zemax 教程

使用ZEMAX®於設計、優化、公差和分析
Design, optimization, tolerancing and analysis using ZEMAX®
摘要
光學設計軟體ZEMAX®的功能討論可藉由使用ZEMAX去設計和分析一個投影
系統來討論，包括使用透鏡陣列 (lenslet arrays) 來建構聚光鏡 (condenser)。
ABSTRACT
A discussion of the capabilities of the optical design program ZEMAX® is followed by a

discussion of using ZEMAX to design and analyze a projection system to include the
condenser made using lenslet arrays.
簡介
ZEMAX 以非序列性 (non-sequential) 分析工具來結合序列性 (sequential) 描光

程式的傳統功能，且為一套能夠研究所有表面的光學設計和分析的整合性套裝軟
體，並具有研究成像和非成像系統中的雜散光 (stray light) 和鬼影 (ghosting) 的能
力，從簡單的繪圖 (Layout)一直到優化和公差分析皆可達成。
根據過去的經驗，對於光學系統的端對端 (end to end)分析往往是需要兩種不

同的設計和分析工具。一套序列性描光軟體，可用於設計、優化和公差分析，而一
套非序列性或未受限制的 (unconstrained) 描光軟體，可用來分析雜散光、鬼影和一
般的非成像系統分析，包括照明系統。
序列性描光程式這個名詞是與定義一個光學系統為一連串表面的工具有關。所
有的光線打到光學系統之後，會依序的從一個表面到另一個表面穿過這個系統。在
定義的順序上，所有的光線一定會交到所有的表面，否則光路將終止。光線不會跳
過任何中間的表面；光線只能打在每一個已定義的表面一次。若實際光線路徑交到
一個表面上超過一次，如使用在二次描光 (double pass) 中的元件，然後在序列性列
表中，必須再定義超過一次的表面參數。
大部份成像光學系統，如照相機鏡頭、望遠鏡和顯微鏡，可在序列性模式中完
整定義。對於這些系統，序列性描光具有許多優點：非常快、非常彈性和非常普
遍。幾乎任何形狀的光學表面和材質特性皆可建構。在成像系統中，序列性描光最
重要的優點為使用簡單且高精確的方法來做優化和分析。序列性描光的缺點，包括
無法追跡所有可能的光路徑 (即鬼影反射) 和許多無法以序列性方式來描述的光學
系統或元件。
１
非序列性描光最常用來分析成像系統中的雜散光和鬼影，甚致分析照明和其他
非成像系統。在非序列性描光中，光線入射光學系統後，是自由的沿著實際光學路
徑追跡；一條光線可能打到一個物件 (object) 許多次，而且可能完全未打到其他物
件。此外，非序列性方法可用來分析從光學或機構元件產生的表面散射 (scatter)，
和從場內 (in-field) 和場外 (out-of-field) 的光源所產生的表面反射而形成的鬼影成
像。
INTRODUCTION
ZEMAX combines the traditional capabilities of sequential ray tracing programs with
non-sequential analysis tools in an integrated package capable of studying all facets of
optical design and analysis, from initial layout through optimization and tolerancing with
the ability to study stray light and ghosting in imaging as well as non-imaging systems.
Historically, two different design and analysis tools were required for end to end analysis
of optical systems. A sequential ray tracing program for design, optimization and
tolerancing, and a non-sequential, or unconstrained, ray tracing program to analyze stray
light, ghosting, and for general non-imaging system analysis, including illumination
systems.
The term sequential ray tracing program refers to a tool that defines an optical system as
a sequential series of surfaces. All rays entering the optical system proceed through the
system from surface to surface in a defined, sequential order. All rays must intercept all
surfaces in this defined order or the ray path will be terminated. Rays can not skip over
any of the intermediate surfaces; rays can only strike each defined surface once. If the
actual ray path would intercept a surface more than once, such as a component used in
double pass, then the surface parameters must be defined more than once in the
sequential listing.
Most imaging optical systems, such as camera lenses, telescopes, and microscopes are
well defined by the sequential model. Sequential ray tracing has many advantages for
these systems: it is very fast, very flexible and very general. Optical surfaces of almost
any shape and material properties can be modeled. The most important advantage of
sequential ray tracing in imaging systems is that it leads to a straightforward and highly
accurate method for optimization and analysis. The disadvantages of sequential ray
tracing include the inability to trace all possible light paths (i.e. ghost reflections) and
there are many optical systems or components which can not be described in a sequential
fashion.
Non-sequential ray tracing is most often used to analyze stray light and ghosting in
imaging systems, as well as to analyze illumination and other non-imaging systems. In
non-sequential ray tracing rays entering the optical system are free to follow any real
optical path; a ray may strike an object multiple times and may entirely miss other objects.
Additionally, non-sequential methods can be used to analyze surface scatter from optical
or mechanical components as well as visualizing ghost images formed due to surface
reflections from in-field and out-of-field sources.
２
ZEMAX 的功能
ZEMAX 可以用於一個完全序列性模式中、一個完全非序性模式中和一個混合
模式中，混合模式對分析具有大部分序列性而卻有一些元件是作用在非序列性方式
的系統，是相當有用的，如導光管 (light pipes) 和屋頂稜鏡 (roof prisms)。
序列性系統需定義視禓角 (field of view)、波長範圍和表面資料。序列性設計

的最重要參數之一，為系統孔徑 (system aperture)。系統孔徑，常指入瞳 (entrance
pupil) 或孔徑光欄 (aperture stop)，它限制可從已定義視場入射光學系統的光線。光
學表面可以是折射、反射或繞射。透鏡可以是由均勻或漸變折射率材質所製成。表
面的下彎 (sag) 可以是球面、圓錐面 (conic)、非球面 (aspheric)或藉由多項式或其他
參數函數來定義。也包含了許多繞射光學元件模型。此外，一個使用者自定表面的
功能，允許設計者以撰寫程式的方式來建構任何實際的表面下彎或相位分佈。
一些功能可以用來分析系統，包括數個系統繪圖 (layouts) 類型、匯出 CAD 格

