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150 IEEE T R A N S A C ’ TELECTRON

ON
I~NS DEVICES, VOL. ED-30, NO. 2 , FEBRUARY 1983

Ballistic Transport and Velocity Overshoot in


Semiconductors: Part I-Uniform
Field1 Effects
STEPHEN LEWIS TELTEL AND J. W. WILKINS

Abstract-The relationship between ballistic electron transportan 3 Although a uniform field is an idealization of the situation
velocity overshoot, in semiconductor materials, is clarified. By cor[. ina realdevice, we feelitcontainsmuchoftheessential
sidering the behavior of electrons in a uniform electric field, we sholv
that while ballistic transport can coexist with velocity overshoot, it ‘ B
physics of the effects of phonon collisions on the approach to
not necessary for overshoot. Furthermore, we show that ballistic tram- steadystate.Non-uniformfieldeffects will be treated in a
port will not lead to overshoot unless one of the two classic mechanism !% second paper. In Section 111, we state our conclusions.
for overshoot is also operative.
11. VELOCITYOVERSHOOTAND BALLISTICTRANSPORT
I N UNIFORMFIELDS
I. INTRODUCTION Consider the problem of an ensemble of electrons with zero

T HE NOTION of ballistic electron transport has been


troduced as a means for achieving velocity overshoot
submicrometersemiconductordevices
in-
in
[ 11 -[4] . Significar t
initialaveragevelocityreleased at time t = 0 into a uniform
electric field. We ask about the evolution of the average veloc-
ity of the ensemble u as a function of time. Although in a real
controversy has appeared in the literature concerning the time deviceelectricfieldsarenon-uniform,theabovepicture is
and length scales on which ballistic transport should appe; r suggestive [15] , [16] of the behavior of a packet of electrons
[5] -[ 101 and whether or not it has been observed experimelu- originatinginaheavilydopedregion(lowfield)suddenly
tally [ l 11 -[14].In anefforttoelucidatetheimportar i entering a lightly doped region (high field). We also note that
physics behind electron transport in submicrometer semicon- indicationsintheliteraturesuggestthatnon-uniformfields
ductors, we review theprocessofvelocityovershootand serve t o reduce the velocity overshoot effect [ 181 .
clarify its relationship to ballistic transport.
In Section 11, we consider the case of a uniform electric field. A . Definitions
We definepreciselywhatwemeanbytheterms“velocity Ballistic transport, as originally introduced [ 11, referred to
overshoot”and“ballistictransport”and we concludetke the motion of electrons through the semiconductor material in
following. the complete absence of any collisions. Motion in a uniform
1) Velocity overshoot is expected to exist in most semicoll- field, therefore, would be governed by
ductor materials due to the presence of one of the followini;: u = qEt/m. (1)
a) a momentum relaxation rate which is larger than t k Obviously,this is valid only at short times. “Short” is deter-
energy relaxation rate and which is an increasing fun 3- mined by comparing the average energy acquiredby the ballistic
tion of energy; electron e 4muz t kBT withtheenergyscaleatwhich
particular collision mechanisms become important.
or At longer times it becomes impossible to ignore collisions:
the velocity approaches some steady-state drift value instead
b) heavier mass satellite conduction valleys at low enocy;h of increasing without bound as predicted by (1). The recogni-
energy to have a significant electron population in the tionoftheimportanceofcollisionsledtotheintroduction
steady state. [ 3 ] , [4] of theconcept“near-ballistic”transport,which we
define as transport in the presence of at most a few collisions.
2) Ballistic transport can exist in conjunction with veloci .y
When we wish to distinguish between these two we will refer
overshoot.However, ballistic transportcannotbyitselflead
to the former as true ballistic and the later as near ballistic.
to any overshoot, since that can occur only if one of the abo,/e
Ballistic transport was introduced as a means of producing
mechanisms is also operative.
velocity overshoot. By velocity overshoot we mean the abilitv
to achieve, on short time scales, velocities exceeding the long-
Manuscript received June 7, 1982; revised September 13, 1982. This
work was supported by the Office of Naval Research. time steady-state drift velocity ud(E). In Fig. 1, we show some
S. L. Teitel was with the Laboratory of Atomic and Solid State Pfr~.s- examples of velocity overshoot for Si as determined by the
ics, Cornell University, Ithaca, NY 14853. He is now with the Physics Monte Carlo calculations of Ruth [ 151 . The classic origins of
Department, Ohio State University, Columbus, OH 43210.
J, w. wilkins is with the Laboratory of Atomicand Solid velocityovershoot, as determinedfromsuchMonteCarlo
Physics, Cornell University, Ithaca, NY 14853. studies [ 151 - [ 171 , can be separated into two distinct mecha-

