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Lecture 7
Lecture 7
If we have a solution
and if we
containing particles like a coffee
the
towardsring
a post
Particles
droplet
forming
it the edge the
on to
coffee around
ready
of evaporation
surface
I NI
Note that coffee ring is not necessarily
in any
present in circle shape It can be
complicated shape depending on the shape of
droplet It should assume the projection of
the 3D shape of droplet dispersion
9
Enample
coffeering
effect
Trait
Feet frail't'd
Tat
remember
disordered
odd
g
If you ever spill a drop of coffee teal
almost any liquid with something suspended
or dissolved in it you will observe the
coffee ring effect No uniform stain but a
molecules
that the
what happens
is inside the
will try to goideally the
in the surface and hence to a surface
bulk of the liquidsettle down lowest
may
will has the
liquid which
shape 3D shape
spherical among any
area ud
mind Onstuicker
fakrarporation
gscrameg
egg
shape
Ssc
the
Ii
According to Deegan et Al there are three
requirements for the coffee ring effect
E
Contact line is pinned to its initial
position
I Man flux
V on a and t
Note depends
DEWI
point 9
the height her every
I to
maintain
shownwifn
the
him volume
for the removed
cat be
spherical must difference
stripe time
in At to be centre
volume
removed
every
S
But
volume
14g
removed
so IGI D TO
D Diffusivity
04
Inte 8
As Este
my
tater fair
i_
we get
do
How
forms
0 0 0 0
drying
Then a second lager is deposited on top after
so that they remain in touch with eachother
and staysconductive
00000
So basically the carbon nanotubes in the water
dispersion arranges an shown above to foam
coffeeringsand create a conductive surface which
is also transparent
There is 81 t transmission best
so we get a transparent conductive film
Conductivity 1560hm sq average respectable
blanket
a
surface
fam
Now drop small drop of soap
a
ta
drop
s p on a
d I
soap
Clogalfacetonical
on
É
clower
contractile
face
A
set outwards
stfu fi
na Ét s
to
I
contractile
Meagher
Hateabm
some ApplicatingMaragoniethet
Drying of Silicon
waters after wet processing
a
step
wet
An alcohol vapour is blown to a
surface This leads to a surface tension
I
gradient which allow the liquid to pull off
completely The alcohol essentially pushes the water
outside
a Crystal growth
of man transfer
Improve the performance
To improve MT surfactants
are added on the surface of the supporting
liquid to induce artificial Marangoni
convection
By of surface tension b w
imbalance
Artificial Rain
I goniefectinanevaporatingdooklet
Iitfeapitates it undergoes
Ist gradiatindroplet
called Marghoni number Ma
There is something
Ma a T
surface temp
At higher contact angles hisher
higher Marghoni number and there will be
presence of
recirculation
C
At lower contact angles as evaporation progresses
Waffarasonistnonvelocitfield
With Marangoni siren the difference
radial direction
in velocity is observed in
considerably
Noted
Overall we can say this
I flow
higher
the
eraparationogatgelocity
pushleft ege
to
Il dropletd d Effect
evapYatin
But
a
honk
He
sort y
has
my
i
É
coffee ring
H
But is contaminated with
water
if the
is
surfactants the Marangoni effect
suppressed because it supoen the radial
velocity recirculation
H
Hence surfactant contamination must be
avoided
Consider
Forms coffee
ring No coffee
ring
H H
Because Marangoni flow Here the Marangoni
is suppressed in water effect is so strong that
due to small interface we can see an inverse
contamination which cannot coffee ring Buildup of
be avoided
1 particles in the centre
ANOTHER STRAIGHTFORWARD WAY TO ELIMINATE
COFFEE RINGS INTERFACE CAPTURE
low
eraplemp
capillary flow
f
ratewill increase
The faster evaporation
vertically evaporating
liquid carrying particle
ANOMERMETHODqsopp.es
CHANGING THE
rinI i
SHAPE OF PARTICLES USED
int
Under appropriate conditions it anisotropic particles
are mixed with spherical particles it can
still ensure improved uniformity during
deposition
ME
At interface
interaction between 2x interactions b w
anisotropic particles spherical fartides
anisogatiicles
Mt sphericalarticles
whom
body
I
crafting
I
fgnanda
agatteach
edge
