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: A Compact Repetitive Nanosecond Pulsed Power Generator Based on Transmission Line Transformer
ABSTRACT
In this paper, a compact repetitive nanosecond pulsed power generator based on
transmission line transformer (TLT) is developed for non-thermal plasma generation.
The high voltage capacitor, the spark gap switch and the input side of the TLT are
built into a compact structure to obtain a fast high-power pulse. The properly designed
magnetic cores placed around the coaxial cables of the TLT have been chosen to obtain
a higher voltage gain. The layout of TLT is optimized to make the generator more
compact. Experiment test shows that voltage pulses of 30 kV with rise time of about 25
ns, pulse duration of about 100 ns, pulse repetition rate of 500 pps have been achieved.
Index Terms - High-voltage pulse generator, non-thermal plasma, transmission-line
transformer.
3k L2 C2 R1
L1 K1
T T
2.5mH A C Line 3
L 3mH
CH 2.2nF S ZL
AC C C1 Line 2
1mF 4uF
K2 Line 1
of the capacitor CH can approximately expressed as [8] : In this system, a triggered spark gap switch is developed.
Vmax Figure 3 shows the schematic diagram of the switch, it works
V(t ) [1 cos(2 t )] (1) in atmospheric pressure.
2
C1 N 2 CH
where 2 is the resonant charging anode
cat hode
L
N 2 CH C1 2
N
frequency determined by C1, L and CH, N is the transformation
ratio.
At the same time of the CH charging process, the voltage i nsul at i ng mat er i al
Vn V
Figure 2. Schematic diagram of the voltage on C1.
Vn, Vn+1 are the nth and n+1th voltage on C1 after charging, ∆Vn is the voltage on
the C1 after nth discharging. Vs, ∆V are the stabilized values of voltage on C1
after charging and discharging.
Figure 4. Schematic diagram for n-stage TLT.
Figure 2 shows a schematic diagram of the voltage on C1.
For the stabilized states of the low voltage part of the According to [6], the output voltage Vo of the TLT
generator, K. Yan had done the similar derivation in [8]. But
the difference is that the negative voltage ∆Vn at C1 is not (2Vi VT ) Z L
Vo (4)
converted to -∆Vn by another resonant charge circuit in our Z0 ZT Z L
generator. So the stabilized values can be got:
4Vi ZS Q
where VT
C N 2 CH (B+1) Z0
Vs 1 V0
CL (2) 2ZS Q
ZT (5)
C N CH 2 B+1
V 1 2 V0 B-1 2n-2
N CH (3) 1-( )
B+1 Z
Where V0 is the voltage on C, and N is the transformation Q= B= 1+4 S (6)
B-1 2n-1 Z0
ratio. 1+( )
B+1
During the pulse formation process, the spark switch and
the TLT play an important role in the performance of the and n, Z0, ZS, and ZL is the number of the TLT stage, the cable
generator. Some critical parameters such as rise time, characteristic impedance, the secondary mode and the load
repetition rate, life time and efficiency are determined by the impedance, respectively.
properties of switch and TLT. From equation (4), it is follows that when the TLT is
connected to an ideal matched load impedance, ZL=nZ0 and
2.2 THE SPARK GAP SWITCH ZS>>Z0, the output voltage is n times of input voltage, i.e.
The switch is an important section which connects the high Vo=nVi.
voltage capacitor to the input end of the TLT. A triggered According to the above when the TLT is connected to a
spark gap switch is used and triggered by a LCR trigger matched load, the voltage gain (the output voltage divided by
circuit, this type of switch has been developed in order to the input voltage) depends on the ZS. In order to obtain a
produce high levels of pulsed corona plasma at high-repetition larger ZS, the same magnetic cores are placed around the
rate and with a long lifetime by Yan [8] and Winands [9]. coaxial cables of the TLT in this work.
