. While each application is unique, we can often reduce product waste. The total cost of ownership must be considered Ultra-Pure
divide high-purity applications into the following broad processes: without compromising the quality of the end product. Water (UPW)
• Ultra-pure water is needed to enable production of liquid high-purity
chemical, or to dilute concentrated chemical into Market Applications High-Purity
the concentration required by the customer. • High-purity concentrated acids Solvents Isopropyl
• Specialty chemical-vapor filtration which is unique to • High-purity acid blends Alcohol (IPA)
polysilicon production. • High-purity bases
• Distillation in some processes may be done in a very High-Purity
• High-purity alkaline solutions Acids & Bases
aggressive, high-temperature environment requiring
• High-purity solvents Hydrofluoric Acid
a special filtration solution.
• Some photoresists and polyimides
• Venting of tanks with hydrophobic filters to relieve gas
pressure build-up. • Anti-reflective coatings High-Purity
Acids & Bases
• Anhydrous and other industrial liquid raw materials may require • Developers – negative and positive
Sulfuric Acid
filtration from tankers, pipelines, or other large vessels before • Organic solvents used to strip photoresist polymer
they are introduced to the high-purity manufacturing system. • CMP base chemicals – acids or bases High-Purity
• Pre-filtration or clarification through the manufacturing process Acids & Bases
• High-purity plating solutions
is typical and necessary to guarantee quality specifications Hydrogen Peroxide
throughout the process. • Trichlorosilane – vapor and liquid
• Final package filtration is the last particle barrier and the final
critical filtration step in the high-purity manufacturing process.
Services

Selection Matrix

Product Overview

|2
High-Purity Chemical Application Overview Introduction

High-Purity Solvents Absorber

Column

High-purity solvents begin as general or industrial grade versions Acid

Dilution Schematic
DI Water
before undergoing a series of filtration, and sometimes, distillation Storage
Tank
steps. While most think of commonly used solvents like IPA or
Distillation
acetone, other mostly polar solvents are used in various Distillation Purifier
microelectronics processes. Both metal ion and particle Column

specifications will vary according to the application

Hydrolyzer
id
Sulfur Trioxide Selection Process
Ac
Vaporizer

and customer. Parker’s filters meet a wide range ol ric

oh
Liquid
fu
ul
Sulfur Trioxide
lc Degasification
lA PS
Storage Storage Tank
of solvent filtration needs and enable the Absorber
py
& Air Vent Filter

UH
Sulfur Trioxide
solvent manufacturer to meet the Sulfate
o pro Condensor UV

Is
Esters Station
Sulfur Trioxide
needs of their customers. Evaporator
Reverse Applications
Osmosis
System 2

Ultra-Pure
Reverse
DI Water Osmosis
Propene System 1
EDI Water (UPW)
Pretreatment
Tank
Sulfuric Ion
Ultapure

ter
Exchange
Acid Dilute HF
High-Purity
e Wa Solvents Isopropyl
r
Pu
Storage

ra- Alcohol (IPA)

Tank
& Air
Ult Vent Filter

DI Water Oxidizer
Water
Ion
Exchange High-Purity
O2
Rich Air
Recycle
Acids & Bases
Storage
Ultra-Pure Water Process Hydrofluoric Acid
Hydrogenator
Ultrapure
Aquesous HF
DI Water The use of polypropylene depth filters or
Anhydrous HF Final Hydrogen Solvent
high-flow pleated filters on the deionization High-Purity
cid
Distillation
Purification
system is used to treats incoming water and Acids & Bases
Concentrated
ricA e
Aqueous HF
flu
o xid protects the RO system. Trap filters ensure Sulfuric Acid
ero
Liquid

dro
Extractor
y n P that the make-up process water is
H ge
dro ultra-pure by preventing downstream
Anthraquinone

High-Purity
+ Solvent
Hy
contamination of source water sediment
Acids & Bases
Purification Purification
Column 2 Column 1
or ion exchange bead migration.
Hydrogen Peroxide

High-Purity Acids & Bases

High-purity acids & bases are critical to the cleaning and etching of microelectronic Services
devices, especially semiconductors. Parker dh’s lineup of filters are well suited for
achieving the challenging particle and ionic specifications the chemical companies need
to meet. Filtration is progressive, getting tighter throughout the process. Materials of
construction must not only be highly compatible and provide good performance, but must
also offer outstanding value. While polypropylene may be compatible in a particular acid or For detailed products in each process Selection Matrix
base for one manufacturer, it may not be suitable for another whose end user customers application, see pages 5 - 9.
require ultra low metal extractables. Parker can meet the needs of both customers.

