You are on page 1of 12

Numerical-1

1
Numerical-2

2
Numerical-3
Design the circuit in the following Fig. to establish IC= 0.2 mA and VC
= 0.5 V. The transistor exhibits vBE of 0.8 V at iC= 1 mA, and β=100.

3
Numerical-4

4
Numerical-5

5
Numerical-6

6
Numerical-7

Considering conductivity as a function of electron concentration,


obtain expression of minimum conductivity and corresponding
electron concentration at which conductivity is minimum. Is
instrinsic conductivity the minimum conductivity?

7
Numerical-8,9

8
Numericals-10,11

9
Numerical-12

Also calculate conductance and transconductance

10
Numericals-13-15

Q.13 Draw band diagram, distribution of charge, electric field and


electrostatic potential for an ideal n-channel MOS capacitor in
inversion.
Q.14 An n-type silicon sample has a uniform donor concentration Nd
= 5 x 1015 cm-3.Calculate the surface potential required a) to make the
surface intrinsic b) to bring strong inversion at the surface. Write your
answer with proper sign.
Q.15 Consider a MOS capacitor with Silicon substrate with NA=2 x
1016 cm-3 If dox=100 nm, a) Calculate Φms if electron affinity
for Si is 4.05 eV. Draw a neat band diagram indicating this
calculation.

11
Numerical-15-18

• Q.16 a) Calculate the VT of Si p-channel MOSFET for an n+ polysilicon gate with a


SiO2gate oxide of thickness of 100 Å with dielectric constant 3.9, Nd = 5 x 1017 cm-3,
and a fixed oxide charge of 5×1010 qC/cm2 , Φms = -0.3 eV.
b) Calculate electron and hole concentrations in the semiconductor near the interface and
deep in the substrate during accumulation and inversion.
• Q.17 Calculate the drain current, gD and gm of an n-channel MOSFET with Z/L=10,
Vth=0.5V, channel mobility µn=300cm2/V-sec and oxide thickness 0.12 µm with a)
VD=0.2V b) VD=2V and c) in the saturation. Assume VG= 3V in all calculations.
• Q.18 n- channel and p-channel MOSFETs are to be designed such that both have
saturation current of 2 mA when Gate to source voltage is 5V for n-MOSFET and -5V
for p-MOSFET. The other parameters are as following. Oxide thickness dox=30 nm,
µn=500cm2/V-sec, µh=300cm2/V-sec, VT=0.7 n-MOSFET, VT=-0.7 for p-MOSFET.
Calculate the Z/L ratio for n-MOSFET and p-MOSFET.

12

You might also like