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1Å (angstrom) = 10-8cm
1μm = 10-4cm
1eV=1.6•10-19J
Intrinsic Carrier Concentration at 300K for:
Si = 1.5•1010cm-3
Ge = 2.5•1013cm-3
GaAs = 2•106cm-3
Relative Permitivity of SiO2 εr, SiO2 = 3.9 Electron affinity of Si qχSi = 4.05eV
1
MSE3025 반도체소자 학번:
Final exam (2020) 이름:
Fermi Function
1
f (E) =
1 + exp[( E − E F ) / kT ]
Carrier Concentrations
n0 = f ( E ) N ( E )dE N
EC
c f ( Ec ) N c exp[ −( E c − E f ) / kT ]
EV
p0 = N ( E )(1 − f ( E ))dE N
V [1 − f ( EC )] NV exp[ −( E f − EV ) / kT ]
3/ 2
2mn*, p kT
N C ,V = 2
h2
n0 = ni exp[( E F − Ei ) / kT ]
p0 = ni exp[( Ei − E F ) / kT ]
n0 p0 = ni
2
ni = N C NV exp[ − Eg / 2kT ]
2kT
3/ 2
2
MSE3025 반도체소자 학번:
Final exam (2020) 이름:
J = E
= q(n0 n + p0 p )
1
=
Hall measurement
z
Bz
y
x
Ey
L
t Ex
1 1 RH
RH = RH = − =
qp0 or qn0
Haynes-Shockley Experiment
L = vd (x) 2 (tL) 2
vd =
td
p
E D p = 16t = 16t 3 (x = tvd )
d d
3
MSE3025 반도체소자 학번:
Final exam (2020) 이름:
PN junction
kT p p kT N a N d
V0 = ln = ln 2
q pn q ni
1/ 2 1/ 2
2V0 1 1 2 (V0 − V ) 1 1
W = + (equilibrium), W = + (with bias)
q N a N d q N a N d
Na Nd
xn0 = W , xp0 = W
Na + Nd Na + Nd
Dp qV
p n + n n p e kT − 1 = I 0 e kT − 1
D qV
I = qA
L Ln
p
1/ 2
q Nd Na A
C j = A =
2 (V0 − V ) N d + N a W
JFET
1/ 2
2 (V − VGD )
W = S 0
qN a , if not ignoring V0
V 2 VG
3/ 2
2 VD − VG
3/ 2
I D = G0VP + − −
D
Linear region G0 = 2aZ / L
VP 3 VP 3 VP
MOSFET
1/ 2
2
W = S S
qN a
Qi Qd
VT = m s − − + 2 F (Assuming all oxide charges are located at the interface)
Ci Ci
n Ci (VG − VT )VD − VD 2 Linear region
Z 1
ID =
L 2
4
MSE3025 반도체소자 학번:
Final exam (2020) 이름: