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Hindawi

Advances in Materials Science and Engineering


Volume 2023, Article ID 6525507, 10 pages
https://doi.org/10.1155/2023/6525507

Research Article
Investigation of Structural, Electronic, and Optical Properties of
Chalcogen-Doped ZrS2: A DFT Analysis

Sayedul Hasan,1 Mohammad Tanvir Ahmed ,2 Abdullah Al Roman,2 Shariful Islam ,1


and Farid Ahmed1
1
Department of Physics, Jahangirnagar University, Dhaka 1342, Bangladesh
2
Department of Physics, Jashore University of Science and Technology, Jashore 7408, Bangladesh

Correspondence should be addressed to Shariful Islam; s_islam@juniv.edu

Received 2 December 2022; Revised 7 February 2023; Accepted 9 February 2023; Published 23 February 2023

Academic Editor: Samia A. Gad

Copyright © 2023 Sayedul Hasan et al. Tis is an open access article distributed under the Creative Commons Attribution License,
which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
Te electrical and optical characteristics of a ZrS2 monolayer doped with chalcogen atoms (O, Se, or Te), where dopants are
introduced by substituting the S atom, are examined on the basis of the density functional theory. Te semiconductors pristine
ZrS2 and O, Se, and Te-doped ZrS2 monolayers possessed indirect band gaps of 1.187 eV, 1.227 eV, 1.146 eV, and 0.922 eV,
respectively. According to the formation energy, the O-doped ZrS2 monolayer is more stable compared to Se-doped and Te-doped
ZrS2 monolayers. Te optical properties are very similar for both the undoped and doped ZrS2 monolayers. Te absorption
coefcient and optical conductivity are the highest in the ultraviolet energy region. Te designed materials are potentially suitable
for UV photodetection and UV fltering applications.

1. Introduction suggested to be opened using a variety of techniques,


including the in-plane strain application [20, 21] and
Te approach of investigation on two-dimensional (2D) external electric feld application along with chemical
materials, including graphene [1], silicone [2, 3], boron modifcation [22–24]. In contrast, 2D semiconductor
nitride (BN) [4, 5], and transition metal dichalcogenide materials made of stacked transition-metal dichalcoge-
(TMD) monolayers [6], was sparked by the discovery of nides have a naturally found band gap, and recent de-
graphene in 2004 [7, 8]. A novel generation of transistors, velopments on feld efect transistors (FET) [11] based on
optoelectronic (OE) devices, energy storage, and gas a TMD monolayer have drawn intense research atten-
sensors are just a few of the exciting potential for in- tion. A transition metal dichalcogenide (TMD) layer (M)
dustrial applications that these 2D materials provide, in is inserted between two chalcogens (X) layers to form the
addition to opening up new felds [6, 9–13]. One of the hexagon, with alternately placed M and X atoms at the
most robust materials ever tested is graphene, which has corners. Each TMD layer is made up of three atomic
sp 2-hybridized orbitals and a 2D honeycomb network layers.
[14]. Graphene ofers a lot of potential for ultrahigh- Tese molecular layers in bulk MX 2 are kept by the
speed electronics, according to its unique electrical Van der Waals force with a graphite-like Bernal stacking.
characteristics, such as the quantum Hall efect (half- It is interesting to note that as the dimensionality goes
integer), charge carriers, high migration rates, and sat- from 3D to 2D, MoX 2 and WX 2 experience alteration
uration velocities [15–19]. However, because graphene between an indirect band gap and direct band gaps from
has no band gap, it cannot be used in many optoelec- 1.5 to 2.0 eV [25–28] which are appropriate for opto-
tronic devices. Te band gap of graphene has now been electronic (OE) applications and energy harvesting
2 Advances in Materials Science and Engineering

