Professional Documents
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Biochip Technology
of MEMS
Dr. Bruce K. Gale with special thanks to
Fundamentals of Micromachining Xiaolian Gao, University of Houston
Sequence 301
361
gcacctttgc
tcaggctcct
cacactgagt
gggcaacgtg
gagctgcact
ctggtctgtg
gtgacaagct
tgctggccca
gcacgtggat
tcactttggc
cctgagaact
aaagaattca
421 ccccaccagt gcaggctgcc tatcagaaag tggtggctgg tgtggctaat gccctggccc
481 acaagtatca ctagctcgct ttcttgctgt ccaatttcta ttaaaggttc ctttgttccc
22 Coupling
Coupling Ni OR O 33 Oxidation
Oxidation
___ ___ ___ ___
PPP PPP PPP PPP
___ ___ ___ ___
PPP PPP PPP PPP HHH P P P HHH P P P
OOO OOO OOO OOO PGA OOO OOO OOO OOO OOO OOO OOO OOO _
DMT-O LLL LLL LLL LLL Precursor LLL LLL LLL LLL LLL LLL LLL LLL T-OP
O-P-amidite
CH2Cl2
Ni
Ni N1
N1 DMT-O O N1
HO
HO
- =
O- P -O
O-OP -O N1 hv hv
OR O
-
precursor
O- P-O
O N2
C-O P AAA AAA CCC CCC
- =
O- PGA G-OP _
OR P -O LLL LLL LLL LLL LLL LLL LLL LLL
- =
precursor
OR O- P -O T-OP
OR O
Basic Fabrication Photoresist Method
• A, C, G, and T bases • Single layer and
applied to each layer bilayer methods
– Each has its own • Bilayer method
protective block provides better
• Photolithography or chemistry for
printing used to define nucleotides
location by removing
block
• Multiple methods