Product Overview

|3
Selection Process
Identifying customer needs
In order to meet filtration
specifications, physical and
chemical conditions of the S E
process have to be considered.
It is therefore essential that a
methodical process for identifying
the customer’s needs is followed.
START with the
The SELECT process builds on end in mind
principles used to select the
optimized filtration solution for the
high-purity chemical manufacturer.
• What is the customer • What type of filter?
trying to achieve?
– Ultra-purewater
– Pre-filtration to trap
and final filters
– Filtration of raw
materials or additives
– Vapor filtration
– Distillation of
concentrated chemical
– Venting of tanks
– Stage pre-filtration
– Final package filtration
• What are the target
contaminants?
– Hard particles
– Gels
– Fibers
– Moisture
– Metal ions
• Legislation and
environmental
Introduction
Schematic
L E C T Selection Process
Applications
COMPETITIVE TECHNICAL
EFFICIENCY LIFE ECONOMY
ADVANTAGE SUPPORT Ultra-Pure
Water (UPW)
High-Purity
• Life to blockage • Existing housings • Differentiation • Ongoing Support Solvents Isopropyl
– Coarse – bag, etc – Life to loading – Identify housing through support – Contract testing Alcohol (IPA)
– Depth/pleated – Identify volume/through – Determine correct programs – Troubleshooting
– Pleated membrane put (batch size) filter code – Operator training – Technical audits
– Retention/efficiency – Flow rates – Length/width – Process audits – Operator training
High-Purity
– Grade of filter media – Particle concentration – Filter changeout – Validations
Acids & Bases
(micron) – Correlation of pressure • New housings – Returned filter analysis – Product trials Hydrofluoric Acid
– Single pass drop to particle spec – Chemical compatibility – Contract testing – Scale-up
– Multi pass – Operating pressure/
• Filter compatibility temp • Parker cross- • TSG Support
High-Purity
– Support material
– Chemical/solvent type – Fittings/vents divisional solutions – Experienced and highly
Acids & Bases
– Media
– Solids loading and concentration – Materials of construction qualified scientists Sulfuric Acid
– Operating temperature – Size–flow rate • Alternative – Fully equipped labs
– Viscosity technologies High-Purity
• Operational efficiency – Custom engineered • Regional Support
– Low downtime solutions
Acids & Bases
– Low hold-up volume • Divisional Support Hydrogen Peroxide
– Disposable costs
• Product and process
safety Services
– Minimize operator
exposure to process
chemicals
Selection Matrix
Product Overview
|4
 Column

cid
Sulfur Trioxide
Vaporizer
A
ric
Ultra-Pure Water (UPW)
Liquid
Sulfur Trioxide
lfu Introduction
Su
Degasification
Storage Storage Tank
P & Air Vent Filter

UH
Sulfur Trioxide
Condensor UV
Station
Sulfur Trioxide
Evaporator
Reverse Schematic
Osmosis
System 2
2
Ultra-Pure Water (UPW)* is essential in the
Reverse
manufacturing processes of most chemicals, Osmosis
chemical blends, and solvents. Chemical System 1 Selection Process
companies with high-purity chemical processes EDI
use UPW in the manufacturing process or to Pretreatment
control concentrations per their customer’s Tank 2
Ion
tapure specification. 3
r Exchange

ate
ute HF Applications
Converting typical city or lake water into UPW W
requires several steps. Reverse osmosis (RO) is
Pure Storage
Ultra-Pure
the first major step used to remove contaminants 1 ra- Tank
& Air Water (UPW)
from the mains water. Parker domnick hunter
filters are used prior to the RO systems to protect
Ult Vent Filter

High-Purity
the RO membrane from large particles. Solvents Isopropyl
Oxidizer Ion
Water
3 Exchange Alcohol (IPA)
Ion exchange converts
O2 the post-RO water to UPW
Recycle
water with a combination
Rich Air of cation and anion
resins used to remove positive and negative ions. 4 High-Purity
Filters are used to remove any particles that Acids & Bases
Hydrogenator
could come off the ion exchange resin beds. Hydrofluoric Acid
r

Final filters may be used for last chance particle Core Filter(s) Location Purpose Features Benefits Advantages
Hydrogen
High-Purity
Solvent
capture from the system to ensure thePurification
very best Abso-Mate Acids & Bases
UPW quality. Sulfuric Acid
Poly-Mate
Post RO, most filters used
de
xi are hydrophilic with Incoming mains Polypropylene Capture large particles Protection of reverse
ro Poly-Mate
Liquid Plus 1
water & pre-RO depth media in raw materials osmosis system High-Purity
Pe
Extractor
a polypropylene structure. It’s important to Acids & Bases
Polyflow
note that somee ncompanies may decide to use
rog
Hydrogen Peroxide
all-fluoropolymer filters if they use an aggressive Polyflow-G
line yd
sanitization method, like ozone, to kill any
H
bacteria in the line.
Purification Purification
Proflow II-E
2
Storage tank Hydrophobic PTFE
Venting of air
Prevent unwanted
Column 2 Column 1 Proflow II-E Select air vent membrane pressure buildup
Services
Clariflow-WE
Post ion Hydrophilic PES Capture fine Protect downstream
*UPW refers to ultra-pure deionized water used Clariflow-E 3 exchange resin membrane particles coming off equipment and
in Microelectronics manufacturing capture (no wetting needed) ion exchange beds added process
Clariflow-E Select
Clariflow-E Hydrophilic PES Final filtration step
Selection Matrix
Final Tightest particle removal
4 membrane to help meet final
Clariflow-E Select filtration step to meet UPW standards
(no wetting needed) particle specification