devices [27, 28]. Recently, an experimentally manufac- revealed that the calculated lattice constant a is 3.68 Å and
tured novel 2D TMD called the ZrS 2 monolayer was the calculated Zr-S bond length is 2.57 Å, which satisfes
created [29, 30]. In order to investigate its electrical previous studies [38, 39]. Additionally, one sulfur atom in
transport capabilities, high and fast-responsive hexag- the pristine monolayer of ZrS2 is replaced by other chalcogen
onal ZrS 2monolayer-based FET devices have been syn- atoms such as O, Se, and Te. Te bond length varies and the
thesized [31]. According to Ahmad et al., ZrS 2 lattice constant changes very little as a result of chalcogen
nanostructures are potential candidates for high short- atom doping concentration. Te bond length for O-doped
circuit current, large-area solar cell applications [32]. ZrS2 ranges from 2.557 Å to 2.598 Å. Similar to this, for Se-
However, the lack of thorough study work on doped 2D doped ZrS2 and Te-doped ZrS2, the bond length varies from
ZrS 2 hinders future improvements and applications. 2.531 Å to 2.593 Å and from 2.559 Å to 2.579 Å, respectively.
Tere are still many unknown doped ZrS 2 parameters Te lattice constant decreases due to O doping whereas
that are crucial for material design, including in-plane increases after Se and Te doping. Tis variation occurred due to
stifness, optical reaction, adsorption coefcients, Pois- the variation of the dopant diameter. O ion has a lesser diameter
son’s ratio, and geometrical efect on the band structure. compared to S, Se, and Te, i.e., O occupies a lesser volume
Terefore, there is an urgent need for a theoretical compared to other chalcogen ions, which can cause the decrease
analysis of these features. Moreover, we feel that the in the cell volume as well as lattice constants. Hence, the lattice
doped ZrS2 monolayer merits special consideration given constants can vary with the variation of dopant concentration.
the intricate and adaptable electrical architectures of 2D Due to 3.7% doping, a slight change in lattice constants is
TMD monolayers. observed. Similarly, the lattice constant increases due to Se and
In this study, we focus on the chalcogen-doped ZrS2 Te doping due to their larger ionic diameter.
monolayer’s structural, electrical, and optical characteristics Table 1 lists the specifc characteristics, including the
via the density functional theory (DFT) analysis. Our in- computed lattice constants (a), average bond lengths be-
terest in studying the consequences of dopants on various tween Zr and the closest S and X atoms (DZr-S and DZr-X,
properties of ZrS2 was inspired by the fact that, to our best respectively), and the formation energy (EForm). Table 1
knowledge, there has not yet been a thorough exploration of demonstrates that the link length rises as atomic radius
ZrS2 monolayers doped with chalcogen atoms. rises. For O-doped ZrS2, Se-doped ZrS2, and Te-doped ZrS2,
the bond length between the nearest Zr and the X-doped
2. Computational Details atom (DZr-X) is 2.12 Å, 2.69 Å, and 2.93 Å, respectively. Te
formation energy EForm can be obtained from the following
Te DFT analysis is performed via the Cambridge Serial Total equation [40–43]:
Energy Package (CASTEP) code [33–35], and for the exchange-
EForm � Edoped − Epristine + n μS − μX 􏼁. (1)
correlation correction, the generalized gradient approximation
of the Perdew–Burke–Ernzerhof method was utilized [36]. Te Here, Edoped is the total ground state energy of X (X � O,
Broyden–Fletcher–Goldfarb–Shanno (BFGS) minimization al- Se, and Te)-doped ZrS2, Epristine is the total ground state
gorithm was used to analyze the geometrical parameters by energy of the pristine ZrS2, μX andμS represent the chemical
optimizing the pristine ZrS2 and X-doped ZrS2 (X = O, Se, and potentials of the X (O, Se, and Te) and S atoms, and n is the
Te) structures [37]. Te plane wave cutof energy of 600 eV is number of S atoms replaced by O, Se, and Te atoms. From
chosen for the plane wave expansion and the 3 × 3 × 1k-points Table 1, we can see that O-doped ZrS2 has the most stable
grid is maintained by the Monkhorst–Pack scheme [37]. Te structure and Te-doped ZrS2 has the least stable structure.
tuning of cell parameters as well as atomic positions are per-
formed until the doping of the residual force is below 0.01 eV/Å
and till the convergence energy of 2 × 10−5 eV between two 3.2. Mulliken and Hirshfeld Charge Analysis. Te Mulliken
stages is reached. Two ZrS2 layers and X-doped ZrS2layers are charge analysis not only ofers an objective standard for atom-
separated by a distance of 29 Å vacuum region to avoid in- to-atom bonding but also aids in determining if a bond is
terlayer interactions. In order to explore X doping in the covalent or ionic. A covalent bond is indicated by a higher bond
monolayer of ZrS2, it is designed with a supercell consisting of population, whereas a lower bond population indicates an ionic
3 × 3 × 1two-dimensional (2D) unit cells containing 18 sulfur bond formation. Other facets of the ionic character can be
atoms and 9 zirconium atoms where 1 sulfur atom is replaced by measured using the efective ionic valance, that is, the gap
X atom, as shown in Figure 1. Te valance electrons for Zr, S, O, between the conventional ionic charge as well as the Mulliken
Se, and Te are 4p6 5s2, 3s2 3p4, 2s2 2p4, 4s2 4p4, and 5s2 5p4, charge here on anion species. Greater values above zero show an
respectively. For each system of doping, S atom is substituted by increase in covalency, whereas a value of zero represents the ideal
a dopant atom maintaining the percentage of doping to 3.7%. ionic bonding [44, 45]. Mulliken charge analysis has been carried
out to observe the charge distribution of the pure and chalcogen-
3. Results and Discussion doped ZrS2, and the average Mulliken charge of every element is
displayed in Table 2.
3.1. Optimized Structures. Figures 1(a)–1(e) show the top Mulliken charge illustrates the partial atomic charges
and side views of the ZrS2 monolayer and X-doped ZrS2. that result from diferences in electronegativity inside
After total energy relaxation, the results of the optimization molecules. When two atoms with diferent electronegativ-
of the pristine ZrS2 unit cell of the space group p63/mnc ities combine, the atom with a higher electronegativity
Advances in Materials Science and Engineering 3