amassed
are non crystalline
the
a major reasons
so we can say there are
II agglomeration toted
Cii interfacial trapping
gym
M
it e
yummy
deform
Imminent
not
spheradoes Yffmains
and
an
sphere
toeds9iloe
imy.gl anpsdropMoweN
infested
particle dimensions
i
because particle dimensions
can greatly effect the functionality of the
formed thin film
typically 10MHz
Seth
SAWS Surface Acoustic waves can be
what happens
We already know there is an internal
capillary flow that causes the coffee ring
effect the flow can be traced as standing
Capillary waves
trapped
since there is absolutely no transport of
the the contact line
particles towards edges
IIÉÉ
we can achieve the same
result as above
by applying an
alternating
current instead
So an AC is
given to the substrate Hence
the substrate used must be conductive
ME
Electrowetting means the modification of
the wetting properties of a surface by applying an
electricfield This is the reason why the
contactlineuntin
COLLOIDAL CRYSTALS
Colloidal crystals are mono dispersed colloids
in which the colloidal particles organize themselves
in long ranged ordered crystals monodispersed
colloids are colloids containing particles of uniform
size
OPALI
Colloidal crystals are also called
opals
colloids
Opals are self assembled monodispersed
spherical
Hydrophobic Hydrophilic
I water lovingsubstrate
line
shrinking contact y
during drying contact line
pinned
H
H
Shrunkopal film
coffeering
formed
EVAPORATION ON VERTICAL SUBSTRATE
Extension of coffeering
POSSIBLE SOLUTION
Automate the deposition such that the
substrate is pulled off a detuned
speed
In the method the concept of coffee ring
is extended such that the localization takes
in the flat substrate instead of edge
place
can
evaporation their
offstage
I
t
H
Not desirable c Betterton
t
to
Hiatt interface
comin
of similar sizes
HASURFACK
a ELECTROPHORETIC DEPOSITION
electrode
Why EPD
d No expensive equipment
to
hen time consuming in comparison
Chemical and physical methods
Easily adaptable to changes in substrate
shape electrolyte composition
stabilization of powder
Inededanodel
used a
As shown in the figure they have
down to up coating process This is because
up to down approach can result in
agglomeration
Powderprocening
d Sedimentation tests
sedimentation test
is very important for
powder drocening The particles must not
sediment during deposition Based on the
colloid G liquid certain additives are
added to prevent sedimentation and ensure
stabilization
Surfactants are added in 5m02 Acetyl
eg
acetone to stabilize it from
suspension
sedimentation till 24 hours oo
till thou
Ultrasonification can stabilize the suspension
obtained
strength
ElectrodeMaterial
AMLI.IE
tophaetic
colloids
deposition to deposit
IT 02 nano on electronically conducting
glass
Usingthe method it is possible to
obtain thick homogenous films suitable
for photovoltaic applications
Colloidal monolayer
ÉA monolayer made out
of colloids
To obtain this we
assemble colloids on the
air water interface
We will have the monolayer arranged in the
air water interface similar to what spherical
particles do the bottom of a bucket
Inside the arrangement we can find different
features
boundary
Bluecolor
car dm
while missin cand
redcolors sphere
vacancy ya
gmisains
be willhexasend
There will we
where packingently
Areas packing
Fcc two
perfect good
have there
packing the arrangement
aniern
FABRICIONOFCOLOIDALMONOLAYERS
to fabricate complex it is
nanostructures
I Directassembly
ME
The monolayer can be transferred from the parent
substrate by slowly tilting the substrate the
interface 450angle
I
Is there any other method to transfer mono
lager to the air water interface
I Not
We should use Langmuir blodgett method if
ordered
we intend to transfer in an
way or controlled way
vacant
one
only space
only sp
Ectualcontrol
AI Non close packed Monolayer fabrication by
etching
Orflowrate
Both have
a
etching
Linear
dependency
Lower flowrate is desirable
a semiconductor
Higher etching rate in
like silicon is higher than Glass 5102
certain point
when we look the image from the top
there is no change in shape
lentil
O My
sphere
Final dia
Initial
