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Abstract-In VLSI technology, continuous scale down of the • Soft Error Rate: the a-generated charges are less, due to
transistor proves the Moore's law which describes the transistors the presence of buried oxide. Scaling of the device
placed in a chip doubles in every 2 years. As MOS transistors reduces the charge generation volume, the Qcrit
sizes scales down, challenges and limitations also doubles in each decreases due to a lower capacitance at the cell's
shrinking of the transistors such as short channel effects and sub
storage node and scaled V DD.
threshold voltage variations etc. To reduce such challenges and
keep shrinking the size of transistor will attain the certain level of
• Strained-Si channel and high-K gate: strained Si
achievements in nanoelectronics with the help of FINFET based
surface channel CMOS has high- performance
transistors. In this paper, we've described about FINFET based applications due to higher mobility and improved
Arithmetic Logic Unit (ALU) is developed which acts as core current. The lattice mismatch between the Si channel
part of a CPU, with the arithmetic functions such as addition, and the SiGe layer results in biaxial tensile strain, it
subtraction, and logical functions such as AND, OR etc. reduces the scattering by increasing sub-band splitting
and enhances carrier transport by reducing
Keywords- FINFET; 4-Bit ALU conductivity effective mass. High-k dielectrics are
used to contain the gate leakage and extend device
I. INTRODUCTION scaling. The high-k has the band gap less than Si02,
MOSFET technologies that are proposed as a by which tunneling leakage is reduced. High-k has
replacement to planar devices that uses gates on more than charge-trapping related instability and mobile
one side of a thin channel have shown better short channel degradation. By integration the High-k gate, the
characteristics. These FIN type devices have a single gate higher gate capacitance per unit area and mobility is
wrap around multiple silicon surfaces. These devices offer improved.
excellent characteristics for a given bias across the gate.
Scaling down in the MOS transistor increased the FINFET offers distinct advantages for scaling to very
interconnections and limits the circuit density. This is short gate lengths. Fabrication of the FINFET- DGCMOS is
intended the VLSI technology to invent the new transistor similar to that of the conventional CMOS process, with only
called FINFET. minor disruptions, offering the potential for a rapid
deployment to manufacturing. The channel of the FINFET is a
II. BACKGROUND THEORY tiny chunk of un-doped silicon perpendicular to the substrate.
The un-doped channel eliminates the coulomb scattering due
A. FINFET to impurities resulting in higher mobility in FINFETs. The
The major design issues in Metal Oxide height of the FIN, hfin, acts as the width of the channel.
Semiconductor Field Effect Transistor (MOSFET) based
designs are [1]: The channel width of FINFET is given by W=nfin*
hfin, Here, nfin is the number of fins in the transistor.
• Gate oxide tunneling leakage: as the gate oxide
thickness is scaled to maintain gate control voltage VT The control of the short channel effects for FINFETs is
and performance, gate insulator direct tunneling provided by the two gates without aggressively scaling down
leakage increases. The electron tunneling from the the gate-oxide thickness and increasing the channel doping
Valence Band (EVB) generates the substrate current density. The modes of FINFET operation identified are [2]:
in both nMOS and pMOS. This substrate current and • The short-gate (SG) mode - where transistor gates tied
its effects are neglected in bulk CMOS. together, as shown in the figure 1 with an example of
• Self heating: the heat transfer is dominated by NAND gate.
photon transport in semiconductors and by electron • The independent gate (IG) mode-where
transport in metal. The thermal resistance increase is independentdigital signals are used to drive the two
prominent for thinner Si film with thick buried oxide. device gates, the mode is explained in the figure
2, taking the example of NAND gate.
� j �j ;;
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B
B A
A
Figure 3: LP-mode[2] Figure 4: IG/LP-mode[2] In the figure 6, the logical operations are performed using
the basic logic gates, the delay for each logic operation would
be delay through the gate. The Arithmetic operations make use
of the complete adder. Increment and decrement operations are
B. Arithmic Logic Unit(ALU) [3][4]
special cases of addition and subtraction. Increment operation
The design of 4-bit ALU of the ripple carry adder is equivalent to an addition byl and subtraction is equivalent to
model, which performs four arithmetic and four logical 2's complement addition. The delay for each arithmetic
operations. The four arithmetic operations include ADD, operation is more complex than that of the logical operation as
SUBTRACT, INCREMENT and DECREMENT. The four it depends not only on the type of logic used to construct the
logical operation are AND, OR NOT and IDENTITY. 4-bit SUM and CARRY units of the full adder, but also input pattern
ALU is designed by cascading four I-bit ALU blocks. Each 1- and the critical paths in the circuit. Optimizing the design of
bit ALU is composed of the following four components: the full adder optimizes all operations to some extent.