Product Overview

|5
High-Purity Solvents
Storage
Tank
Introduction
Distillation

Isopropyl Alcohol (IPA) Distillation

3 4
Schematic
Hydrolyzer

l
Isopropyl Alcohol (IPA) is the most common
3 oho
solvent used in semiconductor manufacturing. It
Alc
yl
Absorber
may be used to rinse wafers in certain processes Selection Process
op Sulfur Trioxide
where water contact is not desirable. IPA is also Sulfate
pr Condensor
used to dry wafers and other Microelectronics
Iso
Esters
Sulfur Trioxide
devices since it will not streak or leave watermarks. Evaporator
While there are different methods of manufacturing
IPA, a common one is through the combination 2 Applications
of propene and sulfuric acid to create sulfate 1
esters. Parker melt blown and pleated depth DI Water Ultra-Pure
filters may be used to filter these raw materials. Propene Water (UPW)
The hydrolization process combines the sulfate High-Purity
esters and Ultra-Pure Water (UPW). A hydrophilic Solvents Isopropyl
filter may be used to filter incoming UPW. As the Sulfuric Ultapure Alcohol (IPA)
Acid
newly created IPA leaves the hydrolyzer, it may Dilute HF
pass through filtration prior to other process
steps including distillation.
High-Purity
Core Filter(s) Location Purpose Features Benefits Advantages Acids & Bases
The number of distillation steps will depend on the Abso-Mate Hydrofluoric Acid
level of purity required. Though not shown here, Poly-Mate
some manufacturers may use filters during or Incoming raw DI Water Polypropylene Capture large particles Protection of High-Purity
between distillation steps. Following distillation, Poly-Mate Plus 1 Acids &Oxidizer
Bases
materials depth media in raw materials absorption process
a series of filtration steps may be used to Polyflow O2
Sulfuric Acid
R
further reduce inline particle size and quantity. Rich Air
Polyflow-G
High-Purity
Final package filtration is a last chance particle Clariflow-WE Acids & Bases
removal step. This is typically where inline Storage Provide consistent
Hydrogenator
Hydrophilic PES Removal of particles in
Ultrapure Hydrogen Peroxide
particle counters will be used to monitor Clariflow-E 2 DI water source
DI Water of UPW to
membrane UPW down to 0.02
Aquesous HF microns
hydrolyzer
particle size and quantity. Here, filters will be Clariflow-E Select Anhydrous HF Final Hydrogen Solvent
tighter than upstream filters in the manufacturing
cid
Distillation
Chemflow-PE Purification
process. Micron rating will depend on the end
PTFE membrane on c A Services
oriFine particle removal ide
user particle specification. Chemflow-PE Select Pre and post Concentrated Protect and enhance
3 either HDPE
Aqueous HF or PP
u x
support structureofl ero
Proflow II-E distillation distillation process
dr P
Proflow II-E Select
Hy n
ge Selection Matrix
Chemflow-PE
Anthraquinone
+ Solvent
dro
Chemflow-PE Select PTFE membrane on Hy
Final filtration step
to help meet final Purification Purification
4 Final package either HDPE or PP Fine particle removal
Proflow II-E product particle Column 2 Column 1
support structure
specification
Proflow II-E Select Product Overview

|6
 Propene

High-Purity Acids & Bases Sulfuric

Acid
Ultapure
Dilute HF Introduction

Hydrofluoric Acid
5

Schematic
3

High-purity hydrofluoric (HF) acid begins with the DI Water Oxidizer

mixing and chemical interaction of sulfuric acid and Water
O2
dry fluorspar (CF2). The result of mixing those in a 4 SelectionRecycle
Process
rotary kiln is HF gas. The HF gas is condensed then 2 Rich Air
3 2
distilled to form anhydrous hydrofluoric acid.
Storage Hydrogenator
Ultrapure DI Water
In this diagram, the industrial anhydrous HF is delivered 3 Aquesous HF
via tanker or pipeline to become ultra-pure HF Anhydrous HF
Applications
Final
commonly used in semiconductor wafer etch and Hydrogen Solvent
id
Distillation
Ac
clean processes. Parker domnick hunter membrane Purification
Ultra-Pure
c
ori ide
filters with either HDPE or PFA structures may be 1 Concentrated Water (UPW)
used throughout the manufacturing process. Aqueous HF
flu ro x Liquid

dro Pe
Extract
High-Purity
Distillation is an important step in producing
H y en Solvents Isopropyl
ultra-pure hydrofluoric acid. The aggressive Anthraquinone
rog Alcohol (IPA)
nature of the acid combined with temperatures + Solvent
yd
high enough to vaporize the HF make this a H Purification Purification
challenging filter application. For that reason, Core Filter(s) Location Purpose Features Benefits Advantages
Column 2
High-Purity
Column 1
only 100% fluoropolymer filters can be used. Chemflow-PE
Acids & Bases
Hydrofluoric Acid
Chemflow-PE Select Optional PTFE membrane on More open ratings to
The HF vapor can pass through the PTFE membrane, Process particle
1 Incoming raw either HDPE or PFA capture large particles
then re-condense in to a purer form with ultra low Fluoroflow control High-Purity
materials support structure in raw materials
contaminants. As the ultra-pure concentrated HF Acids & Bases
Fluoroflow-HSA
exits the distillation process, a filtration step to Sulfuric Acid
remove additional particles may be present. Clariflow-WE
Provide consistent
Hydrophilic PES Removal of particles in High-Purity
Clariflow-E 2 DI water source of DIW to
From here, the ultra-pure concentrated HF membrane UPW down to 0.02 microns Acids & Bases
hydrolyzer
may be blended with ultra-pure water to various Clariflow-E Select
Hydrogen Peroxide
desired concentrations. Chemflow-PE
Parker domnick hunter filters ensure process Chemflow-PE Select Stage/ PTFE membrane on
Process particle
consistency and enable the HF manufacturer to 3 pre-filtration/ either HDPE or PFA Fine particle removal
Fluoroflow control Services
blending support structure
meet the final particle specification for their end
user customers. Fluoroflow-HSA
Fluoroflow High temp acid 100% fluoropolymer Temperature rating Coalesce water and
It’s important to note that while polypropylene 4
Fluoroflow-HSA distillation construction up to 180C particle removal
filters, like Parker’s Proflow-II-E, could be used Selection Matrix
in dilute HF, both HDPE and PFA are considered Chemflow-PE
to be more chemically robust and would typically PTFE membrane
Chemflow-PE Select Fine particle Final filtration step
be recommended. 5 on either HDPE or Fine particle removal
Fluoroflow removal to help meet final
PP support
Product Overview
Fluoroflow-HSA

