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Classification of Transistors
Bipolar Junction Transistor
A Bipolar junction transistor, shortly termed as BJT is called so as it has two PN junctions for its
function. This BJT is nothing but a normal transistor. It has got two types of
configurations NPN and PNP. Usually NPN transistor is preferred for the sake of convenience.
The following image shows how a practical BJT looks like.
Biased Transistor
Transistor Biasing
Applying proper external voltage to a transistor is known as biasing. A
biased transistor can be operated in two modes.
Transistor as an Amplifier.
Transistor as an Switch.
Configuration of BJT
Common Base(CB)
The input parameters are VEB and IE and the output parameters are VCB and IC.
The input current flowing into the emitter terminal must be higher than the base
current and collector current to operate the transistor, therefore the output
collector current is less than the input emitter current.
Current gain in common base configuration is given as
α = Output current/Input current
α = IC/IE
BJT: Properties
BJT has been replaced by MOSFET in low-voltage (<500V) applications.
BJT is being replaced by IGBT in applications at voltages above 500V.
A minority-carrier device: compared with MOSFET, the BJT exhibits slower
switching, but lower on-resistance at high voltages.
Field Effect Transistor
• The field-effect transistor (FET) is a generic term for a device that
controls current through a circuit via an applied voltage, i.e. it behaves
like a voltage-controlled resistor.
• There are two main varieties of FETs:
• junction FETs (JFETs)
• metal-oxide-semicondutor FETs (MOSFETs)
• A FET has three terminals:
• gate (G): as in the “gate” keeper of the current
• source (S): the source of the electrons
• drain (D): the destination of the electrons
vS vG vD MOSFET (NMOS)
vS vG vD
n+ p+ n+ metal
n n+ n+ oxide
p+
p
vG
N-channel JFET
• Depletion at gate diode.
• Reverse biased gate diode increases depletion region.
–––––
Advantages of JFET
• controlled by the applied gate voltage, they draw very little gate current
and hence present a very high input resistance to any signal source
• low noise at low frequency
• the reverse-biased junctions can tolerate a considerable amount of
radiation damage without any appreciable change in FET operation.
MOSFET
FETs have a few disadvantages like high drain resistance, moderate input impedance
and slower operation. To overcome these disadvantages, the MOSFET which is an
advanced FET is invented.
MOSFET stands for Metal Oxide Silicon Field Effect Transistor or Metal Oxide
Semiconductor Field Effect Transistor. This is also called as IGFET meaning Insulated
Gate Field Effect Transistor. The FET is operated in both depletion and enhancement
modes of operation. The following figure shows how a practical MOSFET looks like.
Construction of a MOSFET
The construction of a MOSFET is a bit similar to the FET. An oxide layer is deposited
on the substrate to which the gate terminal is connected. This oxide layer acts as an
insulator (sio2 insulates from the substrate), and hence the MOSFET has another name
as IGFET. In the construction of MOSFET, a lightly doped substrate, is diffused with a
heavily doped region. Depending upon the substrate used, they are called as P-
type and N-type MOSFETs
The voltage at gate controls the operation of the MOSFET. In this case, both positive and
negative voltages can be applied on the gate as it is insulated from the channel. With negative
gate bias voltage, it acts as depletion MOSFET while with positive gate bias voltage it acts as
an Enhancement MOSFET.
Classification of MOSFETs
Depending upon the type of materials used in the construction, and the type of
operation, the MOSFETs are classified as in the following figure.
The N-channel MOSFETs are simply called as NMOS. The symbols for N-channel MOSFET
are as given below.
The P-channel MOSFETs are simply called as PMOS. The symbols for P-channel MOSFET
are as given below.
When no voltage is applied between gate and source, some current flows due to the
voltage between drain and source. Let some positive voltage is applied at VGG. Then
the minority carriers i.e. holes, get repelled and the majority carriers i.e. electrons gets
attracted towards the SiO2 layer.
With some amount of positive potential at VGG a certain amount of drain current ID flows
through source to drain. When this positive potential is further increased, the
current ID increases due to the flow of electrons from source and these are pushed
further due to the voltage applied at VGG. Hence the more positive the applied VGG, the
more the value of drain current ID will be. The current flow gets enhanced due to the
increase in electron flow better than in depletion mode. Hence this mode is termed
as Enhanced Mode MOSFET.
P - Channel MOSFET
The construction and working of a PMOS is same as NMOS. A lightly doped n-
substrate is taken into which two heavily doped P+ regions are diffused. These two
P+ regions act as source and drain. A thin layer of SiO2 is grown over the surface.
Holes are cut through this layer to make contacts with P+ regions, as shown in the
following figure.
Working of PMOS
When the gate terminal is given a negative potential at VGG than the drain source
voltage VDD, then due to the P+ regions present, the hole current is increased through
the diffused P channel and the PMOS works in Enhancement Mode.