(a) (b)

(c) (d)

(e)

Zr S O Se Te
Figure 1: Optimised structures of the top and side view of the (a) pristine ZrS2 and (b)–(d) O, Se- and Te-doped ZrS2 monolayer,
respectively.
4 Advances in Materials Science and Engineering

Table 1: Structural parameters (lattice constants (a), the average bond length between Zr and the nearest S atoms (DZr-S), the bond length
between nearest Zr and the X atom (DZr-X), and the formation energy (EForm)) of the pristine and single-doped ZrS2 structure.
X-doped ZrS2 a (Å) DZr-S(Å) DZr-X(Å) EForm in eV
Pristine 11.10 2.57 0 −37.87
X�O 11.03 2.58 (2.557 to 2.598) 2.12 −1.45
X � Se 11.12 2.57 (2.559 to 2.579) 2.69 0.82
X � Te 11.15 2.56 (2.531 to 2.593) 2.93 1.35

Table 2: Mulliken and Hirshfeld charges of pristine and chalcogen-doped ZrS2.


Mulliken charge analysis Hirshfeld charge analysis
Species
ZrS2 ZrS2@O ZrS2@Se ZrS2@Te ZrS2 ZrS2@O ZrS2@Se ZrS2@Te
S −0.36 −0.38 −0.36 −0.36 −0.16 −0.17 −0.16 −0.17
Zr 0.72 0.73 0.72 0.72 0.32 0.32 0.32 0.32
O −0.73 −0.32
Se −0.21 −0.12
Te 0.00 −0.03

attracts the bound electrons, turning it partially negative is located at the Γ point, although the CBM lies at the Q
while turning the other partially positive. Te S atom is more point, which shows the X-doped ZrS2 (X � O, Se, and Te)
electronegative in pure ZrS2, which means it will be partially monolayers with a band gap of 1.227 eV, 1.146 eV, and
negative while the Zr atom is partially positive. Chalcogen 0.922 eV, respectively. Te band gap is increased for X � O-
atoms are more electronegative than the transition metal doped ZrS2 than pristine ZrS2, but the other two X � Se and
atom Zr in chalcogen-doped ZrS2. As a result, the Zr atoms Te-doped ZrS2 are decreased which means the VB and CB
are partially positive and the chalcogen atoms are partially are moved towards Fermi levels (EF), which is described by
negative. Using the Mulliken analysis scheme, these partially a reduction of the band gap as the confnement of electrons
positive and negative values are listed in Table 2. After and holes increases and the size of the doped element
doping X � O, Se, and Te, it is observed that the partially decreases [49].
positive and negative charge values of Zr and S atoms have
altered, but the charge distribution of the doped ZrS2 sheet
3.4. Density of States (DOS) Analysis. By examining the
has remained almost the same. Te interaction of the doped electron energy states close to the Fermi level (EF), DOS
atom causes the electron density in ZrS2 to deform, causing
analysis is the most fundamental way of determining
this change.
whether a material is an insulator or a metal. If there is
Te Hirshfeld population analysis (HPA) scheme divides the
a continuous number of states present in EF, which shows
deformation density among the atoms of a molecule to express
that there is no band gap, then the material will behave in
atomic charges [44]. According to the Hirshfeld charge distri-
a metallic pattern. On the other hand, the absence of energy
bution study shown in Table 2, the charge state of Zr is positive,
levels in EF suggests the existence of a band gap, which
but the charge states of the chalcogen atoms (S, O, Se, and Te) are suggests that the material in question is either a semi-
negative. Te partially positive and negative charge values difer conductor or an insulator.
between the HPA scheme and the Mulliken scheme because
Figure 3 shows the results of our analysis of the pristine ZrS2
these two analysis schemes are distinct from one another. HPA is
sheet’s total density of states (T-DOSs) and partial density of
less dependent on the basis set than Mulliken charge
states (PDOSs) before and after doping. While the S-3p orbitals
analysis [46].
have the largest presence in the valance band (VB), the Zr-3d
orbitals have the highest contribution to the conduction band
3.3. Band Structure Analysis. In Figure 2, we exhibit the (CB) (Figure 3(a)). A situation is very similar to the one shown in
pristine ZrS2 monolayer’s energy band structures and doped Figure 3(b), in which one of the S atoms is replaced by an O
ZrS2 monolayer calculated by the PBE method. Figure 2(a) atom. However, when the S atom is replaced by Se or Te, the VB
demonstrates that the pure ZrS2 single layer is indeed a semi- is dominated by the S-3p and Zr-4p electrons, while the CB is
conducting material with a band gap of 1.187 eV, which is contributed by the Zr-3d electrons. Tere is a signifcant hy-
slightly greater than previous theoretical studies [47, 48]. Te bridization going on between the Zr-4p states and the S-3p states
valance band maximum (VBM) is located at the Γ point, in both the VB and the CB (Figures 3(c) and 3(d)). According to
whereas the conduction band minimum (CBM) is located at the the results of the T-DOSs, the CBM is further of from the Fermi
Q point of the Brillouin zone. level in O-doped ZrS2 than in pristine ZrS2. On the other hand,
Figures 2(b)–2(d) show the band structures of the X- the CBM is closer to the Fermi level in Se- and Te-doped ZrS2
doped ZrS2 sheet where we substitute one S atom with the than in pristine ZrS2, and the CBM is furthest near the Fermi
same chalcogen group atoms (X � O, Se, and Te). Te VBM level in Te-doped ZrS2.
Advances in Materials Science and Engineering 5