|7
 Absorber
Column

High-Purity Acids & Bases

Acid
Dilution
DI Water
Introduction
Storage
2
Sulfuric Acid
Tank
3
Distillation
Schematic
Distillation Purifier 4
Column
Sulfuric
Hydrolyzer acid is highly used with either hydrogen
cid
Sulfur Trioxide
peroxide or ozonated UPW to create an intended Vaporizer
l A
ric
exothermic reaction. The added energy to this Selection Process
o ho
aggressive acid is ideal for removing hard-baked
Liquid
Sulfur Trioxide
lfu 4
lc u Degasification
l A wafers.
Storage Tank
photoresists and most organic contaminants
y
Storage
P S & Air Vent Filter
p
from the surface of silicon production Sulfur Trioxide
UH
Sulfate
pro Condensor
Esters
socreating sulfuric acid
A common method Iof 1 Sulfur Trioxide
Evaporator
Applications
begins by mixing oleum and steam to produce
sulfur trioxide vapor. Filters may be used to 5 Reverse
Osmosis Ultra-Pure
remove large particles and provide protection System 2 Water (UPW)
to the evaporator.
Reverse
DI Water
Core Filter(s) Location Purpose Features Benefits Osmosis Advantages High-Purity
The SO3 is condensed then vaporized again just System 1
Fluoroflow Solvents Isopropyl
before entering a series of purifier columns. The 100% fluoropolymer Temperature rating Protection of
1 Steam filter Alcohol (IPA)
number of purifiers will depend on the H2SO4 Fluoroflow-HSA construction up to
180C
Pretreatment absorption process
specification. Exiting the absorber column is pure Tank
Ion
concentrated sulfuric acid. UltapureFluoroflow-HSA High High-Purity
ter
Exchan
Dilute HF temperature 100% fluoropolymer Temperature rating Protect and enhance Acids & Bases
Fluoroflow-Select 2 a
acid construction up to 180C distillation process Hydrofluoric Acid
The pure concentrated acid is cooled and W
carefully diluted into usable concentrations. Fluoroflow-XL vaporization
u re Storage
From there, the acid goes through a series of Clariflow-WE
ra -P Tank
High-Purity
& Air
membrane filtration steps, each succeeding Hydrophilic PES t
Removal of particles inUl Provide consistent Acids Vent
& Bases
Filter
Clariflow-E 3 DI water
step tighter than the previous until particle membrane UPW down to 0.02 microns source of UPW Sulfuric Acid
DI Water specifications are met and the product is Clariflow-E Select
Oxidizer Ion
packaged for the end user. Chemflow-PE Water Exchange High-Purity
O2 Recycle Acids & Bases
Chemflow-PE Select Rich Air
Hydrogen Peroxide
Proflow II-E Stage/ PTFE membrane on
Process particle
4 pre-filtration/ either HDPE,PFA or Fine particle removal
Storage
ProflowHydrogenator
II-E Select control
Ultrapure DI Water blending PP support structure
Aquesous HF
Fluoroflow-HSA Services
Final
Fluoroflow-Select
Hydrogen Solvent
id
Distillation
Ac
Purification
Chemflow-PE
ric
ide
Concentrated
Aqueous HF
fluo Chemflow-PE Select
ro x Liquid
Final filtration step Selection Matrix
dro Pe5
Extractoron
PTFE membrane
Proflow II-E to help meet final
Hy en Final package either HDPE, PFA or Fine particle removal
Anthraquinone
og
Proflow II-E Select PP support structure
product particle
+ Solvent
dr specification
Hy
Fluoroflow-HSA
Purification Purification Product Overview
Fluoroflow-Select Column 2 Column 1

|8
 ra
Ult

High-Purity Acids & Bases

DI Water Oxidizer Ion
3 Exchange
O2
Water Introduction
Recycle
Rich Air

Hydrogen Peroxide
2
Storage Hydrogenator
Ultrapure DI Water Schematic
Aquesous HF
4
Anhydrous HF Final Hydrogen Solvent
Hydrogen peroxide is made in a series of steps.
Distillation
id 2
Ac
Purification
A hydrocarbon-based “work-solution” is fed to
Concentrated
the hydrogenator along with a stream of hydrogen o ric ide Selection Process
Aqueous HF
where hydrogenation occurs over a bed of Niflu ro x Liquid

dro Pe
Extractor
or Pd catalysts. 1
Hy ge
n
The first filtration step is used to capture catalyst
Anthraquinone
+ Solvent
dro
2
particles from the hydrogenated fluid. Hy Purification Purification
Applications