式的表面資訊功能、光點圖 (spot diagrams)、光扇圖 (ray fan) 和光程差圖、繞射調
變轉移函數 (modulation transfer function, MTF) 和點擴散函數 (point spread function,
PSF) 圖、包圍圓 (encircled) 和包圍矩形 (ensquared) 的能量資訊、像差計算 ( 塞德
(Seidel) 和策尼克 (Zernike) )、理想或偏斜 (skew) 高斯光束參數計算、極化描光和
波前傳播工具。
ZEMAX FEATURES
ZEMAX can be used in a fully sequential mode, a fully non-sequential mode as well as a
hybrid mode which is useful for analyzing systems which are largely sequential with
some components which behave in a non-sequential fashion, such as light pipes and roof
prisms.
Sequential systems are defined by a field of view, wavelength range and surface data.
One of the most important parameters of the sequential design is the system aperture.
The system aperture, often the entrance pupil or the aperture stop, limits the rays that can
enter the optical system from the defined field. The optical surfaces can be refractive,
reflective or diffractive. Lenses can be made of homogeneous or gradient index materials.
The sag of the surface can be spherical, conic, aspheric, or defined by a polynomial or
other parametric function. Many surface models for diffractive optical elements are also
included. Additionally, a user defined surface capability allows designers to program
virtually any arbitrary surface sag or phase profile.
Some of the features available to analyze systems include several forms of system layouts,
with the ability to export surface information in CAD format, spot diagrams, ray fan and
optical path difference plots, diffraction based modulation transfer function (MTF) and
point spread function (PSF) plots, encircled and ensquared energy information, aberration
calculations (Seidel and Zernike), ideal or skew Gaussian beam parameter calculation,
polarization dependent ray tracing and a wavefront propagation tool.
３
優化
序列性描光軟體的關鍵功能即是可以快速且精確的優化一個光學設計。主要的
優化技巧是以減幅最小均方根 (damped least squares, DLS) 的演算法為基礎，並使
用主動減幅 (active damping)。此外，ZEMAX 包括全域性優化功能，其以結合減褔
最小均方根過程的優化演算法為基礎。優化是以使系統績效函數 (merit function) 的
總值達到最小為基礎。簡單的說，績效函數為一種對一個理想光學系統的數值描
述。重要的是，績效函數代表光學系統的要求性能。對於既定的設計，可以適當的
選用好幾個預設的績效函數。對於成像系統，績效函數可用來特別地針對減低光學
像差，藉由限制光線在成像面上的延伸，或使從理想球面的系統波前偏差減至最
小。許多其他的優化參數也用來修改標準績效函數或建立一個使用者自定的績效函
數。
當執行優化時，ZEMAX 對任何使用者建構的系統或表面參數，決定最理想的
值。幾乎任何參數，包括曲率、厚度、玻璃特性、非球面係數和視場或波長資料，
皆可設為變數。可以對可接受的參數值範圍內下限制，以確保可以輕易的建構一個
合理的系統。
OPTIMIZATION
The key feature of a sequential ray tracing program is the ability to rapidly and accurately
optimize an optical design. The primary optimization technique is based on a damped
least squares algorithm using active damping. Additionally, ZEMAX includes global
optimization capabilities, which combines a genetically based optimization algorithm
with the damped least squares process. Optimization is based on minimizing the total
value of the system merit function. Simply stated, the merit function is a mathematical
description of an ideal optical system. It is important that the merit function represent the
desired performance for the optical system. There are several default merit functions
available which can be selected as appropriate for a given design. For imaging systems,
merit functions are available which specifically aim at reducing the optical aberrations by
limiting the spread of rays on the image surface or to minimize the departure of the
system wavefront from an ideal sphere. Many other optimization parameters are also
available to modify a standard merit function or to create a user defined merit function.
During the optimization process, ZEMAX determines the optimal values for any of the
user specified system or surface parameters. Almost any parameter including radius,
thickness, glass properties, aspheric coefficients, as well as field or wavelength data can
be made variable. Limitations can be placed on the range of acceptable parameter values
to insure a reasonable system which can be easily built.
公差分析
在完成光學系統的設計之後，執行公差分析是重要的。公差分析為一種統計的
過程，用來有系統的引入缺陷到光學設計中，以決定任何系統參數的誤差對整體而
４
言，如何影響系統性能。公差分析是必須的，因為沒光學元件是光滑的，或者當設
計好時，可以精確的組裝系統。公差分析可用來決定每個系統參數的可接受值範
圍。這個資訊之後可以用來決定任何系統的可能性、以公差範圍內來製造、在指定
的性能水平之上工作。ZEMAX 包括一個廣泛的、完整的公差分析演算法，允許設
計者自由完成任何光學設計的公差。可以決定出相對於任何性能尺寸的公差，且可
以包括任何補償因子的影響，甚致機構的部分或光學的部分將被用來組裝，或系統
的使用。
TOLERANCING
After the design of the optical system is completed, it is important to perform a tolerance
analysis. Tolerancing is a statistical process which is used to systematically introduce
defects into the optical design to determine how an error in any of the system parameters
impacts the performance of the system as a whole. Tolerancing is necessary because no
optical component will be polished or system assembled exactly as designed. The
tolerance analysis is used to determine a range of acceptable values for each system
parameter. This information can then be use to determine the likelihood of any system,
manufactured within the tolerances, working at or above a specified performance level.
ZEMAX includes a comprehensive, integrated tolerancing algorithm which allows the
designer complete freedom in the tolerance of any optical design. Tolerances can be
determined relative to any performance criteria and can include the effects of any
compensator, either mechanical or optical which will be used in the assembly or use of
the system.
波前傳播
幾何光線追跡為一般用來描述光的傳播通過一個光學系統的方法。如同先前所
描述的，光線追跡對於分析許多光學系統來說，為一種非常精確的方法，然而這個
模型的實用性有一些限制。光線模型的限制是因為光線追跡而產生，每條光線是獨
立的，即，一條光線傳播的路徑是可以完全決定的，而不受其他光線的影響。光線
之間不會發生干涉 (interference)。若光線與一個限制孔徑或遮擋物的表面相交，光
線不是被擋住就是通過，但在其他方面，光線路徑是不受影響的，光線不會發生繞
射現像。ZEMAX 包含了數個光線為基礎的繞射計算，包括 PSF 和 MTF，為包括
單階的 Fraunhofer 計算，波前從近場 (出瞳) 傳播到遠場 (成像面)。這些計算只可以
在成像系統中執行，且在非常接近成像的表面。
當以光線為基礎的方法不適用時，ZEMAX 中的物理光學傳播 (Physical Optics

