Professional Documents
Culture Documents
BiS Seed Layer For Thin Chalcogenide Films
BiS Seed Layer For Thin Chalcogenide Films
Chemically deposited ZnS thin films: application as substrate for chemically deposited Bi2S3,
This content has been downloaded from IOPscience. Please scroll down to see the full text.
(http://iopscience.iop.org/0268-1242/7/2/011)
View the table of contents for this issue, or go to the journal homepage for more
Download details:
IP Address: 131.238.16.30
This content was downloaded on 13/08/2014 at 03:26
Abstract. Chemical deposition of good quality ZnS thin films from aqueous
Solutions containing zinc sulphate, NH,/NH,CI buffer (pH IO). triethanolamine and
thioacetamide is described. It is shown that the presence of these films on glass
substrates offers various advantages in the case of chemically deposited metal
sulphide thin films: (i) improved adhesion of Bi,S, thin films. which is vital for
growing films of thickness > 0.2pm for semiconductor applications and in metal
sulphide thin film (MSTF) photography based on photoaccelerated chemical
deposition: (ii) improved adhesion of Cu,S films, offering the choice of different
shades of colours for the same integrated transmittance in the visible region of
- 2 0 % in solar control coatings and the possibility of multiple-dip deposition of
Cu,S films to enhance the film thickness, enabling the realization of Solar
absorptance of -90% and (iii) reduced reflectance in the visible light which can
reduce the glare from PbS solar control coatings and improve the solar
absorptance i n thicker PbS coatings and offer better contrast in MSTF photography.
1 . lniroductlon films. The presence of the ZnS films has been found to
solve the problem of poor adhesion of Bi,S, and Cu,S
ZnS is a material with an optical bandgap 3.7 eV [I] and film on the glass substrates, while offering optical charac-
a refractive index 2.37 for the visible region [2]. The teristics desirable for various applications in the
combination of these properties has led to a wide range of ZnS-Bi,S,, ZnS-Cu,S and ZnS-PbS multilayer struc-
applications for ZnS films: Mn-doped electroluminescent tures. The details of optical, electrical and structural
panels, Ag-, Cu-, AI- or In-doped cathodoluminescent characteristics of the ZnS thin films and the effect of post-
panels, hetero-epitaxial ZnS films on Si, GaAs or Ge as deposition processing on these characteristics will be
electro-optic modulators and blue luminescent diodes, in reported subsequently.
ZnS-CdS superlattices and in multilayer optical coatings
requiring alternate layers of ZnS films of precisely con-
trolled thickness and flatness [3]. While the deposition of 2. Experimental details
ZnS thin films by thermal evaporation of the ZnS powder
samples containing the appropriate dopants, at a
vacuum of - Torr and at substrate temperatures of
50-250 "C, remains the most popular thin film technique
2.1. Deposition of the films
[4-61, a range of other vapour phase techniques-such 2.1.1. ZnS thin films. The solution composition found
as electron beam evaporation, sputtering, spray pyroly- suitable for the deposition of these films on glass sub-
sis, chemical vapour deposition, hot-wall epitaxy, close- strates at deposition temperatures ranging from 25 "C
spaced epitaxy and molecular beam epitaxy-and liquid (for duration of deposition of up to 36 h) to 75 "C (of up
phase techniques such as liquid phase epitaxy, chemical to 4 h) is: 2.5 ml of 1 M zinc sulphate solution, 2.2 ml of
bath deposition, electrochemical deposition and succes- NH,/NH,CI (pH 10) buffer solution, 2.7 ml of 50%
sive ionic layer adsorption and reaction process-have triethanolamine (TEA) and 1 ml of 1 M thioacetamide
also been reported [3]. (TA) and the rest distilled water to make up to 50 ml by
In this paper, we shall report on the use of chemically volume.
deposited ZnS thin films as a substrate film on glass for The conditions of deposition for ZnS thin films used
the chemical bath deposition of Bi,S,, C u S and PbS in the present work, samples A-G, are listed in table 1.
026&1242/92/020239+06 804.50 @ 1992 IOP Publishing Ltd
239
P K Nair and M T S Nair
Table 1. Details of t h e chemical deposition of ZnS. ZnS-Bi,S,, 2nS-Cu.S and ZnS-PbS thin films
Thin film deposition Thickness (pn)
Substrate side
Sample Duration Temperature appearance in Substrate Top
label Substrate Material ( h , min) ("C) daylight ZnS film
The test samples of ZnS as well as ZnS-Bi,S,, ZnS-Cu,S 2.1.3. Cu,S thin films. Details of the deposition of Cu,S
and ZnS-PbS films were deposited on 7 5 m m x thin films from aqueous solutions of copper(I1) chloride,
25 mm x 1 mm glass slides for optical transmittance and TEA, NH, (as. 30%), NaOH and thiourea (TU)have been
reflectance measurements, hut the films were also depo- discussed in [SI. Here again, the detachment of the film
sited inside pairs of sheet glass of 300 mm x 200 mm x from glass substrates at longer durations of deposition
4 mm for assessing the uniformity of the films and for the has prevented us from achieving film thicknesses z
photographic technique to be described below. 0.3 pm. Further, the use of a protective polymer coating
over the film, as required in the solar control and solar
absorber coating applications of the film, has been found
2.1.2. Bi,S, thin films. Details of the deposition of these
to transfer the film on to the polymer foil in peeling tests.