1196 C. Jiang et al.: A Compact Repetitive Nanosecond Pulsed Power Generator Based on Transmission Line Transformer
But for a typical TLT, the magnetic field caused by the trigger circuit, a transmission line transformer, and magnetic
secondary mode current (the current across the secondary mode cores placed around the TLT cables, as shown in Figure 1.
impedance ZS) may reach 0.5-5 kA/m within a few tens of The third cable is connected to ground, so the magnetic cores are
nanoseconds, which can bring magnetic cores into saturation placed around the first and second one only. The magnetic material
easily [8]. As a result, the saturation of the magnetic material is NiZn R250p with permeability r of 250. The values of D, D0,
must be avoided. According to [7] equation (7) must be met: D1 and D2 are chosen as 150, 10, 28 and 48 mm, respectively.
BS >BS0 , (7) According to equations (7), (8) and (9), calculated values of the
secondary mode impedance and BS0 are shown in Table 1.
0 r VP
where BS0 Table 1. Calculated values of the Z1S, Z2S and BS0.
m ZS
Parameter Line 2 Line 3
where BS is the saturation flux density of the magnetic Z1S 1.98 kΩ 2.11 kΩ
Z2S 4 kΩ 4 kΩ
material, m is the mean length of the magnetic path of the BS0 42 mT
magnetic core, and VP is the voltage over the secondary mode
impedance ZS. Equation (7) can provide the basis for choosing The Z0 of the cable (SYV50-10) and BS of the magnetic
the material of the magnetic core. core are 50 Ω and 390 mT respectively. It is obvious that ZS is
Two neighboring cables of the TLT was chosen in [7] to much larger than Z0 and BS is much larger than BS0.
demonstrate the effects of the magnetic core on the secondary According to [8,11], to avoid multiple reflections of high
mode impedance ZS. Figure 5 shows the two-cable model of voltage pulses inside the core, the transient time inside the core
the TLT with magnetic cores. must be at least longer than 50% of the pulse duration △T.
The magnetic material length h should be designed
according to the following relation [8]:
1 c T
h (10)
2 r r
where r , r and c are the effective permeability and
dielectric constant of the magnetic core and light velocity in
vacuum respectively.
According to the equation (10), in the case of this TLT,
Figure 5. Schematic diagram of two parallel coaxial cables covered with
magnetic material. D is the distance between the magnetic cores, D0 is the
pulse duration △T is 100 ns, r is 250, r is 1, the minimum
diameter of the outer conductor of the coaxial cables of the TLT, D1 and D2 length of the magnetic material can be calculated as 0.9 m.
are the inner and outer diameters of the magnetic core respectively. The total inductance of the circuit from the high voltage
capacitor to the TLT can decrease the input pulse voltage of
When only one coaxial cable is covered with magnetic
the TLT drastically. Therefore, a compact structure presented
cores, the secondary mode impedance between the two cables
in figure 6 is employed to reduce total inductance. The spark
can be written as [7]:
gap switch, the high voltage capacitor and the input side of the
2D+D 1 D 2( D+D ) - D 2D+D
(8) TLT are enclosed into this compact structure.
Z1S=120 { l n 0
+ ( r - 1) [ l n 2 +l n 0 1
] }l n 0
D0 2 D1 2( D+D0 ) - D2 D0
① ② ③ ⑥ ⑦ ⑨
When both coaxial cables are covered with magnetic core,
the secondary mode impedance between the two cables can be
written as:
2D+D0 D2 2(D+D)- D1 2D+D0 (9)
Z2S=120 { l n +( r -1)[ l n
0
+l n ] }l n
D0 D1 2(D+D)-
0
D2 D0
50 cm
impedance [10]. The fluctuation still exists in the input voltage
of the TLT, therefore, the total inductor needs to reduce further.
Magnetic
14
cores
12
10
Figure 10. Photo of the compact design.
Voltage(kV)
4 5 CONCLUSION
2 A compact and reliable high voltage pulse generator based
0 on spark gap switch and transmission line transformer has
-2 been developed. The results of experimental tests show that
-7 -6 -5 -4 -3 -2 -1
Time(ms)
repetitive pulses with maximum voltage of 30 kV, rise time of
25 ns, pulse duration of 100 ns, and repetitive rate of 500 Hz
Figure 7.The typical voltage waveforms on capacitor CH at a pulse repetition can be obtained.
rate of 500 Hz.