Propagation, POP) 工具可用來分析系統，包括表面非常接近焦點、表面遠離焦點但
接近繞射孔徑 (diffracting apertures) 和平行光的傳播，或行經長距離後的近似平面
波前。
使用 POP，任何波前，包括高斯和混合的高階模態光束、帽蓋形 (top hat) 分佈

或任意的使用者自定波前，皆可以傳播通過任何 ZEMAX 的設計檔案。幾乎支援
５
所有表面型態。從任何場點來的波前可插入光學系統中的任何位置 (不會僅能在已
定義的物面位罝)。波前傳播通過每個表面，且相位強度的資訊可以在每個表面做
計算。POP 功能是非常有用的用於空間濾波 (spatial filters)、分析光束成形的光學
或任何其他與干涉和繞射有關的光學系統，如繞射菲涅耳區域平板 (Fresnel Zone
Plates)。
WAVEFRONT PROPAGATION
Geometrical ray tracing is the method generally used to describe the propagation of light
through an optical system. As described previously, ray tracing is a very accurate method
for analyzing many optical systems, however there are some limitations to the
applicability of this model. The limitations to the ray model arise because in ray tracing,
each ray is an independent entity, that is, the path a ray follows is entirely deterministic, it
is not affected by other rays. No interference occurs between rays. If rays intersect a
surface with a limiting aperture or obscuration, ray is either blocked or it passes through,
but the ray path is otherwise unaffected, the rays do not diffract. ZEMAX includes
several ray based diffraction calculations, including PSF and MTF, which include a
single step Fraunhofer calculation which propagates the wavefront from the near field
(exit pupil) to the far field (image). These calculations can only be performed for imaging
systems, at surfaces very near the image.
The physical optics propagation (POP) tool in ZEMAX is used to analyze systems where
the ray based methods are not appropriate, including surfaces very near a focus, surfaces
far from focus but near diffracting apertures and for the propagation of collimated, or
nearly collimated wavefronts propagating long distances.
With POP, any wavefront, including Gaussian and mixed higher mode beams, top hat
distribution or any arbitrary user specified wavefront, can be propagated through any
ZEMAX design file. Almost all surface types are supported. The wavefront can be
inserted at any location in the optical system (not just at the defined object location), from
any field point. The wavefront is the propagated through the remaining surfaces and the
intensity of phase information can be calculated each surface. POP calculations are very
useful for modeling spatial filters, analyzing beam shaping optics or any other optical
system which depends on interference or diffraction, such as diffractive Fresnel Zone
Plates.
極化光線追跡
光可以光線來類比，並以位置、方向、相位和振幅來表示之。然而，光也與電
場有關。電場的方向與傳播方向互相垂直，且隨著時間的改變，其方向和大小亦會
有所變化。當光線傳播通過一光學系統時，其極化狀態一般並無需有守恆的關係存
在。
當極化光線傳播通過一個光學系統時，極化光線追跡可追蹤光線極化的狀態。
介質間的界面，包括空氣、玻璃和金屬，會導致衰減 (diattenuation) 和延緩
６
(retardance) 的變化產生，和改變極化橢圓 (polarization ellipse) 的形狀。而入射角和
波長的關係則會減少表面的傳輸。這些在傳輸相位上的變化，稱為極化像差
(polarization aberrations)。這些像差會導致 MTF 和 Strehl ratio 值變小，此外亦會使
得系統性能降低。實際上，這些像差並沒有不同於任何其他成像的像差。ZEMAX
可以在任何類型的光學表面上，完整建構出任何薄膜干涉的鍍膜層。極化光線追跡
的計算，包括薄膜鍍膜層、體積吸收 (volumetric absorption) 和波長與入射角的影
響，能更精確的預測真實系統的性能。
POLARIZATION RAY TRACING
Light, as represented by rays is described by a location, direction, phase and amplitude.

However, there is also an electric field associated with the light. The electric field is
oriented perpendicularly to the direction of propagation and may be time varying in
orientation and magnitude. The state of the polarization is generally not conserved as the
rays propagate though the optical system
Polarization ray tracing tracks the state of polarization of a ray as it propagates through
an optical system. Interfaces between media, including air, glass and metals, introduce
changes to the diattenuation and retardance, changing the shape of the polarization ellipse.
Surface transmission is also reduced as a function of angle of incidence and wavelength.
These variations in transmitted phase are referred to as polarization aberrations. These
aberrations result in a reduction of the MTF and Strehl ratio, and otherwise degrade
system performance. Physically, these aberrations are no different than any other imaging
aberration. ZEMAX can fully model any thin film interference coatings placed on any
type of optical surface. Polarization ray tracing calculations include the effects of thin
film coatings, volumetric absorption, and wavelength and incident angle to more
accurately predict true system performance.
非序列性分析
使用非序列性分析，光學元件必須以真實物件來表示，而不是以表面來表示。
並允許以光線追跡的方法來決定物件被光線打到的順序。這不僅包括物件的順序，
也包括物件上的特殊表面或小刻面 (facet) 的順序。當考量控制雜散光、分析成像
系統中的鬼影、設計照明和其他非成像光學系統時，這樣的功能是重要的。
非序列性分析不會被已定義的系統孔徑所限制。任何光分佈種類的光源可以放
置在光學空間中的任何位置。從任何光源發射出的光線可以任何實際有意義的方向
傳播。打到光學或機構元件上的一條特定光線的順序，可藉由光線的位置、目前傳
播的方向和其他元件的位置來決定。被光打到的物件將是沿光線傳播方向上最接近
光源的物件。此外，在非序列性空間中，在每個光線表面交點上，任何光線可以分
裂 (split) 成任何數目的子光線。每條子光線將與父段中的一些能量有關。這樣一
來，便允許追跡所有的折射、反射、散射和繞射能量路徑。建構諸如菲涅耳反射的
影響來分析成像系統的鬼影，和在粗糙的或光滑的機構或光學元件上建構散射面來
７
研究雜散光影響皆是必須的。每一條子光線的能量可以藉由極化光線追跡來決定，
這對研究鬼影的相對強度和建構諸如干涉儀 (interferometers) 的系統，包括整形平
板 (shearing plates) ，是很重要的。對於散射特性，使用者可自由的指定任何表面
粗糙的種類，然後分裂子光線的散射分佈模型。
檢測面裝置是用在非序列性分析中。檢測面為奇特的表面，不是平的就是彎曲
的，是用來量測入射在檢測面位置上的能量。可以賦予檢測面表面性質來模仿真實
檢測器的效果，包括用於 Narcissus 分析的反饋 (self-reflection)。可量測包括非同調
或同調發光、同調相位和發光強度。並提供幅射度 (Radiometric) 或光度
(photometric) 資訊。複雜的篩選功能可用於從指定的光源而來所截取的能量資訊，
包括僅觀看鬼影、折射、反射、散射或繞射能量，並在所指定的物件上做限制。在
追蹤雜散光和鬼影問題上，這些篩選功能 (filters) 是很重要的。所篩選的光線資訊
也可以用來產生以通過篩選功能為基礎的光源光線資料。這個功能可以用於反向光
線追跡的分析。
以上所述為 ZEMAX 的概述。有許多其他的功能還沒有提到。我們現在將應

