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• Storage reservoir. Purified water from the Table 4 Common pure water applications and required water quality
makeup system typically is stored in a reservoir
that helps meet daily needs and cover peak peri-
ods of high demand from laboratories. Both the
makeup water system’s water production rate and
the reservoir must be sized to meet the daily and
peak usage demands for purified water.
• Distribution loop. An appropriately sized distri-
bution pump ensures water is distributed through
the piping network at the correct flow rates and
pressures. Distribution equipment often includes
additional equipment such as in-line ultraviolet
(UV) lamps and filtration to maintain or improve
the quality of the water being distributed. Water
quality monitoring equipment also may be added
to ensure the product water is within specifica-
tions.
• Point-of-use delivery and polishing. Throughout
the piping distribution network, water can be
used for feeding instruments, dishwashers, and
autoclaves, general glassware rinsing, and buffer
and media preparation. Additional point-of-use their responses are “DI water,” “RO water,” or “house DI water.”
polishing also can be added to meet ultrapure water quality Others may respond, “The water must be really pure.” These gen-
needs for more sensitive applications. eral responses neither provide the specifics needed to design a
A Step-by-Step Total Purification System Design water system nor define whether the water quality is adequate
for an end user’s application.
Step 1—Defining User Requirements and Pure Several organizations provide detailed standards for specific
Water Specifications water quality types, including ASTM International, Clinical and
A successful water system design must start with a clear and Laboratory Standards Institute (CLSI), College of American
precise definition of the pure water needs at the facility. Two Pathologists (CAP), International Organization for Standard-
simple questions need to be answered in detail: ization (ISO), and United States Pharmacopeia (USP). Most
1. What is the purity level required at each point of use? organizations classify water purity levels as Type I, Type II, and
2. How much water is required at each point of use? Type III, with Type I being the most pure. Although similar, each
Answering these simple questions is not always an easy task. purity level is slightly different across the different published
The designer, often with help from a water system supplier, must standards. Table 3 consolidates these standards and includes
investigate all user requirements before starting the design USP purified water quality levels for comparison.
phase. For example, the requirements may vary from general End users typically follow the standards closely tied to their
rinsing to highly sensitive analytical techniques within the same industry. For example, hospital, medical, and clinical laborato-
facility. The delivery points also vary from gooseneck faucets ries tend to follow CLSI or CAP standards. University research-
and simple valves to instruments and point-of-use ultrapure ers and industrial laboratory technicians follow ASTM. In some
polishing systems. cases, end users may specify a variation of the water quality
Step 1a—Defining Water Purity Level. Too often when end standards to meet a sensitive application requirement. For
users are asked to define what purity level they use or need, example, a scientist using gas chromatography-mass spectrom-
etry (GCMS) for trace organic analysis may require
Table 3 Consolidated water purity standards, including USP purified water quality total oxidizable carbon (TOC) levels controlled lower
than specified by the Type I standard. Therefore, it is
important to define the required water quality at each
point of use in as much detail as possible.
Often end users do not know the required water
quality. An experienced designer or water system sup-
plier can help determine the required purity level to
match the specific application requirements. Table 4
provides an overview of common pure water applica-
tions and required water quality.
Step 1b—Defining Water Volume Requirements.
Once the water quality requirements are defined, the
selected to meet point-of-use requirements for each of the four water contaminants found locally in the tap water and be sized
types of contaminants. to accommodate seasonal variations that may occur. To ensure
Distribution Monitoring Equipment. To verify and docu- bacteria control, a UV light (254-nm wavelength) may be added
ment performance, system design should include equipment as a final step of the makeup purification system for both the
to monitor distribution loop water quality. Actual requirements production of Type III and Type II water quality.
should be defined in Step 1, when all user requirements are Water in the storage reservoir serves as a buffer during peak
determined. Common monitoring options include: demand periods, allowing the makeup system time to produce
• pressure gauges to monitor pressure at key points (pump the total daily volume needed. For example, a laboratory oper-
pressure, pressure drop across equipment and filters, and ating and using pure water (primarily eight to 10 hours per day)
pressure at the loop return); can utilize the overnight hours to produce water that fills the
• conductivity or resistivity monitoring to measure inorganic storage reservoir.
impurities; Although at first glance the storage reservoir simply needs to
• TOC monitors to measure the total organic content; and store the water, it is also important that the design of the reservoir
not compromise the quality of the water stored. Construction
• sample valves for collection of water samples for bacteria
materials and design features, such as a conical bottom, closed
monitoring.
design with proper air venting and filtration, and a protected
The valve type must be carefully selected to ensure the valve overflow, are important factors that can minimize contamina-
itself does not contribute contamination to the sample. An tion from materials or from the air.
example of a zero dead leg sanitary valve is shown in Figure 6
as a clean sample with minimal risk of bacteria
contamination from the valve. Figure 7 Multi-step makeup purification process for production of Type III and Type II water
Step 4—Water Purification Makeup
and Storage
The selection and size of the makeup purifica-
tion system need to be determined together with
the selection and size of the storage reservoir to
meet water quality requirements and both daily
and peak usage demands for purified water in
the facility. The makeup purification system
produces the total volume of water consumed
by a facility each day, starting with tap water and
purifying it to a level of water quality that meets
laboratory-specific water quality requirements.
The selection of purification technologies for
the makeup purification system must be linked
to the requirements defined in Step 1 of the total design process. Additional Considerations to Finalize Total
Figure 7 provides an example of a multistep makeup purifica- System Design and Specifications
tion process that can deliver Type III and up to Type II water The final use or application of the purified water is impor-
quality to the storage reservoir. tant to understand when determining the need for additional
Most facilities requiring purified water have a higher volume point-of-use purification polishing systems. Most general, non-
demand for more general applications (i.e., washing and rinsing critical applications may use the water directly from the distri-
glassware) than for critical applications. A practical approach to bution system. In contrast, sensitive applications may require
the total system design is to feed a more general-grade water water quality targeted for their specific needs. There are several
quality through the primary distribution and polish this water options for final point-of-use polishing systems that combine
to a Type I level at the points of use where the critical or sensi- the necessary purification technologies to meet specific qual-
tive work is being performed. A facility with more general appli- ity requirements of critical applications. Monitoring resistivity
cations, requiring Type III quality as the primary water quality and TOC should be included as a final check of the water quality
throughout the distribution loop, can utilize reverse osmosis used. Space requirements in the laboratory also must be con-
as the primary makeup purification technology. A facility with sidered. Installation options should include bench top, under
applications requiring Type II or USP purified water quality as the bench, or wall mounting to optimize space allocation.
the primary water throughout the distribution loop can add an Total System Control. Control and coordination of all operat-
additional purification step of deionization or electrodeioniza- ing modes, performance parameters, water quality, indicators
tion to achieve higher water quality requirements. for routine maintenance, and key alerts and alarms for the total
Electrodeionization, as a continuous low-energy process, pro- system—from makeup to distribution—also need to be part of
vides advantages over traditional deionization since there is no the total system design. Easy and user-friendly access must be
need to exchange resin cartridges or to chemically regenerate provided to the controls and displays for simplified, convenient
the resins. The pretreatment system should consider the feed system operation, monitoring, and maintenance. Monitoring
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