3 3

2 2

1 Eg=1.187 eV 1 Eg=1.277 eV
CBM CBM
Energy (eV)

Energy (eV)
VBM VBM
0 EF 0 EF

-1 -1

-2 -2

-3 -3

-4 -4
Γ F Q Z Γ Γ F Q Z Γ
K Points K Points
(a) (b)

3 3

2 2

1 Eg =1.146 eV 1
CBM Eg=0.922 eV CBM
Energy (eV)
Energy (eV)

VBM VBM
0 EF 0 EF

-1 -1

-2 -2

-3 -3

-4 -4
Γ F Q Z Γ Γ F Q Z Γ
K Points K Points
(c) (d)

Figure 2: Band structures of pristine and single-doped ZrS2. (a) ZrS2. (b) O-doped ZrS2. (c) Se-doped ZrS2. (d) Te-doped ZrS2.

3.5. Optical Properties. Te dielectric function can be used to 6.15 eV, which correspond to 0.123 μm, 0.125 μm, and
calculate frequency-dependent optical properties, such as 0.13 μm, respectively. A very slight red shit (blue shift) is
optical absorption, refectivity, loss function, and conduc- observed in the absorption edge at the low energy region for
tivity, where the Kramer–Kronig dispersion relation is used Se-doped ZrS2 and Te-doped ZrS2 (O-doped ZrS2), which
to calculate the dielectric function [50]. Te optical prop- satisfes the decrease (increase) of the band gap after doping.
erties of ZrS2 and X-doped ZrS2 materials are demonstrated Te absence of absorption in the 0 eV–1.16 eV range signifes
in Figure 4 for energy ranging up to 18 eV. According to annihilation [52]. Tese fndings indicate that such struc-
Figure 4(a), the absorption (α) explains the absorption of tures could be used in UV flters and UV photodetectors.
photons per unit distance in the medium [51]. Maximum Figure 4(b) shows the dielectric function (real) ε1 (ω)
absorption is found in the ultraviolet energy region. How- which represents the polarization of light in a material. It is
ever, all the structures showed a wide and fne absorption in maximum from near-infrared (0.29 eV) to visible photon
the range of 3–14 eV. Te maximum absorption coefcient (2.31 eV), particularly for green photons at about 2.31 eV.
of the pristine ZrS2 structure of 81733.86 cm−1 at 6.17 eV is Te dielectric function has multiple peaks, which dissipate
observed, which signifes that a fraction of the micron with increasing photon energy. It drops to a near value of
thickness of the ZrS2 is sufcient to absorb most of the zero value (0.28, 0.35, 0.29, and 0.36) at 6.70 eV for ZrS2 and
incident waves within the given energy range. Te corre- 6.79 eV, 6.67 eV, and 6.65 eV for X-doped ZrS2 (X � O, Se,
sponding penetration depth for the 6.17 eV photons is about and Te), respectively. Te energy loss function reports the
0.12 μm. loss of energy caused by fast-moving electrons through
Similarly, the maximum value of α for the Se-doped matter. Te loss function has a wide variety of prominent
ZrS2, O-doped ZrS2, and Te-doped ZrS2 is 80898.60 cm−1 at peaks for a wide energy range (Figure 4(g)). Te plasmonic
6.17 eV, 79880.6369 cm−1 at 6.22 eV, and 77192.15 cm−1 at energy (ℏωp) is shown by the major peak of the loss function
6 Advances in Materials Science and Engineering

50 50
EF EF
40 40

Density of States (ZrS2@O)


Density of States (ZrS2)

30 30

20 20

10 10

0 0
-4 -3 -2 -1 0 1 2 3 4 -5 -4 -3 -2 -1 0 1 2 3 4
Energy (eV) Energy (eV)

Total-DOS Zr-d Total-DOS S-S


Zr-S S-S Zr-S S-P
Zr-P S-P Zr-P O-S
Zr-d O-p
(a) (b)
50 50

EF
EF
40 40
Density of States (ZrS2@Te)
Density of States (ZrS2@Se)

