Professional Documents
Culture Documents
Enrico Sangiorgi
ARCES, University of Bologna
ESONN’ 2005
WFE WFE
$15.7 $24.7
Billion Billion 1.6X
ITRS Projections
0.10
1985 1990 1995 2000 2005 2010 2015 2020
Year
D. A. Antoniadis, MIT
12
Power - Delay
3 Way NAND, Unloaded
0.22 0.18
HP
1 0.25
Power/Stage (mW)
0.1
Improving Device
Performanmce 0.22 SOI
Delay (nS)
13
Enabling Elements
Node Feature Density Performance
SOI, Cu
180 Tinv: 28 A 0.5X 34%
Lpoly: 85 nm
Leakage: ~20 nA
SOI, Cu
130 Tinv: 23 A 0.5X 34%
Lpoly: 55 nm
Leakage: ~100 nA
Thin SOI
90 Tinv: 19 A 0.5X ~34%
Lpoly: 45 nm
Leakage: ~300 nA
14
Wafer Dimensions
DNA
10 nm
viruses
nerve
fibers 100 nm
groove
hair 1 µm spacing
diameter on CD
large
10 µm
bacteria
biological
100 µm
cells
insects
1 mm
1 cm
Titanium silicide
Ef
Nichel silicide
fe
199 BPSG
Device dimensions
10 2 4
cti
Polysilicon
ve
Silicon nitride
L g (nm)
199
sc
9 Oxinitrides
a
Indium
li n
20
10 1 01 Arsenic
g
Boron Boron
ra
Phosphorous Phosphorous
t e
Aluminum Aluminum
SiO2 SiO2
10 0 Silicon Silicon
1990 1995 2000 2005 2010 2015 2020 1970 2000
65nm
65nm 45nm
32nm
37nm
22nm
25nm
18nm
10 13nm
9nm
Gate
Source Drain
L g~16nm
8/18/2005 Enrico Sangiorgi ARCES University of Bologna
Mobility in Ultra-thin-body SOI
10
0.1
0.01
Stand-by Power Density
0.001
0.01 0.1 1
Gate Length (µm)
23
Enabling Elements
Node Feature Density Performance
SOI, Cu
130 Tinv: 23 A 0.5X 34%
Lpoly: 55 nm
Leakage: ~100 nA
Thin SOI
90 Tinv: 19 A 0.5X ~34%
Lpoly: 45 nm
Leakage: ~300 nA
More Strain
24
BEYOND SI-MOSFET
Carbon nanotubes:
(expected 2x improvement in current drivability)
8/18/2005 Enrico Sangiorgi ARCES University of Bologna
When nano-electronics meets
biology