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Noise in Spintronics
Noise in Spintronics
From Understanding to Manipulation
Farkhad G. Aliev
Juan Pedro Cascales
Published by
Pan Stanford Publishing Pte. Ltd.
Penthouse Level, Suntec Tower 3
8 Temasek Boulevard
Singapore 038988
Email: editorial@panstanford.com
Web: www.panstanford.com
All rights reserved. This book, or parts thereof, may not be reproduced in any
form or by any means, electronic or mechanical, including photocopying,
recording or any information storage and retrieval system now known or to
be invented, without written permission from the publisher.
Preface xi
Acknowledgments xiii
1 Introduction 1
1.1 Magnetoresistance 1
1.1.1 Tunnel Magnetoresistance 3
1.2 Tunneling Involving Magnetic Materials 4
1.2.1 The Rectangular Potential Barrier 5
1.2.2 Jullière Model for Spin-Dependent Tunneling 7
1.2.3 Coherent Magnetic Tunneling 9
1.3 General Motivation behind Noise Measurements
in Spintronics 11
3 Experimental Methods 41
3.1 Amplifying the Signal 42
3.1.1 The Cross-Correlation Technique 45
3.2 Data Analysis 48
3.2.1 1/f Noise Analysis 48
3.2.2 Shot Noise Analysis 49
3.2.3 Random Telegraph Noise Analysis 51
3.2.3.1 Using the time series and spectrum 51
3.2.3.2 Using only the time series 51
References 283
Index 329
Preface
The authors would like to thank many colleagues and friends for
their support. Among those who formed the Condensed Matter
Physics Department of Universidad Autónoma de Madrid and our
MAGNETRANS research group and contributed in one or other
way to the opening of the new research line related with noise in
spintronics: Raul Villar, Arkadi Levanyuk, Sebastian Vieira, Rodolfo
Miranda, Ruben Guerrero, David Herranz, Isidoro Martinez, and
Pablo Andres. Special acknowledgments and thanks go to our
long-standing international collaborators and friends Jagadeesh
Moodera, Józef Barnaś, Vitali Dugaev, Coriolan Tiusan, Michel
Hehn, Stephane Andrieu, Fanny Greullet, Fred Bonell, Yaroslav
Tserkovnyak, Stephen Russek, Minn-Tsong Lin, Jhen Yong Hong,
Günter Reiss, Gernot Güntherodt, Victor Moshchalkov, Rainer Schad,
Chris van Haesendonck, Rembert Duine, Ivo Vavra, Ursula Ebels,
Alek Dediu, Mairbek Chshiev, Felix Casanova, and Luis Hueso.
FGA thanks Stephane Mangin for his generous help with the
establishment of collaboration with Cori Tiusan. We also thank the
members of the other branch of the Magnetrans group for providing
their expertise over the last decade (Juan F. Sierra, Ahmad Awad,
Antonio Lara, and Vladimir Pryadun).
We thank Juan Carlos Cuevas and Thomas Frideriksen for
their stimulating discussions of the origin of spin-dependent noise
through molecular barriers; Ed Nowak for providing a simple
deduction of the joint thermal and shot noise formula; and Michael
Coey, Paolo Freitas, and Claude Fermon for their interest in the
discussion of different aspects of noise in spintronics. The authors
wish to acknowledge the Spanish Science Ministry (MEC, MINECO),
Comunidad de Madrid, Fundacion Seneca (Murcia), and European
xiv Acknowledgments
Introduction
1.1 Magnetoresistance
Magnetoresistance is referred to as the change of the electrical
resistance of a material or device when an external magnetic field is
applied to it. There exist several magnetoresistance effects, includ-
ing anisotropic magnetoresistance (AMR), giant magnetoresistance
(GMR) and tunneling magnetoresistance (TMR). Recent studies
show that GMR-based devices could be mainly implemented in the
high current densities spintronic, while TMR structures are more
useful in the situations when low power dissipation becomes the
main priority.