0018-9383/83/0200~3150$01.000 1983 IEEE


TEITEL AND WILKINS: BALLISTIC TRANSPORT AND VELOCITY OVERSHOOT 151

zE
I 2

VOP
V

Fig. 2. Typical momentum relaxation rate rm as a function of average


Fig. 1. Averageelectronvelocity as afunction of timeforSifrom electron velocity.
Monte Carlo calculations [ 15] .

nisms: 1) adifferenceinmomentumandenergyrelaxation
rates; and 2) the presence of higher mass satellite conduction
valleys. We review these as follows.

B. Velocity Overshootfor One- Valley Semiconductors


For the case where electron transport is mainly confined to
one set of equivalent conduction valleys (such as Si or Ge),
0
Y t "
A
t-too
onecanwritemomentequationsforthe averageelectron
ve1ocit:y u and energy E Fig. 3. Average electron velocity u as a function of time for anensemble
displaying velocity overshoot. The points where du/dt = 0 are marked
with a cross.

collision mechanisms are scattering from acoustic phonons and


equivalentintervalleyscattering [ 2 0 ] . Scattering is largely
isotropicandthe relativelylargenumberofbackscattering
where is the electron charge, m the effective mass (parabolic
( q
events reduces momentum much more effectively than energy.
dispersion is assumed), and eo the equilibrium electron thermal Although the peak velocities in the overshoot curves for Si
energy. rm
and re are the momentum and energy relaxation (Fig. 1) occuratroughlyonerelaxationtimeafterinjection
rates, which are assumed to depend only on the instantaneous into the field, Le., t = r;', it is important to realize that the
average energy E . overshoot effect is produced by the crucial interplay between
Notice that for times t << r;' (2) reduces to the true-ballistic energy and momentum relaxation and not just the short time
limit (1). However, in this case, the ballistic velocity u = qEt/m scale involved.
will be much less than the average drift velocity u = qE/mF, . We illustrate this fact clearly by considering the case where
Thus the true-ballistic regime will not produce overshoot. For the energy relaxation is tied to that of the momentum; then
times t < I ?;'( 2 ) describe the near-ballistic regime. Overshoot there is no overshoot. In this case, the energy is specified by
is possible in this regime. However, as we show below, when 4
the instantaneous velocity: E ( t ) = eo -t mu2(t); and the en-
overshoot is presentit is theinterplaybetween rm and re, ergy relaxation rate must be twice [due to u 2 ] the momentum
and nol. the time scale t 2: I?;', that is important. relaxation rate. Then (2b) and (2a) coalesce into
The ]intuitive argument [16] for the occurrence of velocity
overshoot is as follows [ 191 .* If re << rm,we expect mo-
menturn to relax on time scales which are short compared to
that on which the electron distribution heats up.If the average wherewehaveexplicitlyacknowledgedthattherelaxation
electronenergy is initiallythenwhenanelectricfield E is rate depends on the velocity. The near-ballistic region of (5)
turned on the momentum will relax to give is again t < rG1.
In Fig. 2, we show a typical functional farm for the relaxa-
tional rate r,(u). We have included a step at u = uOp corre-
sponding to theonsetofanextra collisionprocess as the
electron energy increases. The precise form of r,(u) will not
At alatertimewhentheelectronshaveheateduptotheir
play an important role in our arguments. We now demonstrate
final drift energy ~f > ~ ithe
, momentum relaxes to give
that no velocity overshoot can be obtained in the model (5).
For velocity overshoot to exist, a plot ofaverage velocity versus
time must resemble that shown in Fig. 3. We see from Fig. 3
that such a solution for u ( t ) must have two values of u where
If rm is an increasing function ofE, then ui > uf and overshoot du/dt = 0 : one at the peak velocity and one at the long time
has occurred. Such is the situation for Si because the dominant limit (these points are marked by a cross in Fig. 3). Using(Sa),
the condition du/dt = 0 can be rewritten as
' A more quantitative set ofrestrictionsontherates I',and rm in
order to produce velocity overshoot is given in [ 191. u rm( u ) = qE/m. (6)
152 IEEE TRANSA'r"1ONSON ELECTRON DEVICES, VOL. ED-30, NO. 2 , FEBRUARY 1983

