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Department of Electronics and Communication Engineering

Tutorial Sheet1 (Advanced Solid State Devices, UEC-801)

Q1: Derive the basic equations of semiconductor current Drift and Diffusion.
Q2. The 1mm long bar of silicon at 300K is doped with donor impurity to extent of
5x1020/cm3. Find the voltage drop across the bar if the current density in the bar is
1mA/cm2.
Q3. The sample of intrinsic silicon at 300K is doped to acceptor impurity such that hole
concentration becomes 2x1020/cm3. Calculate the concentration of electron in
extrinsic semiconductor and also calculate the conductivity.
Department of Electronics and Communication Engineering
Tutorial Sheet1 (Advanced Solid State Devices, UEC-801)

Q1: Derive the basic equations of semiconductor current Drift and Diffusion.
Q2. The 1mm long bar of silicon at 300K is doped with donor impurity to extent of
5x1020/cm3. Find the voltage drop across the bar if the current density in the bar is
1mA/cm2.
Q3. The sample of intrinsic silicon at 300K is doped to acceptor impurity such that hole
concentration becomes 2x1020/cm3. Calculate the concentration of electron in
extrinsic semiconductor and also calculate the conductivity.
Department of Electronics and Communication Engineering
Tutorial Sheet1 (Advanced Solid State Devices, UEC-801)

Q1: Derive the basic equations of semiconductor current Drift and Diffusion.
Q2. The 1mm long bar of silicon at 300K is doped with donor impurity to extent of
5x1020/cm3. Find the voltage drop across the bar if the current density in the bar is
1mA/cm2.
Q3. The sample of intrinsic silicon at 300K is doped to acceptor impurity such that hole
concentration becomes 2x1020/cm3. Calculate the concentration of electron in
extrinsic semiconductor and also calculate the conductivity.

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