l. Arithmetic 4:1 multiplexer,
2. Full adder, A
AND
3. Logical 4:1 multiplexer, R
logical operation. B OR
::E
-
�
OUTPUT
191
Table I. Operation of ALU F = (A. SO'. SI ')+(B. SO. Sl')+(C. SO'. S1)+(D. SO. S1).
52 51 50 Mnemonics Description
Add Data-A and Oata-B
0 0 0 Addition Oata-A + Data-B = Result
Cis Carrv for Addition
Subtract Data-A and D ata-B
0 0 1 Subtraction Data-A - Data-B = Result B
C i s Borrow for S ubtraction
I ncrernent Data-A by 1
0 0 Increment Data-A + 1 = Result
Carry bit has to be 1 c;
Data-B has to be 0 Tl"T I
Decrement Oata-A by 1
0 Decrement Oata-A - 1 -= Result
Carry bit has to be 0
D,_---'TTT I I
Data-B has to be 1
logical AND for Data-A and Data-B
0 0 AND Data-A & Data-B = Result
C is Don't Care
• 4:1 Multiplexers
• Exclusive -OR, AND, OR and INVERTER gates y
A B
• Full Adder block
• 2:1 Multiplexer
The blocks are developed using the dual-gate IG-mode
of FINFET modeling. As shown in the figure 7, the two
vertical gates of the Single-FINFET is separated by an oxide
on top of the silicon FIN, thus forming an independent- gate Figure 9: AND Gate using IG-mode FINFET
FINFET. An IG FINFET works on two modes of
operation with different I-V characteristics depending on
input bias to gates. In the dual-gate mode, the two gates are The OR gate is a digital logic gate that implements
biased with the same signal and in the single-gate-mode; one logical disjunction- it behaves according to the truth table to
gate is biased with the input signal to induce channel the right. A HIGH output results if one or both the inputs to
inversion while the other gate is disable. As two gates are the gate are HIGH. If neither input is HIGH, a LOW output
strongly coupled in the dual-gate- mode, the threshold results. The schematic is shown in the figure 10, using IG
voltage IVthl is lowered when compared to the single-gate mode FINFET.
mode. For example, the maximum drain current VDD
produced in the dual-gate-mode is 2.77 times higher as
compared to the single-gate-mode in a minimum-sized P
channel FINFET.
y
A B
Bac.kG_
192
VDD D. 2:1 Multiplexers:
The 2:1 MUX is an combinational design, the 2 input are
13 given and one output. The output depends on the select input
of the design. The Boolean equation is given by
A 13 Y=(A. S')+ (B. S).
A 13
The schematic of the 2:1 MUX is shown in the figure 13.
'GND
first stage. The outputs are SUM and CARRY. The Boolean select lines of the MUX SO and S, will be used to select
expression for SUM and CARRY bits are given below. the operations that the ALU performs. The input lines of the
MUX will BO (used for addition), BOn(used for
SUM=A Ef)BEf)Cin.
subtraction),O(used for increment) and 1 (used for decrement).
The input lines of 4:1 MUX corresponds to only Input Date-B.
CARRY=AB+BCin+CinA.
The next block is Full Adder block. The input Data-A
SUM bit is the EXOR function of all three inputs and and carry Bit will be given externally to the FULL ADDER.
CARRY bit is the AND function of the three inputs. The With these 3 input variables the Arithmetic operations will be
schematic of the full adder using AND OR and EX-OR gates ,
performed with respect to the select lines. The next block is
is shown in the figureI2. being the Logical Block which again requires a 4:1 MUX The .
D-- select lines will be the same as SO and S l. The input lines for
::::JC>L::::JC>------o SU�I
XOR2
the second 4:1 MUX is AND (Intermediate stage output in
carry), OR, NOT (Inverter used for subtractor) and
J IDENTITY. As AND NOT logic gates are already used for in
,
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Table Ill: Delay and power of the ALU Design operations V. CONCLUSION
195