用 ZEMAX 於特定問題：一個投影系統的設計和分析，包括聚光鏡 (condenser) 和
投影機的設計。
NONSEQUENTIAL ANALYSIS
With non-sequential analysis, optical components must be described as true objects,

rather than as a collection of surfaces. This allows the ray trace to determine the sequence
in which objects are struck by the ray. This includes not only the order of the objects, but
also the particular surface or facet on the object. This capability is important when
considering controlling stray light, analyzing ghosts in imaging systems, as well as for
designing illumination and other non-imaging optical systems.
Non-sequential analysis is not constrained by a defined system aperture. Sources of any

type of light distribution can be position anywhere in the optical space. Rays launched
from any of the sources can propagate in any physically meaningful direction. The order
in which a particular ray strikes the optical or mechanical components is determined by
the position of the ray, its current direction of propagation, and the position of the other
components. The struck object will be that object which is closest to the source along the
direction of the ray being propagated. Additionally, within the non-sequential space, any
ray can be split into any number of child rays at each ray-surface intersection. Each child
ray will be associated with some of the energy in the parent segment. This allows
tracking of all refracted, reflected, scattered and diffracted energy paths. This is necessary
to model effects such as Fresnel reflection to analyze ghosting in imaging systems as well
as modeling scatter from rough or polished mechanical or optical components to study
stray light effects. The energy in each child ray can be determined by polarization ray
tracing, this is important for studying the relative intensity of ghosts as well as for
modeling systems such as interferometers, including shearing plates. For scattering, the
８
user is free to specify any type of surface roughness, and then split the child rays model
the scatter distribution.
Detector devices are used for non-sequential analysis. Detectors are pixilated surfaces,
either flat or curved which are used to measure the energy incident at the detector
location. Detectors can be provided with surface properties to mimic the effects of the
actual detector, including self-reflection to be used for Narcissus analysis. Measurements
include incoherent or coherent irradiance, coherent phase and radiant intensity.
Radiometric or photometric information can be provided. Complex filtering can be
applied to the captured energy information to include looking at only ghosted, refracted,
reflected, scattered or diffracted energy, to limit these based on specific objects, from
specific sources. These filters are important in tracking stray light and ghosting problems.
The filtered ray information can also be used to generate source ray data based on rays
passing the filter. This can be used for reverse ray tracing analysis.
The preceding is an overview of ZEMAX. There are many other features which have not
been considered. We will now apply ZEMAX to a specific problem: design and analysis
of a projection system, to include design of both the condenser and the projector.
投影系統的設計和分析
我們將看到使用 ZEMAX 來設計和分析由一聚光鏡配件所組成的投影系統，

其能在投影鏡頭的輸入端提供均勻的照明。一個 8 mm 長的燈絲光源所發出的光在
經過聚光鏡後，將在底片閘 (film gate) 上形成一均勻的能量分佈。投影機會產生一
個 640 x 480 mm 的影像到距輸出端 2000 mm 遠的螢幕上。兩個次要配件中的每一
個次要配件將可序列性的設計 (優化)，然後將這個系統組合起來，所以能計算出整
個系統的照明和成像性質。
DESIGN AND ANALYSIS OF A PROJECTION SYSTEM
We will look at using ZEMAX to design and analyze a projection systems consisting of a
condenser assembly to provide uniform illumination at the input of a projection lens. The
condenser will provide a uniform distribution of energy at the film gate from an 8 mm
long filament source. The projector will provide a 640 x 480 mm image to a screen 2000
mm from the output. Each of the two subassemblies will be designed (optimized)
sequentially and then the systems will be combined so the illumination and imaging
properties of the full system can be evaluated.
聚光鏡的設計
聚光鏡必須收集從光源發出來的光，並在底片閘 (film gate) 上形成一均勻分佈