30 30

20 20

10 10

0 0
-4 -3 -2 -1 0 1 2 3 4 -4 -3 -2 -1 0 1 2 3 4
Energy (eV) Energy (eV)

Total-DOS S-S Total-DOS S-S


Zr-S S-P Zr-S S-P
Zr-P Se-S Zr-P Te-S
Zr-d Se-P Zr-d Te-P
(c) (d)

Figure 3: Te density of states of the pristine and single-doped ZrS2 monolayers. (a) Pristine ZrS2. (b) O-doped ZrS2. (c) Se-doped ZrS2. (d)
Te-doped ZrS2.

diagram. Te several energy loss peaks for ZrS2 and X-doped doped structures. It measures the number of free charge
ZrS2 (X � O, Se, and Te) are observed at 1.82, 3.95, 5.90, and carriers generated as a result of bond breakage caused by the
7.48 eV, which correspond to their plasma frequency. electron-photon interaction [53]. For all the structures, it
Figure 4(c) shows the imaginary dielectric function ε2 reaches an extreme in the UV energy region. Te maximum
(ω). From our computed results, the peaks of the imaginary values are observed at 5.67 eV, 5.76 eV, 5.65 eV, and 5.61 eV
parts of the dielectric function show at visible and UV energy for ZrS2 and X-doped ZrS2 (O, Se, and Te), respectively, and
regions. Te interband transition from VB to CB is asso- the conductance vanishes for higher energies, i.e., the
ciated with 1.44 eV and 3.12 eV, but the value of the conductivity peak blue shifted after O-doping but red-
imaginary part of the dielectric constant is a small change for shifted after Se and Te-doping. Tis result signifes that
doped ZrS2 monolayers than pristine ZrS2 structures. comparatively less energy photons are required to achieve
Figure 4(d) exhibits the conductivity of the pristine and maximum conductivity for Te-doped ZrS2. Figure 4(e)
Advances in Materials Science and Engineering 7

3.5
8.0×104
3.0

Dielectric Function (ε1)


Absorption (cm-1)

6.0×104 2.5

2.0
4.0×104
1.5

2.0×104 1.0

0.5
0.0
0 3 6 9 12 15 18 0 3 6 9 12 15 18
Energy (eV) Energy (eV)

ZrS2 ZrS2@Se ZrS2 ZrS2@Se


ZrS2@O ZrS2@Te ZrS2@O ZrS2@Te

(a) (b)

1.4
2.0
1.2
Dielectric Function (ε2)

Conductivity (1/fs)

1.0
1.5
0.8

1.0 0.6

0.4
0.5
0.2

0.0 0.0
0 3 6 9 12 15 18 0 3 6 9 12 15 18
Energy (eV) Energy (eV)
ZrS2 ZrS2@Se ZrS2 ZrS2@Se
ZrS2@O ZrS2@Te ZrS2@O ZrS2@Te
(c) (d)
Figure 4: Continued.
8 Advances in Materials Science and Engineering

0.14 2.0

0.12 1.8

0.10

Refractive Index (n)


1.6
Reflectivity

0.08
1.4
0.06
1.2
0.04

0.02 1.0

0.00 0.8
0 3 6 9 12 15 18 0 3 6 9 12 15 18
Energy (eV) Energy (eV)

ZrS2 ZrS2@Se ZrS2 ZrS2@Se


ZrS2@O ZrS2@Te ZrS2@O ZrS2@Te

(e) (f )

1.2

1.0
Loss Function

0.8

0.6

0.4

0.2

0.0
0 3 6 9 12 15 18
Energy (eV)

ZrS2 ZrS2@Se
ZrS2@O ZrS2@Te

(g)

Figure 4: Diagrams of the optical parameters (absorption (a), dielectric function (real) (b), dielectric function (imaginary) (c), conductivity
(d), refectivity (e), refractive index (f ), and loss function (g)) of pristine ZrS2 and X (X � O, Se, and Te)-doped ZrS2.

describes the refection of the structures, which is frequency- refractive index (η) represent the lowering of light speed in
dependent. When compared to other energies, the mini- the medium, curves for η follow the analogous pattern as the
mum absorption for UV photons shows a high refectivity in dielectric function’s real part, as shown in Figure 4(f ). Te
this area. Refectivity represents the fraction of loss of the structures possess a comparatively higher refractive index in
incident energy via refection. In the visible energy range, the the visible energy region. Te fact that there is no optical
refectivity ranges between 0.04 and 0.13 with a maximum in response above 15 eV means that the electronic coupling is
the green wavelength region. In the higher energy region, up low above these energies and that photons above such en-
to 13.6% of refection is observed for the pristine ZrS2. ergies face little to no resistance as they fow through the
Meanwhile, the refectivity decreased signifcantly after material.
doping in visible and UV regions.
Te refectivity spectra also show red shifting after O- 4. Conclusion
doping and blue shifting after Se and Te-doping. All the
structures show very less refection of incident photons Te structural, optical, and electronic properties of ZrS2 and
(<14%), which can provide better performance in opto- chalcogen atoms mono-doping ZrS2 are studied using the
electronic applications. Since both the refectivity and frst-principle methods based on DFT. A slight deformation
Advances in Materials Science and Engineering 9

