Professional Documents
Culture Documents
by David R. Gabe
Institute of Polymer Technologyand Materials Engineering, Loughborough Universityof
Technology, Loughborough, Leicestershire, U.K.
Plating cells are employed to define the link between processing conditions and deposit
properties and characteristics for electrodeposition.
Process Parameters:
Solution concentration
Conductivity, pH
Temperature
Current density
Voltage/potential
Deposit Parameters:
Composition/purity
Thickness uniformity
Smoo~ness, brightness
Hardness, ductility, strength
Grain size
The electroplater needs a rapid and convenient test method to give a good, not
necessarily precise, indication of this interaction and, in particular, to indicate any departure
from perceived optimum process conditions and then provide the means of correcting that
departure. A number of cells have been devised to give such a convenient link. They attempt
to correlate the parameters of prime concern--composition and current density--with deposit
thickness and thickness distribution. Figure 1 and Table I illustrate this choice.
Some of the cells in Fig. 1 and Table I have very specific applications, e.g., D and K for
chromium plating, where the throwing power (TP) is poor and the CrO3:SO 4 catalyst ratio is
critical. Two (B,F) have been adopted for wider use on account of their versatility.
HARING-BLUM CELL
This cell was devised as a TP cell and consists of a long, narrow plating box with one
central movable anode and two cathodes placed at relative distances, typically of 5:1 from the
anode. TP is calculated from a formula, the classic Haring version being:
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.I1..... \ 1 A
I1o G
-I-
-!- o~ +
~
JHc
-t-
[I, :it;
-
F
II f .... I +
d
~a IJI I 1 4-
K
% TP = 100 ( L - R ) / L
where L is the far-to-near cathode distance ratio and R is the ratio of weights of deposits on
the cathodes.
The experimental principle is well established, but a number of alternative formulas have
been used primarily to either give a symmetrical TP scale or to expand the scale at specific
ranges. Three other TP index formulas in use are
Heatley:
% TP = 100 ( L - M / ( L - 1 )
Field."
% TP = 100 ( L - M / ( L + M - 2 )
Subramanian:
% TP = 100 ( L - M ) / M ( L - 1 )
Of these formulas, that of Field has been most widely used and is incorporated in some
standards (e.g., British Standard 205 part 5), with L = 5:1, largely because the values of TPcan
vary from + 100 to - 100, with a value of TP = 0 when the current and metal distribution are
equal. This scale gives the poorest TP of - 1 0 0 % (as M --> ~ when there is no metal
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Colorimetric
Analysis of Metal Hull CellCathodePanels
Finishing & Metal 267mL Zinc CoatedSteel . . . . . . . . $20.001100
Working 267mL Brass . . . . . . . . . . . . . . . . . $55.00/100
1000mL Brass . . . . . . . . . .$93.00/100
. . . . . .
deposited on the far cathode) and the best TP of +100% (for M = 1). If metal distributes
according to the length ratio (e.g., M = 5 when L = 1), the TP is 0. Values of the TP index
for each formula are tabulated in Table II for the Haring-Blum cell and several others.
Chin has proposed a logarithmic index, such that M = 1 when L = 1, which would yield
more convenient numbers for the index values. Chin's definition is:
Logarithmic TP = Log L/Log M
Graphic and computerized methods have also been developed.
HULL CELL
The Hull cell provides four basic facilities for the electroplater in plating process control:
optimization for current density range; optimization of additive concentration; recognition of
impurity effects; and indications of macro-throwing power capability.
The common type of Hull cell is the 267-ml trapezoidal container utilizing a 4-in.
(10.2-cm) cathode panel inclined at 38 ° to the parallel sides and having a 2-in. (5.1-cm) anode,
which may be corrugated to increase its electrode area. A solution depth of 2 in. (5.1 cm) gives
a volume of 267 ml; a 3-in. (7.6-cm) depth would give a volume of 320 ml. Figure 2 illustrates
the form of the standard cell. The dimensions are important to give the following
relationships:
267-ml cell: 2 g addition is equivalent to 1 oz per U.S. gal
320-ml cell: 2 g addition is equivalent to 2 oz per Imperial gal
The cell can be made of a number of materials, including Perspex, Lucite, polypropylene,
or glazed porcelain, depending upon the temperature of usage and the corrosivity of the
electrolyte. It is nowadays usual to supply them as a plain box with incorporated air bubbler
or with incorporated thermostatic heater.
ANODEn
' i 7•8" ~CATHODE
2~ "
T-F ................... - p - - a~7 ,.I
|I I SOLUTO
IN
1/2 ~ LEVEL
,
i
I- 5" .I
Fig. 2. Dimensions of the Hull cell.
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t2
3A
,7,
t0
< 2A
~a
Fig. 3. Calibration graph for a Hull cell with cell currents of 1, 2, and 3 A.
The standard cell current is 2 A, which gives a current density range of 2.4-84 A/ft z
(0.26-9 A]dm 2) corresponding to anode-to-cathode spacings of 5 to 17/8 in., respectively. The
cell is calibrated by using thickness profiles of the cathode panel and assuming appropriate
current efficiencies, such data yielding a calibration graph having curves for 1, 2, 3, etc.-A cell
currents (see Fig. 3). If preferred, a formula may be derived having the following form:
i(L) = Iappl ( a - b log L)
where i(L~ is the current density at a distance L; Iappl i s the total cell current employed; L is
the length along the panel; and a,b are constants requiring calibration. Using inch and A/ft 2
units, a = 27.7 and b = 48.7; if cm and A/cm 2 are used, a = 5.10 and b = 5.24.