的光。此處考慮的聚光鏡將由一準直鏡配件所組成，用來使沿著兩個透鏡陣列中的
第一個透鏡陣列傳播的初始光源能量平行。第一透鏡陣列，為場透鏡陣列 (field
array)，用於收集從延伸光源物件來的能量，和在第二或成像透鏡陣列 (imaging
array) 中的每一個透鏡上的光源之重新成像 (reimage)。在遠距離的時候，成像透鏡
９
陣列會將所有分開的光源影像，形成一部分重疊的影像；然而聚光鏡取而代之的將
這些重疊的光源影像重新成像在底片閘 (film gate) 位置上。對於這個設計，準直鏡
和聚光鏡元件將完全相同於兩透鏡配件。這並非必要的，但對於控制成本來說是相
當有用的。
CONDENSER DESIGN
The condenser needs to take the light coming from the source and present a uniform
distribution of that light at the film gate. The condenser considered here will consist to a
collimator assembly used to collimate the initial source energy followed by the first of
two lenslet arrays. The first array, the field array, is used to collect energy from the
extended source object and reimage that source at each of the lenslets in the second or
imaging array. The imaging array would form an overlapping image of all of the separate
source images at a far distance; however a condenser stage instead reimages these
overlapping source images at the film gate location. For this design, the collimator and
condenser components will be identical as will both lenslet assemblies. This is not
necessary but is useful to control costs.
透鏡陣列
透鏡陣列通常用在照明系統。每一陣列會形成一個最終影像，其影像是所有獨
立影像的疊加。每一個透鏡的形狀大小將會影響最後的能量分佈。對於一已知孔徑
大小的透鏡，具有較短焦距 (較快的 F/#) 的系統將會產生較廣的光分佈。
投影系統通常需要兩個透鏡陣列。單一透鏡陣列只能使用在小的光源分佈。對
於單一透鏡陣列，從延伸光源出來的離軸能量將成像在底片閘 (film gate) 上的不同
位置。藉由使用一額外的場透鏡陣列，全部的光源影像會在底片閘(film gate)上均
勻的重新組合。系統的視場角 (光源大小) 會被透鏡陣列的 F/#所限制。相當重要的
是，從場透鏡陣列中的任何透鏡出來的所有能量，需落在成像透鏡陣列中的相同透
鏡上，否則將會在底片閘 (film gate) 上變模糊 (blurring)，降低均勻度(uniformity)。
這可由圖 1 和圖 2 中來看到，顯示對於一延伸光源的物件，單一透鏡陣列和雙透鏡
陣列的照明會有所不同。
１０
圖 1. 在單一透鏡陣列設計中的照明
圖 2. 場透鏡陣列的照明設計
LENSLET ARRAYS
Lenslet arrays are often used in illumination systems. Each array contributes to a final
image which is the superposition of all of the individual images. The shape and size of
each lenslet will impact the final energy distribution. For lenslets of a given aperture size,
the system with the shorter focal length (faster F/#) will provide the broader light
distribution.
Two arrays are often required in projection systems. A single array can be used, but only
for small source distributions. With a single array, off-axis energy from an extended
source will image at different positions at the film gate. By using an additional field array,
the full source images are recombined uniformly at the film gate. The field of view of the
system (source size) is limited by the F/# of the field array. It is important that all of the
energy from any lenslet in the field array fall on the same element in the imaging array
otherwise there will be blurring at the film gate, reducing uniformity. This can be seen in
Figs. 1 and 2 which demonstrate the difference in illumination between the single array
and two arrays for an extended source object.
INSERT FIGURE 1
１１
INSERT FIGURE 2
陣列必要條件
在設計此類的系統時需要考量數個參數，包括：
1) 在底片閘 (film gate) 上所需的照明大小
EFL col lim ator

Illu min ated _ size = lenslet _ size • (1)
EFL lenslet
2) 場透鏡陣列的透鏡大小和位置：
假如陣列大小固定的話，較多的透鏡通常會產生較好的均勻度但限制了
F/#。
陣列的位置通常由機構的限制來決定。
3) 成像透鏡陣列的大小和位置：
陣列必須在場透鏡陣列的焦點上。
基於成本和裝配的理由，陣列通常是完全相同的。
4) 場透鏡陣列的焦距：
必須在第二透鏡陣列上成像，但沒有打滿光線 (overfilling)。
ARRAY REQUIREMENTS
Several parameters need to be considered in designing this type of system, including:
1) The required size of illumination at the film gate:
EFL col lim ator

Illu min ated _ size = lenslet _ size • (1)
EFL lenslet
2) Element size and position of the field array:

More elements generally provide better uniformity but limit the F/# if array size is
fixed.
Location of the array is usually determined by mechanical constraints.
3) Size and focal length of imaging array:

Array needs to be at the focus of the field array.
Arrays are often identical for cost, assembly reasons.
4) Focal length of field array:

Image must be formed at the second array without overfilling.
１２
以 ZEMAX 來做設計
將藉由使用 ZEMAX 來決定聚光鏡的參數來序列性地分析這個設計。聚光鏡

的要求，整體來說相當複雜，且照明系統並不會形成一真實的像，故可能使得優化
過程複雜化。然而，這個設計可劃分成兩個不同的工作，每一個都是簡單的設計工
作。第一個問題僅是準直鏡和聚光鏡的設計。從光源發出的光將會被準直，然後重
新成像在底片閘 (film gate) 位置上，猶如透鏡陣列不存在般。將光場透鏡陣列成像
到底片閘 (film gate) 位置上是第二個設計上的議題。合併這兩個設計的結果就是最
後的聚光鏡裝配。這種型態的設計要求可很快地以 ZEMAX 的多重組態功能來建
構。
DESIGNING WITH ZEMAX
The condenser parameters will be determined by using ZEMAX to analyze the design
sequentially. The requirements of the condenser, taken as a whole are very complex, and
the illumination system does not form a true image which can also complicate the
optimization process. However, the design can be broken down into to two separate tasks,
each a straightforward design task. One problem is simply the design of the collimator
and condenser. Light from the source will be collimated and then reimaged at the film
gate location, as if the lenslet arrays were not present. The second design issue is to
image the field array at the film gate location. The result of merging these two designs is
then final condenser assembly. This type of design requirement can be readily modeled in
ZEMAX using its multi-configuration capabilities.
多重組態的設計
一個多重組態的設計是參照一光學系統，其系統是經由多於一種的模式或結構
來分析。對於多重結構的分析，最普遍的應用之一就是變焦鏡頭 (zoom lens)，其
可允許光學元件的位置以焦距或放大率為函數做改變。其他普遍的系統，包括消溫
差設計 (athermalized designs)、多重光路系統 (multi-path systems) 和掃描系統
(scanning systems)。
多重組態系統的設定與單組態系統設定非常類似。多重組態編輯器是用來表示
那些在不同組態間變化的設計參數。對於這個設計，我們將需要三種組態：第一個
組態將建構整個系統，以致於能在底片閘 (film gate) 上決定均勻度。第二個組態將
用來優化相匹配的準直鏡和聚光鏡的光學元件。第三個組態將用來決定焦距和透鏡
陣列的間隔。
MULTI-CONFIGURATION DESIGN
A multi-configuration design refers to an optical system which is analyzed in more than

one mode, or configuration. One of the most common applications for multi-
configuration analysis is the zoom lens, which allows the position of the optical elements
１３
to vary as a function of focal length or magnification. Other common systems include
athermalized designs, multi-path systems, and scanning systems.
The setup of a multi-configuration system is very similar to a single configuration system.