of the unit cell was observed after doping due to the variation [7] P. Blake, E. W. Hill, A. H. Castro Neto et al., “Making gra-
of dopant radius. Te minimum formation energy among phene visible,” Applied Physics Letters, vol. 91, no. 6, Article ID
the doped structures is for O-doped ZrS2 which signifes the 063124, 2007.
most stable structure. All the structures are shown with the [8] A. R. Botello-Méndez, F. López-Urı́as, M. Terrones, and
CBM and VBM located at Q and Γ points, respectively. Te H. Terrones, “Metallic and ferromagnetic edges in molyb-
pristine ZrS2 and O, Se, or Te-doped ZrS2 monolayers are denum disulfde nanoribbons,” Nanotechnology, vol. 20,
indirect band gap semiconductors with band gaps of pp. 325703–325732, 2009.
1.187 eV, 1.227 eV, 1.146 eV, and 0.922 eV, respectively. [9] S. Tongay, J. Zhou, C. Ataca et al., “Broad-range modulation
of light emission in two-dimensional semiconductors by
According to the density of states analysis, the S-3p orbital
molecular physisorption gating,” Nano Letters, vol. 13, no. 6,
for pristine ZrS2 monolayer and S-3p and Zr-4p orbitals for
pp. 2831–2836, 2013.
doped ZrS2 monolayers contribute to the VBM, but the Zr-
[10] Q. Peng, C. Liang, W. Ji, and S. De, “A theoretical analysis of
3d orbital is contributed to the CBM. All the structures the efect of the hydrogenation of graphene to graphane on its
showed maximum optical conductivity and strong ab- mechanical properties,” Physical Chemistry Chemical Physics,
sorption with a maximum absorption coefcient over vol. 15, no. 6, pp. 2003–2011, 2013.
104 cm−1 in the UV region, suggesting that the structure is [11] B. Radisavljevic, A. Radenovic, J. Brivio, V. Giacometti, and
very suitable for UV flter and detector applications. A. Kis, “Single-layer MoS2 transistors,” Nature Nanotech-
nology, vol. 6, no. 3, pp. 147–150, 2011.
[12] O. Ochedowski, K. Marinov, G. Wilbs et al., “Radiation
Data Availability
hardness of graphene and MoS2 feld efect devices against
Research data are not shared since they are still a part of an swift heavy ion irradiation,” Journal of Applied Physics,
ongoing research. vol. 113, no. 21, Article ID 214306, 2013.
[13] Y. Zhou, Z. Wang, P. Yang et al., “Tensile strain switched
ferromagnetism in layered NbS2 and NbSe2,” ACS Nano,
Conflicts of Interest vol. 6, no. 11, pp. 9727–9736, 2012.
[14] C. Lee, X. Wei, J. W. Kysar, and J. Hone, “Measurement of the
Te authors declare that they have no conficts of interest. elastic properties and intrinsic strength of monolayer gra-
phene,” Science, vol. 321, no. 5887, pp. 385–388, 2008.
[15] A. K. Geim, “Graphene: status and prospects,” Science,
Acknowledgments
vol. 324, no. 5934, pp. 1530–1534, 2009.
Tis research was supported by the Condensed Matter [16] Y. M. Lin, K. A. Jenkins, A. Valdes-Garcia, J. P. Small,
Physics Lab and the authors thank the National Science and D. B. Farmer, and P. Avouris, “Operation of graphene
Technology (NST) Fellowship, under the Ministry of Science transistors at gigahertz frequencies,” Nano Letters, vol. 9,
and Technology, Bangladesh, for ofering fnancial support no. 1, pp. 422–426, 2009.
[17] Y. M. Lin, C. Dimitrakopoulos, K. A. Jenkins et al., “100-GHz
for this research.
transistors from wafer-scale epitaxial graphene,” Science,
vol. 327, no. 5966, 2010.
References [18] L. Liao, Y. C. Lin, M. Bao et al., “High-speed graphene
transistors with a self-aligned nanowire gate,” Nature,
[1] D. Malko, C. Neiss, F. Viñes, and A. Görling, “Competition vol. 467, no. 7313, pp. 305–308, 2010.
for graphene: graphynes with direction-dependent Dirac [19] K. S. Novoselov, V. I. Fal’Ko, L. Colombo, P. R. Gellert,
cones,” Physical Review Letters, vol. 108, no. 8, Article ID M. G. Schwab, and K. Kim, “A roadmap for graphene,”
086804, 2012. Nature, vol. 490, no. 7419, pp. 192–200, 2012.
[2] C. C. Liu, W. Feng, and Y. Yao, “Quantum spin Hall efect in [20] G. Cocco, E. Cadelano, and L. Colombo, “Gap opening in
silicene and two-dimensional germanium,” Physical Review graphene by shear strain,” Physical Review B, vol. 81, no. 24,
Letters, vol. 107, no. 7, Article ID 076802, 2011. Article ID 241412, 2010.
[3] P. Vogt, P. De Padova, C. Quaresima et al., “Silicene: com- [21] J. Viana-Gomes, V. M. Pereira, and N. M. R. Peres, “Mag-
pelling experimental evidence for graphenelike two-
netism in strained graphene dots,” Physical Review B, vol. 80,
dimensional silicon,” Physical Review Letters, vol. 108,
no. 24, Article ID 245436, 2009.
no. 15, Article ID 155501, 2012.
[22] Y. Zhang, T. T. Tang, C. Girit et al., “Direct observation of
[4] K. Watanabe, T. Taniguchi, and H. Kanda, “Direct-bandgap
a widely tunable bandgap in bilayer graphene,” Nature,
properties and evidence for ultraviolet lasing of hexagonal
boron nitride single crystal,” Nature Materials, vol. 3, no. 6, vol. 459, no. 7248, pp. 820–823, 2009.
pp. 404–409, May 2004. [23] B. Wong, H. Simon, G. O. Nanoscale, and G. O’Bryan,
[5] G. Giovannetti, P. A. Khomyakov, G. Brocks, P. J. Kelly, and “Reversible, opto-mechanically induced spin-switching in
J. Van Den Brink, “Substrate-induced band gap in graphene a nanoribbon-spiropyran hybrid material,” Nanoscale, vol. 4,
on hexagonal boron nitride: ab initio density functional no. 4, pp. 1321–1327, 2012.
calculations,” Physical Review B, vol. 76, no. 7, Article ID [24] M. Kim, N. S. Safron, C. Huang, M. S. Arnold, and P. Gopalan,
073103, 2007. “Light-driven reversible modulation of doping in graphene,”
[6] Q. H. Wang, K. Kalantar-Zadeh, A. Kis, J. N. Coleman, and Nano Letters, vol. 12, no. 1, pp. 182–187, 2012.
M. S. Strano, “Electronics and optoelectronics of two- [25] A. Splendiani, L. Sun, Y. Zhang et al., “Emerging photo-
dimensional transition metal dichalcogenides,” Nature luminescence in monolayer MoS2,” Nano Letters, vol. 10,
Nanotechnology, vol. 7, no. 11, pp. 699–712, 2012. no. 4, pp. 1271–1275, 2010.
10 Advances in Materials Science and Engineering

