PHOTOLITHOGRAPHY

BY
CHANDRABHUSHAN
TIWARI
CONSTRUCTION OF
PHOTOLITHOGRAPHY
In general, a photolithography process
requires three basic materials, light source,
photo mask, and photoresist. Photoresist, a
photosensitive material, has two types,
positive and negative. The positive
photoresist become more soluble after
exposure to a light source. On the contrary,
the negative photoresist become less
soluble after exposure
 • WORKING PRINCIPLE OF
PHOTOLITHOGRAPHY
• Photolithography shares some fundamental principles
with photography in that the pattern in the photoresist
is created by exposing it to light — either directly by
projection through a lens, or by illuminating a mask
placed directly over the substrate, as in contact
printing. The technique can also be seen as a high
precision version of the method used to make printed
circuit boards. The name originated from a loose
analogy with the traditional photographic method of
producing plates for lithographic printing on paper
however, subsequent stages in the process have more
lithography with etching than with traditional
lithography.
ADVANTAGES OF PHOTOLITHOGRAPHY

• It can create extremely small patterns, down to a few tens of

nanometers in size.
• It provides precise control of the shape and size of the objects it
creates and can create patterns over an entire wafer in a single step,
quickly and with relatively low cost.
DISADVANTAGES OF PHOTOLITHOGRAPHY

• Photolithography cannot be used to produce masks on

surfaces that are not perfectly flat; and, like all chip
manufacturing processes, it requires extremely clean
operating conditions
REFER FROM

• https://youtu.be/oBKhN4n-EGI
• Photolithography topic from chrome
THANK YOU