In the oxidizer, oxygen-rich air is introduced to the 2 Column 2 Column 1

Ultra-Pure
work solution to reverse the previous reaction. Water (UPW)
The resulting work-solution contains about 40%
H2O2 by weight as it goes into the liquid extractor.
Water is fed into the extractor and since the H2O2
High-Purity
Solvents Isopropyl
is miscible in water while the solvent is not, the
Alcohol (IPA)
water-peroxide layer can be removed and sent to
the purification columns. Core Filter(s) Location Purpose Features Benefits Advantages High-Purity
In the purification columns, the water-peroxide Abso-Mate Acids & Bases
mixture is further concentrated and purified. For Hydrofluoric Acid
Poly-Mate
UHP hydrogen peroxide, multiple columns may Incoming raw Polypropylene depth Capture large particles Protection of
be used. Poly-Mate Plus 1 High-Purity
materials media in raw materials evaporator
Polyflow Acids & Bases
Sulfuric Acid
Polyflow-G
Chemflow-PE High-Purity
Chemflow-PE Select Stage/ PTFE membrane on Acids & Bases
Process particle
2 pre-filtration/ either HDPE or PP Fine particle removal Hydrogen Peroxide
Proflow II-E control
blending support structure
Proflow II-E Select
Clariflow-WE Services
Provide consistent
Hydrophilic PES Removal of particles in
Clariflow-E 3 DI water source of UPW to
membrane UPW down to 0.02 microns
liquid reactor
Clariflow-E Select
Chemflow-PE
Selection Matrix
Chemflow-PE Select
PTFE membrane on Final filtration step
Final
Proflow II-E 4 either HDPE, PP or Fine particle removal to help meet product
Package
PFA support structure specifications
Proflow II-E Select
Fluoroflow Product Overview

|9
Services Introduction

Technical Support Group (TSG)

Schematic

In these industries, manufacturers and end-users face stringent Services Overview

environmental and operational compliances, where the trend is
to ensure low Volatile Organic Compounds (VOC) exposure and Selection Process
spillage of hazardous waste while providing a more user friendly
process environment. Combined with the market demands for high Laser particle size analysis
Quantitative particle counting can give an indication of the expected workload of a filter
quality products, this means that the raw materials and chemistries system. This can identify the need for prefiltration or the use of an alternative technology.
used in formulations result in higher manufacturing costs.
Applications
Parker domnick hunter is committed to providing comprehensive
technical support of our products through our global sales network Identification of the particulate loading within a process fluid or the analysis of filtrate Ultra-Pure
and dedicated technical support group. Our team of trained scientists, through various filtration grades and materials can identify the optimum filtration system.
Particulate analysis Specific particulates can also be identified through light microscopy and SEM to establish
Water (UPW)
engineers and technicians is available to answer questions on the
the contaminant source.
capabilities of our products, assist customers to select, specify and High-Purity
design filtration systems to meet specific user requirements, and Solvents Isopropyl
provide a range of advisory and troubleshooting services. Alcohol (IPA)
Energy-dispersive X-ray spectroscopy (EDS/EDX) and Fourier Transfer infra red (FTIR)
spectroscopy can be conducted to characterize retained materials on a filter media, aiding
We provide technical support to assist in training operators on a wide Advanced analytical analysis
range of activities related to using our products, system sizing and
in identification of the source of blockage material. Identification of metal ion extractables High-Purity
can be done with Inductively coupled plasma mass spectrometry (ICP-MS). Acids & Bases
performance optimization.
Hydrofluoric Acid
Results can be utilized to manipulate pre and final filter trains to Small-scale trials can be conducted with sample volumes of product under controlled
achieve the desired throughput and quality without over processing. laboratory or process conditions. This method is used to determine the optimum multi-stage High-Purity
Filterability index analysis filter system or determine the filter size required for a process batch or a continuous process. Acids & Bases
This allows the system to be specifically sized and designed to give optimum economies in Sulfuric Acid
both hardware installation and replacement element cost.

High-Purity
Where a process is altered through increased operational demand, for example through Acids & Bases
extension of a production campaign, higher production volumes or an increased number Hydrogen Peroxide
Existing system optimization
of product changes, Parker domnick hunter offers support to ensure the system remains
appropriate for these changed process demands.