films from bismuth nitrate solution in TEA and TA have
Deposition conditions stated for samples K-M in table 1
been described in ['I]. The major problem in the deposi-
show that the presence of the ZnS substrate film provides
tion of these films has been the detachment of the films
the necessary mechanical stability t o the Cuss films for
from glass substrates at durations of deposition > 7 h
longer deposition periods and multiple dip depositions
at 25 "C, which corresponds to a film thickness of
so that higher film thicknesses may be attained. Samples
-0.16p1. A greater film thickness of -0.28pm has
K-M have been air annealed at 150 "C for 1 h to reduce
been obtained in double-dip deposition in which the
the near infrared transmittance of these films following
substrate, after deposition of a thin film, grown up to
the results in [S, 91.
terminal thickness, is transferred to a fresh solution for
further deposition, but with the persistent risk of the
detachment of the film during the second dip. This 2.1.4. PhS thin films. These films were deposited from
limitation may be overcome if a thin film of ZnS is aqueous solutions of lead acetate, NaOH, TEA and TU, as
present over the glass substrate, as seen in the case of detailed in previous papers [lo, 111. While PbS films
samples I and J in table 1. show good adhesion to glass substrates, the reflection
240
Chemically deposited Z n S thin films
Table 2.Effect of ZnS substrate film on the solar optical characteristics of ZnS-Cu,S (K-N)
and ZnS-PbS (P and R ) films.
Sample A (%)
__
21.5 5.0 6.5 17.0 15.0 12.5 72.5
22.0 5.5 8.5 15.0 15.0 12.0 73.0
19.0 4.0 5.5 23.5 12.5 15.5 72.0
3.0 0.0 4.0 15.0 1.5 10.0 88.5
26.0 53.0 32.0 32.5 40.5 32.5 27.0
27.5 52.0 19.0 35.0 40.5 28.0 31.5
10.0 45.5 18.0 29.0 29.5 24.0 56.5
14.0 45.0 6.0 27.0 30.5 17.5 52.0
losses as high as 40% for the visible and near-infrared absorptance in the solar spectral range, qai,R,,, and A
spectra for substrate-side incidence reduce the sensitivity from the transmittance and reflectance curves and the
in PhS photodetectors, produce strong glare from PbS spectral irradiance values of air mass (AM) 2 solar spectra,
solar control coatings and reduce the upper limit of solar have been discussed in previous articles [9-121.
absorptance to within 60% [ I l l . Samples P and R The computerized system used for the photocurrent
(tables 1 and 2) show definite advantages in this direc- response measurement on Bi,S, thin films has been
tion. discussed in [7, 131.
2.2. Characterization
For this, films from one side of the test samples were
removed with cotton swabs dipped in dilute acids. The
spectra were recorded on a Shimadzu 340 UV-VIS-NIR
spectrophotometer with air as reference for transmit-
tance measurements and a front-aluminized mirror as
reference for near normal (5") specular reflectance mea-
surement. In the case of ZnS-only coatings, the spectra
were recorded for film side incidence of the light beam, .5 Le 1.5 2.8 2.5
and in all other cases the incidence was from the glass Y."FiLngth cpm,
substrate side, bearing the intended applications in mind. Figure 1. Optical transmittance ( T % ) characteristics (film
The computations of the integrated transmittance side incidence) of chemically deposited ZnS thin films on
and reflectance in the visible region, Ki, and RVi,respec- glass substrates, obtained under different conditions of
tively, and the integrated transmittance, reflectance and deposition a s given in table 1
241
P K Nair and M T S Nair
R U 1 I I.BL.OI
1.8L.86
I C".)
I .BE.87
I . BL-m
c.- I I . 8E.89
I.BE.I8
I.BE-* I
I-BE-IP
- -- -- -
Flgure 2. Near normal specular reflectance ( R % ) of Flgure 4. Photocurrent response of the as-prepared Bi,S,
selected ZnS thin films of figure 1 samples H, I and J of Figure 3. under 1 V bias and
800 W m-' tungsten halogen illumination (during
10LL300 5) with silver print electrodes (length =
separation).
We consider that optimization of the deposition bath
and temperature may make possible good quality ZnS
films of thickness >0.15 pm. In the present work, where post-deposition processing of the film to make it suitable
our intention has been to illustrate the application of for electronic device applications.
these films as a substrate for the chemical deposition of The estimated film thickness for the film J is
8 as compared with r 0 . 1 6 pm for the film H
~ 0 . 3 pm
other metal sulphide films, thickness <0.14 pm corre-
sponding to samples A-C has been found t o be sufficient. obtained on a glass substrate. The main advantage of
having the ZnS substrate film on the glass substrate is
that the Bi,S, film does not peel off during rinsing at the
3.2. ZnS-Bi,S, thin films end of the deposition. There is also a reduction in the
The opticaltransmittanceand reflectance spectra and the reflection losses for substrate side incidence in these films,
photocurrent response of the us-prepurcdfilms (samples I which may be advantageous in photodetector Or solar
and J, table I) are shown in figures 3 and 4, respectively. absorber (ZnS-Ri,S,-Cu,S) applications. The behaviour
We have reported earlier that the as-prepared B~,s, films of the photocurrent response in these films is essentially
are amorphous and can be transformed to crystalline the same as that of Bi,S,-only coatings: the photo- and
state with an accompanying enhancement of electrical dark-currents increasing by many orders of magnitude
conductivity of up to lo7 times by annealing at 300 "Cin when the thickness increases by a factor of 2 or 3 [7].
a nitrogen atmosphere of Torr for c141, The This effect is attributed to the drastic enhancement of
major attraction of Bi,S, thin films is the possibility of carrier mobility with increasing thickness in films of
submicron range of thickness [l5].
242
Chemically deposited ZnS thin films
243
P K Nair and M T S Nair
244