[26] H. S. S. Ramakrishna Matte, A. Gomathi, A. Manna et al., [44] M. D. Segall, R. Shah, C. J. Pickard, and M. C. Payne,
“MoS2 and WS2 analogues of graphene,” Angewandte Chemie “Population analysis of plane-wave electronic structure cal-
International Edition, vol. 49, no. 24, pp. 4059–4062, 2010. culations of bulk materials,” Physical Review B, vol. 54, no. 23,
[27] S. Haastrup, M. Strange, M. Pandey et al., “Te Computational pp. 16317–16320, 1996.
2D Materials Database: high-throughput modeling and dis- [45] R. Khatun, M. T. Ahmed, S. Islam, M. K. Hossain,
covery of atomically thin crystals,” 2D Materials, vol. 5, no. 4, M. A. Hossain, and F. Ahmed, “First-principles investigation
Article ID 042002, 2018. of hexagonal boron-carbon-nitride (h-BCN) nanosheet (2D)
[28] M. N. Gjerding, A. Taghizadeh, A. Rasmussen et al., “Recent as gas sensor towards toxic gases (CO, H2S, PH3, SO2, and
progress of the computational 2D materials database HCN),” International Journal of Computational Materials
(C2DB),” 2D Materials, vol. 8, no. 4, Article ID 044002, 2021. Science and Surface Engineering, vol. 10, no. 3-4, pp. 184–194,
[29] J. Kang, S. Tongay, J. Li, and J. Wu, “Monolayer semi- 2021.
conducting transition metal dichalcogenide alloys: stability [46] J. J. Philips, M. A. Hudspeth, P. M. Browne, and J. E. Peralta,
and band bowing,” Journal of Applied Physics, vol. 113, no. 14, “Basis set dependence of atomic spin populations,” Chemical
Article ID 143703, 2013. Physics Letters, vol. 495, no. 1–3, pp. 146–150, 2010.
[30] Z. Zeng, Z. Yin, X. Huang et al., “Single-layer semiconducting [47] Y. Li, J. Kang, and J. Li, “Indirect-to-direct band gap transition
nanosheets: high-yield preparation and device fabrication,” of the ZrS2 monolayer by strain: frst-principles calculations,”
Angewandte Chemie, vol. 123, no. 47, pp. 11289–11293, 2011. RSC Advances, vol. 4, no. 15, pp. 7396–7401, 2014.
[31] M. Zhang, Y. Zhu, X. Wang et al., “Controlled synthesis of [48] Y. Wang and Z. Geng, “Electronic structures of p-type im-
ZrS2 monolayer and few layers on hexagonal boron nitride,” purity in ZrS2 monolayer,” RSC Advances, vol. 6, no. 63,
Journal of the American Chemical Society, vol. 137, no. 22, pp. 58325–58328, 2016.
pp. 7051–7054, 2015. [49] F. Torrens and G. Castellano, “Periodic table,” in New
[32] S. Ahmad, R. D’Souza, and S. Mukherjee, “Band gap mod- Frontiers in Nanochemistry, pp. 403–425, Apple Academic
ulation of ZrX2 (X � S, Se, Te) mono-layers under biaxial Press, New Jersey, NJ, USA, 2020.
strain and transverse electric feld and its lattice dynamic [50] E. M. V. Valerio Lucarini, J. J. Saarinen, and K.-E. Peiponen,
properties: a frst principles study,” Materials Research Ex- Kramers-Kronig Relations in Optical Materials Research,
press, vol. 6, no. 3, Article ID 036308, 2018. Springer Science & Business Media, Berlin, Germany, 2005.