Anisotropic magnetoresistance (AMR) was discovered by
William Thomson in 1857 (Lord Kelvin) (Thomson, 1857) in iron
and nickel, which presented a dependence on the angle between
the electric current and the magnetization direction. The magnetic
anisotropy in magnetic conductors is characterized by the resistivity
of the material and depends on the angle between the external
applied magnetic field and current running through the material.
The physical origin of the AMR effect lies in spin orbit coupling. The
electron cloud about each nucleus deforms slightly as the direction
of the magnetization rotates, and this deformation changes the
Rmax M θ
R(Ω)
I
e- e- Rmin
M M π/2 3π/2
θ(rad)
(a) (b) (c)
Figure 1.1 AMR effect. The distorted electron clouds of each atom scatter
more electrons when the field is applied parallel (a) to the direction of the
current, while the scattering is minimal when they are perpendicular (b). (c)
Variation of resistance with the angle between current and magnetization.
GMR(%)
30
0
-40 -20 0 20 40
FM1 NM FM2 FM1 NM FM2 H(kOe)
100
50
0
-0.6 0.0 0.6
H(kOe)
Figure 1.3 Simplified picture of the TMR effect for 100% polarized
ferromagnets. (a) In the P state the spin majority electrons from the top
electrode easily find available majority states in the bottom layer to tunnel
into. (b) In the AP state the spin majority electrons from the top layer may
only tunnel into the scarcely available minority states of the bottom layer.
(c) Typical TMR vs. external magnetic field.
4 Introduction
Jullier (Julliere, 1975) was the first to grow and study MTJ-
based devices at low (liquid helium) temperatures, while Moodera
with co-authors (Moodera et al., 1995) and Miyazaki and Tezuka
(Miyazaki and Tezuka, 1995) observed much larger (about 10%)
changes in the tunneling resistance with magnetic state at room
temperature.
Classically, these structures usually have FM electrodes with
different coercive fields H c1 < H c2 . If an external magnetic field is
applied so H ext > H c1 > H c2 , the magnetization of both layers is
oriented along the same direction and this is referred to as the P
state. In the range H c2 > H ext > H c1 there is an antiparallel alignment
of the layers’ magnetization, the AP state. The difference of coercive
field is realized either by choosing a hard and a soft FM material
for each layer or by exchange-coupling one of the layers to an
antiferromagnet (exchange biased).
Similarly as to what happens in spin valves, the parallel or
antiparallel alignment of the layers’ magnetization presents a low
or high resistance state. This effect is called the tunneling magne-
toresistance (TMR) effect. TMR is usually given as a percentage,
corresponding to the difference in resistance between the P and
AP states normalized by the P state resistance (referred to as the
“optimistic” TMR):
RAP − RP
TMR = (1.1)
RP
V0
Ψ(x)
0 a x
EF
Levels from
which tunneling
can occur { Applied voltage eV
EF
Figure 1.5 Sketch which following (Gasiorowicz, 2003) explains the energy
diagram for tunneling between two metals separated by vacuum with an
applied potential difference V.
M
EF EF
DOS DOS
Figure 1.6 Left: sketch of the electronic bands of a normal metal.
Right: sketch of the exchange split electronic bands of a ferromagnet.
e−A (V0 − 2 )
eV 2
J (V ) = J 0 V0 −
2
eV 1
e−A (V0 + 2 ) ,
eV 2
− V0 + (1.4)
2
√
where J 0 = (2π )e2 a2 and A = 2a
2m.
(a)
EF
DOS DOS
(b)
EF
DOS DOS
Figure 1.7 Sketch explaining Jullière model (Julliere, 1975). The majority
electrons easily find available states in the P state (a) while much fewer
states are available in the AP state (b).
Δ2 Δ5 K Δ2 Δ5
Fe(001) Δ1 Fe(001) Δ1
Kz
Al-O MgO(001)
Fe(001) Fe(001) Δ1
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