overall three important aspects must be
taken care of while etching
Things to be taken care of daring etching
9f.tn
ttiscomtromina
Limitation in interparticle distance
Idf
Mang application requires non closepacked
monolayers
Pre assembly of the colloidal particles in
close
oil water interface can provide non
i
sons
Iv
arrangements
Chaika or Line t
we can arrangement
getnongeons
All these are manipulated using Langmuir
Blodgett
ME
How to make hydrophobic substrates
By glass slides with
Shin coating
PS or PMMA
Not
We can confirm the transfer of
monolayer on to the air water interface
with the presence of intense iridescent
colours
monolayers of
A Always
i
a
COLLOIDAL LITHOGRAPHY
i NANOSTRUCTURES
b
The approach takes advantage of the possibility to
colloidal particles in an order d
arrange
across areas and we can then
fashion large
to create
employ direct evaporation etching
complex nanostructures from the shadowing
effect of the colloidal spheres
SIZEREDUCTION
The monolayer has to be made
mom close packed This can be done with any
method we already studied Here plasma
induced size reduction is used
3 Silica deposition
Silica is deposited on the
in a direction
non closepacked PS monolayers
with azimuthal aisle 00
Removal of colloids
1 removed
Now the colloids
are
hydrophobicity etc
Not
How are Nanowires fabricated
M
so MACE t Colloidal etching together can
give the best resolution for vertically
aligned silver nanowires
SHE
Metal Assisted Chemical Etching Mace
MACE is now carried out by dipping
the substrate in an etching som
Etching son has oxidising agent
SKI
SummaryoffunctionsofColloidalMonouges
iay C.IN
most important parameters is
One of the
the ordering of the crystal that we can
have So how good our crystal is is a
very important question
I Mesoporous Silica
Mesoporous silica is a
Eth o s LL
teth
J
E
O Eth
y
One of the hydrogen atom breaks the bond and
the ethong group become ethanol
O Eth
I
C tho OH HzCha OH
SI
O Eth
ethanol
qtth
Eth Si OH tooth Si O Eth
dEth
H
Eth Si O Si Lotty
Eth
si
I
Sli O Eth
Otta si o
I
teth
nai
Oft
hydrophobic
Nicely
When we
try to make a thin layer
of silica that is
meroporous we will
use tetraethony silane and surfactants
together
d
What we do in this configuration is
that we dip inside the solution of
ethanol water ethanol comes as a
by product from reaction of Tetraetnonysilane
and water a glam water and then we
it out
pull
when we pull it out we wet the
surface with the Solm
As we take it out we are evaporating
our solvent
On the son have a mixture of
we
08888
At the same time the coma of water
which means water will start attacking the
tetraethony silane to produce silica
ÉE
The silica will occupy the porous places on
the surface
Ment we can either washoff our
surfactant I burn them by thermolysis
Porogens
the key idea is that
continious matrix
for disordered
Ordinary spherical micelles
mesoperous silica
MelgFTrimethylammoniam
Bromide CTA's is the
commonly used surfactant because it can form a
Y
One of the porous system with controlled
baes
Slayer of
The important feature of this system is that the
pores are interconnected The interconnection area
is called neck which allow optimal flow of
substance in the porous structure especially compared
to mesopcrous silica in which
we
might not
have continious pores as they are just inflated
micelles that are not assembled in an ordered
by
way
Catalysis
opal
Then we can co assemble the inorganic
matrix
After removing the template we will get
a Silica inorganic matrix that is
completely covered in small gold nanoparticles
It is also having a
very high surface area
This is done in a
simple way
we can
just measure the contact angle of
the liquid that we are interested in on a
flat substrate Let this be Oc
Honanisacommonneckopeningans
To modify it's
behavior we can again ur
self assembled monolayers to tomctionalize our surface
This will change the interaction b w the solvent
and the silica surface or the inverse opal
surface in general and thus we will be able to
change wettability of the material
wettability
d
completigged
areaghvisible
little still
the be
Iigdw areas
had two
acetone area
with three
water
with