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    This document summarizes the results of experiments analyzing different thicknesses of titanium dioxide (TiO2) deposited on fluorine-doped tin oxide (FTO) glass substrates for perovskite solar cells. TiO2 was deposited using both sputtering and spray pyrolysis techniques at thicknesses ranging from 5 to 30 nanometers. Key parameters such as open circuit voltage, short circuit current density, fill factor, and power conversion efficiency were measured and reported for each TiO2 thickness and deposition method. In general, higher TiO2 thicknesses around 20 nanometers produced the best performing cells when deposited via spray pyrolysis.

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    This document summarizes the results of experiments analyzing different thicknesses of titanium dioxide (TiO2) deposited on fluorine-doped tin oxide (FTO) glass substrates for perovskite solar cells. TiO2 was deposited using both sputtering and spray pyrolysis techniques at thicknesses ranging from 5 to 30 nanometers. Key parameters such as open circuit voltage, short circuit current density, fill factor, and power conversion efficiency were measured and reported for each TiO2 thickness and deposition method. In general, higher TiO2 thicknesses around 20 nanometers produced the best performing cells when deposited via spray pyrolysis.

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    1 views14 pages

    Preserations 5

    Uploaded by

    sher.baz721
    This document summarizes the results of experiments analyzing different thicknesses of titanium dioxide (TiO2) deposited on fluorine-doped tin oxide (FTO) glass substrates for perovskite solar cells. TiO2 was deposited using both sputtering and spray pyrolysis techniques at thicknesses ranging from 5 to 30 nanometers. Key parameters such as open circuit voltage, short circuit current density, fill factor, and power conversion efficiency were measured and reported for each TiO2 thickness and deposition method. In general, higher TiO2 thicknesses around 20 nanometers produced the best performing cells when deposited via spray pyrolysis.

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    of 14

    SHER BAZ

    Outlines
    • Synthesis of solutions
    • Fabrications of the normal sandwich structures
    with Ti sputtering and spray pyrolysis of Ti at
    different thickness
    • Analysis of the results
    Concentration of solutions
    ● Perovskite (MAPbI3) concentrations (Pbi2 461.2 mg ,MAI 159.6 mg
    mixed in 700 ul MA after 1 hour we add 700 ul ACN)

    ● Concentrations of Spiro-OMeTAD is 72 mg/ml in 1 ml CB


    Mix both after one hour we add additives
    4-Tbp 28.8 ul and LTiFSi 17.5 ul

    ● We papered Ti solution which containing titanium(IV)isopropoxide,


    acetylacetone (TAA) in IPA 1:19(v/v)
    Devices structure

    Al Al
    MoO3 MoO3
    Spiro-OMeTAD Spiro-OMeTAD

    MAPbI3 MAPbI3
    TiO2 TiO2
    FTO FTO
    Glass Glass

    TiO2 Sputtering TiO 2 Spray


    Parameters used during deposition.
    ● Ti solution is deposit on FTO ● Ti is deposit on FTO using
    Glass subtract using spray sputtering technique
    technique ● Thickness of Ti is around
    ● Thickness Ti thin film around 5 ,10,15 and 20 nm
    10,15 ,20 and 25 nm ● Then annealing for 1 hour
    ● Then annealing for 10 mint at at 500 C
    550 C After 2 hour it become TiO2
    After 10 mint it become TiO2 ● The thickness TIO2 become
    ● The thickness TiO2 become around 14,23 ,33 and 40 nm
    around 20 to 35 nm
    Results of TiO2
    at 50 A or 5nm

    Directions Voc,V Jsc ,mA cm -2 FF % PCE% Area ,cm^2 Rs (ohm cm^2)


    Reverse 0.7578 19.8020 30.0598 4.5106 0.0300 104.1410
    Forward 0.5481 13.0053 12.8743 0.9178 0.0300 190.5912
    Reverse 0.8180 17.3173 30.1770 4.2745 0.0300 137.9038
    Forward 0.6829 8.0800 10.2482 0.5655 0.0300 456.1489
    Results of TiO2
    at 100 A or 10nm