Services
Often filtration is a critical step or control point within a process, therefore, when finished
product quality is not achieved the filter is often the first point of call. The Parker domnick
Fault diagnosis
hunter TSG group can provide a reactive service to enable rapid ‘root cause’ analysis and
assist in minimizing the risk of recurrence.
Selection Matrix

Product Overview

| 10
 High-Purity Chemicals Selection Matrix Introduction

Polyflow Membrane

Fluoroflow-Select
Membrane Select

Fluoroflow-HSA
Poly-Mate Plus

Fluoroflow-XF

Fluoroflow-XL
Chemflow-PE
embrane

Chemflow-PE

Chemflow-XF
epth bra Membr

Clariflow-WE
em ne

Clariflow-E

Proflow-II-E
Proflow-II-E
dD ES

Clariflow-E

Fluoroflow
Polyflow-G
a

Abso-Mate
M

Poly-Mate

Polyflow
Schematic

Polyflow
Polypro M

drophilic P

Select

Select
Pleate

Select
PTFE
ne
Hy Selection Process
Point of entry
Ultra-Pure Water

Pre-RO protection
Applications
Resin trap
Ultra-Pure
Final filter Water (UPW)

Raw material or industrial High-Purity

grade chemicals Solvents Isopropyl
Alcohol (IPA)
Steam
Acid/Base production and blending

High-Purity
Coalescing
Acids & Bases
Hydrofluoric Acid
Distillation
High-Purity
Acids & Bases
Venting Sulfuric Acid

Stage or Pre-filtration High-Purity

Acids & Bases
Blending Hydrogen Peroxide

Final packaging
Services
Raw material or industrial
grade chemicals
Solvent production
and blending

Stage or Pre-filtration
Selection Matrix
Blending

Final packaging
Product Overview

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PTFE Membrane Filter Cartridges Introduction

Chemflow®-PE Chemflow®-PE Select Chemflow®-XF

• Good flow rates • High flow rates • Highest flow rates in the industry for a 2.75” wide cartridge
• Good lifetime • Long lifetime • Long lifetime
• Wet-pack option for quick installation • Wet-pack option for quick installation • Wet-pack option for quick installation
Schematic
• PTFE/HDPE construction for chemical • PTFE/HDPE construction for chemical resistance • PTFE/HDPE construction for chemical resistance
resistance • 100% integrity tested in cleanroom environment • 100% integrity tested in cleanroom environment
• 100% integrity tested in cleanroom environment

Chemflow-PE provides a low metals, economical alternative to all-fluoropolymer The addition of the SELECT pleat technology provides a high-flow, low metals, and The asymmetric PTFE membrane provides unmatched flow rates and on-stream
cartridges. Ideally suited for final packaging of high-purity chemicals and solvents and economical alternative to all-fluoropolymer high surface area cartridges. Ideally suited life to help improve throughput and reduce filtration costs. Ideally suited for final Selection Process
most lower temperature chemical delivery and wet process (<60°C) applications. for final packaging of high-purity chemicals and solvents and many low temperature packaging of high-purity chemicals and solvents and many low temperature
chemical delivery and wet process (<60°C) applications. chemical delivery and wet process (<60°C) applications.

Fluoroflow® Fluoroflow®-HSA Fluoroflow® Select Applications

• Economical all-fluoropolymer cartridge
• High particle retention
• Wet-pack option for quick installation
• All-fluoropolymer for maximum chemical resistance
• 100% integrity tested in cleanroom environment
Fluoroflow is an economical all-fluoropolymer solution for low to medium flow high
purity chemical applications that require the highest chemical resistance. This filter is
ideally suited for nearly all high-purity chemical and solvent manufacturing
applications including those requiring a high temperature rating (150°C).
• Increased filtration area for longer life • Highest filtration area in a 2.75” width cartridge
• High particle retention • High flow rates for increased bath turn over Ultra-Pure
• Wet-pack option for quick installation • Wet-pack option for quick installation Water (UPW)
• All-fluoropolymer for most maximum chemical resistance • All-fluoropolymer for maximum chemical resistance
• 100% integrity tested in cleanroom environment • 100% integrity tested in cleanroom environment
High-Purity
This cartridge is a high surface area all-fluoropolymer solution for medium flow high The addition of the SELECT pleat technology increases filtration area and flow rate by over Solvents Isopropyl
purity chemical applications that require the highest chemical resistance and desire 70% versus our standard Fluoroflow to achieve the highest flow and longest filter life
longer life. This filter is ideally suited for nearly all high-purity chemical and solvent available in a 2.75” width cartridge. The all-fluoropolymer construction provides highly Alcohol (IPA)
manufacturing applications including those requiring a high temperature rating (150°C). efficient particle removal, excellent chemical resistance, and very low metal extractables.

High-Purity
Acids & Bases
Fluoroflow®-XF Fluoroflow®-XL Hydrofluoric Acid
• Highest flow rates in the industry for a 2.75” wide cartridge • Extra-high filtration area in a 3.25” wide cartridge
• High flux asymmetric PTFE membrane rates for increased flow • Highest flow rates for maximum bath turn over High-Purity
• Wet-pack option for quick installation • Wet-pack option for quick installation Acids & Bases
All-fluoropolymer for maximum chemical resistance Ultraclean option for absolute cleanliness
•
• 100% integrity tested in cleanroom environment
•
• 100% integrity tested in cleanroom environment
Sulfuric Acid

This cartridge provides excellent flow and chemical resistance for the most aggressive
applications up to 150 °C. Fluoroflow-XF is ideally suited for high-purity chemical
manufacturing processes and recirculated clean, etch, or plating applications where
particle removal efficiency is improved with high bath turnover.
Uses a larger diameter cartridge (3.25˝) combined with our unique SELECT pleating High-Purity
technology to achieve our highest surface area, highest-flow all-fluoropolymer filter.
Fluoroflow-XL is ideal for high-loading, aggressive, high-purity processes where performance
Acids & Bases
is dependent on high flow, efficient particle removal, and ultra-low metal extractables. Hydrogen Peroxide