The multi-configuration editor is used to indicate those design parameters which vary
between the different configurations. For this design we will need three configurations:
the first will model the entire system so the uniformity at the film gate can be determined.
The second configuration will be used to optimize the matched collimator and condenser
optics. The third configuration will be used to determine the focal length and spacing of
the lenslet arrays.
系統參數
對於準直鏡和聚光鏡，選擇一焦距為 60 mm。光源為 8 mm 長的燈絲。透鏡陣

列為 84 mm 的正方形，有 7 x 7 的透鏡結構。照明斑點的要求大小為 16 mm。從這
些我們可以決定出陣列的焦距：
lenslet _ size
EFL lenslet = EFL col lim ator •
Illu min ated _ size
12
= • 60 = 45 (2)
16
重要的是，在第二透鏡陣列上的光源成像大小不能超出透鏡元件的大小：
EFL col lim ator

Im age _ size _ at _ lenslet = source _ size •
EFL lenslet
60
= 8• = 10.66 < 12 (3)
45
透鏡的大小需合適於初始光源的大小。
SYSTEM PARAMETERS
For the collimator and condenser, a focal length of 60 mm was selected. The source is to
be a filament 8 mm long. The lenslet arrays will be 84 mm square having a 7 x 7 element
structure. The desired size of the illumination patch is 16 mm. From this we can
determine the focal length of the array:
１４
lenslet _ size
EFL lenslet = EFL col lim ator •
Illu min ated _ size
12
= • 60 = 45 (2)
16
It is important that the size of the source image on the second array does not exceed the
size of the lenslet element:
EFL col lim ator

Im age _ size _ at _ lenslet = source _ size •
EFL lenslet
60
= 8• = 10.66 < 12 (3)
45
The size of the lenslets is appropriate for the size of the initial source.
初始系統設定
最終的透鏡參數、厚度、間距、曲率…等，將藉由使用 ZEMAX 的優化功能

來決定。一個初始系統，包括基本數據，如光學表面的數目、初始材質的選定和系
統孔徑，必須在執行優化前提供。
準直鏡和聚光鏡皆是由兩個透鏡元件所組成。也將有兩個陣列式單透鏡
(lenslet arrays)，其上共有六個光學元件。整個系統將首先定義 (結構 1)，然後將提
供多重組態 (configuration 1) 數據。表 1 列出初始透鏡參數。
Type Comment Radius Thickness Glass

0 Standard Source Infinity 30.00
1 Standard Collimator 1 Infinity 25.00 B270
2 Standard -50.00 10.00
3 Standard Collimator 2 Infinity 25.00 B270
4 Standard -70.00 20.00
5 Lens Array Field Array 22.50 3.00 B270
6 Standard Infinity 39.00
7 Standard Image Array Infinity 3.00 B270
8 Lens Array -22.50 20.00
9 Standard Condenser 1 70.00 25.00 B270
11 Standard Condenser 2 50.00 25.00 B270
13 Standard Film Gate Infinity 0.00
表 1. 初始透鏡參數
１５
INITIAL SYSTEM SETUP
The final lens parameters, thickness, spacing, curvatures, etc. will be determined using
the optimization capabilities of ZEMAX. An initial system, including basic information
including the number of optical surfaces, initial material selection and the system
aperture must be provided before optimization can be performed.
The collimator and condenser will each consist of two lens elements. There will also be
the two lenslet arrays for a total of six optical elements. The entire system will be defined
first (configuration 1), then the multi-configuration information will be provided. Table 1
lists the initial lens parameters.
INSERT TABLE 1
多重組態編輯欄可用來定義出準直鏡/聚光鏡和透鏡陣列間的不同優化參數。
顯示在表 2 中。數個列出來的多重組態參數可用來維持系統的設定對稱。
Surface Configuration 1 Configuration 2 Configuration 3

Configuration Weight 0 1 1
Aperture Size 45 45 12
Stop Surface 1 1 8
Thickness 0 30 30 0
Thickness 1 25 25 0
Thickness 2 10 10 0
Thickness 3 25 25 0
Thickness 4 20 20 0
Glass 1 B270 B270
Glass 3 B270 B270
Glass 5 B270
Glass 7 B270 B270
Glass 9 B270 B270 B270
Glass 11 B270 B270 B270
Thickness 8 20 20 20
表 2. 多重組態參數
The multi-configuration editor is used to define the parameters which will differ for the
collimator/condenser and the lenslet optimizations. These are indicated in Table 2.
Several of the listed multi-configuration parameters are used to maintain the system
symmetry.
１６
INSERT TABLE 2
圖 3 顯示三種組態的初始設計。組態 1 在最下方，組態 3 在最上方。
圖 3. 使用三重組態的 Layout 圖來優化聚光鏡
Figure 3 shows the initial design form for the three configurations. Configuration 1 is at
the bottom, configuration 3 on top.
INSERT FIGURE 3
績效函數將使用標準的成像要求，以均方根光點大小 (rms spot size) 法，來個