I
shoot.Atshorttimes,theelectronsremaininthecentral
valley withlightmassand,hence,achievehighvelocities.
However,oncetheyachieveenergiescomparable tothatof
the satellite valley, transfer to the satellite valley takesplace
accompanied by a loss in velocity. At longer times, the heavy
mass of the satellite valley prevents transferred electrons from
reaching velocities comparable to those achieved in the central
valley. Thus overshoot occurs.

-e-:-i
An additional mechanism for overshoot of the central-valley
electrons arises from the effect of successive scatterings in and
out of the satellite valleys. This scattering process produces:
1)arapidincreaseinthemomentumrelaxationatenergies
(-0.3 eV) appropriate to the in-and-out scattering and; 2) the
condition rm>> re. Accordingly, velocity overshoot is then
possible b y t h emechanism discussed in Section TI-B. However,
5 kV/cm as shown in the work of Grubinet al. [22] , this effect is small
3
2 compared to that disused first. Thus the major reason for the
c
LL 1 1 kV/cm overshoot of the averageelectronvelocity is thefinitetime
CT
00 required for the transfer of electrons to the satellite valleys.
0 1 2 -12 3
TIME(10 5 ) In particular, contrary to comments made in the paper by
Fig. 5 . Average electron velocity as a function of time for GaAs fr -.m Hess [ S I , we do not expect velocity overshoot to be associated
Monte Carlo calculations [ 1 5 ] . The threshold for negative differen- with central-valley electrons at onset energy (-0.04 eV) for the
tial mobility sets in at E t h r 3 kV/cm. For E < Eth no velocity CIP er- emission of polar optical phonons, an energy whichis far below
shoot is seen.
the threshold energy (-0.3 eV) for transfer into satellite valleys.
Since polar-optical-phonon scattering is peaked in the forward
Thus for overshoot to exist there must be two values of u that direction [20], the energy and momentum scattering rates are
solve equation (6). comparable. Thus by the arguments in Section 11-B, no over-
InFig. 4, we plot the function ur,(u) versus u. The inttx- shoot is expected, and this is confirmed by the Monte Carlo
section of this curve with the line qE/m gives all possible solu- result [ 1SI-[ 171 that overshoot is absent for electric fields
tions to (6). As is seen clearly, only one solution exists. 'The E < Eth. In summary,all velocity overshoot effects in materials
result holds generally, provided only that ur,(u) is an incr'e3.s- such as GaAs are a direct consequence of the presence of heavy
ing function of u. mass-satellite valleys.
Thus in a one-valley model, no overshoot can exist either in These observations may be relevant for devices. For the case
the true-ballistic or near-ballistic regimes without the introd;lc- of submicrometer GaAs devices, it should be possible to apply
