Phase-out AZ5214E

EU version
Photoresist comparison NEGATIVE processing

February 4, 2021
Wiesbaden
 Phase-out AZ5214E Content
EU version Photoresist comparison NEGATIVE processing

1. Spin curve comparison

2. Process parameters
3. Exposure Latitude
4. Linearity
5. Focus Latitude

2 04.02.2021 Phase-out AZ5214E EU version

 Phase-out AZ5214E
Spin Curve comparison
EU version

film thickness /µm Spin curves

spin speed
AZ 5214E [EU] vs. AZ 5214E [JP]
/RPM AZ 5214E [EU] AZ 5214E [JP] 5.00

500 4.32* 4.06* 4.50

4.00

film thickness /µm

1000 3.12 2.93
3.50

2000 2.18 2.06

AZ 5214E [EU]
3.00
AZ 5214E [JP]

3000 1.77 1.67 2.50

4000 1.53 1.44 2.00

1.50
5000 1.37 1.29
1.00
0 1000 2000 3000 4000 5000 6000 7000
6000 1.26 1.18 spin speed /RPM

* no ideal coating at this speed

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 Phase-out AZ5214E Process Parameters
EU version negative processing

AZ 5214E [EU] AZ 5214E [JP]

Substrate 6'' bare silicon (HMDS prime)

Photoresist name AZ 5214E [EU] AZ 5214E [JP]

Film thickness 1.422 µm

RPM 4610 4182

Softbake 105°C / 60 s

Exposure Tool Nikon i-line Stepper

74.64 mJ/cm² 35.96 mJ/cm²

Dose to print
@ L / S: 1.00 µm

Flood exposure 900 mJ/cm², Hg lamp

Post Exposure bake 120°C / 60 s

Developer name AZ 726 MIF

Developing condition 1 x 60 s

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 Phase-out AZ5214E
Exposure Latitude
EU version

Exposure Latitude (neg. mode)

AZ 5214E [EU] vs. AZ 5214E [JP]
1.12

1.08

1.04
CD Mask / µm

1.00

0.96
AZ 5214E [EU]

AZ 5214E [JP]

0.92

0.88
10 35 60 85 110
Exposure / mJ/cm2

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 Phase-out AZ5214E Exposure Latitude
EU version negative processing

Exposure: 53 mJ/cm² Exposure: 75 mJ/cm² Exposure: 83 mJ/cm² Exposure: 97 mJ/cm² Exposure: 102 mJ/cm²
CD: 1.00 µm CD: 1.00 µm CD: 1.00 µm CD: 1.00 µm CD: 1.00 µm

AZ 5214E
[EU]

Exposure: 28 mJ/cm² Exposure: 36 mJ/cm² Exposure: 41 mJ/cm² Exposure: 47 mJ/cm² Exposure: 52 mJ/cm²
CD: 1.00 µm CD: 1.00 µm CD: 1.00 µm CD: 1.00 µm CD: 1.00 µm

AZ 5214E
[JP]

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 Phase-out AZ5214E
Linearity
EU version

Linearity (neg. mode)

AZ 5214E [EU] vs. AZ 5214E [JP]
2.00

1.80

1.60
CD Resist / µm

1.40

1.20

1.00

AZ 5214E [EU]

0.80 AZ 5214E [JP]

0.60
0.60 0.80 1.00 1.20 1.40 1.60 1.80 2.00

CD Mask / µm

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 Phase-out AZ5214E Linearity
EU version negative processing

CD: 0.55 µm CD: 0.60 µm CD: 0.65 µm CD: 0.70 µm CD: 0.75 µm
Exposure: 75 mJ/cm² Exposure: 75 mJ/cm² Exposure: 75 mJ/cm² Exposure: 75 mJ/cm² Exposure: 75 mJ/cm²

AZ 5214E
[EU]