ACKNOWLEDGMENT
14
CH
This work was supported by the Chinese National Nature
12
Science Foundation under Grant 50777027. The author would
10
like to express great thanks to Dr. Zhen Liu from Department
Voltage ( kV)
8 trigger
of Electrical Engineering, Eindhoven University of
6 Technology, for his helpful discussion.
4
2
REFERENCES
0
[1] K. Liu, Q. Hu, J. Qiu, and H. Xiao, “A high repetition rate
-2
-200 -100 0 100 200 300 400 500
nanosecond pulsed power supply for nonthermal plasma generation”,
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20
output Heesch, “A Repetitive Pulser with Four Spark Gap Switches”, IEEE
27th Int’l. Power Modulator Sympos., pp. 478-481, 2006.
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15
[5] K. Yan, E.J.M. van Heesch, A.J.M. Pemen, P.A.H.J. Huijbrechts and
10 Input
P.C.T. van der Laan, “A 10 kW high-voltage pulse generator for
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[6] C.R. Wilson, G. A. Erickson and P.W. Smith, “Compact, repetitive,
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pulsed power generators based on transmission line transformers”,
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IEEE 7th Pulsed Power Conf., Monterey, USA, pp. 108-112,1989.
-100 0 100 200 300 400 500 [7] Z. Liu, A. J. M. Pemen, R. T. W. J. van Hoppe, G. J. J. Winands, E. J.
Time(ns) M. van Heesch and K. Yan, “An efficient, repetitive nanosecond
Figure 9. The typical voltage waveforms of the input and output side of the pulsed power generator with ten synchronized spark gap switches”.
TLT. IEEE Trans. Dielectr. Electr. Insul., Vol. 16, pp. 918-925, 2009.
1198 C. Jiang et al.: A Compact Repetitive Nanosecond Pulsed Power Generator Based on Transmission Line Transformer
[8] K. Yan, Corona Plasma Generation, Ph.D. thesis, Technische Chunyang Jiang was born in Heilongjiang, China, on
Universiteit Eindhoven, 2001, ISBN 90-386-1870-0, 2001. http://a1- 6 January 1985. He received the B.Sc. degree in
andria.tuc-n1/cx-ra2/2O--4AOf96/pdf. electrical and electronic engineering from Dalian
[9] G. J. J. Winands, Z. Liu, A. J. M. Pemen, E. J. M. van Heesch, and K. University of Technology (DLUT), Liaoning, China, in
Yan, “Long lifetime, triggered, spark-gap switch for repetitive pulsed 2008. He is currently working toward the M.S. degree
power applications”, Rev. Sci. Instr. Vol. 76, 085107, 085107-1- 6, in electrical and electronic engineering in Huazhong
2005. University of Science and Technology (HUST), Hubei,
[10] D.B. Pawelek, P.A.A.F. Wouters, A.J.M. Pemen, A.H. Kemper and China. His research interests include the pulsed power
G.J.H. Brussaard, “Design of a compact transmission line transformer and plasma technology and applications.
for high voltage nanosecond pulses”, IEEE Trans. Dielectr. Electr.
Insul., Vol. 14, pp.900-906, 2007. Shengguo Xia was born in Hubei, China, in 1968. He
[11] K. Yan, E. J. M. van Heesch, A. J . M. Pemen, P. A. H. J. Huijbrechts, received the M.S. and Ph.D. degrees in electrical
F. M. van Gompel, H. van Leuken and Z. Matyás, “A High Voltage engineering from the Huazhong University of Science
Pulse Genetator for Corona Plasma Generation”, IEEE Trans. Ind. and Technology (HUST), Wuhan, China, in 2000 and
Appl., Vol. 38, pp. 866-872, 2002. 2004, respectively. He is currently an Associate
Professor with the College of Electrical and Electronic
Engineering, HUST. His main research interests include
high voltage engineering, gas discharge physics, pulsed
power sources, and non-thermal plasmas.