別對光源經過準直鏡和聚光鏡對成像，然後光源同時成像於場陣列和底片閘的位
置。光源是藉由沿著 8 mm 直性範圍的數個點光源來定義。準直鏡和陣列的焦距要
求也將在績效函數中控制。優化設計很容易符合設計要求。圖 4 顯示聚光鏡的最後
設計結果。圖 5 顯示在底片閘位置的照明分佈。結果的分佈顯示出在要求的 16
mm 正方形範圍上有高的均勻度 (uniformity)，而在這個範圍之外能量較低。
圖 4. 優化後的聚光鏡 Layout
１７
圖 5. 在底片閘上的照明分佈
The merit function will use standard imaging requirements on the rms spot size to
separately image the source via the collimator and condenser pairs and to image a source
located at the field array both to the location of the film gate. The source was defined by
several point sources along an 8 mm linear extent. The focal length requirements for the
collimator and array will also be controlled within the merit function. The optimized
design easily meets the design requirements. Figure 4 shows the final design of the
condenser. Figure 5 indicates the illumination distribution at the film gate location. The
resulting distribution shows high uniformity over the required 16 mm square region, with
little energy outside this region.
INSERT FIGURE 4
INSERT FIGURE 5
投影光學
投影光學的設計是以雙高斯 (double Gauss) 系統為基礎。系統的孔徑應該與離

開聚光鏡後的最大輸出分佈相匹配。雖然系統在此已考量過特定放大率和成像位
置，但多重組態在此設計中也可以用來優化放大率和聚焦長度在某範圍內的性能。
此設計的聚焦長為 52 mm、物空間數值孔徑 (object space NA) 為 0.35、物高為 16
mm。在全視場範圍內，優化是以使均方根光點大小減到最小為基礎。從長共軛系
統 (long conjugate) 來優化設計。在結合聚光鏡到投影機設計之前，將反向做最後
的計算。圖 6 顯示投影機光學的設計。放置於距離最後一個透鏡表面 2000 mm 的
成像面將不顯示。
１８
圖 6. 投影鏡頭
PROJECTION OPTICS
The design of the projection optics is based on a double Gauss system. The aperture of
the system should be matched to the distribution leaving the condenser to maximize
throughput. Although the system considered here is for a specific magnification and
image location, multi-configuration could also be used in this design to optimize the
performance over a range of magnifications and focal distances. The design has a focal
length of 52 mm with an object space NA of 0.35 for an object of 16 mm total size.
Optimization was based on minimizing the rms spot size over the field of view. The
design was optimized from the long conjugate. This was reversed for final evaluation
before combining the projector design with the condenser. Figure 6 shows the design of
the projector optics. The image surface, located 2000 mm from the final lens surface is
not shown.
INSERT FIGURE 6
系統組裝
使用 ZEMAX 的非序列性功能來分析全部配件的要求。這將允許複雜光源分
佈的建構，和建構照明與幻燈片物件的投影。大部分所使用的元件可以使用
ZEMAX 主選單的選項，來直接轉成非序列性設計。聚光鏡配件將首先轉換。使用
序列性建構的透鏡陣列，其設計參數是不同於非序列性模型，所以將需要個別定
義。
１９
使用適當的工具，可轉換聚光鏡設計為非序列性形式。兩個個別的透鏡也定義
為非序列性的，表示兩個陣列的中心元件。“複製工具 (Replicator Tool) ＂可用來
產生每個陣列的重複性元件。圖 7 顯示透鏡陣列的形狀。每個小透鏡是 12 mm 的
正方形。
圖 7. 透鏡陣列
ASSEMBLING THE SYSTEM
To analyze the performance of the entire assembly requires using non-sequential

capabilities of ZEMAX. This will allow modeling of complex source distributions as well
as to model the illumination and projection of a slide object. Most of the components
used can be directly converted to non-sequential design using a menu option available in
ZEMAX. The condenser assembly will be converted first. The lenslet array model used
sequentially differs in design parameters from the non-sequential model, so this will need
to be defined separately.
Using the appropriate tools, the condenser design is converted to a non-sequential form.
Two individual lenslet are then defined non-sequentially, representing the center element
of the two arrays. The “Replicator Tool” is used to generate the remaining elements of
each array. Figure 7 shows the shape of the lenslet array. Each element is a 12 mm square.
INSERT FIGURE 7
投影鏡頭現在也轉換成非序列性系統。所有表面可直接轉換成 ZEMAX 的非
序性物件。新的物件可輕易的複製到非序列性元件編輯欄 (Non-Sequential
Component Editor) 中，並已包含了聚光鏡的資訊。使用放置投影機元件相對於底片
２０
閘位置的功能以確保所有的元件能正確的擺放。圖 8 顯示相結合的光學系統。箭頭
表示光源的位置。
圖 8. 聚光鏡和投影配件
The projector lens is now also converted to a non-sequential system. All surfaces convert
directly into ZEMAX non-sequential objects. The new objects are simply copied into the
Non-Sequential Component Editor already containing the condenser information. Using
the option to position the projector components relative to the location of the film gate
insures all components are correctly located. Figure 8 shows the combined optical
systems. The arrow indicates the location of the source.
INSERT FIGURE 8
在非序列性分析中，檢測面可以放到光學系統中來分析感興趣位置上的能量分
佈。在這個系統中，感興趣的位置是在底片閘、成像面和成像的陣列。這個資訊對
確保光源能量沒有充滿陣列是很重要的。理想上，光源的成像應該是在每一個透鏡
上所成的像。
除了考量系統的成像性質外，非序列性分析對於雜散光和散射光分析也是有用
的。機構元件，如擋板 (baffles)、鏡頭套桶 (lens barrels) 和星形輪 (spiders) ，可以
加入設計中。表面散射資訊也可以更精確的使用於建構雜散光效應。
以分析系統的成像品質開始。將需要在準直鏡的焦點建構一個延伸光源
(extended source) 和在底片閘位置放置幻燈片模型。從光源發出的光將傳播通過準
直鏡；打到底片閘，光傳播通過投影機到成像面。任何 JPG 或 BMP 檔案可以放在
底片閘上，這將允許投影系統性能的真實表現。圖 9 顯示被照明的物件，而圖 10
顯示在屏幕位置上的放大成像。為了實際示範，將使用一個延伸的高斯分佈光源。
２１
圖 9. 幻燈片物件
圖 10. 投影系統所形成的放大成像
In non-sequential analysis, detectors can be positioned within the optical system to

analyze the energy distribution at positions of interest. In this system, the locations of
interest are the film gate and the image plane as well as the imaging array. This
information is important to make sure that there the array is not overfilled by the source
energy. Ideally, an image of the source should be formed at each lenslet.
In addition to evaluating the imaging properties of the system, non-sequential analysis is

also used for stray and scattered light analysis. Mechanical components such as baffles,
lens barrels, and spiders can be added to the design. Surface scatter information can also
be used to more accurately model stray light effects.
Start by analyzing the system for image quality. This will require modeling an extended
source at the focus of the collimator and placement of a slide model at the film gate
location. Light from the source will travel through the collimator; strike the film gate,
sending light through the projector to the image plane. Any JPG or BMP file can be
positioned at the film gate which will allow true representation of the performance of the
projection system. Figure 9 indicates the object being illuminated and Fig. 10 shows the
２２
magnified image at the screen location. For this demonstration, an extended Gaussian
source distribution was used.
INSERT FIGURE 9
INSERT FIGURE 10
對於燈絲光源 (filament source)，離開光源的大部分能量是朝向離開準直鏡。