CD: 0.55 µm CD: 0.60 µm CD: 0.65 µm CD: 0.70 µm CD: 0.75 µm
Exposure: 36 mJ/cm² Exposure: 36 mJ/cm² Exposure: 36 mJ/cm² Exposure: 36 mJ/cm² Exposure: 36 mJ/cm²

AZ 5214E
[JP]

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 Phase-out AZ5214E Linearity
EU version negative processing

CD: 0.80 µm CD: 0.90 µm CD: 1.00 µm CD: 1.10 µm CD: 1.20 µm
Exposure: 75 mJ/cm² Exposure: 75 mJ/cm² Exposure: 75 mJ/cm² Exposure: 75 mJ/cm² Exposure: 75 mJ/cm²

AZ 5214E
[EU]

CD: 0.80 µm CD: 0.90 µm CD: 1.00 µm CD: 1.10 µm CD: 1.20 µm
Exposure: 36 mJ/cm² Exposure: 36 mJ/cm² Exposure: 36 mJ/cm² Exposure: 36 mJ/cm² Exposure: 36 mJ/cm²

AZ 5214E
[JP]

9 04.02.2021 Phase-out AZ5214E EU version

 Phase-out AZ5214E Linearity
EU version negative processing

CD: 1.30 µm CD: 1.40 µm CD: 1.50 µm CD: 2.00 µm CD: 3.00 µm
Exposure: 75 mJ/cm² Exposure: 75 mJ/cm² Exposure: 75 mJ/cm² Exposure: 75 mJ/cm² Exposure: 75 mJ/cm²

AZ 5214E
[EU]

CD: 1.30 µm CD: 1.40 µm CD: 1.50 µm CD: 2.00 µm CD: 3.00 µm
Exposure: 36 mJ/cm² Exposure: 36 mJ/cm² Exposure: 36 mJ/cm² Exposure: 36 mJ/cm² Exposure: 36 mJ/cm²

AZ 5214E
[JP]

10 04.02.2021 Phase-out AZ5214E EU version

 Phase-out AZ5214E
Focus Latitude
EU version

Focus Latitude (neg. mode)

AZ 5214E [EU] vs. AZ 5214E [JP]
1.16

1.12

1.08

1.04
CD Mask / µm

1.00

0.96 AZ 5214E [EU]

AZ 5214E [JP]

0.92

0.88

0.84
-1.70 -1.50 -1.30 -1.10 -0.90 -0.70 -0.50 -0.30 -0.10 0.10 0.30 0.50 0.70

Focus / µm

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 Phase-out AZ5214E Focus Latitude
EU version negative processing

Focus: -1.5 µm Focus: -1.1 µm Focus: -0.7 µm Focus: -0.1 µm Focus: 0.3 µm
Exposure: 75 mJ/cm² Exposure: 75 mJ/cm² Exposure: 75 mJ/cm² Exposure: 75 mJ/cm² Exposure: 75 mJ/cm²

AZ 5214E
[EU]

Focus: -1.5 µm Focus: -1.1 µm Focus: -0.7 µm Focus: -0.1 µm Focus: 0.3 µm
Exposure: 36 mJ/cm² Exposure: 36 mJ/cm² Exposure: 36 mJ/cm² Exposure: 36 mJ/cm² Exposure: 36 mJ/cm²

AZ 5214E
[JP]

12 04.02.2021 Phase-out AZ5214E EU version

 Disclaimer

Products are warranted to meet the specifications set forth on their label/packaging and/or certificate of
analysis at the time of shipment or for the expressly stated duration. All sales are subject to Merck’s
complete Terms and Conditions of Sale. Prices are subject to change without notice. We reserves the right
to discontinue products without prior notice.
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OR IMPLIED, INCLUDING MERCHANTABILITY OR FITNESS FOR A PARTICULAR USE, WITH RESPECT TO
SUCH INFORMATION OR ITS APPLICATION. Customers must independently determine the suitability of
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shall be responsible for obtaining any applicable third party intellectual property licenses. Any reference
from our literature requires prior written consent and in any reference the source shall be stated.

13 04.02.2021 Phase-out AZ5214E EU version