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全球主要“MALDI-TOF-MS”生产厂商及其产品比较一览 页码,1/3

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全球主要“MALDI-TOF-MS”生产厂商及其产品比较一览
阅读次数:91
文章日期:2003-7-16 12:02:47

Product Overview MALDI-TOF-MS


This overview was published in the Chemisch2Weekblad, 98 (2002-18) 32-45.

Target type (No


Benchtop Reflectron Mass Laser Features (DE, PSD
Supplier Instrument of samples per
(y/n) (y/n) accuracy type etc.)
target)
yes (unique
<100 ppm
Z2 Pulsed extraction,
with 24, auto slide
quadratic seamless Post-
Amersham Ettan MALDI external loader included 337
yes field, Source Decay (PSD
Bioscience ToF calib. < for 12 slides (288 nm N2
eliminates Linear and reflectro
25ppm with unattended)
data mode
int. calib
stiching)
2x96, 100, 384,
400 well,
Applied Voyager TM yes no < 200 ppm
membrane/gel, 337 Delayed extraction
Biosystems DE BiaCore, nm N2 (DE)
Hydrofobic
masks
2x96, 100, 384,
400 well, DE, Time-ion
Applied Voyager TM yes yes
<20 ppm membrane/gel, 337 selection, PSD,
Biosystems DE-PRO (reflectron) BiaCore, nm N2 Collision-induced
Hydrofobic dissociation (CID)
masks
2x96, 100, 384,
337
400 well,
nm N2
Applied Voyager TM no yes
<5 ppm membrane/gel,
(optie
DE, Time-ion
Biosystems DE-STR (reflectron) BiaCore, selection, PSD, CID
Nd-
Hydrofobic
YAG)
masks
2x96, 100, 384,
DE, Time-ion
400 well, Solid
4700, selection, PSD, high
membrane/gel, State
Proteomics resolution MS-MS,
BiaCore, 355
Applied Analyser <5 ppm High Energy CID,
no yes hydrofobic nm,
Biosystems with TofTof (reflectron) High Throughput,
masks, Cassette 200
Automatisation,
Optics TM voor 24 Hz
Oracle database
bovengenoemde laser
platform
target platen
QSTAR
MS-MS with high-
Pulsar i TM Off-line: AB resolution in MS2.
Applied MALDI Interplate, BAI 337 With LINAC
no yes <5 ppm
Biosystems quadrupool- fraction collector, nm N2 (PULSAR) collision
vluchtijd elk LC systeem cell. Differential
hybride expression studies
systeem
flightpath
120 cm. resolution >2.500,
Linear 36 49 or 100 Gridless design DE

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Linear, 36, 49 or 100 Gridless design, DE


Bruker 337
Omniflex LT yes positive 100 ppm positions with Anchorchips for
Daltonik nm N2
mode, Scout-100 improved sensitivity
gridless MAPII robot
optics

120 cm
resolution>7.000
linear or
(reflectron) Gridless
175 cm
Lineair: 100 design, DE, PSD,
reflectron. 36, 49 or 100
Bruker ppm; 337 ISD, HIMAS
Omniflex yes Both with positions with
Daltonik Reflectron nm N2 detector,
positive&negative Scout-100
30 ppm Anchorchips for
mode and
improved sensititivty
gridless
MAPII robot
optics

resolution>18.000
(reflectron) Gridless
design, DE, PSD,
ISD, CID, HIMAS
detector,
122 cm
Anchorchips for
linear or microtitre plate
improved sensititivty
260 cm format with 384
Lineair: < Twister robot
reflectron. or 1536 posities,
Bruker 60 ppm; 337 (automated analysis
Autoflex no Both with and Twister
Daltonik Reflectron nm N2 of up to 30,000
positive&negative automated
< 15 ppm samples/day)
mode and handling of 20
Proteineer
gridless plates
Spotpicker Robot,
optics
Proteineer
Digest&Preparation
Robot, Barcode
reader, SPR
(Biacore)-MS
resolution>25.000
(reflectron), Gridles
design, DE, PSD,
ISD, CID, HIMAS
detector,
185 cm
Anchorchips for
linear or microtitre plate
improved sensititivty
340 cm format with 384
Lineair: < Twister robot
reflectron. or 1536 posities,
Bruker Ultraflex 50 ppm; 337 (automated analysis
no Both with and Twister
Daltonik TOF Reflectron nm N2 of up to 30,000
positive&negative automated
< 10 ppm samples/day)
mode and handling of 20
Proteineer
gridless plates
Spotpicker Robot,
optics
Proteineer
Digest&Preparation
Robot, Barcode
reader, upgradeable
to TOF/TOF

340 cm microtitre plate


reflectron. format with 384
Lineair: <
Both with or1536 posities, same as Ultraflex
Bruker Ultraflex 50 ppm; 337
no positive&negative and Twister TOF, with TOF/TOF
Daltonik TOF/TOF Reflectron nm N2
mode and automated MS/MS options.
< 10 ppm
gridless handling of 20
optics plates

Time-lag focussing
96 or 384 337
Micromass MicrobeLynx yes no (TLF), micro-
positions nm N2
organism library

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96 or 384 TLF, netwerk


M@LDI R, positions (in HT: 337 integration for fast
Micromass yes yes <10 ppm
LR en HT automatic target nm N2 database search fo
plate change) MFP.

337
nm N2
TOF-Spec- 96 or 384
Micromass no yes <10 ppm (optie: TLF, PSD
2E positions
IR of
ander)

Hybride, QTOF
Instrument with
perfect MS-MS
Q-TOF- 5 ppm over performance. In V-
96 or 384 337
Micromass Ultima no yes m/z 150- mode 10000
positions nm N2
MALDI 900. resolution in W
mode 17500. High
repetition rate laser
optie
Kratos Ion Trap,
AXIMA-QIT yes,
Shimadzu (Quadrupole no curved-field
<5 ppm
384 positions
337 MSn,Variable CID
with IS nm N2 control, Ion selectio
Ion Trap- reflectron
TOF) resolution >1000

<10 ppm Seamless PSD,


with IS Robotic Sample
Kratos yes,
(CFR) and 337 Processor,
Shimadzu AXIMA-CFR no curved-field 384 positions
<5 ppm nm N2 Resolution>10,000
en CFR-Plus reflectron
with IS (CFR) en >20,000
(CFR-Plus) (CFR-Plus)
Seamless PSD,
no, Linear
Kratos <50 ppm 337 Robotic
Shimadzu no flight tube, 384 positions
AXIMA-LNR with IS nm N2 SampleProcessor,
1,2m
Resolution>4000
Kratos <80 ppm
yes, Seamless PSD,
Kompact (SEQ) or 337
Shimadzu yes curved-field 30 positions Robotic Sample
Discovery en <100 ppm nm N2
reflectron Processor
SEQ (Discovery)
no, Linear
flight tube, <80 ppm
Kratos
0,7m (Probe) or 337 Robust system for
Shimadzu Kompact yes 30 positions
(Alpha) or <100 ppm nm N2 routine applications
PROBE
1,7m (Alpha)
(Probe)

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