為了增加系統的效率，一個反射元件常放在光源之後來截取這些能量的部分，並改
變方向反向朝準直鏡。對於這一類的照明具，從光軸補償光源是很重要的。這將防
止重新成像的光源能量造成過熱 (heating) 和損壞燈絲的可能性。落在相同的成像
陣元件上的燈絲成像仍然是必須的。這個糸統顯示在圖 11 中。
圖 11. 補償燈絲光源在第二個陣列上的成像
For a filament source, much of the energy leaving the source is directed away from the
collimator. To increase the efficiency of the system a reflective component is often
placed behind the source to capture some of this energy and to redirect it back towards
the collimator. For this type of illuminator it is important to offset the source from the
axis. This will prevent the reimaged source energy from heating and possibly damaging
the filament. It is still necessary for the images for the filament to fall on the same
imaging array element. This is shown in Fig. 11 for this system.
INSERT FIGURE 11
下一步的設計將包括加入鏡頭夾具 (mounts)、擋板 (baffles) 和其他機構元件，

並使雜散光和鬼影減到最小。可以使用 ZEMAX 本身的物件或匯入 CAD 軟體所設
計的物件來建構這些元件，以便做更進一步的分析。
２３
The next steps in the design would include adding the lens mounts, baffles, and other
mechanical components to minimize stray light and ghosting. These components can be
modeled using native ZEMAX objects or objects designed in a CAD program can be
imported for further analysis.
結論
ZEMAX 這套軟體有很強大的功能，對於成像系統和分析照明系統的整體表
現，包括雜散光和散射光，可當作設計和優化的工具。投影系統的設計，可用來驗
証這些功能如何讓光學工程師能幾乎毫無隔閡的在不同的分析模式下使用。
CONCLUSION
The ZEMAX program has significant capabilities both as a design and optimization tool
for imaging systems as well as for analyzing illumination systems for overall
performance, including stray and scattered light. The design of a projection system was
used to demonstrate how these capabilities allow an optical designer to move almost
seamlessly between the different modes of analysis.
２４

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zemax 教程

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使用ZEMAX®於設計、優化、公差和分析

Design, optimization, tolerancing and analysis using ZEMAX®

A discussion of the capabilities of the optical design program ZEMAX® is followed by a

ZEMAX 以非序列性 (non-sequential) 分析工具來結合序列性 (sequential) 描光

根據過去的經驗，對於光學系統的端對端 (end to end)分析往往是需要兩種不

序列性系統需定義視禓角 (field of view)、波長範圍和表面資料。序列性設計

一些功能可以用來分析系統，包括數個系統繪圖 (layouts) 類型、匯出 CAD 格

當以光線為基礎的方法不適用時，ZEMAX 中的物理光學傳播 (Physical Optics

使用 POP，任何波前，包括高斯和混合的高階模態光束、帽蓋形 (top hat) 分佈

POLARIZATION RAY TRACING

Light, as represented by rays is described by a location, direction, phase and amplitude.

以上所述為 ZEMAX 的概述。有許多其他的功能還沒有提到。我們現在將應

With non-sequential analysis, optical components must be described as true objects,

Non-sequential analysis is not constrained by a defined system aperture. Sources of any

我們將看到使用 ZEMAX 來設計和分析由一聚光鏡配件所組成的投影系統，

DESIGN AND ANALYSIS OF A PROJECTION SYSTEM

聚光鏡必須收集從光源發出來的光，並在底片閘 (film gate) 上形成一均勻分佈

1) 在底片閘 (film gate) 上所需的照明大小

EFL col lim ator

Several parameters need to be considered in designing this type of system, including:

1) The required size of illumination at the film gate:

EFL col lim ator

2) Element size and position of the field array:

3) Size and focal length of imaging array:

4) Focal length of field array:

將藉由使用 ZEMAX 來決定聚光鏡的參數來序列性地分析這個設計。聚光鏡

DESIGNING WITH ZEMAX

A multi-configuration design refers to an optical system which is analyzed in more than

The setup of a multi-configuration system is very similar to a single configuration system.

對於準直鏡和聚光鏡，選擇一焦距為 60 mm。光源為 8 mm 長的燈絲。透鏡陣

EFL col lim ator

EFL col lim ator

最終的透鏡參數、厚度、間距、曲率…等，將藉由使用 ZEMAX 的優化功能

Type Comment Radius Thickness Glass

Surface Configuration 1 Configuration 2 Configuration 3

圖 3 顯示三種組態的初始設計。組態 1 在最下方，組態 3 在最上方。

圖 3. 使用三重組態的 Layout 圖來優化聚光鏡

績效函數將使用標準的成像要求，以均方根光點大小 (rms spot size) 法，來個

投影光學的設計是以雙高斯 (double Gauss) 系統為基礎。系統的孔徑應該與離

ASSEMBLING THE SYSTEM

To analyze the performance of the entire assembly requires using non-sequential

In non-sequential analysis, detectors can be positioned within the optical system to

In addition to evaluating the imaging properties of the system, non-sequential analysis is

對於燈絲光源 (filament source)，離開光源的大部分能量是朝向離開準直鏡。

下一步的設計將包括加入鏡頭夾具 (mounts)、擋板 (baffles) 和其他機構元件，

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