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Introduction
IC technologies :
• NMOS
• PMOS
• CMOS
• SOI
• BiCMOS
• GaAs
Lecture-2-Fabrication
• Wafer Processing.
• Mask making.
• Photolithography.
• Oxidation.
• Diffusion.
• Etching.
• Poly-gate formation.
• Metallization.
Lecture-2-Fabrication
Lecture-2-Fabrication
Mask making :
• After complete design the drawing is broken
into subsequent IC processing steps.
• These steps are called mask levels.
• Electron beam machine known as pattern
generator is used for mask making.
• The interface is CIF between layout and mask
machine.
• Mask machine transfers design features
directly on photosensitive glass plate using
CIF.
Lecture-2-Fabrication
1. Photoresist Coating.
2. Pre baking.
Lecture-2-Fabrication
Lecture-2-Fabrication
4. Development.
5. Post baking.
Lecture-2-Fabrication
Lecture-2-Fabrication
Lecture-2-Fabrication
Lecture-2-Fabrication
Goal :
1. Control of impurity concentration.
2. Uniformity.
3. Reproducibility.
Lecture-2-Fabrication
Metallization :
Lecture-2-Fabrication
Lecture-2-Fabrication
Lecture-2-Fabrication
Lecture-2-Fabrication
Lecture-2-Fabrication
Lecture-2-Fabrication
Lecture-2-Fabrication
Lecture-2-Fabrication
Lecture-2-Fabrication
Lecture-2-Fabrication
Lecture-2-Fabrication
Next Class Topic
Lecture-2-Fabrication