tion of separate energy and momentum relaxation rates. 'We sufficiently low voltages to effectively confine the electrons to
also note that it is possible, at least in theory, to make the peak the high-mobility central valleywhilein the same device cre-
velocity occur at several times ril away from injection ( t := 9) atinglargeelectricfields E > E t h . Undersuchconditions,it
by taking certain choices of rm and re in ( 2 ) [ 191 . Whetller should be possible to produce average velocities exceeding the
such cases exist for real materials, however, remains to be se1:n. maximum steady-state drift velocity ud(Eth). Such an effect is
observed in thecalculationsofBoschandThim[23]. In a
C. Velocity Overshoot for Semiconductors with Satellite future paper, we will treat the effect of a non-uniform field in
Conduction Valleys a submicrometer device on velocity overshoot.
Formaterialswheresignificantconductiontakesplace in 111. CONCLUSIONS
highermasssatellite valleys (such as GaAs or InP), (2) is, in-
adequate.Onemustintroduceseparateequationsforezch The origins of velocity overshoot and their relation to ballistic
valley withappropriatetransferratescouplingthem [21] .2 electron transport in uniform electric fields can be characterized
Such complications introduce a second mechanism for achiev ng by thefollowing observations. Ballistic transportatshort
velocity overshoot. times does notbyitself lead to largevelocities.In the true-
InFig.5weshowcurvesofvelocityovershootfor GaAs ballistic regime ( t << r;'), even though collisions will have
from the work of Ruch [ 151. Monte Carlo simulations [ 1fi - a negligible effect on the motion of the electron, the times are
[ 171 of such materials show no overshoot until the electric so short that the electron will not be accelerated up to veloc-
field exceeds. the threshold value Eth for negative differeniial ities comparable to the steady-state value. In the near-ballistic
mobility. As negative differential mobility is due to the tra 11s- regime ( t < F;'), large velocities can be achieved through the
fer of electrons to the higher mass valleys, these calculaticlns mechanisms of velocity overshoot. However, these are not so
indicatethattransfer is thekeymechanismproducing ovtx- much amanifestation oftherarityof
collisions as ofthe
subtle way collisions act in the approach to steady state. For
'Satellite valleys are treated by the addition of an energy dependznt semiconductors where conduction takes place in a single set
massrn(e) in (2), in the paper by M. S. Shur [ 2 1 ] . of equivalent valleys, velocity overshoot is not possible unless
TEITEL AND WILKINS: BALLISTIC
OVERSHOOT
VELOCITY
TRANSPORT
AND 153