[33] D. C. Reynolds, C. W. Litton, and T. C. Collins, “Zeeman [51] N. A. Shahed, M. Nishat, S. Khanom, M. K. Hossain,
efects in the edge emission and absorption of ZnO,” Physics M. A. Hossain, and F. Ahmed, “Efect of oxygen defciency on
Reviews, vol. 140, no. 5A, pp. A1726–A1734, 1965. optical and magnetic properties of Ba2MMoO6 (M�Cr, Mn,
[34] W. Kohn and P. Vashishta, “General density functional Fe): a frst-principles study,” Computational Condensed
theory,” in Teory of the Inhomogeneous Electron Gas, Matter, vol. 23, 2020.
pp. 79–147, Springer US, Berlin, Germany, 1983. [52] S. S. A. Gillani, R. Ahmad, I. Zeba et al., “Efect of external
[35] M. D. Segall, P. J. D. Lindan, M. J. Probert et al., “First- pressure on the structural stability, electronic structure, band
principles simulation: ideas, illustrations and the CASTEP gap engineering and optical properties of LiNbO3: an ab-
code,” Journal of Physics: Condensed Matter, vol. 14, no. 11, initio calculation,” Materials Today Communications, vol. 23,
pp. 2717–2744, 2002. Article ID 100919, 2020.
[36] J. P. Perdew, K. Burke, and M. Ernzerhof, “Generalized [53] M. K. Butt, M. Yaseen, A. Ghafar, and M. Zahid, “First
gradient approximation made simple,” Physical Review Let- principle insight into the structural, optoelectronic, half
ters, vol. 77, no. 18, pp. 3865–3868, 1996. metallic, and mechanical properties of cubic perovskite
[37] J. D. Head and M. C. Zerner, “A Broyden-Fletcher-Goldfarb- NdInO3,” Arabian Journal for Science and Engineering,
Shanno optimization procedure for molecular geometries,” vol. 45, no. 6, pp. 4967–4974, 2020.
Chemical Physics Letters, vol. 122, no. 3, pp. 264–270, 1985.
[38] S. Li, C. Wang, and H. Qiu, “Single- and few-layer ZrS2 as
efcient photocatalysts for hydrogen production under visible
light,” International Journal of Hydrogen Energy, vol. 40,
no. 45, pp. 15503–15509, 2015.
[39] B. Yang, H. Zheng, R. Han, X. Du, and Y. Yan, “Tuning the
magnetism of a ZrS2 monolayer by substitutional doping,”
RSC Advances, vol. 4, no. 97, pp. 54335–54343, 2014.
[40] C. Xia, Y. Peng, H. Zhang, T. Wang, S. Wei, and Y. Jia, “Te
characteristics of n- and p-type dopants in SnS2 monolayer
nanosheets,” Physical Chemistry Chemical Physics, vol. 16,
no. 36, pp. 19674–19680, 2014.
[41] C. Xia, Y. Peng, S. Wei, and Y. Jia, “Te feasibility of tunable p-
type Mg doping in a GaN monolayer nanosheet,” Acta
Materialia, vol. 61, no. 20, pp. 7720–7725, 2013.
[42] Y. Peng, C. Xia, H. Zhang, T. Wang, S. Wei, and Y. Jia,
“Characteristics of p-typeMg-doped GaS and GaSe nano-
sheets,” Physical Chemistry Chemical Physics, vol. 16, no. 35,
pp. 18799–18804, 2014.
[43] Y. Peng, C. Xia, H. Zhang, T. Wang, S. Wei, and Y. Jia,
“Tunable electronic structures of p -type Mg doping in AlN
nanosheet,” Journal of Applied Physics, vol. 116, no. 4, Article
ID 044306, 2014.

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