Proflow™ II-E Proflow™ II-E Select Services

• Economical, high-purity chemical and • Economical, high-purity chemical and solvent filtration
solvent filtration • High surface-area SELECT pleating for excellent
• Good liquid and gas flow rates liquid flow rates
• Wet-pack option for quick installation • Wet-pack option for quick installation
• PTFE/ PP construction for high chemical resistance • PTFE/ PP construction for chemical resistance
• 100% integrity tested in cleanroom environment • 100% integrity tested in cleanroom environment Selection Matrix
Proflow-II-E uses a PTFE membrane with high purity polypropylene supports to An economical, yet high-performance filter cartridge for high-purity chemical and
provide an economical yet high-purity filtration solution for high-purity chemical, solvent applications, the Proflow II-E Select uses a PTFE membrane along with
solvent and gas applications. This filter is ideal for many high-purity chemical and polypropylene supports. With SELECT pleating, liquid flow rates are increased by
solvent manufacturing applications. up to 50% verses our standard Proflow II-E.

Product Overview

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Pleated Depth Filter Cartridges Introduction

Abso-Mate® Polyflow® Polyflow®-G

• Non-fiber releasing and low extractables
• Single-piece construction eliminates bypass concerns
• All-polypropylene construction offers wide chemical
compatibility with most chemicals
• Absolute rated for consistent and reliable performance (99.98%)
Cost-effective and absolute rated for capturing particles 0.2 to 70 μm in size. This
pleated melt blown cartridge is of all-polypropylene construction, and without adhesives
that could potentially contaminate fluids.
• High-retention depth matrix for economical prefiltration
• High flow rate and long service life reduce processing time
• Wide variety of configurations and ratings
• Broad chemical compatibility allows use in most applications
• Thermally bonded virgin polypropylene construction
minimizes extractables
Thermally bonded, absolute rated 100% virgin polypropylene to provide absolute
filtration cartridge features a random-fiber polypropylene depth matrix to provide
excellent retention efficiencies. Ideally suited for most high-purity chemical and
solvent pre-filtration applications.
• Depth matrix for economical prefiltration
• High flow rate and long service life reduce processing time
• Wide variety of configurations and ratings
Schematic
• Broad chemical compatibility allows use in most applications
• Thermally bonded virgin polypropylene construction
minimizes extractables
These nominal-rated depth filter cartridges are thermally bonded from 100% virgin
polypropylene. Polyflow-G’s high dirt-loading, random-fiber polypropylene depth media Selection Process
provides consistent particle retention and protection of upstream filters.

Fulflo® Poly-Mate™ Fulflo® Poly-Mate™ Plus Applications

• All Polypropylene construction maximizes • Fixed pore construction provides
chemical resistance ultimate particle retention
• Pleated surface area offers extended service life, • Offers high flow rates and extended service life Ultra-Pure
low pressure drop and high flow capacity • Non-fiber releasing enabling consistent quality filtration performance Water (UPW)
• One-piece, continuous to 40 inches length, integrally sealed • One piece integral construction for maximum cartridge integrity
pleated filter media
• Non-fiber releasing polypropylene construction High-Purity
A unique combination of polypropylene melt blown and spun-bonded pleated media A unique combination of polypropylene melt blown and spun-bonded pleated media
Solvents Isopropyl
provides retention ratings of 0.5 to 60 μm at 99% efficiency. provides high surface area at retention ratings of 0.25 to 100 μm at 90% efficiency. Alcohol (IPA)

High-Purity
Polypropylene Membrane Filter Cartridges Acids & Bases
Hydrofluoric Acid
Polyflow® Membrane Polyflow® Membrane Select
• Highly-retentive polypropylene membrane • Highly-retentive polypropylene membrane High-Purity
Wide range of configurations and ratings Unique SELECT pleating technology for higher flow and longer life
• •
Acids & Bases
• Wet-pack option for quick installation • Wet-pack option for quick installation
• 100% thermally welded virgin polypropylene construction • 100% thermally welded virgin polypropylene construction
Sulfuric Acid
• 100% integrity tested in cleanroom environment • 100% integrity tested in cleanroom environment
This all-polypropylene filter cartridge is optimized for use in certain electronics Polyflow-Membrane-Select is a higher surface area, all-polypropylene filter cartridge ideal High-Purity
applications such as the manufacturing of high-purity solvents and most G or I-line
photoresists. Every cartridge is fabricated in a clean room environment, pre-flushed
for use in certain electronics applications such as the manufacturing of high-purity solvents
and most G or I-line photo resists. Every cartridge is fabricated in a clean room environment,
Acids & Bases
with 18 megohm-cm ultrapure DI water, and 100% integrity tested. pre-flushed with 18 megohm-cm ultrapure DI water, and 100% integrity tested. Hydrogen Peroxide