When the gate terminal is given a positive potential at VGG than the drain source
voltage VDD, then due to the repulsion, the depletion occurs due to which the flow of
current reduces. Thus PMOS works in Depletion Mode. Though the construction
differs, the working is similar in both the type of MOSFETs. Hence with the change in
voltage polarity both of the types can be used in both the modes.
This can be better understood by having an idea on the drain characteristics curve.
Drain Characteristics
The drain characteristics of a MOSFET are drawn between the drain current ID and the
drain source voltage VDS. The characteristic curve is as shown below for different
values of inputs.
Actually when VDS is increased, the drain current ID should increase, but due to the applied VGS,
the drain current is controlled at certain level. Hence the gate current controls the output drain
current.
It is a three-terminal semiconductor switching device that can be used for fast switching with high
efficiency in many types of electronic devices. IGBT is a fusion between a BJT and MOSFET. The symbol
of the IGBT also represents the same, as you can see the input side represents a MOSFET with a Gate
terminal and the output side represents a BJT with Collector and Emitter. The Collector and the Emitter
are the conduction terminals and the gate is the control terminal with which the switching operation is
controlled.
Construction of IGBT:
IGBT has three terminals attached to three different metal layers, the metal layer of the gate terminal is
insulated from the semiconductors by a layer of silicon dioxide (SIO2). IGBT is constructed with 4 layers
of semiconductor sandwiched together. The layer closer to the collector is the p+ substrate layer above
that is the n- layer, another p layer is kept closer to the emitter and inside the p layer, we have the n+
layers. The junction between the p+ layer and n- layer is called the junction J2 and the junction between
the n- layer and the p layer is called the junction J1. The structure of IGBT is shown in the figure below.
Working of IGBT:
Consider a voltage source VG connected positively to the Gate terminal with respect to the Emitter.
Consider other voltage source VCC connected across The Emitter and the Collector, where Collector is
kept positive with respect to the Emitter. Due to the voltage source VCC the junction J1 will be forward-
biased whereas the junction J2 will be reverse biased. Since J2 is in reverse bias there will not be any
current flow inside the IGBT (from collector to emitter).
Now if we increase the applied gate voltage, due to the capacitance effect on the SiO2 layer the
negative ions will get accumulated on the upper side of the layer and the positive ions will get
accumulated on the lower side of the SiO2 layer. This will cause the insertion of negative charge carriers
in the p region, higher the applied voltage VG greater the insertion of negatively charged carriers. This
will lead to a formation of the channel between the J2 junctions which allow the flow of current from
collector to emitter. The flow of current is represented as the current path in the picture, when the
applied Gate voltage VG increases the amount of current flow from the collector to the emitter also
increases.
The output characteristics of IGBT have three stages, initially, when the Gate Voltage VGE is zero the
device is in the off state, this is called the cutoff region. When VGE is increased and if it is less than the
threshold voltage then there will be a small leakage current flowing through the device, but the device
will still be in the cutoff region. When the VGE is increased beyond the threshold voltage the device goes
into the active region and the current starts flowing through the device. The flow of current will
increases with an increase in the voltage VGE as shown in the graph.
Applications of IGBT:
IGBTs are used in various applications such as AC and DC motor drives, Unregulated Power Supply (UPS),
Switch Mode Power Supplies (SMPS), traction motor control and induction heating, inverters,
DIAC
The DIAC is a combination of two diodes in parallel, one in forward bias and the
other one is in reverse bias condition with respect to both sides. DIAC is a
specially constructed diode, which allows current to pass in both
directions when certain conditions are met.
One more interesting thing about the DIAC is, due to no specified direction of
current flow, it is considered as a bidirectional device. DIAC only has two
Anode pins, and no cathode pins are there. Those two anode terminals are often
referred to Main Terminal 1 (MT1) and Main Terminal 2 (MT2).
The construction of DIAC looks like a transistor but there are major differences.
They are as follows:
(i) All the three layers, p–n–p or n–p–n, are equally doped in the DIAC, whereas
in the BJT there is a gradation of doping. The emitter is highly doped, the
collector is lightly doped, and the base is moderately doped.
(ii) The DIAC is a two-terminal diode as opposed to the BJT, which is a three-
terminal device.
Silicon Controlled
Rectifier (SCR)
SCR (Thyristor) is a Semi-controlled switch having three terminals:
Anode (A)
Gate (G)
Cathode (K)
SCR: Junctions
Forward blocking mode – Voltage is applied in the direction that would cause
a diode to conduct (+ve to Anode and -ve to Cathode), but the thyristor has not
been triggered into conduction as no gate pulse is applied or VAC has not
reached VBO.
Forward conducting mode – The thyristor has been triggered into conduction
and will remain conducting until the forward current drops below a threshold
value known as the "holding (threshold) current ".
TRIAC (Power device for AC)
Construction Implementation & Symbol