momentum can relax faster than energy. For semiconductors, to ballistic transport in semiconductors,” IEEE Electron Device
Lett., vol. EDL-2, p. 228, 1981.
withheaviermasssatellitevalleys,largerthansteady-state L. F. Eastman, R. Stall, D. Woodard,.C.E.C.Wood, N. Dande-
drift velocities can occur before the electrons have transferred kar, M. Shur, M. Hollis, and K. Stall, “Ballistic electron transport
tosatellitevalleys. For submicrometerdevicesitshouldbe in thin layers of GaAs,” in Proc. 10th Jnt. Symp. on GaAs and
Related Compounds, Vienna, Austria, 1980.
possible to apply low enough voltages such that the electrons L. F. Eastman, R. Stall, D. Woodard, N. Dandekar, C. E. Wood,
will beunable to transfer to satellite valleys and stillcreate M. S . Shur, and K . Board, “Ballistic electron motion in GaAs at
large enough electric fields to produce large velocities. room temperature,” Electron. Lett., vol. 16, p. 524, 1980.
M. Hollis, N. Dandekar, L. F. Eastman, M. Shur, D.Woodard,
R . Stall, and C. Wood, “Transverse magnetoresistance, in GaAs
two terminal submicron devices: A characterization of electron
ACKNOWLEDGMENT transport in the near ballistic regime,” in IEDM Tech. Dig., 1980.
It is apleasure t o acknowledgeusefulconversationsand R. Zuleeg,“Possibleballisticeffects in GaAs current limiters,”
IEEE Electron Device Lett.,vol. EDL-1, p . 234,1980.
correspondences with J. B. Socha, L. F. Eastman, H. U. Baran- J. G.Ruch,“Electrondynamicsinshortchannelfieldeffect
ger, H. L. Grubin, D. K. Ferry, K . Hess, and J. A. Krumhansl. transistors,” IEEE Trans. Electron Devices, vol. ED-19, pp. 652-
654, May 1972.
T. J . Maloney and J. Frey, “Transient and steadv-state electron
REFERENCES transport properties of G ~ A sand InP,” J. AppL-Phys., vol. 48,
P. 781, 1977.
i l l M. S. Shur and L. F. Eastman, “Ballistic transport in semicon- M . A. Littlejohn, L. A. Arledge, T. H. Glisson, and J. R. Hauser,
ductorat low temperaturesfor low-powerhigh-speedlogic,” “Influence of central valley effective mass and alloy scattering on
IEEE Trans. Electron Devices, vol. ED-26, p. 1677, 1979. transient drift velocityin Gal,InxP1-yAsy,” Electron. Lett., vol.
-, “GaAs n+-p--n+ ballistic structure,” Electron. Lett., vol. 16, 15, p. 586, 1979.
p. 522, 1980. H.L. Grubin, G. J. Iafrate, and D. K. Ferry, “Hot carrier space
-, “Ballistic and near ballistic transport in GaAs,” IEEE Elec- and time dependent transientsin short GaYlium Arsenide devices,”
tron Device Lett., vol. EDL-1, p. 147, 1980. J. de Physique, vol. C7, p. 201, 1981.
-, “Near ballistic electron transport in GaAs devices at 77’K,” S. Teitel and J. W. Wilkins,“Smallsignal acconductivityand
Solid-state Electron., vol. 24, p. 11, 1981. velocity overshoot in semiconductor materials,” J. Appl. Phys.,
K. Hess, “Ballistic electron transport in semiconductors,” IEEE vol. 53, p. 5006, 1982.
Trans. Electron Devices, vol. ED-28, p. 937, 1981. K. Hess, Physics of NonlinearTransport in Semiconductors,
‘T.J. Maloney, “Polar mode scattering in ballistic transport GaAs Ferry, Barker, andJacoboni, Eds.New York:Plenum,1980,
devices,” IEEE Electron Device Lett.,vol. EDL-1, p. 54, 1980. p. 1.
.J. R. Barker, D. K. Ferry, and H. L. Grubin, “On the nature of K. Blatekjaer,“Transportequationsforelectronsin two-valley
ballistic transport in short-channel semiconductordevices,” IEEE semiconductors,” IEEE Trans. Electron Devices, vol. ED-17, p.
Electron Device Lett., vol. EDL-1, p. 209, 1980. 38, 1970;also M. S. Shur, Electron. Lett., v01. 12, p. 615, 1976.
W. R. Frensley,“High-frequencyeffectsofballisticelectron H. L. Grubin, D. K. Ferry, G. J. Iafrate, and J. R. Barker, “The
1:ransport in semiconductors,” IEEE Electron Device Lett., vol. numerical physics of micron-length and submicron-length semi-
EDL-1, p. 137, 1980. conductor devices,” to be published.
J. Frey, “Ballistic transport in semiconductor devices,” in IEDM R. Bosch and H. W. Thim, “Computer simulation of transferred
Tech. Dig., 1980. electron devices using the displayed Maxwellian approach,”IEEE
I). K. Ferry, J. Zimmerman, P. Lugli, and H. Grubin, “Limitations Trans. Electron Devices, vol. ED-21, p . 16, 1974.

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