Other sizes of Hull cell, which have been employed for specific purposes and
calibrations, would be:
3 × 5-in. panel with 2.5-in solution depth a =18.8; b = 28.3
6.4 × 10.2-cm panel with 5-cm solution depth a = 5.10; b = 5.24
In all cases, extremities of the cathode panel should be neglected and every attempt made
to eliminate solution impurities, residues, etc. and to maintain a consistent procedure with a
standard time of plating, typically 2 or 5 min (for 5 and 2 A, respectively). Means of
temperature and agitation control can be built in for the same reason.
Interpretation of the cathode panels relates to three pieces of derived information.
1. Establishment of the optimum plating current density range by means of the graph,
formula, or various charts. For this purpose, a mid-height line should be taken to
minimize stagnation effects at the cell bottom and to avoid emphasizing convection
effects at the top meniscus.
2. Establishment of the additive level required to create bright or level deposit zones
preferably at the center of the panel. For this purpose, aliquots of 0.5 or 1.0 g are
added to the cell, mixed in, and the effect noted.
3. Recognition of atypical appearances attributable to the presence of impurities in
solution or to additive degradation products. Experience frequently indicates an
appropriate remedy and suppliers of proprietary processes should provide guidance
notes.
A number of coding and diagrammatic systems have been used for the panel's appearances
(see Fig. 4). The panel demonstrates, in zones from left to right, high-, medium-, and low-current
density appearances corresponding to bttrned/nodular, semibright/bright/leveled to dull, or no
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BRIGHT PLATING ADDITION AGENT -NONE
A . A . 5 0 % OF OPTIMUM
A.A. OPTIMUM
A.A, 150% OF O P T I M U M
GR AY PITTED NO PLATE Do
oo×
deposit zones. The presence of additives will eliminate extremes of burning and powdery/dendritic
deposit formation and ideally widen the leveled/bright zone into a practicable working range of
current density at that temperature and solution concentration.
MODIFIED CELLS
Each of the basic cells has a number of limitations that have been recognized, but which
do not detract from usage as "qualitative procedures to provide quantitative information,"
however, in a number of specific cases, the limitation could be more serious; for example,
temperature control may be poor and metal ion concentrations may change if the test extends
over a few minutes. Various modifications have, therefore, been employed, which, for the Hull
cell, can be enumerated as in Table III.
The most serious shortcoming relates to the use of agitation to enhance deposition rates
in high-speed electrodeposition processes when a correlation factor of 5 to 50 times may apply
between the "static" Hull cell and the "dynamic" plating tanks. This factor can be determined
typically by comparing bright plating ranges for the Hull cell with those identified for the
tank; recently, however, several proposals have been made for current density distribution
cells incorporating electrode rotation as a convenient means of quantitative agitation. They
utilize rotating cone electrodes; rotating cylinder electrodes; or rotating electrodes in baffled
cells.
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In general, all appear to be reasonably effective, but each requires development work in
the context of a particular application to establish its credibility.
Cathodic~'~
I
Anodic
........ dwd~ I Emlll h U ra m 1 = w l n l L i B................... J~dml n JbE J~41
==,~q, iI
I
Magnet
ic~~l
mmStirerO0
5mm I
TM "1
Fig. 5. Schematic form of the Assaf throwing power cell.
585
Cells may also be adapted for other purposes. For example, it need not be necessary to
have both a Hull cell and a Haring-Blum cell in regular use, because several workers have
shown how TP can be measured using the Hull cell by measuring deposit thickness across the
regular panels. In particular, Watson7 and more recently Money and Dobre 8 have obtained
good comparable data.
A cell designed to assess throwing power in small/narrow recesses has been described by
Assaf9 and utilizes a rectangular (40 × 40 ram) or round (40 mm diameter = 0.25 dm 2)
coupon as cathode placed 5 m m in front of a dummy perspex cathode sheet (see Fig. 5). The
anode-cathode spacing is not specified but is typically 150 mm. The throwing power is
expressed as the ratio of deposit thickness on the rear compared to the thickness on the front
and as it can be suspended over the installed agitator it can overcome uncertainties of the
effect of agitation. Its use for assessing solutions for printed circuit board production has been
described and its use in assessing t h e effects of pulsed current emphasised: throwing power
ratios for pulsed current of 0.66 to 0.75 for DC plating compared to 1 for pulsed currents have
been reported thus demonstrating its sensitivity] °
Acknowledgment
This chapter has drawn on some aspects of a similarly titled article by J.B. Mohler
included in earlier editions of the Metal Finishing Guidebook. Readers requiring more
information may care to refer to those volumes.
References
1. Mohler, J.B., Metal Finishing, 32:55; 1959
2. Skwirzynski, J.K. and M. Huttley, Journal of the Electrochemical Society, 104:650; 1957
3. Gilmont, R. and R.F. Walton, Proceedings of the American Electroplating Society, 4:239;
1956; Journal of the Electrochemical Society, 103:549; 1956
4. Dimon, R.A., Proceedings of the American Electroplating Society, 35:169; 1948
5. Esih, I., Metalloberflache, 20:352; 1966
6. Teraikado, R. and I. Negasaka, Metal Finishing, 77(1):17; 1979
7. Watson, S.A., Transactions of the Institute of Metal Finishing, 37:28; 1960
8. Money, M. and T. Dobrev, Metal Finishing, 90(10):50; 1992
9. Assaf, Y., Plating, 67(10):12; 1980
10. Gabe, D.R. et al., Plating & Surface Finishing, 88(5):127; 2001
Further Reading
Gabe, D.R. and G.D. Wilcox, Transactions of the Institute of Metal Finishing, 71(2):71; 1993
Nobse, W., The Hull Cell, Robert Draper, Teddington, London, 1966
The Canning Handbook, E.E Spon Ltd., London, 1982, pages 9 3 9 - 9 4 3
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