Hydrophilic PES Membrane Filter Cartridges

Services
Clariflow®-E Clariflow®-E Select Clariflow®-WE
• High-retention hydrophilic PES membrane • High-retention hydrophilic PES membrane • Economical filtration
• Good flow rate • Unique SELECT pleating technology for high flow rate and increased life • High-retention hydrophilic PES membrane
• DI water and dilute acids and bases • DI water and dilute acids and bases • DI water and dilute acids and bases
• Rating down to 0.02 microns • Rating down to 0.02 microns • Rating down to 0.04 microns Selection Matrix
• 100% integrity tested in cleanroom environment • 100% integrity tested in cleanroom environment • 100% integrity tested in cleanroom environment

Clariflow-E filter cartridges are optimized for semiconductor DI water and dilute Clariflow-E-SELECT filter cartridges are optimized for high-flow microelectronics DI Clariflow-WE filter cartridges are an economical option for filtering DI water filtration
aqueous-based chemicals. A mirrored-anisotropic hydrophilic PES (Polyethersulfone) water and dilute aqueous-based chemical microelectronics applications. The SELECT and other dilute aqueous solutions. The filter features a hydrophilic PES membrane
membrane allows for quick and convenient startup without the need for pre-wetting. pleated, mirrored-anisotropic hydrophilic PES (Polyethersulfone) membrane enables and all polypropylene support structure for cost efficient and convenient filtration.
quick and convenient startup without the need for pre-wetting. Product Overview

| 13
Worldwide Filtration Manufacturing Locations
Introduction
North America Process Filtration Engine Filtration & Asia Pacific Latin America
Compressed Air Treatment domnick hunter Process Filtration Water Purification Australia Parker Comercio Ltda.
Gas Separation SciLog Racor Castle Hill, Australia Filtration Division
Oxnard, CA Dewsbury, England +61 2 9634 7777 Sao Paulo, Brazil
& Filtration Division
Airtek/Finite/domnick hunter/Zander 805 604 3400 +44 (0) 1924 487 000 www.parker.com/australia +55 12 4009 3500 Schematic
www.parker.com/processfiltration www.parker.com/rfde www.parker.com/br
Lancaster, NY
716 686 6400
China
Racor Research & Development Shanghai, China Pan American Division
www.parker.com/faf Water Purification +86 21 5031 2525 Miami, FL
Stuttgart, Germany
Balston Village Marine, Sea Recovery, +49 (0)711 7071 290-10 www.parker.com/china 305 470 8800
www.parker.com/panam Selection Process
Haverhill, MA Horizon Reverse Osmosis
978 858 0505 Carson, CA India
www.parker.com/balston
Hydraulic Filtration Chennai, India
310 637 3400
Hydraulic Filter +91 22 4391 0700
www.parker.com/watermakers
Arnhem, Holland www.parker.com/india Africa
Engine Filtration +31 26 3760376
Aeroport Kempton Park, South Africa
Parker Fowler +27 11 9610700
Racor www.parker.com/hfde Applications
Modesto, CA Europe Bangalore, India
+91 80 2783 6794
www.parker.com/africa
209 521 7860 Urjala, Finland
www.parker.com/racor Compressed Air Treatment +358 20 753 2500 www.johnfowlerindia.com
Ultra-Pure
Holly Springs, MS
domnick hunter Japan Water (UPW)
662 252 2656 Filtration & Separation Condition Monitoring Tokyo, Japan
www.parker.com/racor Gateshead, England Parker Kittiwake +81 45 870 1522
+44 (0) 191 402 9000 West Sussex, England www.parker.com/japan High-Purity
Hydraulic Filtration
www.parker.com/dhfns +44 (0) 1903 731 470 Solvents Isopropyl
www.kittiwake.com Korea Alcohol (IPA)
Hydraulic & Fuel Filtration Parker Gas Separations Hwaseon-City
Metamora, OH Etten-Leur, Netherlands +82 31 359 0852
+31 76 508 5300 Process Filtration
419 644 4311
www.parker.com/dhfns
www.parker.com/korea High-Purity
www.parker.com/hydraulicfilter domnick hunter Process Filtration Acids & Bases
Parker Twin Filter BV Singapore
Laval, QC Canada Hiross Zander Jurong Town, Singapore Hydrofluoric Acid
450 629 9594 Essen, Germany Birtley, England +65 6887 6300
www.parkerfarr.com +49 2054 9340 +44 (0) 191 410 5121 www.parker.com/singapore
www.parker.com/hzfd www.parker.com/processfiltration High-Purity
Velcon Thailand
Colorado Springs, CO Padova, Italy Acids & Bases
Bangkok, Thailand
719 531 5855 +39 049 9712 111 +66 2186 7000 Sulfuric Acid
www.velcon.com www.parker.com/hzfd www.parker.com/thailand
High-Purity
Acids & Bases
Hydrogen Peroxide

Services
© 2016 Parker Hannifin Corporation.
All rights reserved.
Parker Hannifin Corporation Parker Hannifin Manufacturing Ltd
GL_HPGuide_1/16 Rev. 1B domnick hunter domnick hunter
Process Filtration - North America Process Filtration - Europe Selection Matrix
2340 Eastman Avenue Durham Road
Oxnard, California, USA 93030 Birtley, Co. Durham
toll free: +1 877 784 2234 DH3 2SF, England
phone: +1 805 604 3400 phone +44 (0)191 4105121 Product Overview
email: dhpsales.na@parker.com email: dhprocess@parker.com

www.parker.com/processfiltration