    Directions Voc,V Jsc ,mA cm -2 FF % PCE% Area ,cm^2 Rs (ohm cm^2)


    Reverse 0.9145 20.5693 39.0324 7.3424 0.0300 91.1632
    Forward 0.7968 14.4193 11.8504 1.3615 0.0300 311.1420
    Reverse 0.9009 20.1427 37.0354 6.7206 0.0300 91.6224
    Forward 0.7727 13.1860 11.4259 1.1641 0.0300 314.5281
    Results of TiO2
    at 150 A or 15nm

    MAPbI3

    Directions Voc,V Jsc ,mA cm -2 FF % PCE% Area ,cm^2 Rs (ohm cm^2)


    Reverse 0.8904 18.3513 32.7445 5.3507 0.0300 95.8436
    Forward 0.7555 11.6580 12.8585 1.1326 0.0300 360.9804
    Reverse 0.8784 18.1453 32.5925 5.1951 0.0300 117.5061
    Forward 0.7500 11.4747 12.2889 1.0576 0.0300 498.2230
    Results of TiO2
    at 200 A or 20nm

    Directions Voc,V Jsc ,mA cm -2 FF % PCE% Area ,cm^2 Rs (ohm cm^2)


    Reverse 0.8989 18.6173 32.0395 5.3615 0.0300 108.3568
    Forward 0.7760 13.4687 14.6755 1.5339 0.0300 290.4950
    Reverse 0.9050 17.5020 31.2443 4.9488 0.0300 103.0344
    Forward 0.7943 12.5887 14.7379 1.4737 0.0300 437.9690
    TiO2 spray pyrolysis
    ( 15 strips)

    Directions Voc,V Jsc ,mA cm -2 FF % PCE% Area ,cm^2 Rs (ohm cm^2


    Reverse 0.9313 15.8040 41.6948 6.1369 0.0300 18.7559
    Forward 0.9038 13.5527 24.5454 3.0067 0.0300 70.2996
    Reverse 0.9292 14.8200 39.4638 5.4346 0.0300 22.6672
    Forward 0.9067 12.7867 24.5344 2.8445 0.0300 71.6606
    TiO2 spray pyrolysis
    ( 20 strips)

    Directions Voc,V Jsc ,mA cm-2 FF % PCE% Area ,cm^2 Rs (ohm cm^2)
    Reverse 0.9740 16.2573 45.1497 7.1450 0.0300 14.2819

    Forward 0.8851 13.1653 21.45.19 2.4997 0.0300 125.8759

    Reverse 0.9719 16.1733 45.1497 7.0969 0.0300 15.1462


    TiO2 spray pyrolysis
    ( 25 strips)

    Directions Voc,V Jsc ,mA cm -2 FF % PCE% Area ,cm^2 Rs (ohm cm^2

    Reverse 0.9752 19.4007 49.8223 9.4263 0.0300 12.667


    Forward 0.8867 18.6107 27.2504 4.4971 0.0300 86.1190
    Reverse 0.9732 18.6353 52.2915 9.4837 0.0300 11.1045
    Forward 0.9221 18.0387 30.0396 4.9965 0.0300 37.7908
    TiO2 spray pyrolysis
    ( 30 strips)

    Directions Voc,V Jsc ,mA cm -2 FF % PCE% Area ,cm^2 Rs (ohm cm^2


    Reverse 0.9335 16.4200 28.7228 4.4025 0.0300 66.204
    Forward 0.8311 11.7593 15.6390 1.5284 0.0300 507.966
    Reverse 0.9481 11.8647 33.6887 3.7898 0.0300 45.2172
    Forward 0.8694 8.3433 18.2213 1.3217 0.0300 201.1937
    End

    www.nu.edu.kz

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