Soft Lithography

Reference

Dr. Gargi Raina VIT 2011

Motivation for Soft Lithography
→ Need for new techniques in micro- and nano-fabrication prompted a group at Harvard
University (George Whitesides et al) about ten years ago to start exploring methods
that get round the limitations of photolithography.
These methods are collectively known as "soft lithography".
Key Elements
• “Pattern-transfer element" or stamp that has a 3D structure moulded onto its surface

• Pattern-transfer elements are always made from an elastomer - a polymer network that
deforms under the influence of a force and regains its shape when the force is released.

(This elasticity is why these techniques are called "soft" lithography).

Making of pattern-transfer element

• Pattern transfer elements (PTE) made from PDMS

(Polydimethysiloxane)

• PTE generated from pouring PDMS prepolymers

onto a Master made from Si

• Curing of monomers to form the Elastomer and

then remove master

• Formed relief on PDMS called the STAMP

Dr. Gargi Raina VIT 2011

 Self-Assembled Monolayers

A self-assembled monolayer of a functionalized alkanethiolate, R(CH2)nS- on gold.

Modifying the organic functional group. R, controls the surface properties of the
monolayer, while varying n, the number of CH2 groups in the alkyl chain, changes the
thickness of the monolayer

In the self-assembling process, molecules spontaneously arrange

themselves on a well defined surface to form a regular lattice, thereby
minimizing their free energy. The self-assembled systems are usually
close to thermal equilibrium and therefore tend to have few defects.

Self-assembly is found widely in nature - for example, when water

molecules form a rain-drop with a smooth, curved surface or
when polypeptide chains fold into functional proteins.

Dr. Gargi Raina VIT 2011

Different Types of Soft Lithography Techniques:

• MICRO-CONTACT PRINTING

• MICROMOULDING IN CAPILLARIES

• MICROTRANSFER MOULDING

• SOLVENT-ASSISTED MICROMOULDING

• REPLICA MOULDING

• NEAR-FIELD CONTACT-MODE LITHOGRAPHY

Dr. Gargi Raina VIT 2011

MICRO-CONTACT PRINTING

Various Steps:

• PDMS replica from a master used as

STAMP

• Ink applied to STAMP (for e.g.

CH3(CH2)15SH), alkanethiol

• Inked STAMP placed on metal-coated Si

substrate

• A Self-assembled-Monolayer (SAM)
forms in regions of contact

Dr. Gargi Raina VIT 2011

MICROMOULDING IN CAPILLARIES
(MIMIC)
Various Steps:

• PDMS mould with channels placed on a

substrate forming network of capillaries

• A drop of viscous liquid prepolymer

placed at one end of channel & drawn
into the capillaries

• Polymer is cured by heating or

exposing to UV-radn to form network
within PDMS channels

• After removal of mould, polymeric

structures left supported on substrates

Dr. Gargi Raina VIT 2011

MICROTRANSFER MOULDING

Various Steps:

• Small drop of liquid prepolymer poured

on PDMS mould

• Excess polymer wiped off from surface

of mould

• Filled mould placed on substrate and

prepolymer cured by heating or UV-radn

• After removal of mould, polymeric

structures left supported on substrates

Dr. Gargi Raina VIT 2011

SOLVENT- ASSISTED MICROMOULDING
(SAMIM)
Various Steps:

• A thin layer of prepolymer first coated

on planar or curved surface

• PDMS mould wetted with liquid that is

good solvent for the prepolymer

• When mould brought into contact with

substrate, the solvent dissolves (or
swells) the polymer

• Dissolved polymer flows and conforms

to shape of features of mould (5 mins)

• After the solvent dissipated completely,

embossed polymer can be peeled from
substrate.

Dr. Gargi Raina VIT 2011

REPLICA MOULDING

Various Steps:

• PDMS replica coated with a polymeric

precursor such as polyurethane

• After curing of polyurethane by heating

or UV-radn, it is separated from mould

• Hence obtain polymeric replica of

original master

Dr. Gargi Raina VIT 2011

NEAR-FIELD CONTACT-MODE LITHOGRAPHY

Various Steps:

• Surface coated with photosensitive

material or “photoresist

• PDMS stamp placed over the above

• Material then exposed to UV light

through the mask

• After chemical development, features

about 100 nm wide form at phase
boundaries along the mask edges

Dr. Gargi Raina VIT 2011

Examples of Soft Lithography
patterns

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 Micro-contact Printing
Master used ÆCD

AFM image of a PDMS stamp prepared using CD as mould

B
A

AFM 3D view

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 APTMS patterned on Si wafer using PDMS stamp

B
A
C

CONTACT TIME BETWEEN PDMS STAMP AND SILICON WAFER 20MINUTES@670C

Optical image
AFM 3D view

20µm
Dr. Gargi Raina VIT 2011
 MIMIC

A scanning electron microscopy (SEM) image of a free-standing polyurethane grid made

using the technique of micromoulding in capillaries (MIMIC). The polymeric microstructure
was freed from the substrate on which it was formed by dissolving a sacrificial layer of
SiO2 (grown prior to MIMIC by heating the silicon wafer in air to 1100 °C for several hours)
in an aqueous solution of hydrogen fluoride

Dr. Gargi Raina VIT 2011

MIMIC

An SEM image of polystyrene beads crystallized from

an aqueous dispersion inside capillaries that were
formed and patterned using MIMIC

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 ZnO Nanoparticles patterned on Si through PDMS channels

Pattern
direction
PDMS stamp
Silicon
wafer

ZnO in different solvents

AFM image

C
A

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SEM image Optical image

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Microtransfer Moulding

An SEM image of a three-layer polyurethane grid fabricated in

three steps using the technique of microtransfer moulding

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Microtransfer Moulding

An SEM image of a glassy carbon deflector made using microtransfer moulding.

The structure, which was formed from a furfuryl alcohol-phenol resin that was
then heated at 1000 °C, is slightly buckled due to shrinkage and mass loss
during heating. The structure is electrically conducting, and when
electrostatically actuated, the central plate twists in and out of the plane of
the supporting frame, along the axis of the spring-like, serpentine arms

Dr. Gargi Raina VIT 2011

 Solvent-Assisted Micro-Moulding (SAMIM)

An SEM image of a microelectronic test pattern formed using the technique

of solvent-assisted micromoulding (SAMIM) in a thin film of a Novolac
polymer photoresist using ethanol as the solvent. The height variations
replicated in the polymer show that this technique can be used to fabricate
quasi-three dimensional structures in a single step.

Dr. Gargi Raina VIT 2011

Near-Field Contact Mode Lithography

Dr. Gargi Raina VIT 2011

Dr. Gargi Raina VIT 2011
Dr. Gargi Raina VIT 2011