Professional Documents
Culture Documents
Semiconductors
Intrinsic Extrinsic
Semiconductors semicondutors
INTRINSIC SEMICONDUCTORS
They are free from impurities
They have a valence band and a conduction band separated by a thin
forbidden band(gap) of nearly 1.0eV. For silicon, it is 1.1eV and for
Germanium, it is 0.74eV. Examples of intrinsic semiconductors are
Silicon
Germanium
The electron -holes ratio is 1:1 which implies n(e) = n(h)
Conductance increases with increase in temperature
They become insulators or behave as such at 0K (Zero Kelvin)
When an intrinsic semiconductor is doped (impurity atoms are added)
with an impurity atom, it becomes extrinsic
EXTRINSIC SEMICONDUCTORS
a) P-type semiconductor
b) N-type semiconductor
Doping is achieved in the following three ways
I. The crystal is heated in an atmosphere containing the dopant atoms. The dopant
atoms diffuse into the hot crystal
II. The impurity atoms ate added in the molten state of the semiconductor
III. The intrinsic semiconductor is bombarded by ions of the impurity atoms
N-TYPE
Intrinsic semiconductor is doped with group V atoms such as phosphorus, arsenic or
antimony. These impurities are pentavalent C5-electrons on their outermost shells.
Four of the five electrons are involved in covalent bonding. The fifth electron is loosely
bonded. It is available as a carrier of current. It has lower energy than the energy of the
conduction band. The majority carries are the electrons (negative electrons). The holes
are minority carriers.
NB:
In N-type semiconductors, the donor electrons are all free at room temperature
and are the main current carriers. The number of electrons constituting current
ne = nd where nd=donor electrons
In the P-type semiconductor, conductivity is considerably increased due to the
excess hole numbers nh >>>ne
V e =electrondrift velocity
E=Electric field strength
Also, for the holes
Vh
μh =
E
μh=hole drift velocity per unit electric field
PN JUCNTION
A p-n junction is formed by fusing an n-type semiconductor with a p-type
semiconductor or growing an n-type semiconductor on a p-type semiconductor.
P-type N-type
Second diagram
A small layer in the vicinity of the junction is depleted of free charge carriers
Electrons diffuse across the barriers into the p-type leaving more holes to
wander in the n-type and excess electrons to remain on the p-type.
The depletion layer is of the order 1µm=1×10-6m thickness
Due to differences in concentration, electrons diffuse from n-type to p-side and
also holes from p-side to n-side
P-type(side) attains lower potential than the n-side
An electric field is created and directed from n-type to the p-type
No free charge carriers are left in the depletion layer of the junction due to
electron-hole combination.
The width of the depletion layer depends on the following
i. Nature of semiconductor
ii. Nature of impurity
iii. Temperature
Ohm’s law is not obeyed in a p-n junction
Barrier potential of silicon p-n junction is about 0.6V at room temperature and
0.3V for germanium
A P-N junction diode is an electronic valve. It is a device which allows electric current to
flow in only one direction
Two -Diagrams
Diagram
RECTIFICATION
Rectification
γ=√
( )
V rms 2
V DC
-1
2 2
2 V rms −V DC
γ= 2
V DC
I max
DC=( )
π
I max=Maximum DC load
FULL-WAVE RECTIFIER
Both halves of the AC wave cycle are tapped.